CN110201610A - Gas distributor and reactor - Google Patents

Abstract

The invention discloses gas distributors and reactor, the gas distributor includes main air inlet pipe, false plate, at least one vapor riser and self spaced multilayer pipeline assembly from bottom to up, one end of the vapor riser is through the false plate, and the other end is through every layer of pipeline assembly of connection；Every layer of pipeline assembly includes that a plurality of one end is connected the closed charging distributor pipe of the other end with vapor riser, and the multiple nozzles being connected with the charging distributor pipe, the gas being introduced by main air inlet pipe is distributed in charging distributor pipe by vapor riser, and is sprayed by nozzle；Wherein, along the direction from far from the false plate to close to the false plate, the internal diameter of the charging distributor pipe of every layer of pipeline assembly is gradually reduced, and the internal diameter of the nozzle is gradually increased.The gas distributor can make air-flow difference uniform in the reactor, prevent catalyst deposit and abrasion, avoid slurry plugs main air inlet pipe.

Description

Gas Distributors and Reactors

technical field

The invention relates to the field of chemical industry, in particular to a gas distributor and a reactor.

Background technique

With the continuous rise of oil prices in recent years, people pay more and more attention to the development of technologies to produce alternative oil products. Syngas is produced through coal, natural gas or other substances, and then according to the requirements of the Fischer-Tropsch synthesis catalyst for synthesis gas, through water-gas shift and synthesis The gas purification process processes the syngas, and uses the treated syngas as a raw material to produce hydrocarbons through Fischer-Tropsch synthesis, and at the same time produces oxygenated compounds, which are then processed by mature petroleum processing technology to produce high-quality, environmentally friendly oil. Taste. The development of Fischer-Tropsch synthesis technology is of great significance to the development of production technology for alternative oil products.

In the Fischer-Tropsch synthesis slurry bed reactor, the gas feed enters the gas feed distributor through the inlet pipe, and under the condition of stable inlet pressure, the gas will be dispersed into each feed distribution pipe of the gas feed distributor, and Finally, it enters the slurry bed reactor through the opening on the feed distribution pipe, drives the slurry (that is, the mixture of liquid and solid catalyst) in the reactor to move and produces a catalytic reaction, and the resulting liquid product is separated by filtration or overflowed from the top. Reactor, gas phase products and unreacted gases leave the reactor through the top of the reactor.

The Fischer-Tropsch synthesis reaction is a gas-liquid-solid three-phase reaction. The gas distributor is an important part to ensure the uniform distribution of raw gas in the bed. The main problems of the currently used gas distributor are uniform distribution of the raw material gas after passing through the distributor, wear of the catalyst and deposition of the catalyst at the bottom of the reactor. Another important problem is that when the raw material gas supply is interrupted or the pressure is unstable, it is easy to Problems with clogging, reverse flow of slurry into the gas inlet pipe. The solution of these problems is very important to realize the continuous operation of the slurry bed reactor.

The structures of the existing gas feed distributors are mainly head type, filling type, pipe type and branch type. The head-type gas distributor usually sets a closed gas chamber at the bottom of the reactor for gas redistribution, but this causes a waste of reactor volume, and there is a risk of the slurry in the reactor being poured into the head; the filling type The structure of the distributor is simple, but once the solid particles enter the packing layer during operation, it is difficult to be blown out, and it is easy to cause the packing layer to be blocked; in the existing tubular and branched gas distributors, although the gas distribution effect is better, but Fair performance in reducing catalyst attrition and preventing catalyst settling.

Generally speaking, in the existing patents and reports, the gas distributor in the slurry bed only improves one or two of the problems, but cannot improve all the above problems.

Contents of the invention

The object of the present invention is to provide a gas distributor and a reactor in order to overcome the above-mentioned problems in the prior art. The raw material gas can be evenly distributed after passing through the gas distributor, and the gas distributor can effectively avoid the wear of the catalyst and reduce the deposition of the catalyst, and it can also avoid blockage and reverse flow of the slurry when the raw material gas supply is interrupted or the pressure is unstable. Problem with the gas inlet tube.

In order to achieve the above object, the present invention provides a gas distributor on the one hand, the gas distributor includes a main air intake pipe, a dummy plate, at least one gas riser pipe and multi-layer pipeline components arranged at intervals up and down from bottom to top. One end of the gas riser pipe runs through the dummy plate, and the other end passes through each layer of pipeline components; each layer of pipeline components includes a plurality of feed distribution pipes with one end connected to the gas riser pipe and the other end closed, and connected with the gas riser pipe. The multiple nozzles connected to the feed distribution pipe, the gas introduced through the main air intake pipe is distributed into the feed distribution pipe through the gas riser pipe, and sprayed out through the nozzles; In the direction of the dummy plate, the inner diameter of the feed distribution pipe of each layer of the pipeline assembly gradually decreases, and the inner diameter of the nozzle gradually increases.

Preferably, in the pipeline assembly close to the dummy plate, the inner diameter of the nozzle increases gradually along a direction from close to the gas riser to away from the gas riser.

Preferably, the distance between the piping assembly closest to the dummy board and the dummy board is uniform.

Preferably, each of the nozzles includes a central spout with an axis vertically arranged, and further includes a plurality of side spouts arranged at an angle to the axis of the central spout and symmetrically with respect to the central spout.

Preferably, the included angle between the axis of the central nozzle and the axis of the side nozzle is 20° to 60°, preferably 30° to 45°.

Preferably, the nozzle is provided with a one-way valve disc to prevent foreign matter from entering the nozzle.

Preferably, the one-way valve flap is a spring pressing piece.

Preferably, the gas distributor includes a gas riser, the gas riser is connected to the center of each layer of the pipeline assembly, and each of the feed distribution pipes is along the circumference of the gas riser Uniformly distributed radially, each feed distribution pipe is distributed with multiple nozzles.

Preferably, the gas distributor further includes a plurality of branch pipes evenly distributed in the area between the feed distribution pipes, one end of the branch pipes is connected to the feed distribution pipe, and the other end is closed, and each of the branch pipes A plurality of nozzles are distributed on the branch pipe.

Preferably, the gas distributor includes a bottom pipeline component arranged close to the dummy plate, and a top pipeline component arranged away from the dummy plate; the inner diameter of the feed distribution pipe of the bottom pipeline component is 0.1 to 0.8 times, preferably 0.3 to 0.6 times, the inner diameter of the feed distribution pipe of the top pipeline assembly.

Preferably, the bottom surface of the bottom pipeline component is a spherical surface parallel to the upper surface of the dummy plate; the bottom surface of the top pipeline component is a plane.

Preferably, in the pipeline assembly close to the dummy plate, along the direction from away from the gas riser to close to the gas riser, the nozzle from the feed distribution pipe toward the dummy plate The extension length of the extension increases gradually.

Preferably, the maximum vertical distance between the top pipeline component and the bottom pipeline component is 50mm to 200mm, preferably 70mm to 140mm; the maximum vertical distance between the bottom pipeline component and the dummy plate is 20mm to 80mm, Preferably 40mm to 60mm.

Preferably, the main air intake pipe is provided with an open pipe facing downward.

Preferably, the bottom wall of the container is provided with a sewage outlet.

The second aspect of the present invention provides a reactor, wherein the reactor includes the above gas distributor, the gas distributor is located at the bottom of the reactor, wherein the dummy plate is connected to the bottom wall of the reactor, The side wall forms an air cavity, the main air intake pipe is inserted transversely into the air cavity, and one end of the gas riser passes through the dummy plate and communicates with the air cavity.

Preferably, the distance between the dummy plate and the bottom wall of the reactor is uniform.

Preferably, the bottom wall of the reactor is a spherical surface with a concave central area, and the upper and lower surfaces of the dummy plate are spherical surfaces parallel to the bottom wall of the reactor.

Preferably, said gas distributor comprises a gas riser extending along the longitudinal centerline of said reactor.

Preferably, when the gas distributor includes a bottom pipeline component disposed close to the dummy plate, and a top pipeline component disposed away from the dummy plate, the distance between the periphery of the top pipeline component and the reactor’s The horizontal spacing of the side wall is not less than 2.5% of the radial length of the reactor; the horizontal spacing of the peripheral edge of the bottom pipeline assembly from the side wall of the reactor is 1.5% of the radial length of the reactor % to 2.0%.

Preferably, the bottom wall of the reactor is provided with a sewage outlet.

Through the above technical solution, the gas distributor provided by the present invention is provided with multi-layer pipeline components spaced apart from each other up and down. Each layer of pipeline assembly includes multiple feed distribution pipes, one end of these feed distribution pipes is connected with the gas riser pipe, and the other end is closed; there are also multiple nozzles connected with these feed distribution pipes. That is to say, the piping components of each layer form injectors that spray the gas evenly towards the dummy plate. Moreover, in the gas distributor of the present invention, along the direction from away from the dummy plate to close to the dummy plate, the inner diameter of the feed distribution pipe of each layer of pipeline components gradually decreases, but the inner diameter of the nozzle gradually increases. In this way, the closer the piping assembly is to the dummy plate, the smaller the inner diameter of the feed distribution pipe of this layer of piping assembly is, and the larger the inner diameter of the nozzle is. The inner diameter of the feed distribution pipe is small, which can reduce the gas flow distribution and reduce the gas flow rate; the inner diameter of the nozzle is large, which can reduce the gas flow rate. Therefore, according to the structure of the gas distributor of the present invention, the closer the pipeline component is to the dummy plate, the lower the gas flow rate; the farther the pipeline component is from the dummy plate, the greater the gas flow rate. In this way, the flow rate of the gas ejected from the pipeline components of each layer can be relatively close when reaching the false plate, effectively eliminating the dead angle, ensuring the uniform distribution of the gas after passing through the gas distributor, and preventing the catalyst from flowing through the false plate. deposition on the plate and also reduces catalyst attrition. Moreover, in the reactor containing the gas distributor, the dummy plate forms an air cavity with the bottom wall and side wall of the reactor. When the pressure of the raw material gas is unstable or the gas supply is interrupted, the slurry will only flow back into the cavity and will not Reverse flow blocked main intake pipe.

Other features and advantages of the present invention will be described in detail in the detailed description that follows.

Description of drawings

Fig. 1 is a structural representation of a reactor containing the gas distributor according to the present invention;

Fig. 2 is a schematic structural view of a layer of pipeline assembly in the multilayer pipeline assembly of the gas distributor according to the present invention;

Fig. 3 is the structural representation of the nozzle of gas distributor according to the present invention;

Fig. 4 is a structural schematic view of the nozzle of the gas distributor according to the present invention, showing the spring pressing piece.

Explanation of reference signs

1 reactor; 11 bottom wall;

12 side walls; 13 sewage outlet;

2 Gas rising pipe; 3 Feed distribution pipe;

4 pipes; 51 top pipeline components;

52 bottom pipeline components; 6 nozzles;

61 center spout; 62 side spout;

63 spring pressing piece; 7 main intake pipe;

71 open pipes; 8 false plates;

9 air chambers.

Detailed ways

Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.

In the present invention, in the absence of a contrary statement, the used orientation words such as "up, down, left, right" usually refer to the " up down left right".

Referring to Fig. 1 and Fig. 2, the present invention provides a gas distributor and a reactor. As shown in Fig. 1 and Fig. 2, the gas distributor comprises a main air intake pipe 7, a dummy plate 8, at least one gas riser 2 and multi-layer pipeline assemblies spaced up and down from each other from bottom to top, and the gas riser 2 One end runs through the dummy plate 8, and the other end runs through each layer of pipeline components. The gas passes through the main air intake pipe 7 and enters the multilayer pipeline components along at least one gas riser 2. Although only one gas riser 2 is shown in FIG. 1 and FIG. 2 , this is only an embodiment of the gas riser 2 of the present invention, and there may be multiple gas riser pipes of the present invention.

The gas in the gas riser 2 is evenly sprayed onto the surface of the false plate 8, driving the slurry above the false plate 8 (ie the mixture of liquid phase and solid phase reactants) to move and generate a catalytic reaction. The gas distributor of the present invention includes multi-layer pipeline components, and these pipeline components are spaced up and down from each other. That is to say, the gas distributor is arranged in a layered structure, and the pipeline components of each layer are provided with a plurality of feed distribution pipes 3 and a plurality of nozzles 6 communicated with the feed distribution pipes 3 . One end of each feed distribution pipe 3 is connected to the gas riser pipe 2, and the other end is closed. In this way, the feed distribution pipes 3 distributed in a mesh shape form the extended distribution structure of the gas riser 2, and the area of the carrier gas is expanded to be slightly smaller than the cross-sectional area of the reactor 1, so that the ejected gas is basically distributed in the reactor 1. uniformly distributed across the cross-sectional area. The gas enters the pipeline components of each layer from the gas riser pipe 2, and after passing through the feed distribution pipe 3, it is sprayed from each nozzle 6 to the upper surface of the dummy plate 8, and then turns back upward after reaching the upper surface of the dummy plate 8, driving The slurry (ie the mixture of liquid phase and solid phase reactant) on the upper part of the dummy plate 8 moves and produces a catalytic reaction, preventing the solid phase reactant in the slurry from depositing.

According to the embodiment of the present invention, along the direction from away from the dummy plate 8 to close to the dummy plate 8, the inner diameter of the feed distribution pipe 3 of each layer of pipeline assembly gradually decreases, and the inner diameter of the nozzle 6 gradually increases. That is to say, the closer the piping assembly is to the dummy plate 8, the smaller the inner diameter of the feed distribution pipe 3 of the layer piping assembly is, and the larger the inner diameter of the nozzle 6 is; The larger the inner diameter of the feed distribution pipe 3 of the pipeline assembly, the smaller the inner diameter of the nozzle 6 . When the gas flows from the gas riser 2 to the feed distribution pipe 3 of the pipeline assembly of different layers, the flow rate and velocity of the gas flowing into the feed distribution pipe 3 are proportional to the inner diameter of the feed distribution pipe 3 . Therefore, when the inner diameter of the feed distribution pipe 3 is small, the gas flow distribution can be reduced and the gas flow velocity can be reduced. Thus the effect formed in the gas distributor of the present invention is that the closer to the pipeline assembly of the false plate 8, the smaller the flow rate and flow velocity of the gas in the feed distribution pipe 3; the farther away from the pipeline assembly of the false plate 8 , the greater the flow rate and velocity of the gas in the feed distribution pipe 3. On the other hand, when the gas flows from the feed distribution pipe 3 to different nozzles 6 , the flow velocity of the gas flowing into the nozzles 6 is inversely proportional to the inner diameter of the nozzles 6 . Therefore, when the inner diameter of the nozzle 6 is large, the flow velocity of the ejected gas can be reduced. Thus the effect formed in the gas distributor of the present invention is that the closer to the pipeline assembly of the dummy plate 8, the smaller the flow velocity of the gas ejected from the nozzle 6; The flow rate of the ejected gas is greater.

The gas distributor of the present invention is arranged at the bottom of the reactor 1, the dummy plate 8 forms an air chamber 9 with the bottom wall 11 and the side wall 12 of the reactor 1, and the main air inlet pipe 7 is inserted transversely into the air chamber 9, One end of the gas riser 2 passes through the dummy plate 8 and communicates with the air chamber 9 . When the raw material gas pressure is unstable or the gas supply is interrupted, the slurry will only flow back into the air inlet chamber 9, and will not enter the main air inlet pipe 7 and block the main air inlet pipe 7.

Based on the above, in the gas distributor provided by the present invention, by setting feed distribution pipes 3 and nozzles 6 with different inner diameters in the pipeline components of each layer, the gas ejected from the pipeline components of each layer reaches the dummy plate 8, the flow velocity is relatively close, which can effectively eliminate the dead angle. In this way, even if the solid phase reactants temporarily fall on the dummy plate 8, they will be blown away by the uniformly distributed gas; The airflow ejected from the nozzle 6 close to the dummy board 8 is too fast and strongly hits the dummy board 8 to cause abrasion. At the same time, in the reactor 1, when the raw material gas pressure is unstable or the gas supply is interrupted, the slurry will only flow back into the inlet chamber 9, and will not enter the main inlet pipe 7 and block the main inlet pipe 7.

Taking the embodiment shown in FIG. 1 and FIG. 2 as an example, the gas distributor includes a bottom pipeline assembly 52 disposed close to the dummy plate 8 , and a top pipeline assembly 51 disposed away from the dummy plate 8 . The top pipeline assembly 51 and the bottom pipeline assembly 52 are spaced up and down, and both communicate with the gas riser 2 . Both the top pipeline assembly 51 and the bottom pipeline assembly 52 include a plurality of feed distribution pipes 3 and a plurality of nozzles 6 communicating with the feed distribution pipes 3 . According to an embodiment of the present invention, the inner diameter of the feed distribution pipe 3 of the bottom pipeline assembly 52 is smaller than the inner diameter of the feed distribution pipe 3 of the top pipeline assembly 51 . For example but not limited to, the inner diameter of the feed distribution pipe 3 of the bottom pipeline assembly 52 may be 0.1 to 0.8 times, preferably 0.3 to 0.6 times, the inner diameter of the feed distribution pipe 3 of the top pipeline assembly 51 . When the gas flows from the gas riser 2 to the top pipeline assembly 51 and the bottom pipeline assembly 52, since the inner diameter of the feed distribution pipe 3 of the bottom pipeline assembly 52 is relatively small, the feed that enters the bottom pipeline assembly 52 The gas flow rate of the distribution pipe 3 will be smaller than the gas flow rate entering the feed distribution pipe 3 of the top pipeline assembly 51 . In addition, according to the present invention, the inner diameter of the nozzle 6 of the bottom pipeline component 52 is larger than the inner diameter of the nozzle 6 of the top pipeline component 51 . Therefore, the velocity of the air flow ejected from the nozzles 6 of the bottom piping assembly 52 is significantly lower than the air velocity ejected from the nozzles 6 of the top piping assembly 51 . And when the airflow ejected from the nozzle 6 of the bottom pipeline assembly 52 and the airflow ejected from the nozzle 6 of the top pipeline assembly 51 reach the dummy plate 8, since the bottom pipeline assembly 52 is closer to the dummy plate 8, both The air velocity of group nozzle 6 ejection just is in the state of approaching substantially. Thereby, it is possible to effectively eliminate the purging dead angle of the air flow on the dummy plate 8 and prevent the accumulation of solid-phase reactants in the dead angle. In addition, although the distance between the bottom pipeline assembly 52 and the dummy plate 8 is relatively small, the air velocity ejected from the bottom pipeline assembly 52 is low, so it will not cause wear of the solid phase material; The air velocity is relatively high, but because the distance between the top pipeline assembly 51 and the dummy plate 8 is relatively large, it will also prevent the solid-phase reactants from colliding with the dummy plate 8 at high speed and cause abrasion. At the same time, in the reactor 1, when the raw material gas pressure is unstable or the gas supply is interrupted, the slurry will only flow back into the inlet chamber 9, and will not enter the main inlet pipe 7 and block the main inlet pipe 7.

The above is described by taking a two-layer pipeline assembly as an example. The present invention can also provide more layers of pipeline assemblies, which are all embodiments of the present invention and within the scope of protection of the present invention. In the following, for the convenience of description, the structure of the two-layer pipeline assembly is still used as an example for illustration, but implementations of more-layer pipeline assemblies are not excluded.

Continuing to refer to FIG. 1 and FIG. 2 , according to an embodiment of the present invention, the gas distributor includes a gas riser 2 , and the gas riser 2 is connected to the center of each layer of pipeline components. As shown in FIG. 2 , the feed distribution pipes 3 are evenly distributed radially along the circumferential direction of the gas riser pipe 2 . In reactions comprising this gas distributor, said gas riser 2 extends along the longitudinal centerline of the reactor 1 . In this way, it can be ensured that the pressure and velocity of the gas entering each feed distribution pipe 3 are substantially equal, so that the distribution of the gas is uniform. A plurality of nozzles 6 are distributed on each feed distribution pipe 3, and these nozzles 6 can be arranged at equal intervals, or can be arranged in other ways, but preferably, the flow velocity of the gas ejected from each nozzle 6 should be as close as possible. quite.

Further, according to the embodiment of the present invention, the gas distributor further includes a plurality of branch pipes 4 , and these branch pipes 4 are evenly distributed in the area between the feed distribution pipes 3 . One end of the branch pipe 4 is connected to the feed distribution pipe 3 , and the other end is closed, and a plurality of nozzles 6 are distributed on each branch pipe 4 . That is to say, the area of the carrier gas is further expanded through the branch pipe 4, so that the gas is ejected more uniformly. As shown in FIG. 2 , a plurality of branch pipes 4 arranged at intervals extend outwards from both sides of each feed distribution pipe 3 . The orientation of the branch pipes 4 located on one side of each feed distribution pipe 3 and the inclination angle relative to the feed distribution pipe 3 are the same, and the distances between the branch pipes 4 are basically the same. The purpose of this setting is to make the distribution of gas even when spraying.

As shown in FIGS. 1 and 2 , according to an embodiment of the present invention, in the piping assembly near the dummy plate 8 , that is, in the bottom piping assembly 52 of the embodiment shown in FIG. 1 , along the As the riser 2 moves away from the gas riser 2, the inner diameter of the nozzle 6 gradually increases. That is, the inner diameter of the nozzle 6 gradually increases along the direction from the center to the periphery of the pipe assembly. Since the pipeline components such as the bottom pipeline component 52 are arranged close to the dummy plate 8, the distance with the dummy plate 8 is relatively small, so the solid-phase reactants temporarily falling on the dummy plate 8 are ejected to the nozzles 6 of these pipeline components. The air flow is relatively sensitive, and the nozzles 6 on these pipeline components should try to ensure a relatively uniform air flow. Since the velocity of the airflow ejected from the nozzle 6 is related to the pressure difference before and after the nozzle 6, when the gas is gradually ejected from the nozzle 6, the closer to the periphery of the pipeline assembly, the smaller the pressure difference between the front and rear of the nozzle 6, causing the airflow ejected from the nozzle to The reduction of the speed may cause the solid-phase reactant to deposit on the corresponding dummy plate 8 at the periphery of the pipeline assembly. In the present invention, the inner diameter of the nozzle 6 of the pipeline assembly such as the bottom pipeline assembly 52 is set to gradually increase along the direction from close to the gas riser 2 to away from the gas riser 2, so that the pipeline such as the bottom pipeline assembly 52 The jet volume of the nozzle 6 at the periphery of the assembly is increased, thereby reducing the possibility of deposition of solid phase reactants at the periphery of the tubing assembly. In other embodiments, this problem can also be solved by changing the distance between the nozzles 6 . For example, along the direction from close to the gas riser 2 to away from the gas riser 2, the distance between the nozzles 6 can be gradually reduced, so as to reduce the possibility of solid-phase reactants being deposited at the periphery of the pipeline assembly. Of course, the embodiment of changing the inner diameter of the nozzle 6 is more convenient to implement.

In addition, according to the embodiment of the present invention, the pipeline component closest to the dummy plate 8 refers to the bottom pipeline component 52 in the embodiment shown in FIG. 1 , and the distance between it and the dummy plate 8 is uniform. As mentioned above, in the pipeline assembly such as the bottom pipeline assembly 52, the inner diameter of the nozzle 6 gradually decreases along the direction from the periphery to the center of the pipeline assembly, so that the airflow velocity ejected by each nozzle 6 is approximately quite. However, if it is considered that the dummy plate 8 may not be a plane but other shapes, such as a spherical surface as shown in Fig. 6 is different from the dummy board 8, which may cause uneven distribution of the airflow when it reaches the dummy board 8. In the gas distributor of the present invention, the piping components closest to the dummy plate 8 are set to be at a uniform distance from the dummy plate 8, that is, no matter what shape the dummy plate 8 is, the piping components closest to the dummy plate 8 They are all arranged to be kept substantially parallel to the dummy plate 8, so that the distances between the nozzles 6 and the dummy plate 8 are substantially equivalent. In this way, the uniform distribution of the evenly ejected airflow can be maintained when sprayed onto the dummy plate 8, and the airflow can effectively disturb the solid phase reactant on the dummy plate 8, thereby preventing the occurrence of dead spots for solid phase reactant deposition. Of course, if the gas distributor has more than three layers of pipeline components, the two-layer or three-layer pipeline components close to the dummy plate 8 can also be arranged in a shape that is basically parallel to the dummy plate 8. A simple variant of the invention. When the gas distributor includes a plurality of gas risers 2, it is the same as the above-mentioned principle, in order to make the gas flow velocity entering each gas riser 2 equivalent, so that the gas velocity ejected by each nozzle 6 is equivalent, in the reaction In the reactor 1, the distance between the dummy plate 8 and the bottom wall 11 of the reactor 1 is also set to be uniform. At the same time, the diameter of the gas riser 2 can be set to be constant or gradually increase from the center to the side wall 12 along the radial direction of the reactor 1 .

In more detail, as shown in FIG. 1 , the bottom surface of the bottom pipeline assembly 52 closest to the dummy plate 8 is set as a spherical surface substantially parallel to the upper surface of the dummy plate 8, so that each nozzle of the bottom pipeline assembly 52 The distance between 6 and dummy plate 8 is roughly kept the same, so that the airflow can be evenly distributed when it reaches the dummy plate 8. Of course, in the embodiment where the gas distributor has more layers of pipeline components, the bottom surface of the penultimate layer or even more layers of pipeline components close to the dummy plate 8 can also be set approximately parallel to the dummy plate 8 spherical shape. These embodiments are all simple variations of the present invention. In addition, according to the embodiment of the present invention, the bottom surface of the top pipeline component 51 may be set in a planar shape. That is to say, the various layers of pipeline components may not be arranged in the same shape. In other embodiments, for example, when the gas distributor includes three layers of piping components, the bottom surface of the bottom piping component can be set as a spherical surface parallel to the dummy plate 8, and the bottom surfaces of the other two layers of piping components can be set to It is also possible to set the bottom surface of the topmost pipeline component as a plane, and set the bottom surfaces of the other two layers of pipeline components to be spherical surfaces parallel to the upper surface of the dummy plate 8 . The implementations can be combined arbitrarily according to the different requirements for the gas distributor. Compared with the embodiment in which the bottom surface of the pipeline assembly is arranged as a spherical surface, the manufacturing cost of the embodiment in which the bottom surface of the pipeline assembly is set as a plane is lower. As shown in Figure 1, when the bottom wall 11 of the reactor 1 is a concave spherical surface in the central area, according to an embodiment of the present invention, the upper and lower surfaces of the dummy plate 8 can be arranged to be aligned with the bottom wall of the reactor 1. 11 substantially maintain parallel spheres.

In addition, according to the embodiment of the present invention, when the dummy plate 8 is a concave spherical surface, in the pipeline assembly close to the dummy plate 8, that is, in the bottom pipeline assembly 52 of the embodiment shown in FIG. 1 , along From the direction away from the gas riser 2 to the direction close to the gas riser 2 , the extension length of the nozzle 6 extending from the feed distribution pipe 3 toward the dummy plate 8 gradually increases. That is to say, when there is only one gas riser 2 and it is connected to the central part of each layer of the pipeline assembly, the extension length of the nozzle 6 gradually increases along the direction from the periphery of the pipeline assembly to the center. As mentioned above, in the pipeline assembly such as the bottom pipeline assembly 52, the inner diameter of the nozzle 6 can be gradually reduced along the direction from the periphery to the center of the pipeline assembly, so that the airflow ejected by each nozzle 6 The speed is about the same. However, when the dummy plate 8 is a spherical surface such as that shown in FIG. Therefore, the present invention takes the extension length of the nozzle 6 close to the gas riser 2, so that even if the central area of the dummy plate 8 is concave, the nozzle 6 can be shortened to the dummy plate by extending the length of the nozzle 6. 8, so that the distance between each nozzle 6 of the bottom pipeline assembly 52 and the dummy plate 8 can still maintain approximately the same distance.

In addition, as shown in Figure 1, according to the preferred embodiment of the present invention, the maximum vertical distance between the top pipeline assembly 51 and the bottom pipeline assembly 52 is 50mm to 200mm, preferably 70mm to 140mm; The maximum vertical spacing of 8 is 20mm to 80mm, preferably 40mm to 60mm. As shown in Fig. 2, according to a preferred embodiment of the present invention, in the reactor 1, the horizontal distance between the peripheral edge of the top layer piping assembly 51 and the side wall 12 of the reactor 1 is not less than 100% of the radial length of the reactor 1. 2.5%; the horizontal distance between the periphery of the bottom piping assembly 52 and the side wall 12 of the reactor 1 is 1.5% to 2.0% of the radial length of the vessel. Under this parameter setting, the catalyst will not be deposited on the dummy plate 8, and will not be worn at the same time.

In addition, according to an embodiment of the present invention, as shown in FIG. 1 , the main inlet pipe 7 is provided with an open pipe 71 with the opening facing downward, so that in the reactor 1 where the gas distributor is installed, the main inlet pipe 7 The gas sprays to the bottom wall 11 of the reactor 1 through the open pipe 71 , and rebounds into the gas riser 2 after touching the bottom wall 11 of the reactor 1 . Preferably, the bottom wall 11 of the reactor 1 is provided with a sewage outlet 13 . The slurry deposited on the bottom wall 11 of the reactor 1 can be discharged at any time when the slurry enters the air cavity 9 in reverse flow, so as to further prevent the slurry from entering the main air inlet pipe 7 in reverse flow.

According to the embodiment of the present invention, the dummy plate 8 can be processed integrally with the container shell, and the upper surface is preferably set as a smooth surface.

Referring to FIG. 3 , according to an embodiment of the present invention, each nozzle 6 includes a central nozzle 61 and a plurality of side nozzles 62 arranged symmetrically with respect to the central nozzle 61 . The axis of the central nozzle 61 is arranged in the vertical direction, and the axis of the side nozzles 62 is arranged at an angle to the axis of the central nozzle 61 . Each nozzle 6 is provided with a plurality of nozzles, which can further expand the area of the carrier gas; the central nozzle 61 ejects the airflow vertically downward, and the side nozzles 62 eject the airflow from other angles, so that the airflow ejected from the nozzle 6 has a larger coverage ; Thus, making the air distribution more uniform. In addition, the axial section of the central nozzle 61 and the side nozzle 62 can be set in the shape of a truncated cone, and the range of the cone angle can be set between 60-150°. Preferably, the included angle between the axis of the central nozzle 61 and the axis of the side nozzle 62 , such as the angle β shown in FIG. 3 , is 20° to 60°, more preferably, the included angle is 30° to 45°. Such an angle setting can make the distribution of the airflow more uniform and avoid dead angles.

Referring to FIG. 4 , according to an embodiment of the present invention, the nozzle 6 is provided with a one-way valve disc to prevent foreign matter from entering the nozzle 6 . The airflow in the nozzle 6 operated by the one-way flap is ejected from the nozzle 6 , but foreign matter from the outside is not allowed to enter the nozzle 6 . That is to say, when the pressure of the gas riser 2 is normal, the pressure of the gas can push the one-way valve disc, and the gas can enter the reactor 1 through the nozzle 6; when the pressure of the gas riser 2 is unstable, or temporarily interrupts , the one-way disc is closed. This prevents the slurry from flowing backwards to the nozzle 6 , thereby avoiding backflow into the gas riser 2 and the main air intake pipe 7 to cause blockage. Preferably, the one-way valve flap is a spring pressing piece 63 . The spring pressing piece 63 is simple in structure, low in cost, and easy to realize.

The reactor containing the above-mentioned gas distributor of the present invention is especially suitable for the slurry bed reactor of Fischer-Tropsch synthesis. After the above-mentioned gas distributor is installed, the gas flow can be made uniform respectively, and the catalyst in the slurry can also be prevented from being in the false plate and reacting. Deposition at the bottom of the device can prevent catalyst wear, and can also prevent slurry backflow from blocking the main inlet pipe 7 when the feed gas pressure is unstable or the gas supply is interrupted.

All the embodiments of the above-mentioned gas distributor can be combined with all the embodiments of the reactor in any combination, and all are within the protection scope of the present invention. The same content will not be repeated here.

【Example】

The experiments were carried out in a slurry bed reactor with a diameter of 0.5 m. The form of the gas distributor is shown in Figure 1 to Figure 4. Using a solid powder catalyst and liquid paraffin as the experimental medium, the particle size of the catalyst ranges from 30 to 150um, and the airflow velocity is controlled at 0.25m/s to verify the performance of the gas distributor and reactor. Among them, the gas distributor has a gas riser and is located on the longitudinal central axis of the reactor. The gas distributor has two layers of pipeline components. The inner diameter of the feed distribution tube of the top pipeline component is about 40mm, and the inner diameter of the branch pipe is about 30mm. ; The inner diameter of the feed distribution pipe of the bottom pipeline assembly is about 20mm, and the inner diameter of the branch pipe is about 15mm. The inner diameter of the nozzle of the top pipeline assembly is 4mm, and the nozzle length is 10mm; among the nozzles of the bottom pipeline assembly, the inner diameter of the nozzle close to the gas riser is 6mm, and the nozzle length is 20mm, and the inner diameter of the nozzle near the periphery of the pipeline assembly is 10mm, nozzle length is 15mm.

The test results found that there was no catalyst deposition on the dummy plate and the bottom of the reactor, the gas distribution along the axial direction of the reactor was uniform, the catalyst particle size in the reactor was almost unchanged compared with the fresh catalyst, and when the gas flow was interrupted, the main inlet pipe No slurry backflow blockage occurred.

The test result shows that the structure of the gas distributor and the reactor thereof provided by the invention is reasonable and the effect is remarkable.

The preferred embodiments of the present invention have been described in detail above with reference to the accompanying drawings, however, the present invention is not limited thereto. Within the scope of the technical concept of the present invention, various simple modifications can be made to the technical solution of the present invention, including combining various technical features in any other suitable manner. In order to avoid unnecessary repetition, various possible combinations are not further described in the present invention. However, these simple modifications and combinations should also be regarded as the content disclosed by the present invention, and all belong to the protection scope of the present invention.

Claims (11)

1. a kind of gas distributor, which is characterized in that the gas distributor includes main air inlet pipe (7), false plate from bottom to up (8), at least one vapor riser (2) and self spaced multilayer pipeline assembly, the vapor riser (2) One end through the false plate (8), the other end is through every layer of pipeline assembly of connection；Every layer of pipeline assembly includes a plurality of one end Be connected the closed charging distributor pipe (3) of the other end with vapor riser (2), and is connected with the charging distributor pipe (3) Multiple nozzles (6), by main air inlet pipe (7) introduce gas by vapor riser (2) be distributed to charging distributor pipe (3) In, and sprayed by nozzle (6)；Wherein, along the direction from far from the false plate (8) to close to the false plate (8), every layer of institute The internal diameter for stating the charging distributor pipe (3) of pipeline assembly is gradually reduced, and the internal diameter of the nozzle (6) is gradually increased.

2. gas distributor according to claim 1, which is characterized in that in the pipeline group close to the false plate (8) In part, along from the direction close to the vapor riser (2) to separate the vapor riser (2), the nozzle (6) it is interior Diameter is gradually increased；

Preferably, the spacing between the pipeline assembly of the false plate (8) and the false plate (8) is proportional spacing.

3. gas distributor according to claim 1 or 2, which is characterized in that it is perpendicular that each nozzle (6), which includes axis, Histogram further includes angled with the axis of the center nozzle (61) and relative in described to the center nozzle (61) of setting Multiple side spouts (62) that heart spout (61) is symmetrically arranged；

Preferably, the angle of the axis of the axis and side spout (62) of the center nozzle (61) is 20 ° to 60 °, preferably It is 30 ° to 45 °.

4. gas distributor according to claim 1, which is characterized in that the nozzle (6) is provided with clapper, to prevent Only foreign matter enters the nozzle (6)；

Preferably, the clapper is spring pressuring plate (63).

5. gas distributor according to claim 1, which is characterized in that the gas distributor includes that a gas rises It manages (2), the vapor riser (2) is connected to the centre of every layer of pipeline assembly, charging distributor pipe (3) described in each item Circumferential along the vapor riser (2) is uniformly distributed with radial, is distributed on every charging distributor pipe (3) multiple The nozzle (6)；

Preferably, the gas distributor further includes a plurality of of the region being evenly distributed between charging distributor pipe (3) Branch pipe (4), one end of the branch pipe (4) are connected to the charging distributor pipe (3), and the other end is closed, on every branch pipe (4) Multiple nozzles (6) are distributed with.

6. gas distributor according to claim 1, which is characterized in that the gas distributor includes close to the false plate (8) the bottom pipeline assembly (52) being arranged, and the top layer pipeline assembly (51) being arranged far from the false plate (8)；

The internal diameter of the charging distributor pipe (3) of the bottom pipeline assembly (52) is the described of the top layer pipeline assembly (51) Feed 0.1 times to 0.8 times, preferably 0.3 times to 0.6 times of the internal diameter of distributor pipe (3).

7. gas distributor according to claim 6, which is characterized in that the bottom surface of the bottom pipeline assembly (52) be with The parallel spherical surface in the upper surface of the vacation plate (8)；The bottom surface of the top layer pipeline assembly (51) is plane；

Preferably, in the pipeline assembly close to the false plate (8), along from far from vapor riser (2) to close institute The direction of vapor riser (2) is stated, the nozzle (6) is prolonged from charging distributor pipe (3) towards what the false plate (8) extended Elongation is gradually increased；

Preferably, maximum perpendicular spacing of the top layer pipeline assembly (51) apart from the bottom pipeline assembly (52) be 50mm extremely 200mm, preferably 70mm are to 140mm；Maximum perpendicular spacing of the bottom pipeline assembly (52) apart from the false plate (8) is 20mm To 80mm, preferably 40mm to 60mm.

8. gas distributor according to claim 1, which is characterized in that be provided with opening court on the main air inlet pipe (7) Under open tube (71).

9. a kind of reactor, which is characterized in that the reactor includes gas distribution of any of claims 1-8 Device, the gas distributor are located at the bottom of the reactor (1), wherein the bottom wall of vacation plate (8) and reactor (1) (11), side wall (12) forms air cavity (9), in the horizontal insertion air cavity (9) of main air inlet pipe (7), the one of the vapor riser (2) End is connected to across the false plate (8) with the air cavity (9).

10. reactor according to claim 9, which is characterized in that the bottom wall of vacation plate (8) and the reactor (1) (11) spacing between is proportional spacing；

Preferably, the bottom wall (11) of the reactor (1) is the recessed spherical surface in center region, the upper and lower surface of the vacation plate (8) For the spherical surface parallel with bottom wall (11) of the reactor (1)；

Preferably, the gas distributor includes a vapor riser (2), and the vapor riser (2) is along the reaction The longitudinal centre line of device (1) extends.

11. reactor according to claim 9 or 10, which is characterized in that when the gas distributor includes close to described The bottom pipeline assembly (52) of false plate (8) setting, and when top layer pipeline assembly (51) far from false plate (8) setting, it is described The horizontal space of side wall (12) of the periphery of top layer pipeline assembly (51) apart from the reactor (1) is not less than the reactor (1) the 2.5% of radical length；Side wall (12) of the periphery of the bottom pipeline assembly (52) apart from the reactor (1) Horizontal space is the 1.5% to 2.0% of the radical length of the reactor (1)；

Preferably, the bottom wall (11) of the reactor (1) is provided with sewage draining exit (13).