CN110760791A

CN110760791A - Mask plate and mask assembly

Info

Publication number: CN110760791A
Application number: CN201910153513.9A
Authority: CN
Inventors: 李加伟
Original assignee: Yungu Guan Technology Co Ltd
Current assignee: Yungu Guan Technology Co Ltd
Priority date: 2019-02-28
Filing date: 2019-02-28
Publication date: 2020-02-07

Abstract

The application provides a mask plate and a mask assembly. The mask plate comprises a first evaporation coating area and a second evaporation coating area, the first evaporation coating area reaches a plurality of evaporation coating openings are arranged in the second evaporation coating area respectively, the density of evaporation coating openings in the first evaporation coating area is greater than that of evaporation coating openings in the second evaporation coating area, and the area of the cross section of the evaporation coating openings in the first evaporation coating area is smaller than that of the cross section of the evaporation coating openings in the second evaporation coating area.

Description

Mask plate and mask assembly

Technical Field

The application relates to the technical field of display device preparation, especially relates to a mask plate and a mask assembly.

Background

With the rapid development of electronic devices, the requirements of users on screen occupation ratio are higher and higher, so that the comprehensive screen display of the electronic devices is concerned more and more in the industry. Traditional electronic equipment such as cell-phone, panel computer etc. owing to need integrate such as leading camera, earphone and infrared sensing element etc. so the accessible is slotted (Notch) on the display screen, sets up camera, earphone and infrared sensing element etc. in the fluting region, but the fluting region can not be used for the display screen, like the bang screen among the prior art, or adopts the mode of trompil on the screen, to the electronic equipment who realizes the function of making a video recording, external light accessible screen on trompil department get into the photosensitive element who is located the screen below. However, these electronic devices are not all full-screen in the true sense, and cannot display in each area of the whole screen, for example, the camera area cannot display the picture.

Disclosure of Invention

The first aspect of the embodiment of the application provides a mask plate, the mask plate includes first coating by vaporization region and second coating by vaporization region, first coating by vaporization region reaches be equipped with a plurality of coating by vaporization openings in the second coating by vaporization region respectively, coating by vaporization open-ended density is greater than in the first coating by vaporization region coating by vaporization open-ended density in the second coating by vaporization region, the area of coating by vaporization open-ended cross section is less than in the first coating by vaporization region coating by vaporization open-ended cross section area in the second coating by vaporization region.

In one embodiment, at least one side surface of the inner wall of the evaporation opening in the first evaporation region is provided with a first protrusion, the same side of the inner wall of the evaporation opening in the second evaporation region is provided with a second protrusion, and the area of a first section of the first protrusion in the direction perpendicular to the extending direction of the first protrusion is larger than the area of a second section of the second protrusion in the direction perpendicular to the extending direction of the second protrusion; and in the two adjacent side surfaces of the inner wall of the evaporation opening where the first protrusion and the second protrusion are located, the direction in which one side surface points to the other side surface is the extending direction of the corresponding protrusion. The density of the evaporation openings in the first evaporation area of the mask plate is greater than the density of the evaporation openings in the second evaporation area, because at least one side of the inner wall of the first evaporation area is provided with a first protrusion, the same side of the second evaporation area is provided with a second protrusion, and the first protruding section is greater than the second protruding section of the second, the mask plate is in the mesh opening process, so that the deformation of the evaporation openings in the first evaporation area is reduced, thereby the deformation of the evaporation openings 11 in the first evaporation area is consistent with the deformation of the evaporation openings in the second evaporation area, the color mixing in the evaporation process caused by the inconsistency of the deformation of the evaporation openings in the first evaporation area and the second evaporation area is avoided, and the evaporation yield is improved.

Preferably, the boundary of the first cross section is composed of a plurality of folding lines, and the boundary of the second cross section is composed of a plurality of folding lines.

In one embodiment, the first cross section and the second cross section are respectively axisymmetric figures, and the symmetry axes of the first cross section and the second cross section are respectively vertical to the side surface of the inner wall of the evaporation opening where the first cross section and the second cross section are located; the distance between the boundary of the first section and the side surface of the inner wall of the evaporation opening where the first section is located is gradually reduced from the symmetrical axis to the direction deviating from the symmetrical axis, and the distance between the boundary of the second section and the side surface of the inner wall of the evaporation opening where the second section is located is gradually reduced; so set up, the change rule of first cross-section and second cross-section is unanimous, more does benefit to the size of adjusting first cross-section and second cross-section. And the first section and the second section are respectively in an axisymmetric pattern, so that the shapes of the first section and the second section are more attractive, and the shapes of the first bulge and the second bulge are more attractive.

Preferably, the maximum distance between the first cross section and the side surface of the inner wall of the evaporation opening where the first cross section is located is equal to the maximum distance between the second cross section and the side surface of the inner wall of the evaporation opening where the second cross section is located; the parts of the boundaries of the first cross section and the second cross section, which are positioned at two sides of the symmetry axis, are respectively arc-shaped, the included angle between a first straight line tangent to the part of the boundary of the first cross section, which is positioned at one side of the symmetry axis, and the symmetry axis is a first included angle, and the first straight line passes through the intersection point of the boundary of the first cross section and the symmetry axis; the included angle between a second straight line tangent to the part of the boundary of the second section, which is positioned on one side of the symmetry axis, and the symmetry axis is a second included angle, and the second straight line passes through the intersection point of the boundary of the second section and the symmetry axis; the first included angle is greater than the second included angle. The thickness of each part of the mask plate is generally the same, and when the maximum distance between the boundary of the first section and the second section and the side surface of the inner wall of the evaporation opening where the boundary is located is constant, the larger the first included angle corresponding to the first section is, the larger the area of the first section is; the larger the second included angle corresponding to the second cross section is, the larger the area of the second cross section is. Therefore, the size of the area of the first section can be adjusted by adjusting the size of the first included angle corresponding to the first section, and the size of the area of the second section can be adjusted by adjusting the size of the second included angle corresponding to the second section.

In one embodiment, the first included angle ranges from 60 ° to 80 °, and the second included angle ranges from 20 ° to 40 °. So set up and more do benefit to in the mask plate stretch-screen in-process in the first coating by vaporization regional deformation volume of coating by vaporization opening unanimous with the deformation volume of coating by vaporization opening in the second coating by vaporization region.

In one embodiment, the mask further includes a transition region adjacent to the first evaporation region and the second evaporation region, the transition region is provided with a plurality of evaporation openings, a third protrusion is arranged on the same side of the inner wall of the evaporation opening in the transition region as the first protrusion arranged on the evaporation opening in the first evaporation region, and the area of a third cross section of the third protrusion in a direction perpendicular to the extending direction of the third protrusion is smaller than the area of the first cross section and larger than the area of the second cross section; and one of the two adjacent side surfaces of the side surface of the inner wall of the evaporation opening where the third protrusion is positioned points to the other side surface is the extending direction of the third protrusion. Because the transition region borders on first coating by vaporization region and second coating by vaporization region, and the area of the bellied third cross-section of third on the coating by vaporization opening in the transition region is greater than the area of the bellied second cross-section of second on the coating by vaporization opening in the second coating by vaporization region, and be less than the area of the first bellied first cross-section on the coating by vaporization opening in the first coating by vaporization region, then the mask plate is at the net in-process that opens, the transition region can play the cushioning effect to the deformation stress that first coating by vaporization region and second coating by vaporization region received, more do benefit to the deformation volume that makes the coating by vaporization opening in first coating by vaporization region and second coating by vaporization region unanimously.

In one embodiment, the first cross section, the second cross section and the third cross section are respectively axisymmetric patterns, and the symmetry axes of the first cross section, the second cross section and the third cross section are respectively perpendicular to the side surface of the inner wall of the evaporation opening where the first cross section, the second cross section and the third cross section are located; the distance between the boundary of the first section and the side surface of the inner wall of the evaporation opening where the first section is located is gradually reduced from the symmetrical axis to the direction deviating from the symmetrical axis, the distance between the boundary of the second section and the side surface of the inner wall of the evaporation opening where the second section is located is gradually reduced, and the distance between the boundary of the third section and the side surface of the inner wall of the evaporation opening where the third section is located is gradually reduced; so set up, the change rule of first cross-section, second cross-section and third cross-section is unanimous, at the in-process of preparation mask plate, is more convenient for adjust the size of first cross-section, second cross-section and third cross-section. And the first section, the second section and the third section are respectively in an axisymmetric pattern, so that the shapes of the first section, the second section and the third section are more attractive, and the shapes of the first bulge, the second bulge and the third bulge are more attractive.

Preferably, the maximum distance between the first cross section and the side surface of the inner wall of the evaporation opening where the first cross section is located, the maximum distance between the second cross section and the side surface of the inner wall of the evaporation opening where the second cross section is located, and the maximum distance between the third cross section and the side surface of the inner wall of the evaporation opening where the third cross section is located are respectively equal; the parts of the boundaries of the first section, the second section and the third section, which are positioned at two sides of the symmetry axis, are respectively arc-shaped, the included angle between a first straight line tangent to the part of the boundary of the first section, which is positioned at one side of the symmetry axis, and the symmetry axis is a first included angle, and the first straight line passes through the intersection point of the boundary of the first section and the symmetry axis; the included angle between a second straight line tangent to the part of the boundary of the second section, which is positioned on one side of the symmetry axis, and the symmetry axis is a second included angle, and the second straight line passes through the intersection point of the boundary of the second section and the symmetry axis; the included angle between a third straight line tangent to the part of the boundary of the third section, which is positioned on one side of the symmetry axis, and the symmetry axis is a third included angle, and the third straight line passes through the intersection point of the boundary of the third section and the symmetry axis; the third included angle is larger than the second included angle, and the third included angle is smaller than the first included angle. The thickness of each part of the mask plate is generally the same, and when the maximum distance between the boundaries of the first section, the second section and the third section and the side surface of the inner wall of the evaporation opening where the boundaries are located is constant, the larger the first included angle corresponding to the first section is, the larger the area of the first section is; the larger the second included angle corresponding to the second section is, the larger the area of the second section is; the larger the third included angle corresponding to the third section is, the larger the area of the third section is. Therefore, the sizes of the areas of the first section, the second section and the third section can be adjusted by adjusting the sizes of the first included angle corresponding to the first section, the second included angle corresponding to the second section and the third included angle corresponding to the third section, so that the area of the third section is smaller than that of the first section, and the area of the third section is larger than that of the second section.

In one embodiment, the transition region includes a plurality of sub-regions, each sub-region is provided with at least one evaporation opening, the plurality of sub-regions are arranged along a direction in which the first evaporation region points to the second evaporation region, and third included angles corresponding to the sub-regions decrease in sequence from the first evaporation region to the second evaporation region, a minimum value of the third included angles corresponding to the plurality of sub-regions is greater than the second included angle, and a maximum value of the third included angles corresponding to the plurality of sub-regions is less than the first included angle. Because follow first coating by vaporization region points to the direction in second coating by vaporization region, the third contained angle that the coating by vaporization opening in a plurality of sub-regions corresponds reduces in proper order, and then the area of the bellied third cross-section of the coating by vaporization opening that a plurality of sub-regions correspond reduces in proper order, then at the net-opening in-process, the deformation stress of a plurality of sub-regions in transition region is by first coating by vaporization region to the regional gradual change of second coating by vaporization to the realization is to the cushioning effect of the deformation stress in first coating by vaporization region and second coating by vaporization region.

In one embodiment, the transition region includes a plurality of sub-regions, each sub-region is provided with at least one evaporation coating opening, the plurality of sub-regions are arranged along a direction in which the first evaporation coating region points to the second evaporation coating region, and third included angles corresponding to the plurality of sub-regions are respectively equal. So set up, the third contained angle that the coating by vaporization opening in the transition zone corresponds is equal respectively, can simplify the preparation technology of coating by vaporization opening in the transition zone.

In one embodiment, the portions of the boundaries of the first cross section, the second cross section and the third cross section, which are located at two sides of the symmetry axis, are respectively arc-shaped, the portions of the boundaries of the first cross section, which are located at two sides of the symmetry axis, are respectively protruded to the side surface of the inner wall of the evaporation opening away from the side surface, the portions of the boundaries of the second cross section, which are located at two sides of the symmetry axis, are respectively sunken to the side surface of the inner wall of the evaporation opening close to the side surface, which is located at the side surface, of the symmetry axis, of the second cross section, and the portions of the boundaries of the third cross section, which are located. It is more convenient to set the area of the first cross section to be larger than the area of the second cross section and the area of the third cross section respectively.

In one embodiment, the first protrusion extends from one side surface to the other side surface of two adjacent side surfaces of the inner wall of the evaporation opening where the first protrusion is located; in two adjacent side surfaces of the side surface of the inner wall of the evaporation opening where the second protrusion is located, the second protrusion extends from one side surface to the other side surface; and the third protrusion extends from one side surface to the other side surface in two adjacent side surfaces of the side surface of the inner wall of the evaporation opening where the third protrusion is positioned. Thus, when the area of the first cross section is larger than that of the second cross section, the deformation of the evaporation opening of the first evaporation area where the first protrusion is located can be effectively balanced, and the deformation of the evaporation opening in the first evaporation area is more favorably consistent with that of the evaporation opening in the second evaporation area. And, the third arch of transition region is more effective to the cushioning effect to the deformation stress that first coating by vaporization region and second coating by vaporization region received.

Each side of the inner wall of the evaporation opening of the first evaporation area is provided with a first protrusion, each side of the inner wall of the evaporation opening of the second evaporation area is provided with a second protrusion, and each side of the inner wall of the evaporation opening of the transition area is provided with a third protrusion. So set up, be more convenient for adjust the deformation stress of first coating by vaporization region, second coating by vaporization region and the transition region of mask plate through the area of the first bellied first cross-section of adjustment, the area of the bellied second cross-section of second and the area of the bellied third cross-section of third, and then make the deformation volume of the coating by vaporization opening in first coating by vaporization region, second coating by vaporization region and transition region tend to unanimity.

In one embodiment, the transition region comprises a first transition region and a second transition region, the first transition region is adjacent to the first evaporation region, the second transition region is adjacent to the second evaporation region, and a third cross section corresponding to a third protrusion of an evaporation opening of the first transition region is larger than a third cross section corresponding to a third protrusion of an evaporation opening of the second transition region; the density of the evaporation openings in the first transition zone is the same as that of the evaporation openings in the first evaporation zone, and the density of the evaporation openings in the second transition zone is the same as that of the evaporation openings in the second evaporation zone. Because the density of the evaporation openings in the first transition area is the same as that of the evaporation openings in the first evaporation area, and the third cross section corresponding to the evaporation openings of the first transition area is larger than that of the second transition area, the difference between the third cross section corresponding to the evaporation openings of the first transition area and the first cross section corresponding to the evaporation openings of the first evaporation area is smaller, so that the difference between the deformation amount of the evaporation openings of the mask plate in the first transition area and the deformation amount of the evaporation openings in the first evaporation area in the screen-opening process is smaller; because the density of the evaporation openings in the second transition zone is the same as that of the evaporation openings in the second evaporation zone, and the third cross section corresponding to the evaporation openings in the first transition zone is larger than that of the second transition zone, the difference between the third cross section corresponding to the evaporation openings in the second transition zone and that of the second evaporation zone is smaller, so that the difference between the deformation amount of the evaporation openings in the first transition zone and that of the evaporation openings in the second evaporation zone is smaller. Therefore, the deformation of the evaporation openings in the first evaporation area, the deformation of the evaporation openings in the second evaporation area and the deformation of the evaporation openings in the transition area of the mask plate are smaller, and the evaporation yield can be improved.

Preferably, the cross section areas of the evaporation openings in the first transition region are the same, and the cross section area of the evaporation opening in the first transition region is the same as the cross section area of the evaporation opening in the first evaporation region; the area of the cross section of each evaporation opening in the second transition zone is the same, and the area of the cross section of each evaporation opening in the second transition zone is the same as the area of the cross section of each evaporation opening in the second evaporation zone. So set up, when the coating by vaporization organic light emitting material, the coating by vaporization opening of the first coating by vaporization region of accessible and the coating by vaporization opening of first transition district to the non-transparent display area coating by vaporization organic light emitting material of display panel, coating by vaporization opening through the second coating by vaporization region and the coating by vaporization opening of second transition district to the transparent display area coating by vaporization organic light emitting material of display panel to can make the organic light emitting material's of each pixel in the transparent display area the same area, the organic light emitting material's of each pixel in the non-transparent display area the same area.

In one embodiment, the mask further includes a non-functional mask region surrounding the first evaporation region and the second evaporation region, and a plurality of ineffective evaporation openings are disposed in the non-functional mask region. Because non-functional mask district encircles first coating by vaporization region and second coating by vaporization region, the mask plate is at the net in-process that opens, and the invalid coating by vaporization opening in the non-functional mask district can make first coating by vaporization region and the regional atress of second coating by vaporization more even, avoids first coating by vaporization region and second coating by vaporization region fold to appear.

Preferably, the density of the ineffective evaporation openings is greater than the density of the evaporation openings in the first evaporation region, and the area of the cross section of the ineffective evaporation openings is smaller than the area of the cross section of the evaporation openings in the first evaporation region. Since the density of the vapor deposition openings in the first vapor deposition region is greater than the density of the vapor deposition openings in the second vapor deposition region, the density of the ineffective vapor deposition openings is greater than the density of the vapor deposition openings and the density of the vapor deposition openings, respectively. So set up, the homogeneity of first coating by vaporization region and the regional atress of second coating by vaporization when invalid coating by vaporization opening can increase the mask plate piece more effectively avoids first coating by vaporization region and the regional fold of taking place of second coating by vaporization, and then the coating by vaporization opening in the first coating by vaporization region and the regional deformation volume of coating by vaporization opening of second coating by vaporization are less, can improve the accuracy of organic luminescent material preparation.

Preferably, the invalid evaporation openings are through holes or blind holes;

in one embodiment, a plurality of first auxiliary openings are arranged between the evaporation openings in the first evaporation region, which are close to the second evaporation region, and the area of the cross section of each first auxiliary opening is smaller than that of the cross section of each evaporation opening in the first evaporation region; a plurality of second auxiliary openings are arranged between the evaporation openings in the second evaporation area, which are close to the first evaporation area, and the area of the cross section of each second auxiliary opening is smaller than that of the cross section of each evaporation opening in the second evaporation area. With the arrangement, when the area of the edge of the first evaporation area close to the second evaporation area is smaller and the evaporation opening with a larger area cannot be arranged, the first auxiliary opening with a smaller area can be arranged at the edge; the area that the second coating by vaporization region is close to the edge in first coating by vaporization region is less and can not set up the great coating by vaporization opening of area, can set up the less supplementary opening of second of area in this edge to can avoid appearing not setting up the coating by vaporization opening between first coating by vaporization region and the second coating by vaporization region and lead to the mask plate to take place great deformation at the coating by vaporization opening that the edge of the edge in first coating by vaporization region and second coating by vaporization region of opening net in-process is uneven.

Preferably, the density of the first auxiliary openings is greater than the density of the vapor deposition openings in the first vapor deposition region, and the density of the second auxiliary openings is greater than the density of the vapor deposition openings in the second vapor deposition region. So set up, the deformation stress in first evaporation coating region and second evaporation coating region can be cushioned more effectively in the setting of first auxiliary opening and second auxiliary opening.

Preferably, the first auxiliary opening and the second auxiliary opening are blind holes.

A second aspect of the embodiment of the application provides a mask assembly, the mask assembly includes mask frame, support bar and the foretell mask plate of at least one, the support bar is fixed to be set up on the mask frame, at least one the mask plate sets up on the support bar, and with mask frame fixed connection.

When the mask plate and the mask assembly are used for preparing organic luminescent materials of a display panel, evaporation openings in a first evaporation area can be used for evaporating the organic luminescent materials of pixels in a non-transparent display area of the display panel, and evaporation openings in a second evaporation area can be used for evaporating the organic luminescent materials of pixels in a transparent display area of the display panel, so that the mask plate provided by the embodiment of the application can be used for preparing the display panel of a full-face screen; the density of the evaporation openings in the second evaporation area is smaller than that of the evaporation openings in the first evaporation area, and the area of the cross section of the evaporation openings in the second evaporation area is larger than that of the cross section of the evaporation openings in the first evaporation area, so that the pixel area of the transparent display area of the display panel prepared by the mask plate provided by the embodiment of the application is larger, and the light transmittance of the transparent display area of the display panel is improved.

Drawings

Fig. 1 is a top view of a mask provided in an embodiment of the present application;

FIG. 2 is a cross-sectional view of the mask shown in FIG. 1 taken along line AA;

FIG. 3 is a top view of an evaporation opening of the mask shown in FIG. 1;

fig. 4 is a cross-sectional view of the evaporation opening of the first evaporation region of the mask shown in fig. 1 along a line AA;

fig. 5 is a cross-sectional view of the evaporation opening of the second evaporation region of the mask shown in fig. 1 along a line AA;

fig. 6 is a cross-sectional view of the evaporation openings of the transition region of the mask shown in fig. 1 along a line AA;

fig. 7 is a top view of another mask provided in the embodiment of the present application;

fig. 8 is a top view of another mask provided in the embodiment of the present application;

fig. 9 is a schematic structural diagram of a mask assembly according to an embodiment of the present disclosure.

Detailed Description

Reference will now be made in detail to the exemplary embodiments, examples of which are illustrated in the accompanying drawings. When the following description refers to the accompanying drawings, like numbers in different drawings represent the same or similar elements unless otherwise indicated. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with the present application. Rather, they are merely examples of apparatus consistent with certain aspects of the present application, as detailed in the appended claims.

On intelligent electronic equipment such as cell-phones and panel computer, because need integrate sensitization device such as leading camera, light sensor, can not realize the comprehensive screen display of electronic equipment.

In order to solve the above problem, an embodiment of the application provides a mask plate and a mask assembly. The mask plate and the mask assembly in the embodiments of the present application are described in detail below with reference to the accompanying drawings. The features of the following examples and embodiments can be supplemented or combined with each other without conflict.

Fig. 1 is a top view of a mask provided in an embodiment of the present application; FIG. 2 is a cross-sectional view of the mask shown in FIG. 1 taken along line AA; FIG. 3 is a top view of an evaporation opening of the mask shown in FIG. 1; fig. 4 is a cross-sectional view of the evaporation opening of the first evaporation region of the mask shown in fig. 1 along a line AA; fig. 5 is a cross-sectional view of the evaporation opening of the second evaporation region of the mask shown in fig. 1 along a line AA; fig. 6 is a cross-sectional view of the evaporation openings of the transition region of the mask shown in fig. 1 along a line AA; fig. 7 is a top view of another mask provided in the embodiment of the present application; fig. 8 is a top view of another mask provided in the embodiment of the present application; fig. 9 is a schematic structural diagram of a mask assembly according to an embodiment of the present disclosure.

The embodiment of the application provides a mask plate. Referring to fig. 1, a mask plate 100 provided in the embodiment of the present application includes a first evaporation area 10 and a second evaporation area 20, a plurality of evaporation openings 11 are provided in the first evaporation area 10, a plurality of evaporation openings 21 are provided in the second evaporation area 20, a density of the evaporation openings 11 in the first evaporation area 10 is greater than a density of the evaporation openings 21 in the second evaporation area 20, and an area of a cross section of the evaporation openings in the first evaporation area 10 is smaller than an area of a cross section of the evaporation openings in the second evaporation area 20.

When the mask provided by the embodiment of the application is used for preparing an organic luminescent material of a display panel, each evaporation opening in the first evaporation area 10 can be used for evaporating the organic luminescent material of a pixel in a non-transparent display area of the display panel, and each evaporation opening in the second evaporation area 20 can be used for evaporating the organic luminescent material of a pixel in a transparent display area of the display panel, so that the mask provided by the embodiment of the application can be used for preparing the display panel of a full-face screen; the density of the evaporation openings of the second evaporation area 20 is less than the density of the evaporation openings in the first evaporation area 10, and the area of the cross section of the evaporation openings of the second evaporation area 20 is greater than the area of the cross section of the evaporation openings in the first evaporation area 10, so that the pixel area of the transparent display area of the display panel prepared by the mask plate provided by the embodiment of the application is larger, and the light transmittance of the transparent display area of the display panel is improved.

In one embodiment, a first protrusion (not shown) is provided on at least one side surface of the inner wall of the vapor deposition opening 11 in the first vapor deposition region 10, and a second protrusion (not shown) is provided on the same side as the inner wall of the vapor deposition opening 21 in the second vapor deposition region 20. Referring to fig. 2, a cross section of the first protrusion perpendicular to the extending direction thereof is a first cross section 111, a cross section of the second protrusion perpendicular to the extending direction thereof is a second cross section 211, and an area of the first cross section 111 is larger than an area of the second cross section 211. And in the two adjacent side surfaces of the inner wall of the evaporation opening where the first protrusion and the second protrusion are located, the direction in which one side surface points to the other side surface is the extending direction of the corresponding protrusion.

In the process of opening the screen, the deformation resistance of the area with the higher density of the evaporation openings of the mask 100 is smaller than that of the area with the lower density of the evaporation openings. Through the area of the first cross-section of the great region department of increase coating by vaporization opening density, can improve this regional anti deformability to make the anti deformability in the great region of coating by vaporization opening density and the anti deformability in the less region of coating by vaporization opening density be close unanimous, and then make mask plate 100 in the mesh process everywhere coating by vaporization open deformation volume unanimous.

The mask 100 provided by the embodiment of the application, the density of evaporation openings 11 in the first evaporation area 10 is greater than the density of evaporation openings 21 in the second evaporation area 20, because at least one side of the inner wall of the first evaporation area 10 is provided with a first protrusion, the same side of the second evaporation area 20 is provided with a second protrusion, and the first protruding section is greater than the second protruding section, then the mask 100 is in the process of mesh opening, can make the deformation amount of evaporation openings 11 in the first evaporation area 10 reduce, thereby make the deformation amount of evaporation openings 11 in the first evaporation area 10 consistent with the deformation amount of evaporation openings 21 in the second evaporation area 20, avoid causing the color mixing of the evaporation process due to the inconsistent deformation amount of evaporation openings in the first evaporation area 10 and the second evaporation area 20 in the evaporation process, and further improve the evaporation yield.

When a first protrusion is provided on one side surface of the inner wall of the vapor deposition opening 11 in the first vapor deposition region 10, a second protrusion is provided on one side surface of the same side as the inner wall of the vapor deposition opening 21 in the second vapor deposition region 20; when the two side surfaces of the inner wall of the vapor deposition opening 11 in the first vapor deposition region 10 are provided with the first protrusions, the two side surfaces of the same side of the inner wall of the vapor deposition opening 21 in the second vapor deposition region 20 are provided with the second protrusions; when the first protrusions are provided on the respective side surfaces of the inner walls of the vapor deposition openings 11 in the first vapor deposition region 10, the second protrusions are provided on the respective side surfaces of the same side of the inner walls of the vapor deposition openings 21 in the second vapor deposition region 20.

Each evaporation opening in the mask 100 may be rectangular. Referring to fig. 3, the inner wall of the evaporation opening includes four side surfaces c1, c2, c3 and c4, wherein two adjacent side surfaces of the side surface c1 are a side surface c2 and a side surface c4, respectively, and the extending direction of the protrusion 40 on the side surface c1 is the direction in which the side surface c2 points to the side surface c4, that is, the direction in which the arrow points. Of course, in other embodiments, each evaporation opening of the mask 100 may have other shapes, such as a circle, a pentagon, and the like.

In one embodiment, the first cross section 111 and the second cross section 211 are axisymmetric patterns, and a symmetry axis of the first cross section 111 is perpendicular to a side surface of an inner wall of the evaporation opening 11 where the first cross section is located, and a symmetry axis of the second cross section 211 is perpendicular to a side surface of an inner wall of the evaporation opening 21 where the second cross section is located. Referring to fig. 4, the symmetry axis of the first cross section 111 is a1, and the distance d1 between the boundary of the first cross section 111 and the side surface of the inner wall of the evaporation opening 11 on which the first cross section is located decreases from the symmetry axis a1 to the direction away from the symmetry axis a 1. Referring to fig. 5, the symmetry axis of the second cross section 211 is a2, and the distance d2 between the boundary of the second cross section 211 and the side surface of the inner wall of the evaporation opening 21 on which the second cross section 211 is located decreases from the symmetry axis a2 to the direction away from the symmetry axis a 2. So set up, first cross-section 111 is unanimous with the change rule of second cross-section 211, more does benefit to the size of adjusting first cross-section 111 and second cross-section 211. Moreover, the first cross section 111 and the second cross section 211 are respectively in an axisymmetric pattern, so that the shapes of the first cross section 111 and the second cross section 211 are more beautiful, and further the shapes of the first bulge and the second bulge are more beautiful.

Further, the maximum distance between the first cross section 111 and the side of the inner wall of the evaporation opening 11 where it is located is equal to the maximum distance between the second cross section 211 and the side of the inner wall of the evaporation opening 21 where it is located. Referring to fig. 4 again, the portions of the first cross-section 111 located at both sides of the symmetry axis a1 are respectively arc-shaped, the portions of the second cross-section 211 located at both sides of the symmetry axis a2 are respectively arc-shaped, the angle between the first straight line b1 tangent to the portion of the first cross-section 111 located at one side of the symmetry axis a1 and the symmetry axis a1 thereof is a first angle θ 1, and the first straight line b1 crosses the intersection point of the boundary of the first cross-section 111 and the symmetry axis a1 thereof; referring again to fig. 5, a second straight line b2, which intersects the intersection point of the axis of symmetry a2 of the second cross section 211 and is tangent to the portion of the boundary of the second cross section 211 located on the side of the axis of symmetry a2 thereof, intersects the axis of symmetry a2 thereof at a second angle θ 2, and the second straight line b2 crosses the intersection point of the boundary of the second cross section 211 and the axis of symmetry a2 thereof; the first included angle theta 1 is larger than the second included angle theta 2.

Since the first cross section 111 and the second cross section 211 are respectively in axisymmetric patterns, and the distance between the boundary of the first cross section 111 and the second cross section 211 and the side of the inner wall of the evaporation opening where the first cross section 111 and the second cross section 211 are located gradually decreases from the symmetry axis to the direction deviating from the symmetry axis, the maximum distance between the first cross section 111 and the side of the inner wall of the evaporation opening 11 where the first cross section 111 is located is the distance between the boundary of the first cross section 111 at the symmetry axis a1 and the side of the inner wall of the evaporation opening 11 where the second cross section 211 is located, and the maximum distance between the second cross section 211 and the side of the inner wall of the evaporation opening 21 where the second cross section 211 is located is the distance between the boundary of the second cross section 211 at the symmetry axis a 2. Since the portions of the first cross-section 111 located at both sides of the symmetry axis a1 are symmetrical with respect to the symmetry axis a1, the first included angles θ 1 corresponding to the portions of the first cross-section 111 located at both sides of the symmetry axis a1 are equal; since the portions of the second cross-section 211 located at both sides of the symmetry axis a2 are symmetrical with respect to the symmetry axis a2, the second included angle θ 2 is equal for the portions of the second cross-section 211 located at both sides of the symmetry axis a 2.

The thickness of each part of the mask 100 is generally the same, and when the maximum distance between the boundary of the first cross section 111 and the second cross section 211 and the side surface of the inner wall of the evaporation opening where the boundary is located is constant, the larger the first included angle θ 1 corresponding to the first cross section 111 is, the larger the area of the first cross section 111 is; the larger the second included angle θ 2 corresponding to the second cross section 211 is, the larger the area of the second cross section 211 is. Therefore, the size of the area of the first cross section 111 can be adjusted by adjusting the size of the first included angle θ 1 corresponding to the first cross section 111, and the size of the area of the second cross section 211 can be adjusted by adjusting the size of the second included angle θ 2 corresponding to the second cross section 211.

In one embodiment, the first included angle θ 1 may range from 60 ° to 80 °, and the second included angle θ 2 may range from 20 ° to 40 °. The first included angle θ 1 may be, for example, 60 °, 65 °, 70 °, 75 °, 80 °, and the like, and the second included angle θ 2 may be, for example, 20 °, 25 °, 30 °, 35 °, 40 °, and the like. This arrangement is more favorable for the amount of deformation of the vapor deposition openings 11 in the first vapor deposition region 10 to be consistent with the amount of deformation of the vapor deposition openings 21 in the second vapor deposition region 20 during the process of screening the mask plate 100.

In an embodiment, the mask 100 may further include a transition region 30 adjacent to the first evaporation region 10 and the second evaporation region 20, a plurality of evaporation openings 31 are disposed in the transition region 30, a third protrusion is disposed on the same side of the inner wall of the evaporation opening 31 in the transition region 30 as the inner wall of the evaporation opening 11 in the first evaporation region 10, where the first protrusion is disposed, and an area of a third cross section 311 of the third protrusion perpendicular to an extending direction of the third protrusion is smaller than the area of the first cross section 111 and larger than the area of the second cross section 211; the direction in which one side surface points to the other side surface of the two adjacent side surfaces of the inner wall of the evaporation opening 31 where the third protrusion is located is the extending direction thereof.

Because the transition region 30 is adjacent to the first evaporation region 10 and the second evaporation region 20, and the area of the third convex third cross section 311 on the evaporation opening 31 in the transition region 30 is larger than the area of the second convex second cross section 211 on the evaporation opening 21 in the second evaporation region 20, and is smaller than the area of the first convex first cross section 111 on the evaporation opening 11 in the first evaporation region 10, the transition region 30 can play a role in buffering the deformation stress applied to the first evaporation region 10 and the second evaporation region 20 in the screen-stretching process of the mask plate 100, and is more favorable for making the deformation amount of the evaporation openings of the first evaporation region 10 and the second evaporation region 20 consistent.

Further, the first cross section 111, the second cross section 211, and the third cross section 311 are respectively an axisymmetric figure, and the symmetry axes of the first cross section 111, the second cross section 211, and the third cross section 311 are respectively perpendicular to the side surfaces of the inner wall of the evaporation opening where the first cross section 111, the second cross section 211, and the third cross section 311 are located. From the symmetry axis a1 of the first cross section 111 to the direction away from the symmetry axis a1, the distance d1 between the boundary of the first cross section 111 and the side surface of the inner wall of the vapor deposition opening 11 where the boundary is located gradually decreases; from the symmetry axis a2 of the second cross section 211 to the direction away from the symmetry axis a2, the distance d2 between the boundary of the second cross section 211 and the side surface of the inner wall of the evaporation opening 21 where the boundary is located gradually decreases; from the symmetry axis a3 of the third section 311 to the direction away from the symmetry axis a3, the distance d3 between the boundary of the third section 311 and the side surface of the inner wall of the vapor deposition opening 31 where the boundary is located gradually decreases.

With such an arrangement, the change rules of the first cross section 111, the second cross section 211 and the third cross section 311 are consistent, and the sizes of the first cross section 111, the second cross section 211 and the third cross section 311 are more conveniently adjusted in the process of preparing the mask plate 100. Moreover, the first cross section 111, the second cross section 211 and the third cross section 311 are respectively in an axisymmetric pattern, so that the shapes of the first cross section 111, the second cross section 211 and the third cross section 311 are more beautiful, and further, the shapes of the first protrusion, the second protrusion and the third protrusion are more beautiful.

Preferably, the maximum distance between the first cross section 111 and the side surface of the inner wall of the vapor deposition opening 11 in which it is located, the maximum distance between the second cross section 211 and the side surface of the inner wall of the vapor deposition opening 21 in which it is located, and the maximum distance between the third cross section 311 and the side surface of the inner wall of the vapor deposition opening 31 in which it is located are respectively equal; referring to fig. 4 to 6, the boundaries of the first cross section 111, the second cross section 211 and the third cross section 311 on both sides of the symmetry axis are respectively arc-shaped. A first straight line b1 tangent to a portion of the boundary of the first cross section 111 on the side of the symmetry axis a1 thereof forms a first included angle θ 1 with the symmetry axis a1 thereof, and the first straight line b1 crosses the intersection of the boundary of the first cross section 111 and the symmetry axis a1 thereof; a second straight line b2 tangent to a portion of the boundary of the second cross section 211 on the side of the symmetry axis a2 thereof makes a second included angle θ 2 with the symmetry axis a2 thereof, and the second straight line b2 passes through the intersection of the boundary of the second cross section 211 and the symmetry axis a2 thereof; a third straight line b3, which intersects the intersection point of the symmetry axis a3 of the third cross-section 311 and is tangent to a portion of the boundary of the third cross-section 211 on the side of the symmetry axis a3 thereof, intersects the symmetry axis a3 thereof at a third angle θ 3, and the third straight line b3 crosses the intersection point of the boundary of the third cross-section 311 and the symmetry axis a3 thereof. The third included angle theta 3 is greater than the second included angle theta 2, and the third included angle theta 3 is smaller than the first included angle theta 1.

Since the portions of the first cross-section 111 located at both sides of the symmetry axis a1 are symmetrical with respect to the symmetry axis a1, the first included angles θ 1 corresponding to the portions of the first cross-section 111 located at both sides of the symmetry axis a1 are equal; since the portions of the second cross section 211 located at both sides of the symmetry axis a2 are symmetrical with respect to the symmetry axis a2, the second included angles θ 2 corresponding to the portions of the second cross section 211 located at both sides of the symmetry axis a2 are equal; since the portions of the third cross-section 311 located on both sides of the symmetry axis a3 thereof are symmetrical with respect to the symmetry axis a3 thereof, the third included angles θ 3 corresponding to the portions of the third cross-section 311 located on both sides of the symmetry axis a3 thereof are equal.

The thickness of each part of the mask 100 is generally the same, and when the maximum distance between the boundary of the first cross section 111, the second cross section 211 and the third cross section 311 and the side surface of the inner wall of the evaporation opening where the boundary is located is constant, the larger the first included angle θ 1 corresponding to the first cross section 111 is, the larger the area of the first cross section 111 is; the larger the second included angle θ 2 corresponding to the second cross section 211 is, the larger the area of the second cross section 211 is; the larger the third included angle θ 3 corresponding to the third section 311 is, the larger the area of the third section 311 is. Therefore, the sizes of the areas of the first cross section 111, the second cross section 211 and the third cross section 311 can be adjusted by adjusting the sizes of the first included angle θ 1 corresponding to the first cross section 111, the second included angle θ 2 corresponding to the second cross section 211 and the third included angle θ 3 corresponding to the third cross section 311, so that the area of the third cross section 311 is smaller than the area of the first cross section 111, and the area of the third cross section 311 is larger than the area of the second cross section 211.

In one embodiment, the transition region 30 may include a plurality of sub-regions, each sub-region has at least one evaporation opening 31 therein, and the third included angles θ 3 corresponding to the evaporation openings 31 in each sub-region are the same. The plurality of sub-regions are arranged along the direction of the first evaporation region 10 pointing to the second evaporation region 20, the first evaporation region 10 reaches the second evaporation region 20, the third included angles theta 3 corresponding to the sub-regions 50 are sequentially reduced, the minimum value of the third included angles theta 3 corresponding to the plurality of sub-regions is larger than the second included angle theta 2, and the maximum value of the third included angles theta 3 corresponding to the plurality of sub-regions is smaller than the first included angle theta 1.

Because along the direction that first evaporation plating zone 10 district points to second evaporation plating zone 20, the third contained angle theta 3 that evaporation plating opening 31 in a plurality of sub-regions corresponds reduces in proper order, and then the area of the bellied third cross-section of the third that evaporation plating opening 31 in a plurality of sub-regions corresponds reduces in proper order, then in the net-opening process, the deformation stress of a plurality of sub-regions of transition zone 30 is by first evaporation plating zone 10 to the regional 20 gradual change of second evaporation plating to the cushioning effect of the deformation stress of first evaporation plating zone 10 and second evaporation plating zone 20 is realized.

In another embodiment, the transition region 30 may include a plurality of sub-regions, each of which has at least one evaporation opening therein, the plurality of sub-regions are arranged along a direction in which the first evaporation region 10 points to the second evaporation region 20, and third included angles corresponding to the evaporation openings in the plurality of sub-regions are respectively equal to each other. With such an arrangement, the third included angles corresponding to the evaporation openings in the transition region 30 are respectively equal, so that the preparation process of the evaporation openings in the transition region 30 can be simplified.

In an embodiment, referring to fig. 4 to 6 again, the portions of the first cross section 111, the second cross section 211 and the third cross section 311 on both sides of the symmetry axis thereof may be respectively arc-shaped, the portions of the first cross section 111 on both sides of the symmetry axis a1 thereof respectively protrude to the side away from the inner wall of the evaporation opening on which it is located, the portions of the second cross section 211 on both sides of the symmetry axis a2 thereof respectively recess to the side close to the inner wall of the evaporation opening on which it is located, and the portions of the third cross section 311 on both sides of the symmetry axis a3 thereof respectively recess to the side close to the inner wall of the evaporation opening on which it is located. When the maximum distances between the boundaries of the first, second, and

third cross sections

111, 211, and 311 and the inner walls of the evaporation openings in which the boundaries are located are equal, and the boundaries are convex with respect to the side surfaces of the inner walls of the evaporation openings in which the boundaries are located, the cross sections have a large area, and the boundaries are concave with respect to the side surfaces of the inner walls of the evaporation openings in which the boundaries are located, the cross sections have a small area. It is more convenient to set the area of the first cross section 111 to be larger than the area of the second cross section 211 and the area of the third cross section 311.

When the parts of the first cross section 111 at both sides of the symmetry axis a1 are respectively protruded to the side surface deviating from the inner wall of the evaporation opening 11 where the first cross section is located, the first straight line b1 is tangent to the side of the boundary of the first cross section 111 deviating from the inner wall of the evaporation opening where the first cross section is located; when the portions of the second section 211 and the third section 311 located at the two sides of the symmetry axis are respectively recessed toward the side surface away from the inner wall of the evaporation opening where the second section is located, the second straight line b2 is tangent to the side of the boundary of the second section 211 close to the inner wall of the evaporation opening where the second section is located, and the third straight line b3 is tangent to the side of the boundary of the third section 311 close to the inner wall of the evaporation opening where the third section is located.

In one embodiment, the first protrusion may extend from one side surface to the other side surface of two adjacent side surfaces of the inner wall of the evaporation opening 11 where the first protrusion is located; in two adjacent side surfaces of the side surface of the inner wall of the evaporation opening 21 where the second protrusion is located, the second protrusion can extend from one side surface to the other side surface; in the two adjacent side surfaces of the side surface of the inner wall of the evaporation opening 31 where the third protrusion is located, the third protrusion may extend from one side surface to the other side surface. In this way, when the area of the first cross section 111 is larger than that of the second cross section 211, the first protrusions can more effectively balance the amount of deformation of the vapor deposition openings 11 in the first vapor deposition region 10, and it is more advantageous that the amount of deformation of the vapor deposition openings 11 in the first vapor deposition region 10 matches the amount of deformation of the vapor deposition openings 21 in the second vapor deposition region 20. The third protrusions of the transition region 30 are more effective in buffering the deformation stress applied to the first vapor deposition region 10 and the second vapor deposition region 20.

The first vapor deposition region 10 may have first protrusions on respective side surfaces of the inner wall of the vapor deposition opening 11, the second vapor deposition region 20 may have second protrusions on respective side surfaces of the inner wall of the vapor deposition opening 21, and the transition region 30 may have third protrusions on respective side surfaces of the inner wall of the vapor deposition opening 31. So set up, be more convenient for adjust the deformation stress of first coating by vaporization region 10, second coating by vaporization region 20 and transition region 30 of mask plate 100 through the area of the first bellied first cross-section of adjustment, the area of the bellied second cross-section of second and the area of the bellied third cross-section of third, and then make the deformation volume of the coating by vaporization opening of first coating by vaporization region 10, second coating by vaporization region 20 and transition region 30 tend to unanimously.

In one embodiment, referring again to fig. 1, said transition zone 30 may comprise a first transition zone 301 and a second transition zone 302, said first transition zone 301 being contiguous with said first evaporation zone 10, said second transition zone 302 being contiguous with said second evaporation zone 20, a third cross section 311 corresponding to a third protrusion of evaporation openings 31 of said first transition zone 301 being larger than a third cross section 311 corresponding to a third protrusion of evaporation openings 31 of said second transition zone 302; the density of vapor deposition openings 31 in the first transition region 301 is the same as the density of vapor deposition openings 11 in the first vapor deposition region 10, and the density of vapor deposition openings 31 in the second transition region 302 is the same as the density of vapor deposition openings 11 in the second vapor deposition region 20.

Because the density of the evaporation openings 31 in the first transition zone 301 is the same as the density of the evaporation openings 11 in the first evaporation zone 10, and the third cross section corresponding to the evaporation openings of the first transition zone 301 is larger than the third cross section corresponding to the evaporation openings of the second transition zone 302, the difference between the third cross section corresponding to the evaporation openings of the first transition zone 301 and the first cross section corresponding to the evaporation openings of the first evaporation zone 10 is smaller, so that the difference between the deformation amount of the evaporation openings 31 in the first transition zone 301 and the deformation amount of the evaporation openings 11 in the first evaporation zone 10 of the mask plate in the screen-spreading process is smaller; since the density of the vapor deposition openings 31 in the second transition zone 302 is the same as the density of the vapor deposition openings 21 in the second vapor deposition zone 20, and the third cross section corresponding to the vapor deposition openings 31 of the first transition zone 301 is larger than the third cross section corresponding to the vapor deposition openings 31 of the second transition zone 302, the difference between the third cross section corresponding to the vapor deposition openings 31 of the second transition zone 302 and the third cross section corresponding to the vapor deposition openings 21 of the second vapor deposition zone 20 is small, and thus the difference between the amount of deformation of the vapor deposition openings 31 in the first transition zone 301 and the amount of deformation of the vapor deposition openings 21 in the second vapor deposition zone 20 is small. Therefore, the difference between the amount of deformation of the vapor deposition openings 11 in the first vapor deposition region 10, the amount of deformation of the vapor deposition openings 21 in the second vapor deposition region 20, and the amount of deformation of the vapor deposition openings 31 in the transition region 30 of the mask 100 is small, and the vapor deposition yield can be improved.

Further, the cross-sectional area of each evaporation opening 31 in the first transition zone 301 is the same, and the cross-sectional area of each evaporation opening 31 in the first transition zone 301 is the same as the cross-sectional area of each evaporation opening 11 in the first evaporation zone 10; the area of the cross section of each evaporation opening 31 in the second transition zone 302 is the same, and the area of the cross section of each evaporation opening 31 in the second transition zone 302 is the same as the area of the cross section of each evaporation opening 21 in the second evaporation zone 20. In this arrangement, when depositing an organic light emitting material, the organic light emitting material can be deposited on the non-transparent display region of the display panel through the vapor deposition openings 11 of the first vapor deposition region 10 and the vapor deposition openings 31 of the first transition region 301, and the organic light emitting material can be deposited on the transparent display region of the display panel through the vapor deposition openings 21 of the second vapor deposition region 20 and the vapor deposition openings 32 of the second transition region 302, so that the areas of the organic light emitting material of the pixels in the transparent display region are the same, and the areas of the organic light emitting material of the pixels in the non-transparent display region are the same.

Fig. 2 illustrates only the boundary of the first cross section 111, the second cross section 211 and the third cross section 311 having two arcs as an example, but not limited thereto, the boundary of the first cross section 111, the second cross section 211 and the third cross section 311 may also be composed of two or more broken lines, or one part of the broken lines and the other part of the arcs.

In one embodiment, referring to fig. 7, the mask plate 100 further includes a non-functional mask region 50 surrounding the first evaporation region 10 and the second evaporation region 20, and a plurality of ineffective evaporation openings 51 are disposed in the non-functional mask region 50.

Because the non-functional mask region 50 surrounds the first evaporation region 10 and the second evaporation region 20, the invalid evaporation openings 51 in the non-functional mask region 50 can make the first evaporation region 10 and the second evaporation region 20 more uniformly stressed during the screen-opening process of the mask plate 100, thereby avoiding the first evaporation region 10 and the second evaporation region 20 from wrinkling.

Preferably, the density of the ineffective vapor deposition openings 51 is greater than the density of the vapor deposition openings 11 in the first vapor deposition region 10, and the area of the cross section of the ineffective vapor deposition openings 51 is smaller than the area of the cross section of the vapor deposition openings 11 in the first vapor deposition region 10. Since the density of vapor deposition openings 11 in first vapor deposition region 10 is greater than the density of vapor deposition openings 21 in second vapor deposition region 20, the density of inactive vapor deposition openings 51 is greater than the density of vapor deposition openings 11 and the density of vapor deposition openings 21, respectively. With such an arrangement, the ineffective evaporation openings 51 can effectively increase the stress uniformity of the first evaporation area 10 and the second evaporation area 20 when the mask plate 100 is in mesh, so as to prevent the first evaporation area 10 and the second evaporation area 20 from wrinkling, and further reduce the deformation of the evaporation openings 11 in the first evaporation area 10 and the evaporation openings 11 in the second evaporation area 20, thereby improving the preparation accuracy of the organic light-emitting material.

The ineffective evaporation openings 51 may be through holes or blind holes. Preferably, the ineffective evaporation openings 51 are blind holes and are not used for evaporating the organic light emitting material. The blind hole refers to an opening which is not a through hole and is in the shape of a groove.

In one embodiment, referring to fig. 8, a plurality of first auxiliary openings 12 are provided between the vapor deposition openings 11 in the first vapor deposition region 10, which are close to the second vapor deposition region 20, and the area of the first auxiliary openings 12 is smaller than the area of the vapor deposition openings 11 in the first vapor deposition region 10; a plurality of second auxiliary openings 22 are provided between the vapor deposition openings 21 in the second vapor deposition region 20 close to the first vapor deposition region 10 and the first vapor deposition region 10, and the area of the second auxiliary openings 22 is smaller than the area of the vapor deposition openings 21 in the second vapor deposition region 20. In this arrangement, when the area of the first vapor deposition region 10 near the edge of the second vapor deposition region 20 is small and the vapor deposition opening 11 having a large area cannot be provided, the first auxiliary opening 12 having a small area can be provided at the edge; the area that second evaporation plating region 20 is close to the edge of first evaporation plating region 10 is less and can not set up the great evaporation plating opening 21 of area, can set up the less second auxiliary opening 22 of area at this edge, thereby can avoid appearing not setting up evaporation plating opening and the great region of area between first evaporation plating region 10 and the second evaporation plating region 20, and lead to mask plate 100 to take place great deformation at the edge of the mesh in-process first evaporation plating region 10 and the marginal atress of second evaporation plating region 20 uneven and the evaporation plating opening that leads to the edge of first evaporation plating region 10 and second evaporation plating region 20.

In one embodiment, the density of the first auxiliary openings 12 is greater than that of the evaporation openings of the first evaporation region 10, and the density of the second auxiliary openings 22 is greater than that of the evaporation openings of the second evaporation region 20; so set up, the deformation stress in first evaporation coating region and second evaporation coating region can be cushioned more effectively in the setting of first auxiliary opening and second auxiliary opening.

Preferably, the first auxiliary opening 12 and the second auxiliary opening 22 are blind holes, that is, the first auxiliary opening 12 and the second auxiliary opening 22 are not used for evaporating organic light-emitting materials.

The embodiment of the present application further provides a mask assembly, referring to fig. 9, the mask assembly 200 includes a mask plate frame 210, a supporting bar 220 and at least one mask plate 100, the supporting bar 220 is fixedly disposed on the mask plate frame 210, and at least one mask plate 100 is disposed on the supporting bar 220 and fixedly connected to the mask plate frame 210.

When the mask assembly works, the mask plate frame 210 and the supporting bars 30 support the mask plate 100, so that the mask plate 100 can be prevented from sagging in the evaporation process, and the wrinkle phenomenon of the mask plate 100 in the screen opening process can be reduced.

When the mask assembly 200 provided in the embodiment of the present application is used for preparing an organic light emitting material of a display panel, each evaporation opening in the first evaporation region 10 of the mask 100 may be used for evaporating an organic light emitting material of a pixel in a non-transparent display region of the display panel, and each evaporation opening in the second evaporation region 20 may be used for evaporating an organic light emitting material of a pixel in a transparent display region of the display panel, so that the mask provided in the embodiment of the present application may be used for preparing a display panel of a full-face screen; the density of the evaporation openings of the second evaporation area 20 is less than the density of the evaporation openings in the first evaporation area 10, and the area of the cross section of the evaporation openings of the second evaporation area 20 is greater than the area of the cross section of the evaporation openings in the first evaporation area 10, so that the pixel area of the transparent display area of the display panel prepared by the mask plate provided by the embodiment of the application is larger, and the light transmittance of the transparent display area of the display panel is improved.

It is noted that in the drawings, the sizes of layers and regions may be exaggerated for clarity of illustration. Also, it will be understood that when an element or layer is referred to as being "on" another element or layer, it can be directly on the other element or layer or intervening layers may also be present. In addition, it will be understood that when an element or layer is referred to as being "under" another element or layer, it can be directly under the other element or intervening layers or elements may also be present. In addition, it will also be understood that when a layer or element is referred to as being "between" two layers or elements, it can be the only layer between the two layers or elements, or more than one intermediate layer or element may also be present. Like reference numerals refer to like elements throughout.

In the present invention, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance. The term "plurality" means two or more unless expressly limited otherwise.

Other embodiments of the invention will be apparent to those skilled in the art from consideration of the specification and practice of the disclosure disclosed herein. This invention is intended to cover any variations, uses, or adaptations of the invention following, in general, the principles of the invention and including such departures from the present disclosure as come within known or customary practice within the art to which the invention pertains. It is intended that the specification and examples be considered as exemplary only, with a true scope and spirit of the invention being indicated by the following claims.

It will be understood that the invention is not limited to the precise arrangements described above and shown in the drawings and that various modifications and changes may be made without departing from the scope thereof. The scope of the invention is limited only by the appended claims.

Claims

1. The utility model provides a mask plate, its characterized in that, the mask plate includes that first coating by vaporization is regional and second coating by vaporization is regional, first coating by vaporization region reaches be equipped with a plurality of coating by vaporization openings in the second coating by vaporization region respectively, coating by vaporization open-ended density is greater than in the first coating by vaporization region coating by vaporization open-ended density in the second coating by vaporization region, the area of coating by vaporization open-ended cross section is less than in the first coating by vaporization region coating by vaporization open-ended cross section area.

2. A mask plate according to claim 1, wherein at least one side surface of the inner wall of the evaporation opening in the first evaporation region is provided with a first protrusion, the same side of the inner wall of the evaporation opening in the second evaporation region is provided with a second protrusion, and the area of a first cross section of the first protrusion in the direction perpendicular to the extending direction of the first protrusion is larger than the area of a second cross section of the second protrusion in the direction perpendicular to the extending direction of the second protrusion; the direction of one side surface pointing to the other side surface in two adjacent side surfaces of the inner wall of the evaporation opening where the first protrusion and the second protrusion are located is the extending direction of the corresponding protrusion;

3. A mask plate according to claim 2, wherein the first cross section and the second cross section are respectively axisymmetric patterns, and the symmetry axes of the first cross section and the second cross section are respectively perpendicular to the side surface of the inner wall of the evaporation opening where the first cross section and the second cross section are located; the distance between the boundary of the first section and the side surface of the inner wall of the evaporation opening where the first section is located is gradually reduced from the symmetrical axis to the direction deviating from the symmetrical axis, and the distance between the boundary of the second section and the side surface of the inner wall of the evaporation opening where the second section is located is gradually reduced;

preferably, the maximum distance between the first cross section and the side surface of the inner wall of the evaporation opening where the first cross section is located is equal to the maximum distance between the second cross section and the side surface of the inner wall of the evaporation opening where the second cross section is located; the parts of the boundaries of the first cross section and the second cross section, which are positioned at two sides of the symmetry axis, are respectively arc-shaped, the included angle between a first straight line tangent to the part of the boundary of the first cross section, which is positioned at one side of the symmetry axis, and the symmetry axis is a first included angle, and the first straight line passes through the intersection point of the boundary of the first cross section and the symmetry axis; the included angle between a second straight line tangent to the part of the boundary of the second section, which is positioned on one side of the symmetry axis, and the symmetry axis is a second included angle, and the second straight line passes through the intersection point of the boundary of the second section and the symmetry axis; the first included angle is larger than the second included angle;

preferably, the first included angle ranges from 60 ° to 80 °, and the second included angle ranges from 20 ° to 40 °.

4. A mask plate according to claim 2, further comprising a transition region adjacent to the first evaporation region and the second evaporation region, wherein a plurality of evaporation openings are provided in the transition region, a third protrusion is provided on the same side of the inner wall of the evaporation opening in the transition region as the first protrusion provided on the evaporation opening in the first evaporation region, and the area of a third cross section of the third protrusion in the direction perpendicular to the extending direction of the third protrusion is smaller than the area of the first cross section and larger than the area of the second cross section; the direction in which one side surface points to the other side surface is the extending direction of two adjacent side surfaces of the side surface of the inner wall of the evaporation opening where the third protrusion is positioned;

preferably, the first section, the second section and the third section are respectively axisymmetric figures, and the symmetry axes of the first section, the second section and the third section are respectively vertical to the side surface of the inner wall of the evaporation opening where the first section, the second section and the third section are located; the distance between the boundary of the first section and the side surface of the inner wall of the evaporation opening where the first section is located is gradually reduced from the symmetrical axis to the direction deviating from the symmetrical axis, the distance between the boundary of the second section and the side surface of the inner wall of the evaporation opening where the second section is located is gradually reduced, and the distance between the boundary of the third section and the side surface of the inner wall of the evaporation opening where the third section is located is gradually reduced;

preferably, the maximum distance between the first cross section and the side surface of the inner wall of the evaporation opening where the first cross section is located, the maximum distance between the second cross section and the side surface of the inner wall of the evaporation opening where the second cross section is located, and the maximum distance between the third cross section and the side surface of the inner wall of the evaporation opening where the third cross section is located are respectively equal; the parts of the boundaries of the first section, the second section and the third section, which are positioned at two sides of the symmetry axis, are respectively arc-shaped, the included angle between a first straight line tangent to the part of the boundary of the first section, which is positioned at one side of the symmetry axis, and the symmetry axis is a first included angle, and the first straight line passes through the intersection point of the boundary of the first section and the symmetry axis; the included angle between a second straight line tangent to the part of the boundary of the second section, which is positioned on one side of the symmetry axis, and the symmetry axis is a second included angle, and the second straight line passes through the intersection point of the boundary of the second section and the symmetry axis; the included angle between a third straight line tangent to the part of the boundary of the third section, which is positioned on one side of the symmetry axis, and the symmetry axis is a third included angle, and the third straight line passes through the intersection point of the boundary of the third section and the symmetry axis; the third included angle is larger than the second included angle, and the third included angle is smaller than the first included angle.

5. A mask plate according to claim 4, wherein the transition region comprises a plurality of sub-regions, each sub-region is provided with at least one evaporation coating opening, the plurality of sub-regions are arranged along a direction in which the first evaporation coating region points to the second evaporation coating region, and from the first evaporation coating region to the second evaporation coating region, third included angles corresponding to the sub-regions are sequentially reduced, the minimum value of the third included angles corresponding to the plurality of sub-regions is greater than the second included angle, and the maximum value of the third included angles corresponding to the plurality of sub-regions is smaller than the first included angle;

preferably, the transition region includes a plurality of sub-regions, each sub-region is provided with at least one evaporation opening, the plurality of sub-regions are arranged along a direction in which the first evaporation region points to the second evaporation region, and third included angles corresponding to the plurality of sub-regions are respectively equal.

6. A mask plate according to claim 4, wherein the portions of the boundaries of the first, second and third cross-sections located on both sides of the symmetry axis thereof are respectively arc-shaped, the portions of the boundaries of the first cross-section located on both sides of the symmetry axis thereof are respectively convex to the side surface away from the inner wall of the evaporation opening in which they are located, the portions of the boundaries of the second cross-section located on both sides of the symmetry axis thereof are respectively concave to the side surface close to the inner wall of the evaporation opening in which they are located, and the portions of the boundaries of the third cross-section located on both sides of the symmetry axis thereof are respectively concave to the side surface close to the inner wall of the evaporation opening in which they are located;

preferably, in two adjacent side surfaces of the side surface of the inner wall of the evaporation opening where the first protrusion is located, the first protrusion extends from one side surface to the other side surface; in two adjacent side surfaces of the side surface of the inner wall of the evaporation opening where the second protrusion is located, the second protrusion extends from one side surface to the other side surface; the third protrusion extends from one side surface to the other side surface in two adjacent side surfaces of the inner wall of the evaporation opening where the third protrusion is located;

each side of the inner wall of the evaporation opening of the first evaporation area is provided with a first protrusion, each side of the inner wall of the evaporation opening of the second evaporation area is provided with a second protrusion, and each side of the inner wall of the evaporation opening of the transition area is provided with a third protrusion.

7. A mask according to claim 4, wherein the transition region comprises a first transition region and a second transition region, the first transition region is adjacent to the first evaporation region, the second transition region is adjacent to the second evaporation region, and a third cross section corresponding to a third protrusion of an evaporation opening of the first transition region is larger than a third cross section corresponding to a third protrusion of an evaporation opening of the second transition region; the density of evaporation openings in the first transition zone is the same as that of the evaporation openings in the first evaporation zone, and the density of evaporation openings in the second transition zone is the same as that of the evaporation openings in the second evaporation zone;

preferably, the cross section areas of the evaporation openings in the first transition region are the same, and the cross section area of the evaporation opening in the first transition region is the same as the cross section area of the evaporation opening in the first evaporation region; the area of the cross section of each evaporation opening in the second transition zone is the same, and the area of the cross section of each evaporation opening in the second transition zone is the same as the area of the cross section of each evaporation opening in the second evaporation zone.

8. A mask according to claim 1, further comprising a non-functional mask region surrounding the first and second evaporation regions, wherein a plurality of ineffective evaporation openings are provided in the non-functional mask region;

preferably, the density of the ineffective evaporation openings is greater than that of the evaporation openings in the first evaporation region, and the area of the cross section of the ineffective evaporation openings is smaller than that of the cross section of the evaporation openings in the first evaporation region;

preferably, the invalid evaporation openings are through holes or blind holes.

9. A mask according to claim 1, wherein a plurality of first auxiliary openings are provided between the evaporation openings in the first evaporation region near the second evaporation region and the second evaporation region, and the area of the cross section of each first auxiliary opening is smaller than the area of the cross section of the evaporation opening in the first evaporation region; a plurality of second auxiliary openings are arranged between the evaporation openings in the second evaporation area, which are close to the first evaporation area, and the area of the cross section of each second auxiliary opening is smaller than that of the evaporation opening in the second evaporation area;

preferably, the density of the first auxiliary openings is greater than that of the vapor deposition openings of the first vapor deposition region, and the density of the second auxiliary openings is greater than that of the vapor deposition openings of the second vapor deposition region;

10. A mask assembly, which is characterized in that the mask assembly comprises a mask frame, support bars and at least one mask plate according to any one of claims 1 to 9, wherein the support bars are fixedly arranged on the mask frame, and at least one mask plate is arranged on the support bars and is fixedly connected with the mask frame.