CN111663105A - Ultrahigh vacuum electron beam evaporator and electron beam coating device - Google Patents

Abstract

The invention discloses an ultra-high vacuum electron beam evaporator and an electron beam coating device, comprising: an ultra-high vacuum metal sealing flange, a lifting mechanism arranged on the first side of the ultra-high vacuum metal sealing flange, a The water-cooled shielding barrel on the second side of the ultra-high vacuum metal sealing flange, the material carrying crucible, the electron emitter and the evaporative ion current detector located in the water-cooled shielding barrel and arranged in sequence; the lifting mechanism is focused by high pressure The electrode rod is connected with the material-bearing crucible, and is used to adjust the distance between the material-bearing crucible and the electron emitter; the electron emitter is connected with the ultra-high vacuum metal sealing flange, and the evaporated ion A flow detector is connected to the water-cooled shielded barrel. In the present application, by adopting a water-cooled shielding barrel, interference or influence on other components during the evaporation process is avoided, which is beneficial to the control of the evaporation rate in the evaporation process.

Description

Ultra-high vacuum electron beam evaporator, electron beam coating device

technical field

The invention relates to the technical field of coating equipment, in particular to an ultra-high vacuum electron beam evaporator and an electron beam coating device.

Background technique

Thermal evaporation is widely used in the preparation of thin films in various physical deposition methods. It is well known in the industry that the higher the ultimate vacuum degree of the thin film preparation equipment, the purer the background, the fewer the defects of the film layer, and the better the quality of the prepared thin film. Molecular beam epitaxy (MBE) equipment has its ultra-high vacuum background (the ultimate vacuum is 2 × 10 ^-8 Pa; the vacuum is maintained at 2 × 10 ^-7 Pa), so that high-quality polycrystalline films can be prepared. Microcrystalline film and single crystal film, so molecular beam epitaxy (MBE) equipment is favored by scientific researchers and device production companies.

Under ultra-high vacuum conditions, the temperature of the material to be evaporated in the material-carrying crucible is high, and the evaporation rate is difficult to control.

Therefore, the existing technology still needs to be improved and developed.

SUMMARY OF THE INVENTION

In view of the above-mentioned deficiencies of the prior art, the purpose of the present invention is to provide an ultra-high vacuum electron beam evaporator and an electron beam coating device, aiming at solving the technical problem that the evaporation rate is difficult to control under ultra-high vacuum conditions.

The technical scheme of the present invention is as follows:

An ultra-high vacuum electron beam evaporator, comprising: an ultra-high vacuum metal sealing flange, a lifting mechanism arranged on the first side of the ultra-high vacuum metal sealing flange, and a lifting mechanism arranged on the ultra-high vacuum metal sealing method The water-cooled shielding barrel on the second side of the blue, the material-carrying crucible, the electron emitter and the evaporative ion current detector located in the water-cooled shielding barrel and arranged in sequence; the lifting mechanism is connected with the material-carrying crucible through a high-voltage focusing electrode rod , and is used to adjust the distance between the material-bearing crucible and the electron emitter; the electron emitter is connected with the ultra-high vacuum metal sealing flange, and the evaporative ion current detector is connected to the water-cooled shielding barrel connect.

The ultra-high vacuum electron beam evaporator, wherein the high-voltage focusing electrode rod is provided with a sliding block, the ultra-high vacuum metal sealing flange is provided with a sliding rod matched with the sliding block, and the sliding block is arranged on the sliding block. The block can slide along the slide bar.

In the ultra-high vacuum electron beam evaporator, a shielding cover is provided on the water-cooled shielding barrel, and the shielding cover forms an evaporation channel.

In the ultra-high vacuum electron beam evaporator, the evaporation ion current detector is an ion collecting plate, and the water-cooling shielding barrel and the shielding cover are insulated from the ion collecting plate.

The ultra-high vacuum electron beam evaporator, wherein the ultra-high vacuum electron beam evaporator further comprises: a rotating mechanism arranged on the first side of the ultra-high vacuum metal sealing flange, connected with the rotating mechanism and used To open or close the electric baffle of the evaporation channel.

The ultra-high vacuum electron beam evaporator, wherein the lifting mechanism comprises: a metal welding bellows arranged on the first side of the ultra-high vacuum metal sealing flange, and a moving block connected with the metal welding bellows , a screw thread connected with the moving block, and a driving part connected with the screw; the high-voltage focusing electrode rod is located in the metal welded bellows and connected with the moving block.

In the ultra-high vacuum electron beam evaporator, the electron emitter is a circular electron emitter.

In the ultra-high vacuum electron beam evaporator, the ultra-high vacuum electron beam evaporator further comprises: a ceramic sealing electrode connected with the electron emitter.

In the ultra-high vacuum electron beam evaporator, the water-cooling shielding barrel adopts a fully enclosed double-wall structure.

An electron beam coating device, comprising: the ultra-high vacuum electron beam evaporator according to any one of the above.

Compared with the prior art, the embodiment of the present invention has the following advantages:

According to the ultra-high vacuum electron beam evaporator provided by the embodiment of the present invention, the ultra-high vacuum electron beam evaporator is formed based on the ultra-high vacuum metal sealing flange, and the ultra-high vacuum condition is realized by the ultra-high vacuum metal sealing flange. In addition, a water-cooled shielding barrel is used to surround the material to carry the crucible, the electron emitter and the evaporation ion current detector, so as to avoid interference or influence on other components during the evaporation process, which is beneficial to the control of the evaporation rate in the evaporation process.

Description of drawings

In order to explain the embodiments of the present invention or the technical solutions in the prior art more clearly, the following briefly introduces the accompanying drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments described in the present invention. For those of ordinary skill in the art, other drawings can also be obtained based on these drawings without any creative effort.

1 is a cross-sectional view of an ultra-high vacuum electron beam evaporator in an embodiment of the present invention;

FIG. 2 is a partial enlarged view of a water-cooled shielding barrel of an ultra-high vacuum electron beam evaporator in an embodiment of the present invention.

Detailed ways

In order to make those skilled in the art better understand the solutions of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only These are some embodiments of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

In the prior art, magnetron sputtering technology has been widely used. However, with the advancement of technology, magnetron sputtering requires equipment to achieve higher and higher background vacuum. The cavity and internal parts are degassed at high temperature in vacuum, and organic materials are not used in the vacuum chamber (because it is necessary to degas and bake under vacuum conditions higher than 200 °C for no less than 2 hours after each explosion, which will cause sealing rings. Outgassing and seal failure, polluting the vacuum environment).

Referring to FIG. 1, the present invention discloses an ultra-high vacuum electron beam evaporator, which includes: an ultra-high vacuum metal sealing flange, a lifting mechanism 1 arranged on the first side of the ultra-high vacuum metal sealing flange, The water-cooled shielding barrel 5 arranged on the second side of the ultra-high vacuum metal sealing flange, the material carrying crucible 4, the electron emitter 9 and the evaporation ion current detector 8 arranged in the water-cooled shielding barrel 5 in sequence; The lifting mechanism 1 is connected to the material-carrying crucible 4 through a high-voltage focusing electrode rod 2, and is used to adjust the distance between the material-carrying crucible 4 and the electron emitter 9; High vacuum metal sealing flange connection, the evaporative ion current detector 8 is connected with the water cooling shielding barrel 5 .

The ultra-high vacuum electron beam evaporator provided in this embodiment is based on the ultra-high vacuum metal sealing flange (CF100) to form an ultra-high vacuum electron beam evaporator, a lifting mechanism 1, a water-cooled shielding barrel 5, a material carrying crucible 4, an electronic The components such as the transmitter 9 and the evaporative ion current detector 8 are all made of metal and are assembled on the ultra-high vacuum metal sealing flange. The metal has good high temperature resistance and high pressure resistance, and is not easily deformed. The ultra-high vacuum electronic All parts of the beam evaporator are made of metal materials, which cooperate closely with each other, which is conducive to realizing the airtight condition of ultra-high vacuum; and a water-cooled shielding barrel 5 is used to surround the material carrying crucible 4, electron emitter 9 and evaporation ion current detector 8, which will be soon. The high-temperature parts in the work are contained in the inner side of the water-cooled shielding barrel 5, so as to avoid the interference or influence of other components caused by the high temperature generated during the evaporation process. During the evaporation process, the water-cooled shielding barrel 5 surrounding the outside produces stable and uniform cooling. It is beneficial to the control of the evaporation rate in the evaporation process; at the same time, the main part of the ultra-high vacuum electron beam evaporator is installed on the inside of the water-cooled shielding barrel 5 to prevent the radiation to the external environment from emitting light and heat during coating, It also facilitates damage caused by improper handling during maintenance work. In addition, the water-cooled shielding barrel 5 can also play a shielding role to shield the electric field formed by the electron emitter 9 and prevent the electric field from affecting other components.

Specifically, the central axis of the high-voltage focusing electrode rod 2, the central axis of the material-carrying crucible 4, the central axis of the electron emitter 9, the central axis of the evaporating ion current detector 8 and the central axis of the water-cooling shielding barrel 5 all coincide to ensure that the material The material in the carrying crucible 4 can be sufficiently evaporated. The water-cooled shielding barrel 5 has openings at both ends, which are divided into a first opening and a second opening, and the high-voltage focusing electrode rod 2 is connected to the material-carrying crucible 4 through the first opening. The evaporative ion current detector 8 is provided at the second opening. The evaporative ion current detector 8 is connected to the material carrying crucible 4 through an annular mounting plate, and the evaporative ion current detector 8 is located in the hole of the annular mounting plate.

Further, in order to ensure that the high-voltage focusing electrode rod 2 and the material-bearing crucible 4 can move smoothly, the high-voltage focusing electrode rod 2 is provided with a slider, and the ultra-high vacuum metal sealing flange The sliding rod 3 is matched with the block, and the sliding block can slide along the sliding rod 3 . The slider plays a guiding role, and the slider restricts the rising and falling directions of the high-voltage focusing electrode rod 2 and the material-carrying crucible 4. That is to say, the high-voltage focusing electrode rod 2 and the material-carrying crucible 4 move along the material bearing during the movement. The central axis of the crucible 4 moves in the direction of the center axis, which is convenient for adjusting the distance between the material-carrying crucible 4 and the electron emitter 9. The slider cooperates with the sliding rod 3 and slides up and down along the sliding rod 3. The high-voltage focusing electrode rod 2 and the material-carrying crucible are The movement direction of 4 is limited, so that the material-bearing crucible 4 is always directly below the electron emitter 9, facing the center of the electron emitter 9, and there will be no horizontal offset. Under the action of the high-voltage electric field, electrons move towards the anode. It moves at a high speed, and bombards the material set on the high-voltage focusing electrode rod 2 to carry the evaporated material in the crucible 4 to melt and evaporate it, which is convenient to maintain the efficient and complete coating of the ultra-high vacuum electron beam evaporator when it is working.

Referring to FIG. 2 , the water-cooling shielding barrel 5 is provided with a shielding cover 7 , and the shielding cover 7 forms an evaporation channel. Specifically, the shielding case 7 includes an annular portion 71 and a cylindrical portion 72 surrounding the edge where the hole in the annular portion 71 is provided. The cylindrical portion 72 is opposite to the second opening to form an evaporation channel. The cylindrical portion 72 may pass through the second opening and surround the evaporative ion current detector 8 . The diameter of the cylindrical portion 72 corresponds to the diameter of the material-carrying crucible 4 . The shielding cover 7 is arranged on the water-cooling shielding barrel 5, for example, the shielding cover 7 is connected to the water-cooling shielding barrel 5 through a circular mounting plate. Under the action of the shielding cover 7, the material can be evaporated smoothly through the evaporation channel without interference after evaporation. In addition, the heat generated by the ultra-high vacuum electron beam evaporator during operation is rapidly conducted into the water-cooled shielding barrel 5 through the shielding cover 7, and the heat is taken out of the ultra-high vacuum electron beam evaporator through the cooling water to complete the rapid cooling process, which is conducive to heat dissipation. , to prevent the equipment from being damaged due to excessive temperature.

Specifically, the evaporative ion current detector 8 is an ion collecting plate, and both the water-cooling shielding barrel 5 and the shielding cover 7 are insulated from the ion collecting plate. For example, insulators are arranged between the ion collecting plate and the shielding cover 7 and between the ion collecting plate and the water-cooling shielding barrel 5 to reduce the leakage and glow phenomenon during the working process of the ultra-high vacuum electron beam evaporator, and prevent the The equipment is damaged; and, the material carrying crucible 4, the electron emitter 9 and the ion collecting plate are wrapped by the water-cooled shielding barrel 5 and the shielding cover 7, which not only reduces the photoelectric radiation generated during the coating process, but also prevents the electrons during operation. Radiation outside the beam evaporator has an impact on the coating process, making it easy to maintain the equipment working properly.

Specifically, the ultra-high vacuum electron beam evaporator further includes: a rotating mechanism 11 disposed on the first side of the ultra-high vacuum metal sealing flange, connected to the rotating mechanism 11 and used to open or close the evaporation channel The electric shutter 6. The electric baffle 6 is opposite to the evaporation channel. The size of the electric baffle 6 is larger than that of the evaporation channel. The rotation mechanism 11 adopts a magnetic coupling rotary drive mechanism. It is fast and convenient, easy to operate, and reduces the contact between the human body and the equipment, which is relatively safe. When the electric baffle 6 is opened, the electric baffle 6 does not cover the evaporation channel, therefore, the material in the material-carrying crucible 4 can be evaporated and discharged through the evaporation channel to form a film. When the electric baffle 6 is closed, the electric baffle 6 covers the evaporation passage, and the material in the material-carrying crucible 4 can be evaporated and exit through the evaporation passage, and hit the electric baffle 6 .

The rotating mechanism 11 includes: a second driving member 11a arranged on the first side of the ultra-high vacuum metal sealing flange, a driving rod 11b connected with the second driving member 11a; the driving rod 11b is connected with the electric baffle 6, Specifically, the driving rod 11b is connected to the electric baffle 6 through the ultra-high vacuum metal sealing flange. The second driving member 11a adopts a magnetic coupling rotary driving mechanism, and the rotating shaft of the magnetic coupling rotating driving mechanism is connected with the driving rod 11b. When the rotary shaft of the magnetic coupling rotary driving mechanism rotates, the driving rod 11b also rotates, so that the electric shutter 6 also rotates. Rotate to realize the opening and closing of the electric shutter 6 .

Further, the lifting mechanism 1 includes: a metal welded bellows 1a disposed on the first side of the ultra-high vacuum metal sealing flange, a moving block 1b connected to the metal welded bellows 1a, and the moving block 1b screw screw 1c connected with screw, first driving member 1d connected with screw 1c; the high voltage focusing electrode rod 2 is located in the metal welded bellows 1a and connected with the moving block 1b. The metal welded bellows 1a is sleeved outside the high-voltage focusing electrode rod 2 . The first driving member 1d adopts a magnetic coupling rotary driving mechanism, and the rotating shaft of the magnetic coupling rotating driving mechanism is connected with the screw 1c. When the rotating shaft of the magnetic coupling rotating driving mechanism rotates, the rotating shaft of the magnetic coupling rotating driving mechanism drives the screw 1c to rotate and drives the movement. The block 1b moves, thereby compressing or stretching the metal welded bellows 1a. And under the movement of the moving block 1b, the high-voltage focusing electrode rod 2 can be driven to move, so as to realize the adjustment of the distance between the material-carrying crucible 4 and the electron emitter 9 .

Specifically, the lifting mechanism 1 is sealed by a metal welded bellows 1a. The metal welded bellows 1a is composed of two hollow diaphragms welded on the inner edges in a concentric manner to form a diaphragm pair, and then a plurality of diaphragm pairs are stacked together to form a corrugated section by welding the outer edges, and then the two ends and the end are welded together to form a corrugated section. Sheet metal welding is combined into a bellows group, so that it can reciprocate together with other moving parts according to external needs; the lifting mechanism 1 drives the high-voltage focusing electrode rod 2 and the material-carrying crucible 4 to move up and down. When the metal welding bellows 1a moves up and down The mechanism 1 moves up and down to maintain the protection of the lifting mechanism 1. At the same time, the metal welded bellows 1a made of metal materials can also adapt to the high temperature and high pressure working environment in the ultra-high vacuum electron beam evaporator, and ensure the tightness while realizing the reciprocating motion. .

Specifically, the electron emitter 9 is a circular electron emitter. In this application, a tungsten wire is used to bend into a ring structure, as the electron emitter 9, which can emit electrons uniformly, so that the thickness of the film layer is uniform throughout the coating process, and the process control performance is improved; at the same time, the amount of electron generation can be controlled by adjusting the current of the tungsten wire. The amount of evaporation can be further adjusted to control process parameters such as the thickness of the coating film.

Specifically, the ultra-high vacuum electron beam evaporator further includes: a ceramic sealing electrode 10 connected to the electron emitter 9 . The ceramic metal sealing electrode has good insulation performance, and the vacuum leakage rate is less than 2×10 ^-10 Pa.L/s. The ceramic sealing electrode 10 can reduce the occurrence of leakage, glow and other phenomena. Of course, outside the high-voltage focusing electrode rod 2, ceramic-sealed electrodes are also used to connect with the power supply.

Specifically, the water-cooling shielding barrel 5 adopts a fully enclosed double-wall structure. The water cooling system of the present application is sealed by integral brazing. The fully enclosed water cooling system has high heat dissipation efficiency, low water consumption, energy saving and environmental protection, and is isolated from the external environment. The overall structure has good air tightness and reduces water leakage under high temperature and high pressure. Moreover, the water cooling body is a double-walled type, and the water cooling circuit is even and has no dead ends, which can fully cool the high temperature components.

Further, the power leads inside the ultra-high vacuum electron beam evaporator of the present application are all protected by ceramic tubes. The excellent performance of ceramic tube with high temperature resistance, high pressure resistance and low outgassing is used to protect the power lead, prevent the power lead from being damaged during operation, and reduce equipment failures.

The present application also discloses an electron beam coating device, wherein the electron beam coating device includes the ultra-high vacuum electron beam evaporator as described above.

Other embodiments of the invention will readily occur to those skilled in the art upon consideration of the specification and practice of the invention disclosed herein. The present invention is intended to cover any modifications, uses or adaptations of the present invention that follow the general principles of the invention and include common knowledge or common technical means in the art not disclosed by this disclosure . The specification and examples are to be regarded as exemplary only, with the true scope and spirit of the invention being indicated by the following claims.

The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included in the protection of the present invention. within the range.

Claims (10)

1. An ultra-high vacuum electron beam evaporator, characterized in that, comprising: an ultra-high vacuum metal sealing flange, a lifting mechanism arranged on the first side of the ultra-high vacuum metal sealing flange, a lifting mechanism arranged on the first side of the ultra-high vacuum metal sealing flange, The water-cooled shielding barrel on the second side of the vacuum metal sealing flange, the material carrying crucible, the electron emitter and the evaporative ion current detector located in the water-cooled shielding barrel and arranged in sequence; the lifting mechanism is connected to the The material-carrying crucible is connected and used to adjust the distance between the material-carrying crucible and the electron emitter; the electron emitter is connected with the ultra-high vacuum metal sealing flange, and the evaporative ion current detector is connected to the electron emitter. The water-cooled shielded barrel is connected as described above. 2 . The ultra-high vacuum electron beam evaporator according to claim 1 , wherein a sliding block is provided on the high-voltage focusing electrode rod, and a sliding block is provided on the ultra-high vacuum metal sealing flange. 3 . The sliding rod can slide along the sliding rod. 3 . The ultra-high vacuum electron beam evaporator according to claim 1 , wherein a shielding cover is provided on the water-cooling shielding barrel, and the shielding cover forms an evaporation channel. 4 . 4 . The ultra-high vacuum electron beam evaporator according to claim 3 , wherein the evaporative ion current detector is an ion collecting plate, and the water-cooled shielding barrel and the shielding cover are both connected with the ion collecting plate. 5 . insulation. 5. The ultra-high vacuum electron beam evaporator according to claim 3, wherein the ultra-high vacuum electron beam evaporator further comprises: a rotating mechanism arranged on the first side of the ultra-high vacuum metal sealing flange , an electric baffle connected with the rotating mechanism and used to open or close the evaporation channel. 6 . The ultra-high vacuum electron beam evaporator according to claim 1 , wherein the lifting mechanism comprises: a metal welded bellows disposed on the first side of the ultra-high vacuum metal sealing flange, and the A moving block connected with a metal welded bellows, a screw thread connected with the moving block, and a drive member connected with the screw; the high-voltage focusing electrode rod is located in the metal welded bellows and connected with the moving block. 7 . The ultra-high vacuum electron beam evaporator according to claim 1 , wherein the electron emitter is a circular electron emitter. 8 . 8 . The ultra-high vacuum electron beam evaporator according to claim 1 , wherein the ultra-high vacuum electron beam evaporator further comprises: a ceramic sealing electrode connected to the electron emitter. 9 . 9 . The ultra-high vacuum electron beam evaporator according to claim 1 , wherein the water-cooled shielding barrel adopts a fully enclosed double-walled structure. 10 . 10. An electron beam coating device, characterized by comprising: the ultra-high vacuum electron beam evaporator according to any one of claims 1-9.

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