CN115074792A - Preparation method of cobalt-based alloy film with special structure and product - Google Patents
Preparation method of cobalt-based alloy film with special structure and product Download PDFInfo
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Abstract
本发明公开了一种特殊结构钴基合金膜层的制备方法及产品,属于金属材料技术领域。钴基合金膜层的制备方法,包括以下步骤:将金属基底材料浸入酸性复合镀液中进行复合电沉积,然后再浸入碱性溶液中浸泡腐蚀,得到所述钴基合金膜层;所述酸性复合镀液的制备包括:将钴盐、钨盐和Al2O3颗粒加入溶剂中混合后调节pH值至酸性得到所述酸性复合镀液。该钴基合金膜层耐磨性能提高,析氢过电位减小,析氢性能提高,具有优良的催化性能。
The invention discloses a preparation method and a product of a cobalt-based alloy film layer with a special structure, and belongs to the technical field of metal materials. The preparation method of a cobalt-based alloy film layer includes the following steps: immersing a metal base material in an acidic composite plating solution for composite electrodeposition, and then immersing it in an alkaline solution for immersion and corrosion to obtain the cobalt-based alloy film layer; the acidic composite plating solution The preparation of the composite plating solution includes: adding cobalt salt, tungsten salt and Al 2 O 3 particles into a solvent and mixing, and then adjusting the pH value to be acidic to obtain the acidic composite plating solution. The cobalt-based alloy film layer has improved wear resistance, reduced hydrogen evolution overpotential, improved hydrogen evolution performance, and has excellent catalytic performance.
Description
技术领域technical field
本发明涉及金属材料技术领域,特别是涉及一种特殊结构钴基合金膜层的制备方法及产品。The invention relates to the technical field of metal materials, in particular to a preparation method and product of a cobalt-based alloy film layer with a special structure.
背景技术Background technique
在众多清洁能源中,氢能作为一种经济、高效、可持续的绿色能源,是最为理想的能源载体之一,其受到了越来越广泛的关注。在多种制氢技术中,水电解离制氢被认为是通往“氢经济”的最有效途径之一。然而在实际应用中,水电解离制氢往往需要克服较高的析氢过电位,从而造成较高的能源损耗,为有效解决水电解离析氢过电位过高的技术瓶颈,高效催化材料的应用是突破此瓶颈的技术关键。目前贵金属铂及其合金是最为有效的析氢催化剂,但价格高昂、资源稀少以及电化学稳定性较差等不足限制了其规模化应用,粉末状催化剂受限于粘合剂和电化学稳定性。因此,亟需开发一种机械强度高、催化活性良好的非贵金属电极材料。Among many clean energy sources, hydrogen energy, as an economical, efficient and sustainable green energy, is one of the most ideal energy carriers, and it has received more and more attention. Among various hydrogen production technologies, electrolysis of water is considered to be one of the most effective ways to the "hydrogen economy". However, in practical applications, water electrolysis for hydrogen production often needs to overcome a high hydrogen evolution overpotential, resulting in high energy loss. The key to breaking through this bottleneck is the technology. At present, precious metal platinum and its alloys are the most effective catalysts for hydrogen evolution, but the high price, scarcity of resources, and poor electrochemical stability limit their large-scale applications. Powdered catalysts are limited by binders and electrochemical stability. Therefore, there is an urgent need to develop a non-noble metal electrode material with high mechanical strength and good catalytic activity.
在众多非贵金属电催化材料中,过渡金属磷化物由于其独特的电子结构以及类金属特性,是催化反应活性高、稳定性好和成本效能佳的析氢电催化材料之一,其具有代替Pt基电催化材料的潜质。当前,水电解离析氢所用磷化物催化材料大多采用溶液水热合成工序和高温固相还原工序制备,其形态多为粉体,需在溶剂中充分分散,之后再利用Nafion溶液和聚偏氟乙烯有机溶液等粘结剂将其固定在导电载体上,这样催化电极的催化剂负载量有限,且粘结剂会降低电极材料的电传导性能,同时还存在粘结剂会包覆和遮蔽催化剂的部分活性点位,降低其催化性能;此外,长时间电解过程中,活性催化材料易从电极表面脱落,致使水电解离析氢催化电极稳定性差。而如何制备得到一种催化活性及耐磨性良好的非贵金属电极材料,成为本领域技术人员亟待解决的技术难题。Among many non-precious metal electrocatalytic materials, transition metal phosphide is one of the electrocatalytic materials for hydrogen evolution with high catalytic activity, good stability and cost-effectiveness due to its unique electronic structure and metal-like properties. The potential of electrocatalytic materials. At present, most of the phosphide catalytic materials used for the hydrogen evolution of water electrolysis are prepared by the solution hydrothermal synthesis process and the high-temperature solid-phase reduction process. Most of their forms are powders, which need to be fully dispersed in the solvent, and then the Nafion solution and polyvinylidene fluoride are used. Binders such as organic solutions are used to fix it on the conductive carrier, so that the catalyst loading of the catalytic electrode is limited, and the binder will reduce the electrical conductivity of the electrode material, and there are also parts where the binder will coat and shield the catalyst. In addition, during the long-term electrolysis process, the active catalytic material is easy to fall off the surface of the electrode, resulting in poor stability of the catalytic electrode for hydrogen evolution in water electrolysis. However, how to prepare a non-precious metal electrode material with good catalytic activity and wear resistance has become a technical problem to be solved urgently by those skilled in the art.
发明内容SUMMARY OF THE INVENTION
本发明的目的是提供一种特殊结构钴基合金膜层的制备方法及产品,以解决现有技术中存在的问题,本发明在基底材料表面制备由钴、钨和Al2O3颗粒复合电沉积,再由NaOH溶液腐蚀去除Al2O3颗粒而成的具有特殊结构(将图1~2和图8进行对比,可以看出来特殊结构和原有结构,氧化铝颗粒去除后表面留下多孔)的钴基合金膜层,该膜层兼具耐磨性能及较高的析氢性能。The purpose of the present invention is to provide a preparation method and product of a cobalt - based alloy film with a special structure, so as to solve the problems existing in the prior art. It is deposited and then etched by NaOH solution to remove Al 2 O 3 particles with a special structure (compare Figures 1 to 2 with Figure 8, it can be seen that the special structure and the original structure, after the removal of the alumina particles, the surface remains porous ) cobalt-based alloy film, which has both wear resistance and high hydrogen evolution performance.
为实现上述目的,本发明提供了如下方案To achieve the above object, the present invention provides the following solutions
本发明的技术方案之一:One of the technical solutions of the present invention:
将金属基底材料浸入酸性复合镀液中进行复合电沉积,然后再浸入碱性溶液中浸泡腐蚀,得到所述钴基合金膜层;The metal base material is immersed in an acidic composite plating solution for composite electrodeposition, and then immersed in an alkaline solution for immersion and corrosion to obtain the cobalt-based alloy film layer;
所述酸性复合镀液的制备包括:将钴盐、钨盐和Al2O3颗粒加入溶剂中混合后调节pH值至酸性得到所述酸性复合镀液。The preparation of the acidic composite plating solution includes: adding cobalt salt, tungsten salt and Al 2 O 3 particles into a solvent and mixing, and then adjusting the pH value to be acidic to obtain the acidic composite plating solution.
Co-W合金膜层结构致密、硬度高、耐热性好、耐磨耐蚀性能优良。Co-W alloy film has compact structure, high hardness, good heat resistance, and excellent wear and corrosion resistance.
将氧化铝颗粒通过腐蚀的方法去除,可以在表面形成多孔结构,有效增大表面积,提高其电催化性能。Removing the alumina particles by etching can form a porous structure on the surface, effectively increase the surface area, and improve its electrocatalytic performance.
进一步地,所述酸性复合镀液中钴盐的浓度为0.05~0.1mol/L,钨盐的浓度为0.05~0.1mol/L,Al2O3颗粒的浓度为10~30g/L;所述酸性复合镀液的pH值为4.5~6.0。Further, the concentration of cobalt salt in the acidic composite plating solution is 0.05-0.1 mol/L, the concentration of tungsten salt is 0.05-0.1 mol/L, and the concentration of Al 2 O 3 particles is 10-30 g/L; The pH value of the acidic composite plating solution is 4.5 to 6.0.
复合高浓度氧化铝颗粒的镀层厚度低于低浓度镀层。络合剂可以起到亮化、平整化和缓冲作用。The coating thickness of the composite high-concentration alumina particles is lower than that of the low-concentration coating. The complexing agent can play the role of lightening, leveling and buffering.
进一步地,所述钴盐为硫酸钴;所述钨盐为钨酸钠。Further, the cobalt salt is cobalt sulfate; the tungsten salt is sodium tungstate.
进一步地,所述酸性复合镀液中还含有络合剂。Further, the acidic composite plating solution also contains a complexing agent.
进一步地,所述络合剂在酸性复合镀液中的浓度为0.2~0.4mol/L;所述络合剂为柠檬酸氢二铵。Further, the concentration of the complexing agent in the acidic composite plating solution is 0.2-0.4 mol/L; the complexing agent is diammonium hydrogen citrate.
进一步地,所述复合电沉积的条件为:恒电流密度,电流密度为10~50mA/cm2,电沉积时间为30~60min,电沉积温度为40~70℃。Further, the conditions of the composite electrodeposition are: constant current density, the current density is 10-50mA/cm 2 , the electrodeposition time is 30-60min, and the electrodeposition temperature is 40-70°C.
进一步地,所述碱性溶液包括NaOH溶液;所述NaOH溶液的浓度为5~7mol/L。Further, the alkaline solution includes a NaOH solution; the concentration of the NaOH solution is 5-7 mol/L.
进一步地,所述浸泡腐蚀的温度为60~80℃。Further, the temperature of the soaking corrosion is 60-80°C.
本发明的技术方案之二:一种上述制备方法制备的钴基合金膜层。The second technical solution of the present invention: a cobalt-based alloy film prepared by the above preparation method.
本发明的技术方案之三:一种上述钴基合金膜层在制备电极材料中的应用。The third technical solution of the present invention: an application of the above-mentioned cobalt-based alloy film layer in the preparation of electrode materials.
本发明公开了以下技术效果:The present invention discloses the following technical effects:
(1)采用本发明的酸性复合镀液对基底材料进行复合电沉积,可以形成机械优异性能的Co-W合金膜层,进一步将其浸入NaOH溶液中进行腐蚀,最终在基底表面形成了厚度为10~13μm的特殊结构钴基合金膜层,该复合膜表面平整、特殊结构均匀,摩擦系数为0.5~0.8,在10-100mA/cm2的电流密度下腐蚀,其析氢过电位减小(与Co-W镀层的572mV相比),催化性能提高。(1) Using the acidic composite plating solution of the present invention to perform composite electrodeposition on the base material, a Co-W alloy film layer with excellent mechanical properties can be formed, which is further immersed in a NaOH solution for corrosion, and finally formed on the surface of the substrate with a thickness of Cobalt-based alloy film with a special structure of 10-13μm, the composite film has a smooth surface, a special structure, and a friction coefficient of 0.5-0.8. When corroded at a current density of 10-100mA/cm 2 , its hydrogen evolution overpotential is reduced (with Compared with 572mV of Co-W coating), the catalytic performance is improved.
(2)本发明制备得到的特殊结构的钴基合金膜层兼具耐磨性能及较高的析氢性能。(2) The special-structured cobalt-based alloy film prepared by the present invention has both wear resistance and high hydrogen evolution performance.
(3)本发明在现有的钴盐、钨盐复合共沉积的基础上,加入了Al2O3颗粒,三种物质在络合剂柠檬酸氢二铵的作用下复合共沉积,可以制得Co-W-Al2O3复合膜层,可以提高膜层的耐磨性。然后在NaOH溶液中腐蚀去除Al2O3颗粒,得到具有特殊结构的钴基合金膜层。钴基膜层本身具有优异的性能,而本发明使用的脱颗粒法制备特殊结构的钴基合金膜层,使膜层具有较大的孔隙率、比表面积和化学活性,进一步提高了膜层的力学性能和催化性能。另外,本发明采用复合电沉积和腐蚀脱颗粒的方式,得到的膜层具有耐磨、比表面积大(具有多孔结构,比表面积变大)及析氢性能高等优点。(3) The present invention adds Al 2 O 3 particles on the basis of the existing co-deposition of cobalt salt and tungsten salt, and the three substances are compound and co-deposited under the action of the complexing agent diammonium hydrogen citrate, which can make The Co-W-Al 2 O 3 composite film can be obtained, which can improve the wear resistance of the film. Then, the Al 2 O 3 particles are removed by etching in NaOH solution to obtain a cobalt-based alloy film with a special structure. The cobalt-based film layer itself has excellent performance, and the degranulation method used in the present invention prepares a special-structured cobalt-based alloy film layer, so that the film layer has larger porosity, specific surface area and chemical activity, and further improves the film layer. Mechanical and catalytic properties. In addition, the present invention adopts the method of composite electrodeposition and corrosion and degranulation, and the obtained film has the advantages of wear resistance, large specific surface area (with porous structure, large specific surface area) and high hydrogen evolution performance.
(4)本发明的方法适合于制备电催化中(需要具有优异析氢性能、耐磨要求)的各种电极材料。(4) The method of the present invention is suitable for preparing various electrode materials in electrocatalysis (which need to have excellent hydrogen evolution performance and wear resistance requirements).
(5)本发明采用复合电沉积和腐蚀脱颗粒技术,提高了其析氢性能及力学性能。(5) The present invention adopts composite electrodeposition and corrosion degranulation technology to improve its hydrogen evolution performance and mechanical performance.
(6)本发明的制备方法操作简单、清洁环保、适用于复杂形状及有盲孔的金属材料,易于工业化。(6) The preparation method of the present invention is simple to operate, clean and environmentally friendly, suitable for metal materials with complex shapes and blind holes, and is easy to industrialize.
附图说明Description of drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the accompanying drawings required in the embodiments will be briefly introduced below. Obviously, the drawings in the following description are only some of the present invention. In the embodiments, for those of ordinary skill in the art, other drawings can also be obtained according to these drawings without any creative effort.
图1为本发明实施例1制备的特殊结构钴基合金膜层的表面形貌图;Fig. 1 is the surface topography diagram of the special structure cobalt-based alloy film prepared in Example 1 of the present invention;
图2为本发明实施例2制备的特殊结构钴基合金膜层的表面形貌图;Fig. 2 is the surface topography of the special structure cobalt-based alloy film prepared in Example 2 of the present invention;
图3为本发明实施例3制备的特殊结构钴基合金膜层的表面形貌图;Fig. 3 is the surface topography of the special structure cobalt-based alloy film prepared in Example 3 of the present invention;
图4为本发明实施例4制备的特殊结构钴基合金膜层的表面形貌图;4 is a surface topography diagram of a special-structure cobalt-based alloy film prepared in Example 4 of the present invention;
图5为本发明实施例5制备的特殊结构钴基合金膜层的表面形貌图;Fig. 5 is the surface topography diagram of the special structure cobalt-based alloy film prepared in Example 5 of the present invention;
图6为本发明实施例6制备的特殊结构钴基合金膜层的表面形貌图;6 is a surface topography diagram of a special-structure cobalt-based alloy film prepared in Example 6 of the present invention;
图7为本发明对比例1制备的膜层的表面形貌图;Fig. 7 is the surface topography diagram of the film layer prepared by Comparative Example 1 of the present invention;
图8为本发明对比例2制备的膜层的表面形貌图;Fig. 8 is the surface topography diagram of the film layer prepared by Comparative Example 2 of the present invention;
图9为本发明对比例3制备的膜层的表面形貌图;Fig. 9 is the surface topography diagram of the film layer prepared by Comparative Example 3 of the present invention;
图10为本发明对比例4制备的膜层的表面形貌图;Fig. 10 is the surface topography of the film layer prepared by Comparative Example 4 of the present invention;
图11为本发明对比例5制备的膜层的表面形貌图。FIG. 11 is a surface topography diagram of the film prepared in Comparative Example 5 of the present invention.
具体实施方式Detailed ways
现详细说明本发明的多种示例性实施方式,该详细说明不应认为是对本发明的限制,而应理解为是对本发明的某些方面、特性和实施方案的更详细的描述。Various exemplary embodiments of the present invention will now be described in detail, which detailed description should not be construed as a limitation of the invention, but rather as a more detailed description of certain aspects, features, and embodiments of the invention.
应理解本发明中所述的术语仅仅是为描述特别的实施方式,并非用于限制本发明。另外,对于本发明中的数值范围,应理解为还具体公开了该范围的上限和下限之间的每个中间值。在任何陈述值或陈述范围内的中间值以及任何其他陈述值或在所述范围内的中间值之间的每个较小的范围也包括在本发明内。这些较小范围的上限和下限可独立地包括或排除在范围内。It should be understood that the terms described in the present invention are only used to describe particular embodiments, and are not used to limit the present invention. Additionally, for numerical ranges in the present disclosure, it should be understood that each intervening value between the upper and lower limits of the range is also specifically disclosed. Every smaller range between any stated value or intervening value in a stated range and any other stated value or intervening value in that stated range is also encompassed within the invention. The upper and lower limits of these smaller ranges may independently be included or excluded in the range.
除非另有说明,否则本文使用的所有技术和科学术语具有本发明所述领域的常规技术人员通常理解的相同含义。虽然本发明仅描述了优选的方法和材料,但是在本发明的实施或测试中也可以使用与本文所述相似或等同的任何方法和材料。本说明书中提到的所有文献通过引用并入,用以公开和描述与所述文献相关的方法和材料。在与任何并入的文献冲突时,以本说明书的内容为准。Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention relates. Although only the preferred methods and materials are described herein, any methods and materials similar or equivalent to those described herein can also be used in the practice or testing of the present invention. All documents mentioned in this specification are incorporated by reference for the purpose of disclosing and describing the methods and materials in connection with which the documents are referred. In the event of conflict with any incorporated document, the content of this specification controls.
在不背离本发明的范围或精神的情况下,可对本发明说明书的具体实施方式做多种改进和变化,这对本领域技术人员而言是显而易见的。由本发明的说明书得到的其他实施方式对技术人员而言是显而易见的。本申请说明书和实施例仅是示例性的。It will be apparent to those skilled in the art that various modifications and variations can be made in the specific embodiments of the present invention without departing from the scope or spirit of the invention. Other embodiments will be apparent to those skilled in the art from the description of the present invention. The description and examples of the present application are only exemplary.
关于本文中所使用的“包含”、“包括”、“具有”、“含有”等等,均为开放性的用语,即意指包含但不限于。As used herein, "comprising," "including," "having," "containing," and the like, are open-ended terms, meaning including but not limited to.
实施例1Example 1
一种特殊结构钴基合金膜层的制备方法:A preparation method of a cobalt-based alloy film with a special structure:
(1)酸性复合镀液的制备:将硫酸钴、钨酸钠、络合剂(柠檬酸氢二铵)、氧化铝颗粒(粒径1μm)依次加入溶剂水中混合,溶解,搅拌均匀,得到酸性复合镀液。(1) Preparation of acidic composite plating solution: add cobalt sulfate, sodium tungstate, complexing agent (diammonium hydrogen citrate), and alumina particles (particle size: 1 μm) into solvent water and mix, dissolve, and stir evenly to obtain acidic Composite plating solution.
其中各组分的浓度分别为:硫酸钴0.1mol/L,钨酸钠0.1mol/L,络合剂(柠檬酸氢二铵)0.2mol/L,氧化铝颗粒20g/L。酸性复合镀液的温度为60℃恒定温度,pH值为5.0。The concentrations of the components are: cobalt sulfate 0.1 mol/L, sodium tungstate 0.1 mol/L, complexing agent (diammonium hydrogen citrate) 0.2 mol/L, and alumina particles 20 g/L. The temperature of the acidic composite plating solution was a constant temperature of 60°C, and the pH value was 5.0.
(2)将金属基底材料浸入酸性复合镀液中进行复合电沉积(复合电沉积在空气搅拌的条件下进行,采用恒电流密度,电流密度为20mA/cm2,电沉积时间为60min,电沉积的温度为60℃),电沉积结束后取出、水洗、冷风吹干;然后浸入含有NaOH溶液(浓度为5mol/L)的恒温(80℃)反应器中,空气搅拌下腐蚀60min脱去氧化铝颗粒,取出、水洗、冷风吹干,得到特殊结构钴基合金膜层(具有复合膜层的基底材料)。(2) Immerse the metal base material in an acidic composite plating solution to carry out composite electrodeposition (the composite electrodeposition is carried out under the condition of air stirring, a constant current density is used, the current density is 20mA/cm 2 , the electrodeposition time is 60min, and the electrodeposition time is 60min. The temperature is 60 ℃), after the electrodeposition is finished, take out, wash with water, and dry with cold air; then immerse in a constant temperature (80 ℃) reactor containing NaOH solution (concentration is 5mol/L), and corrode for 60min under air stirring to remove alumina The particles are taken out, washed with water, and dried in cold air to obtain a cobalt-based alloy film layer with a special structure (a base material with a composite film layer).
将制备得到的特殊结构钴基合金膜层置于扫描电镜下观察其表面形貌,结果如图1所示,由图中可以看出,所得复合膜层表面平整、特殊结构均匀。经检测,所得特殊结构钴基合金膜层的厚度为13μm,摩擦系数为0.54,在10mA/cm2的电流密度下腐蚀,其析氢过电位为532mV,与Co-W镀层的572mV相比减小了40mV。The prepared cobalt-based alloy film with special structure was placed under a scanning electron microscope to observe its surface morphology. The results are shown in Figure 1. It can be seen from the figure that the obtained composite film has a smooth surface and a uniform special structure. After testing, the thickness of the obtained special-structure cobalt-based alloy film is 13 μm, the friction coefficient is 0.54, and it is corroded at a current density of 10 mA/cm 2 . 40mV.
实施例2Example 2
一种特殊结构钴基合金膜层的制备方法:A preparation method of a cobalt-based alloy film with a special structure:
(1)酸性复合镀液的制备:将硫酸钴、钨酸钠、络合剂(柠檬酸氢二铵)、氧化铝颗粒(粒径1μm)依次加入溶剂水中混合,溶解,搅拌均匀,得到酸性复合镀液。(1) Preparation of acidic composite plating solution: add cobalt sulfate, sodium tungstate, complexing agent (diammonium hydrogen citrate), and alumina particles (particle size: 1 μm) into solvent water and mix, dissolve, and stir evenly to obtain acidic Composite plating solution.
其中各组分的浓度分别为:硫酸钴0.1mol/L,钨酸钠0.1mol/L,络合剂(柠檬酸氢二铵)0.2mol/L,氧化铝颗粒10g/L。酸性复合镀液的温度为60℃恒定温度,pH值为5.0。The concentrations of each component are: cobalt sulfate 0.1 mol/L, sodium tungstate 0.1 mol/L, complexing agent (diammonium hydrogen citrate) 0.2 mol/L, and alumina particles 10 g/L. The temperature of the acidic composite plating solution was a constant temperature of 60°C, and the pH value was 5.0.
(2)将金属基底材料浸入酸性复合镀液中进行复合电沉积(复合电沉积在空气搅拌的条件下进行,采用恒电流密度,电流密度为20mA/cm2,电沉积时间为60min,电沉积的温度为60℃),电沉积结束后取出、水洗、冷风吹干;然后浸入含有NaOH溶液(浓度为5mol/L)的恒温(80℃)反应器中,空气搅拌下腐蚀60min脱去氧化铝颗粒,取出、水洗、冷风吹干,得到特殊结构钴基合金膜层(具有复合膜层的基底材料)。(2) Immerse the metal base material in an acidic composite plating solution to carry out composite electrodeposition (the composite electrodeposition is carried out under the condition of air stirring, a constant current density is used, the current density is 20mA/cm 2 , the electrodeposition time is 60min, and the electrodeposition time is 60min. The temperature is 60 ℃), after the electrodeposition is finished, take out, wash with water, and dry with cold air; then immerse in a constant temperature (80 ℃) reactor containing NaOH solution (concentration is 5mol/L), and corrode for 60min under air stirring to remove alumina The particles are taken out, washed with water, and dried in cold air to obtain a cobalt-based alloy film layer with a special structure (a base material with a composite film layer).
将制备得到的特殊结构钴基合金膜层置于扫描电镜下观察其表面形貌,结果如图2所示,由图中可以看出,所得复合膜层表面平整、特殊结构均匀。经检测,所得特殊结构钴基合金膜层的厚度为11μm,摩擦系数为0.53,在10mA/cm2的电流密度下腐蚀,其析氢过电位为567mV,与Co-W镀层的572mV相比减小了5mV。The prepared cobalt-based alloy film with special structure was placed under a scanning electron microscope to observe its surface morphology. The results are shown in Figure 2. It can be seen from the figure that the obtained composite film has a smooth surface and a uniform special structure. After testing, the thickness of the obtained special-structure cobalt-based alloy film is 11 μm, the friction coefficient is 0.53, and it is corroded at a current density of 10 mA/cm 2 . 5mV.
实施例3Example 3
一种特殊结构钴基合金膜层的制备方法:A preparation method of a cobalt-based alloy film with a special structure:
(1)酸性复合镀液的制备:将硫酸钴、钨酸钠、络合剂(柠檬酸氢二铵)、氧化铝颗粒(粒径1μm)依次加入溶剂水中混合,溶解,搅拌均匀,得到酸性复合镀液。(1) Preparation of acidic composite plating solution: add cobalt sulfate, sodium tungstate, complexing agent (diammonium hydrogen citrate), and alumina particles (particle size: 1 μm) into solvent water and mix, dissolve, and stir evenly to obtain acidic Composite plating solution.
其中各组分的浓度分别为:硫酸钴0.1mol/L,钨酸钠0.1mol/L,络合剂(柠檬酸氢二铵)0.2mol/L,氧化铝颗粒30g/L。酸性复合镀液的温度为60℃恒定温度,pH值为5.0。The concentrations of the components are: cobalt sulfate 0.1 mol/L, sodium tungstate 0.1 mol/L, complexing agent (diammonium hydrogen citrate) 0.2 mol/L, and alumina particles 30 g/L. The temperature of the acidic composite plating solution was a constant temperature of 60°C, and the pH value was 5.0.
(2)将金属基底材料浸入酸性复合镀液中进行复合电沉积(复合电沉积在空气搅拌的条件下进行,采用恒电流密度,电流密度为20mA/cm2,电沉积时间为60min,电沉积的温度为60℃),电沉积结束后取出、水洗、冷风吹干;然后浸入含有NaOH溶液(浓度为5mol/L)的恒温(80℃)反应器中,空气搅拌下腐蚀60min脱去氧化铝颗粒,取出、水洗、冷风吹干,得到特殊结构钴基合金膜层(具有复合膜层的基底材料)。(2) Immerse the metal base material in an acidic composite plating solution to carry out composite electrodeposition (the composite electrodeposition is carried out under the condition of air stirring, a constant current density is used, the current density is 20mA/cm 2 , the electrodeposition time is 60min, and the electrodeposition time is 60min. The temperature is 60 ℃), after the electrodeposition is finished, take out, wash with water, and dry with cold air; then immerse in a constant temperature (80 ℃) reactor containing NaOH solution (concentration is 5mol/L), and corrode for 60min under air stirring to remove alumina The particles are taken out, washed with water, and dried in cold air to obtain a cobalt-based alloy film layer with a special structure (a base material with a composite film layer).
将制备得到的特殊结构钴基合金膜层置于扫描电镜下观察其表面形貌,结果如图3所示,由图中可以看出,所得复合膜层表面平整、特殊结构均匀。经检测,所得特殊结构钴基合金膜层的厚度为10μm,摩擦系数为0.68,在10mA/cm2的电流密度下腐蚀,其析氢过电位为543mV,与Co-W镀层的572mV相比减小了29mV。The prepared cobalt-based alloy film with special structure was placed under a scanning electron microscope to observe its surface morphology. The results are shown in Figure 3. It can be seen from the figure that the obtained composite film has a smooth surface and a uniform special structure. After testing, the thickness of the obtained special-structure cobalt-based alloy film is 10 μm, the friction coefficient is 0.68, and it is corroded at a current density of 10 mA/cm 2 . 29mV.
实施例4Example 4
一种特殊结构钴基合金膜层的制备方法:A preparation method of a cobalt-based alloy film with a special structure:
(1)酸性复合镀液的制备:将硫酸钴、钨酸钠、络合剂(柠檬酸氢二铵)、氧化铝颗粒(粒径80nm)依次加入溶剂水中混合,溶解,搅拌均匀,得到酸性复合镀液。(1) Preparation of acidic composite plating solution: Add cobalt sulfate, sodium tungstate, complexing agent (diammonium hydrogen citrate), and alumina particles (particle size: 80 nm) into solvent water and mix, dissolve, and stir evenly to obtain acidic Composite plating solution.
其中各组分的浓度分别为:硫酸钴0.1mol/L,钨酸钠0.1mol/L,络合剂(柠檬酸氢二铵)0.2mol/L,氧化铝颗粒10g/L。酸性复合镀液的温度为60℃恒定温度,pH值为5.0。The concentrations of each component are: cobalt sulfate 0.1 mol/L, sodium tungstate 0.1 mol/L, complexing agent (diammonium hydrogen citrate) 0.2 mol/L, and alumina particles 10 g/L. The temperature of the acidic composite plating solution was a constant temperature of 60°C, and the pH value was 5.0.
(2)将金属基底材料浸入酸性复合镀液中进行复合电沉积(复合电沉积在空气搅拌的条件下进行,采用恒电流密度,电流密度为20mA/cm2,电沉积时间为60min,电沉积的温度为60℃),电沉积结束后取出、水洗、冷风吹干;然后浸入含有NaOH溶液(浓度为5mol/L)的恒温(80℃)反应器中,空气搅拌下腐蚀60min脱去氧化铝颗粒,取出、水洗、冷风吹干,得到特殊结构钴基合金膜层(具有复合膜层的基底材料)。(2) Immerse the metal base material in an acidic composite plating solution to carry out composite electrodeposition (the composite electrodeposition is carried out under the condition of air stirring, a constant current density is used, the current density is 20mA/cm 2 , the electrodeposition time is 60min, and the electrodeposition time is 60min. The temperature is 60 ℃), after the electrodeposition is finished, take out, wash with water, and dry with cold air; then immerse in a constant temperature (80 ℃) reactor containing NaOH solution (concentration is 5mol/L), and corrode for 60min under air stirring to remove alumina The particles are taken out, washed with water, and dried in cold air to obtain a cobalt-based alloy film layer with a special structure (a base material with a composite film layer).
将制备得到的特殊结构钴基合金膜层置于扫描电镜下观察其表面形貌,结果如图4所示,由图中可以看出,所得复合膜层表面平整、特殊结构均匀。经检测,所得特殊结构钴基合金膜层的厚度为12μm,摩擦系数为0.69,在10mA/cm2的电流密度下腐蚀,其析氢过电位为561mV,与Co-W镀层的572mV相比减小了11mV。The prepared cobalt-based alloy film with special structure was placed under a scanning electron microscope to observe its surface morphology. The results are shown in Figure 4. It can be seen from the figure that the obtained composite film has a smooth surface and a uniform special structure. After testing, the thickness of the obtained special-structure cobalt-based alloy film is 12 μm, the friction coefficient is 0.69, and it is corroded at a current density of 10 mA/cm 2 . 11mV.
实施例5Example 5
一种特殊结构钴基合金膜层的制备方法:A preparation method of a cobalt-based alloy film with a special structure:
(1)酸性复合镀液的制备:将硫酸钴、钨酸钠、络合剂(柠檬酸氢二铵)、氧化铝颗粒(粒径5μm)依次加入溶剂水中混合,溶解,搅拌均匀,得到酸性复合镀液。(1) Preparation of acidic composite plating solution: add cobalt sulfate, sodium tungstate, complexing agent (diammonium hydrogen citrate), and alumina particles (particle size: 5 μm) into solvent water and mix, dissolve, and stir evenly to obtain acidic Composite plating solution.
其中各组分的浓度分别为:硫酸钴0.1mol/L,钨酸钠0.1mol/L,络合剂(柠檬酸氢二铵)0.2mol/L,氧化铝颗粒20g/L。酸性复合镀液的温度为60℃恒定温度,pH值为5.0。The concentrations of the components are: cobalt sulfate 0.1 mol/L, sodium tungstate 0.1 mol/L, complexing agent (diammonium hydrogen citrate) 0.2 mol/L, and alumina particles 20 g/L. The temperature of the acidic composite plating solution was a constant temperature of 60°C, and the pH value was 5.0.
(2)将金属基底材料浸入酸性复合镀液中进行复合电沉积(复合电沉积在空气搅拌的条件下进行,采用恒电流密度,电流密度为20mA/cm2,电沉积时间为60min,电沉积的温度为60℃),电沉积结束后取出、水洗、冷风吹干;然后浸入含有NaOH溶液(浓度为5mol/L)的恒温(80℃)反应器中,空气搅拌下腐蚀60min脱去氧化铝颗粒,取出、水洗、冷风吹干,得到特殊结构钴基合金膜层(具有复合膜层的基底材料)。(2) Immerse the metal base material in an acidic composite plating solution to carry out composite electrodeposition (the composite electrodeposition is carried out under the condition of air stirring, a constant current density is used, the current density is 20mA/cm 2 , the electrodeposition time is 60min, and the electrodeposition time is 60min. The temperature is 60 ℃), after the electrodeposition is finished, take out, wash with water, and dry with cold air; then immerse in a constant temperature (80 ℃) reactor containing NaOH solution (concentration is 5mol/L), and corrode for 60min under air stirring to remove alumina The particles are taken out, washed with water, and dried in cold air to obtain a cobalt-based alloy film layer with a special structure (a base material with a composite film layer).
将制备得到的特殊结构钴基合金膜层置于扫描电镜下观察其表面形貌,结果如图5所示,由图中可以看出,所得复合膜层表面平整、特殊结构均匀。经检测,所得特殊结构钴基合金膜层的厚度为12μm,摩擦系数为0.78,在10mA/cm2的电流密度下腐蚀,其析氢过电位为559mV,与Co-W镀层的572mV相比减小了13mV。The prepared cobalt-based alloy film with special structure was placed under a scanning electron microscope to observe its surface morphology. The results are shown in Figure 5. It can be seen from the figure that the obtained composite film has a smooth surface and a uniform special structure. After testing, the thickness of the obtained special-structure cobalt-based alloy film is 12 μm, the friction coefficient is 0.78, and it corrodes at a current density of 10 mA/cm 2 , and its hydrogen evolution overpotential is 559 mV, which is lower than the 572 mV of Co-W coating 13mV.
实施例6Example 6
一种特殊结构钴基合金膜层的制备方法:A preparation method of a cobalt-based alloy film with a special structure:
(1)酸性复合镀液的制备:将硫酸钴、钨酸钠、络合剂(柠檬酸氢二铵)、氧化铝颗粒(粒径5μm)依次加入溶剂水中混合,溶解,搅拌均匀,得到酸性复合镀液。(1) Preparation of acidic composite plating solution: add cobalt sulfate, sodium tungstate, complexing agent (diammonium hydrogen citrate), and alumina particles (particle size: 5 μm) into solvent water and mix, dissolve, and stir evenly to obtain acidic Composite plating solution.
其中各组分的浓度分别为:硫酸钴0.1mol/L,钨酸钠0.1mol/L,络合剂(柠檬酸氢二铵)0.2mol/L,氧化铝颗粒30g/L。酸性复合镀液的温度为60℃恒定温度,pH值为5.0。The concentrations of the components are: cobalt sulfate 0.1 mol/L, sodium tungstate 0.1 mol/L, complexing agent (diammonium hydrogen citrate) 0.2 mol/L, and alumina particles 30 g/L. The temperature of the acidic composite plating solution was a constant temperature of 60°C, and the pH value was 5.0.
(2)将金属基底材料浸入酸性复合镀液中进行复合电沉积(复合电沉积在空气搅拌的条件下进行,采用恒电流密度,电流密度为20mA/cm2,电沉积时间为60min,电沉积的温度为60℃),电沉积结束后取出、水洗、冷风吹干;然后浸入含有NaOH溶液(浓度为5mol/L)的恒温(80℃)反应器中,空气搅拌下腐蚀60min脱去氧化铝颗粒,取出、水洗、冷风吹干,得到特殊结构钴基合金膜层(具有复合膜层的基底材料)。(2) Immerse the metal base material in an acidic composite plating solution to carry out composite electrodeposition (the composite electrodeposition is carried out under the condition of air stirring, a constant current density is used, the current density is 20mA/cm 2 , the electrodeposition time is 60min, and the electrodeposition time is 60min. The temperature is 60 ℃), after the electrodeposition is finished, take out, wash with water, and dry with cold air; then immerse in a constant temperature (80 ℃) reactor containing NaOH solution (concentration is 5mol/L), and corrode for 60min under air stirring to remove alumina The particles are taken out, washed with water, and dried in cold air to obtain a cobalt-based alloy film layer with a special structure (a base material with a composite film layer).
将制备得到的特殊结构钴基合金膜层置于扫描电镜下观察其表面形貌,结果如图6所示,由图中可以看出,所得复合膜层表面平整、特殊结构均匀。经检测,所得特殊结构钴基合金膜层的厚度为11μm,摩擦系数为0.80,在10mA/cm2的电流密度下腐蚀,其析氢过电位为562mV,与Co-W镀层的572mV相比减小了10mV。The prepared cobalt-based alloy film with special structure was placed under a scanning electron microscope to observe its surface morphology. The results are shown in Figure 6. It can be seen from the figure that the obtained composite film has a smooth surface and a uniform special structure. After testing, the thickness of the obtained special-structure cobalt-based alloy film is 11 μm, the friction coefficient is 0.80, and it is corroded at a current density of 10 mA/cm 2 . 10mV.
对比例1Comparative Example 1
同实施例1,区别在于,复合电沉积后未浸入NaOH溶液中进行腐蚀。Same as Example 1, the difference is that the composite electrodeposition is not immersed in NaOH solution for corrosion.
将制备得到的膜层置于扫描电镜下观察其表面形貌,结果如图7所示,由图中可以看出,所得膜层表面平整,可见复合氧化铝颗粒。经检测,所得膜层的厚度为13μm,摩擦系数为0.58,其析氢过电位为568mV。The prepared film layer was placed under a scanning electron microscope to observe its surface morphology. The results are shown in Figure 7. It can be seen from the figure that the surface of the obtained film layer is smooth, and composite alumina particles can be seen. After testing, the thickness of the obtained film layer was 13 μm, the friction coefficient was 0.58, and the hydrogen evolution overpotential was 568 mV.
对比例2Comparative Example 2
同实施例1,区别在于,步骤(1)中的酸性复合镀液中不含有氧化铝颗粒,复合电沉积后未浸入NaOH溶液中进行腐蚀。Same as Example 1, the difference is that the acidic composite plating solution in step (1) does not contain alumina particles, and is not immersed in NaOH solution for corrosion after composite electrodeposition.
将所得膜层(Co-W镀层)置于扫描电镜下观察其表面形貌,结果如图8所示,由图中可以看出,所得膜层表面平整,连续致密,无须状形貌。经检测,所得膜层的厚度为8μm,摩擦系数为0.63,其析氢过电位为572mV。The obtained film (Co-W coating) was placed under a scanning electron microscope to observe its surface morphology. The results are shown in Figure 8. It can be seen from the figure that the surface of the obtained film is smooth, continuous and dense, and has no whisker-like morphology. After testing, the thickness of the obtained film layer was 8 μm, the friction coefficient was 0.63, and the hydrogen evolution overpotential was 572 mV.
对比例3Comparative Example 3
同实施例1,区别在于,氧化铝颗粒的粒径为30nm。Same as Example 1, the difference is that the particle size of the alumina particles is 30 nm.
将所得膜层置于扫描电镜下观察其表面形貌,结果如图9所示,由图中可以看出,所得膜层表面平整、连续均匀、特殊结构不明显。经检测,所得膜层的厚度为11μm,摩擦系数为0.71,在10mA/cm2的电流密度下腐蚀,其析氢过电位为560mV,与Co-W镀层的572mV相比减小了12mV。The obtained film was placed under a scanning electron microscope to observe its surface morphology. The results are shown in Figure 9. It can be seen from the figure that the surface of the obtained film is smooth, continuous and uniform, and the special structure is not obvious. After testing, the thickness of the obtained film was 11 μm, the friction coefficient was 0.71, and it was corroded at a current density of 10 mA/cm 2 .
对比例4Comparative Example 4
同实施例1,区别在于,复合电沉积的电流密度为100mA/cm2。Same as Example 1, the difference is that the current density of composite electrodeposition is 100 mA/cm 2 .
将所得复合膜层置于扫描电镜下观察其表面形貌,结果如图10所示,由图中可以看出,所得复合膜层表面平整、特殊结构均匀。经检测,所得复合膜层的厚度为10μm,摩擦系数为0.59,在100mA/cm2的电流密度下腐蚀,其析氢过电位为550mV,与Co-W镀层的572mV相比减小了22mV。The obtained composite film layer was placed under a scanning electron microscope to observe its surface morphology. The results are shown in Figure 10. It can be seen from the figure that the obtained composite film layer has a smooth surface and a uniform special structure. After testing, the obtained composite film has a thickness of 10 μm, a friction coefficient of 0.59, and is corroded at a current density of 100 mA/cm 2 .
对比例5Comparative Example 5
同实施例1,区别在于,硫酸钴的浓度为0.15mol/L。Same as Example 1, the difference is that the concentration of cobalt sulfate is 0.15 mol/L.
将所得膜层置于扫描电镜下观察其表面形貌,结果如图11所示,由图中可以看出,所得膜层表面平整、连续均匀、特殊结构不明显。经检测,所得膜层的厚度为5μm,摩擦系数为0.78,在10mA/cm2的电流密度下腐蚀,其析氢过电位为575mV,与Co-W镀层的572mV相比增加了3mV。The obtained film was placed under a scanning electron microscope to observe its surface morphology. The results are shown in Figure 11. It can be seen from the figure that the surface of the obtained film is smooth, continuous and uniform, and the special structure is not obvious. After testing, the thickness of the obtained film is 5 μm, the friction coefficient is 0.78, and it is corroded at a current density of 10 mA/cm 2 .
以上所述的实施例仅是对本发明的优选方式进行描述,并非对本发明的范围进行限定,在不脱离本发明设计精神的前提下,本领域普通技术人员对本发明的技术方案做出的各种变形和改进,均应落入本发明权利要求书确定的保护范围内。The above-mentioned embodiments are only to describe the preferred modes of the present invention, but not to limit the scope of the present invention. Without departing from the design spirit of the present invention, those of ordinary skill in the art can make various modifications to the technical solutions of the present invention. Variations and improvements should fall within the protection scope determined by the claims of the present invention.
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| CN102605386A (en) * | 2012-02-29 | 2012-07-25 | 华侨大学 | Preparation method of Ni/NiCo2O4 porous composite electrode for oxygen evolution in alkaline medium |
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