CN115437221A - Photoetching machine lamp chamber device - Google Patents

Abstract

The invention provides a lamp chamber device of a photoetching machine, which comprises a lamp chamber shell, a heat dissipation cover and a light source component. The lamp chamber shell is provided with a first air inlet, an air outlet and a light outlet. The heat dissipation cover is positioned in the lamp room shell, the opening end of the heat dissipation cover is superposed with the light outlet, a first cavity is formed between the outer wall of the heat dissipation cover and the inner wall of the lamp room shell, a second cavity is arranged in the heat dissipation cover, and the heat dissipation cover is further provided with a second air inlet. The light source assembly is positioned in the second chamber and comprises a light source and an ellipsoid reflecting mirror, and the ellipsoid reflecting mirror reflects light rays emitted by the light source and then emits the light rays from the light outlet. The first cavity and the second cavity are communicated with each other, cooling air is blown into the first cavity and the second cavity through the first air inlet and the second air inlet respectively, the cooling air in the first cavity flows through the outer surface of the heat dissipation cover and then flows out of the air outlet, and the cooling air in the second cavity flows into the first cavity and then flows out of the air outlet. The photoetching machine lamp chamber device has a better heat dissipation effect.

Description

Lithography machine lamp chamber device

technical field

The invention relates to the technical field of lithography machines, in particular to a lamp chamber device of a lithography machine.

Background technique

In the field of semiconductor manufacturing, in order to improve exposure yield and manufacturing efficiency, it is often necessary to use a mercury lamp with a power of several thousand watts or even higher as a light source. Optical equipment such as a photolithography machine is usually provided with a lamp chamber for accommodating a mercury lamp. The mercury lamp has a high calorific value. In order to ensure the stable operation of the exposure light source, the internal environment of the lamp chamber needs to be cooled. At present, the lamphouses used in optical equipment such as lithography machines in the industry mainly adopt air cooling or air cooling plus water cooling. However, the water-cooled and air-cooled cooling system has a complex structure and a large internal water head, which is prone to problems such as liquid leakage.

In addition, with the continuous improvement of lithography precision, the requirements for the operating environment of lithography machines are becoming more and more stringent. The heat dissipation of each sub-system of the lithography machine must be strictly controlled, and the outer shell of the lamp room is prone to local overheating. question.

In addition, mercury lamps have high requirements on temperature stability, and poor temperature stability will lead to poor luminescence stability of mercury lamps. At the same time, the lamp house is air-cooled, so the cooling effect is limited, and a large amount of cooling wind blows to the surface of the mercury lamp bulb, which will also make the mercury lamp run unstable. In addition, foreign matters such as sublimated substances generated during exposure of the photoresist are mixed with the cooling air and introduced into the interior of the lamp chamber from the outside of the lamp chamber, react with ultraviolet rays, etc., and adhere to the reflective surface of the reflector.

Therefore, a lithography machine lamp chamber device capable of better heat dissipation and reducing foreign matters adhering to the reflective surface of the reflector is pursued in the industry.

Contents of the invention

The purpose of the present invention is to provide a light chamber device for a lithography machine, which has a better heat dissipation effect and can reduce the foreign matters attached to the reflector.

In order to achieve the above object, the present invention provides a lithography machine lamp chamber device, comprising:

The housing of the lamp house is provided with a first air inlet, an air outlet and a light outlet;

The heat dissipation cover is located in the outer shell of the lamp chamber, the heat dissipation cover has an open end, the open end coincides with the light outlet, and a first cavity is formed between the outer wall of the heat dissipation cover and the inner wall of the lamp house shell chamber, the interior of the heat dissipation cover is a second chamber, and the heat dissipation cover is also provided with a second air inlet;

The light source assembly is located in the second chamber and includes a light source and a reflector, the reflector reflects the light emitted by the light source and emits it through the light outlet;

The first chamber and the second chamber are communicated with each other, and cooling air is respectively blown into the first chamber and the second chamber through the first air inlet and the second air inlet, and the The cooling air in the first chamber flows through the outer surface of the heat dissipation cover and then flows out from the air outlet, and the cooling air in the second chamber flows into the first chamber and then flows out from the air outlet.

Optionally, the cooling air in the second chamber is used to cool the heat dissipation cover and the light source.

Optionally, the parameters of the cooling air blown into the first chamber through the first air inlet and the cooling air blown into the second chamber through the second air inlet can be set separately , the parameters include temperature, flow and/or type. .

Optionally, the light source has a bulb and an anode and a cathode respectively located at both ends of the bulb, the anode is closer to the light outlet than the cathode, and the heat dissipation cover includes:

The upper heat dissipation cover wraps the anode of the light source and the light path between the bulb and the light outlet;

A heat dissipation cover for the reflector, wrapping the ellipsoidal reflector;

The lower heat dissipation cover wraps the cathode of the light source;

There is a gap at the junction of the heat dissipation cover of the ellipsoidal reflector and the upper heat dissipation cover, so that the first chamber and the second chamber communicate with each other.

Optionally, the shape of the upper heat dissipation cover is a multi-stage boss shape.

Optionally, a splitter box is provided at the first air inlet, and a plurality of splitter outlets are opened on the splitter box.

Optionally, diverting plates are provided at the diversion outlets.

Optionally, several deflectors are arranged in the housing of the lamp house.

Optionally, several fins are provided on the outer surface of the heat dissipation cover to enhance convection heat dissipation efficiency.

Optionally, the first air outlet is arranged opposite to the air inlet, and the heights of the air outlet and the air inlet are both flush with the height of the ellipsoidal reflector.

Optionally, a filter is also provided at the first air inlet.

Optionally, a heat insulation board is provided on the inner surface of the housing of the light chamber.

Optionally, a flow control system is also included, and the flow control system includes:

a detector for real-time monitoring of the temperature, air pressure and/or flow of the cooling air in the first chamber and the second chamber;

The automatic butterfly valve is used to adjust the flow of the cooling air according to the detection result of the detector.

In the lamp chamber device of the lithography machine provided by the present invention, the lamp chamber device of the lithography machine includes a lamp chamber housing, a heat dissipation cover and a light source assembly. Wherein, the housing of the lamp house is provided with a first air inlet, an air outlet and a light outlet. A first chamber is formed between the outer wall of the heat dissipation cover and the inner wall of the housing of the lamp chamber, the inside of the heat dissipation cover is a second chamber, and the heat dissipation cover is also provided with a second air inlet. The light source assembly is located in the second chamber and includes a light source and an ellipsoid reflector. In the present invention, cooling air is blown into the first chamber through the first air inlet. The heat dissipation cover in the first chamber cools down, and cooling air is blown into the second chamber through the second air inlet for cooling the light source components in the heat dissipation cover. The first chamber and the second chamber communicate with each other, and the cooling air in the second chamber flows into the first chamber and then flows out from the air outlet, so that the lamp chamber device of the lithography machine Has a better heat dissipation effect.

In addition, the type of cooling air blown into the first chamber by the first air inlet is different from the type of cooling air blown into the second chamber through the second air inlet, and the air pressure of the second chamber is greater than that of the first chamber air pressure. It can prevent the cooling air outside the heat dissipation cover from entering the second cavity, avoid the change of the gas manifold of the cooling air in the second cavity, prevent the temperature fluctuation around the surface of the light source, and then affect the life cycle of the light source and the stability of light emission sex. It also protects the light source and ellipsoidal mirror from contamination.

In addition, a splitter box is provided at the first air inlet, and a plurality of splitter outlets are opened on the splitter box. The cooling air is divided into multiple air paths, so that the cooling air has more contact area with the heat dissipation cover, which is beneficial to cooling the heat dissipation cover. In addition, redirection plates are provided at the split outlets. The direction of the diversion outlet can be adjusted by the redirecting plate, so that more cooling air can flow to the higher temperature area in the heat dissipation cover, so as to avoid the local temperature of the heat dissipation cover from being too high, thereby causing deformation or damage of the heat dissipation cover.

In addition, several deflectors are arranged in the housing of the lamp chamber. The deflectors are used to restrict the flow direction of the cooling air. After the cooling air can flow around the outer periphery of the heat dissipation cover, it flows out from the air outlet, which is beneficial for the cooling air to fully contact the outer periphery of the heat dissipation cover to take away more heat.

Description of drawings

FIG. 1 is a schematic structural view of a lamp chamber device of a lithography machine in Embodiment 1 of the present invention;

2 is a schematic diagram of a splitter box in Embodiment 1 of the present invention;

Fig. 3 is a schematic structural diagram of an air outlet in Embodiment 1 of the present invention;

Fig. 4 is a schematic diagram of the field of view in the N direction in Embodiment 1 of the present invention;

FIG. 5 is a schematic structural view of the lamp chamber device of the lithography machine in Embodiment 2 of the present invention;

FIG. 6 is a schematic diagram of a reflector cooling cover in Embodiment 2 of the present invention;

7 is a schematic diagram of the first structure of the lamp chamber device of the lithography machine in Embodiment 3 of the present invention;

FIG. 8 is a second structural schematic diagram of the lamp chamber device of the lithography machine in Embodiment 3 of the present invention;

Wherein, the reference signs are as follows:

100-heat dissipation cover; 110-lower heat dissipation cover; 120-mirror heat dissipation cover; 121-fin; 130-upper heat dissipation cover; 131-deflector, 140-slit;

200-lamp housing shell; 210-first air inlet; 220-air outlet; 221-opening cladding; 230-light outlet; 240-heat insulation board;

300-ellipsoid reflector;

400 - mercury lamp;

500 - reflector;

600-heat insulation pad;

700-insulation gasket;

A- the second cooling air;

B - the first cooling wind.

detailed description

The specific implementation manner of the present invention will be described in more detail below with reference to schematic diagrams. The advantages and features of the present invention will be more apparent from the following description. It should be noted that all the drawings are in a very simplified form and use imprecise scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.

FIG. 1 is a schematic structural diagram of a lamp chamber device of a photolithography machine in this embodiment. As shown in FIG. 1 , the lamp chamber device of the lithography machine includes a lamp chamber housing 200 , a light source assembly and a heat dissipation cover 100 . Wherein, the light source assembly at least includes a light source and an ellipsoid reflector 300 . In this embodiment, the power of the light source is 2500W to 8000W, preferably, the light source is a mercury lamp 400 .

The lamp house housing 200 is provided with a first air inlet 210 , an air outlet 220 and a light outlet 230 . The first air inlet 210 and the air outlet 220 are arranged on two sides of the lamp housing casing 200 , and the light outlet 230 is arranged on the top of the lamp housing casing 200 . It should be known that the mercury lamp 400 as a light source may be broken under abnormal conditions. If the mercury vapor inside the mercury lamp 400 escapes into the external environment, it will cause harm to the operators around the lamp chamber device of the lithography machine, and the The lamp housing 200 described above can be used to control mercury vapor leakage.

Continuing to refer to FIG. 1 , the heat dissipation cover 100 is located in the lamp housing shell 200, the heat dissipation cover 100 has an open end, and the open end coincides with the light outlet 230 on the lamp housing shell 200, and the outer wall of the heat dissipation cover 100 is in contact with the A first chamber is formed between the inner walls of the lamp housing 200 , and the interior of the heat dissipation cover 100 is a second chamber, where the light source and the ellipsoid reflector 300 are located. The ellipsoid reflector 300 reflects the light emitted by the light source and emits it through the light outlet 230 . Since the mercury lamp 400 emits a considerable proportion of ultraviolet light, in order to protect the safety of operators, it is necessary to avoid light leakage. The heat dissipation cover 100 can effectively control the light leakage of the mercury lamp 400 , and at the same time, the lamp housing shell 200 located outside the heat dissipation cover 100 can further control the light leakage of the mercury lamp 400 . In addition, the heat dissipation cover 100 can concentrate the heating surface, which is also beneficial to ensure the stability of the mercury lamp 400 .

The heat dissipation cover 100 is also provided with a second air inlet (not shown in the figure), through which cooling air is blown into the second chamber through the second air inlet (not shown in the figure), and is used to give the heat dissipation cover 100 The mercury lamp 400 and the ellipsoid reflector 300 inside are cooled. The mercury lamp 400 has a bulb and an anode and a cathode respectively located at two ends of the bulb, and the anode is closer to the air outlet 220 than the cathode. Usually, the position of the second air inlet (not shown in the figure) corresponds to the poles of the mercury lamp 400 and the back of the ellipsoid reflector 300 . In this way, when the cooling air enters the second chamber from the second air inlet (not shown in the figure), it will blow to the anode, the cathode of the mercury lamp 400 and the back of the ellipsoid reflector 300, so as to The heat from the surfaces of the mercury lamp 400 and the ellipsoidal reflector 300 is taken away to cool the mercury lamp 400 and the ellipsoidal reflector 300 . More preferably, there is concentrated cooling air at the two poles of the mercury lamp 400 to reduce the temperature of the surface of the mercury lamp 400, and there is a separate cooling air between the ellipsoidal reflector 300 and the reflector cooling cover 100 to reduce the temperature of the surface of the mercury lamp 400. Lower the temperature of the ellipsoidal mirror 300 . In this way, the flow rate and temperature of the cooling air can be finely adjusted according to the actual temperatures of the mercury lamp 400 and the ellipsoid reflector 300 .

Cooling air is blown into the first chamber through the first air inlet 210 . The cooling air in the first chamber flows through the outer surface of the heat dissipation cover 100 and then flows out from the air outlet 220, so that the cooling air can take away the heat from the outer surface of the heat dissipation cover 100, and then Play the role of cooling the heat dissipation cover 100 .

In addition, the first chamber and the second chamber communicate with each other, and the cooling air in the second chamber flows into the first chamber and then flows out from the air outlet 220 . In this way, the cooling air can take away the heat in the heat dissipation cover 100 .

Further, the cooling air blown into the first chamber through the first air inlet 210 and the cooling air blown into the second chamber through the second air inlet (not shown in the figure) The parameters of each can be set separately, and the parameters include temperature, flow and type, or the parameter is one of temperature, flow and type, and there are no too many restrictions here.

As an exemplary implementation, the cooling air blown into the first chamber through the first air inlet 210 is the first cooling air B. As shown in FIG. The cooling air blown into the second chamber through the second air inlet (not shown in the figure) is the second cooling air A.

Further, the air pressure of the second chamber is greater than the air pressure of the first chamber. In this way, the second cooling air A in the second chamber can flow to the first chamber, so that the heat in the second chamber can be taken away. It should be known that the first cooling air B outside the heat dissipation cover 100 enters the second cavity, which will cause the gas flow pattern of the second cooling air A in the second cavity to change, which will cause the surface of the mercury lamp 400 to The ambient temperature fluctuates, which in turn affects the life cycle of the mercury lamp 400 and the stability of light emission, which is undesirable. The air pressure of the second chamber is greater than the air pressure of the first chamber, which can make it difficult for the first cooling air B outside the heat dissipation cover 100 to enter the second chamber. This is beneficial to increase the life cycle of the mercury lamp 400 and the stability of light emission.

Optionally, filters are also provided at the first air inlet 210 and the second inlet. The first cooling wind B and the second cooling wind A are filtered through the filter, so that it is beneficial to further remove the particles in the cooling wind, and further prevent the cooling wind from affecting the mercury lamp 400, the ellipsoidal reflector 300 and the light. Pollution of optical components inside the engraving machine.

Optionally, the first cooling air B is clean air sent in by the air conditioning unit. The second cooling air A is the clean compressed air sent by the public system of the factory area. It should be known that clean compressed air has better cleanliness and can reduce the pollution of the cooling air to the light source group and the optical components inside the lithography machine. It should be known that the clean compressed air has a larger flow rate, which can make the pressure of the second chamber greater than that of the first chamber. In another embodiment, the air source of the clean compressed air is provided with a regulating valve, and the flow rate of the clean compressed air is adjusted through the regulating valve, thereby adjusting the second chamber and the first chamber. gas pressure difference.

Optionally, the heat dissipation cover 100 includes an upper heat dissipation cover 130 , a reflector heat dissipation cover 120 and a lower heat dissipation cover 110 . Wherein, the upper heat dissipation cover 130 wraps the anode of the mercury lamp 400 and the light path between the bulb and the light outlet 230 . The reflector heat dissipation cover 120 wraps the ellipsoidal reflector 300 . The lower heat dissipation cover 110 wraps the cathode of the mercury lamp 400 . It should be known that the heat dissipation cover 100 composed of the upper heat dissipation cover 130 , the reflector heat dissipation cover 120 and the lower heat dissipation cover 110 is to facilitate the disassembly and assembly of the heat dissipation cover 100 to replace the mercury lamp 400 .

Optionally, there is a gap 140 at the junction of the reflector heat dissipation cover 120 and the upper heat dissipation cover 130 , so that the first chamber and the second chamber communicate with each other. Thus, the second cooling air A in the second chamber flows into the first chamber through the slit 140 . It should be known that the slit 140 is arranged at the junction of the reflector heat dissipation cover 120 and the upper heat dissipation cover 130, which is beneficial to increase the flow resistance of the second cooling air A and to maintain the second cooling air. The manifold of A in the second chamber is beneficial to reduce temperature fluctuations around the surface of the mercury lamp 400 .

Further, the first air inlet 210 is arranged opposite to the air inlet 220, and is respectively arranged on both sides of the lamp house housing 200. Preferably, the height of the air outlet 220 and the height of the first air inlet 210 are both the same as those of the first air inlet 210. The heights of the ellipsoidal mirrors 300 are the same. It should be known that when the mercury lamp 400 is working, the temperature of the reflector heat dissipation cover 120 is the highest, and after the first cooling air B flows through the upper heat dissipation cover 130 or the lower heat dissipation cover 110, the gas temperature will still be lower than that near the reflector heat dissipation cover 120 The temperature of the zone. The air outlet 220 is arranged at a position near the heat dissipation cover 120 of the reflector. It can still play a role in heat dissipation, that is, the heat dissipation efficiency can be improved.

In addition, the first cooling air B flowing through the reflector cooling cover 120 has a relatively high temperature, and when it flows through other components, it will heat other components. The air outlet 220 is located near the reflector cooling cover 120 , so that the first cooling air B flowing through the reflector cooling cover 120 can directly enter the air outlet 220 , thus avoiding the above problems.

Fig. 2 is a schematic diagram of the splitter box in this embodiment. As shown in FIG. 1 and FIG. 2 , a splitter box 250 is provided at the first air inlet 210 , and a plurality of splitter outlets 251 are opened on the splitter box 250 . It is used to divide the first cooling air B into a plurality of air paths. In this way, the first cooling air B can have more contact area with the heat dissipation cover 100 , which is beneficial to cooling the heat dissipation cover 100 .

Further, the diversion outlets 251 are provided with diverting plates. The direction of the split outlet 251 can be adjusted through the redirecting plate. It should be known that the temperature distribution on the heat dissipation cover 100 is usually not uniform, and there are situations where the temperature in a local area is relatively high. A redirection plate 252 is provided at the split outlet 251 to guide the first cooling air B. As shown in FIG. More first cooling air B can be allowed to flow to areas with higher temperatures, so as to avoid local overheating of the heat dissipation cover 100 , thereby causing deformation or damage of the heat dissipation cover 100 .

As an example, the temperature of the reflector heat dissipation cover 120 is usually higher than that of the upper heat dissipation cover 130 or the lower heat dissipation cover 110, and we can adjust the diversion outlet 251 to be provided with a redirection plate 252, so that more of the diversion outlet 251 Towards the reflector heat dissipation cover 120, so that more first cooling air B flows to the reflector heat dissipation cover 120, so that the temperature of the reflector heat dissipation cover 120 is lowered to that of the upper heat dissipation cover 130 or the lower one. The heat dissipation cover 110 is the same temperature.

FIG. 3 is a schematic structural diagram of an air outlet in this embodiment, and FIG. 4 is a schematic diagram of a field of view in the N direction in this embodiment. As shown in FIG. 3 and FIG. 4 , the air outlet 220 is provided with an open cladding 221 with the lamp housing housing 200 , and the opening cladding 221 and the lamp housing housing 200 are fixed by bolts. Wherein, a heat insulation pad 600 is provided between the open casing 221 and the lamp housing casing 200 . In this way, heat transfer from the opening cladding 221 to the lamp housing casing 200 can be avoided, causing the outer surface of the lamp housing housing 200 to rise. Further, a heat insulating washer 700 is also provided between the bolt and the open casing 221 to prevent the open casing 221 from transferring heat to the bolt.

Further, a thermal insulation pad 600 is provided at the junction of the splitter box 250 , the air outlet 220 and the lamp housing shell 200 . More preferably, a heat insulation pad 600 is also provided at the joint between the heat dissipation cover 100 and the lamp housing shell 200 .

It should be known that heat insulation pads 600 are provided at the junctions between the heat dissipation cover 100 , the splitter box 250 , the first air inlet 210 and the air outlet 220 inside the lamp housing 200 and the lamp housing 200 . It can prevent the heat dissipation cover 100 , the distribution box 250 , the first air inlet 210 and the air outlet 220 from transferring heat to the outer surface of the lamp housing 200 . Furthermore, the temperature of the outer surface of the lamp housing 200 is too high. It should be known that the purpose of controlling the temperature of the outer surface of the lamp housing 200 to be lower than a certain value, such as 50° C., is to reduce the thermal interference caused by the dissipated heat of the lamp housing device of the lithography machine to other surrounding equipment during operation.

Further, the material of the insulation pad 600 is polytetrafluoroethylene. (Poly tetrafluoroethylene, abbreviated as PTFE). Polytetrafluoroethylene is a high molecular polymer prepared by polymerization of tetrafluoroethylene as a monomer. The appearance of PTFE is white waxy and translucent. PTFE has excellent heat resistance and cold resistance, and can be used for a long time at -180 to 260 °C.

Optionally, a heat insulating board 240 is disposed on the inner surface of the lamp housing housing 200 . In this way, the temperature of the outer surface of the lamp housing casing 200 can be further reduced. More preferably, the surface of the heat insulation board 240 is polished. It is beneficial to reflect light to reduce the temperature pressure of the heat shield 240 itself.

Further, the material of the heat shield 240 is aluminum oxide.

Optionally, the inner surface of the heat dissipation cover 100 is made of light-absorbing material. In this way, reducing uncontrollable heat dissipation due to light reflection is beneficial to reducing temperature fluctuations around the surface of the mercury lamp 400 .

Optionally, the outer surface of the heat dissipation cover 100 is made of reflective material. Increasing the ratio of radiation heat dissipation is beneficial to reduce the temperature pressure of the heat dissipation cover 100 itself.

Further, the outer surface of the heat dissipation cover 100 is roughened. Increasing the ratio of radiation heat dissipation is beneficial to reduce the temperature pressure of the heat dissipation cover 100 itself.

In addition, the light chamber device of the lithography machine also includes a flow control system, and the flow control system includes a detector and an automatic butterfly valve. Wherein, the detector is used for real-time monitoring of the temperature, air pressure and/or flow of the cooling air in the first chamber and the second chamber. The automatic butterfly valve is used to adjust the flow of the cooling air according to the detection result of the detector.

Further, the detectors include pressure detectors, temperature detectors and anemometers. They are respectively used to detect the temperature and air pressure of the first chamber and the second chamber and the flow rate of the cooling air.

Embodiment two

In the lamp chamber device of the lithography machine provided in this embodiment, the parts that are the same as those in the first embodiment will not be described here, and only the differences will be described below.

FIG. 5 is a schematic structural diagram of the lamp chamber device of the lithography machine in this embodiment. As shown in FIG. 5 , the difference between the present embodiment and the first embodiment is that a plurality of deflectors 131 are arranged inside the lamp housing housing 200 . The deflector 131 is used to restrict the flow direction of the first cooling wind B. After enabling the first cooling air B to flow around the outer periphery of the heat dissipation cover 100 , it flows out from the air outlet 220 . In this way, it is beneficial for the first cooling air B to fully contact the outer periphery of the heat dissipation cover 100 to take away more heat.

FIG. 6 is a schematic diagram of the reflector cooling cover in this embodiment. As shown in FIG. 6 , a plurality of fins 121 are provided on the outer surface of the reflector cooling cover 120 , and the length direction of the fins 121 is consistent with the flow direction of the cooling air. It should be known that the upper heat dissipation cover 130 and the lower heat dissipation cover 110 in the heat dissipation cover 100 may also be provided with fins 121 . The outer surface of the heat dissipation cover 100 is designed with ribs 121 according to the flow direction of the first cooling air B to enhance convection heat dissipation efficiency and help reduce the temperature pressure of the heat dissipation cover 100 itself.

Embodiment three

For the lamp chamber device of a lithography machine provided in this embodiment, the parts that are the same as those in Embodiment 1 and Embodiment 2 will not be described here, and only the differences will be described below.

In Embodiment 1 and Embodiment 2, the light outlet 230 is arranged on the top of the lamp housing 200, the upper heat dissipation cover 130 is arranged along the contour of the light path, and the upper heat dissipation cover 130 is in the shape of a cone. The difference between this embodiment and Embodiment 1 and Embodiment 2 is that the shapes of the upper heat dissipation cover 130 and the mirror heat dissipation cover 120 are different.

FIG. 7 is a schematic diagram of the first structure of the lamp chamber device of the lithography machine in this embodiment. As shown in FIG. 7 , in an implementation of this embodiment, the upper heat dissipation cover 130 is in the shape of a multi-stage boss, and the heat dissipation cover 100 is composed of a plurality of circular tubes whose diameters gradually change in sequence. The circular tube overlapping with the light outlet 230 has the smallest diameter, and the circular tube overlapping with the reflector cooling cover 120 has the largest diameter. In this way, the upper heat dissipation cover 130 wraps the outline of the light path. In this embodiment, the reflector cooling cover 120 is cylindrical.

FIG. 8 is a schematic diagram of the second structure of the lamp chamber device of the lithography machine in the third embodiment of the present invention. As shown in FIG. 8 , in another implementation of this embodiment, a reflector 500 is also arranged in the second cavity for changing the direction of the light path, and the light outlet 230 is arranged in the outer shell of the lamp housing 200 one side. The upper heat dissipation cover 130 is arranged along the contour of the optical path.

To sum up, in the embodiments of the present invention, there is provided a light chamber device for a lithography machine. In addition, a splitter box is provided at the first air inlet, and a plurality of splitter outlets are opened on the splitter box. The cooling air is divided into multiple air paths, so that the cooling air has more contact area with the heat dissipation cover, which is beneficial to cooling the heat dissipation cover. In addition, redirection plates are provided at the split outlets. The direction of the diversion outlet can be adjusted by the redirecting plate, so that more cooling air can flow to the higher temperature area in the heat dissipation cover, so as to avoid the local temperature of the heat dissipation cover from being too high, thereby causing deformation or damage of the heat dissipation cover. In addition, several deflectors are arranged in the housing of the lamp house. The deflectors are used to restrict the flow direction of the cooling air. After the cooling air can flow around the outer periphery of the heat dissipation cover, it flows out from the air outlet, which is beneficial for the cooling air to fully contact the outer periphery of the heat dissipation cover to take away more heat.

The foregoing are only preferred embodiments of the present invention, and do not limit the present invention in any way. Any person skilled in the technical field, within the scope of the technical solution of the present invention, makes any form of equivalent replacement or modification to the technical solution and technical content disclosed in the present invention, which does not depart from the technical solution of the present invention. The content still belongs to the protection scope of the present invention.

Claims (13)

1. A lamp chamber apparatus of a lithography machine, comprising:

the lamp chamber shell is provided with a first air inlet, an air outlet and a light outlet;

the heat dissipation cover is positioned in the lamp chamber shell and provided with an opening end, the opening end is superposed with the light outlet, a first cavity is formed between the outer wall of the heat dissipation cover and the inner wall of the lamp chamber shell, a second cavity is formed inside the heat dissipation cover, and the heat dissipation cover is also provided with a second air inlet;

the light source assembly is positioned in the second cavity and comprises a light source and a reflector, and the reflector reflects light rays emitted by the light source and then emits the light rays from the light outlet;

the first cavity and the second cavity are communicated with each other, cooling air is blown into the first cavity and the second cavity through the first air inlet and the second air inlet respectively, the cooling air in the first cavity flows through the outer surface of the heat dissipation cover and then flows out of the air outlet, and the cooling air in the second cavity flows into the first cavity and then flows out of the air outlet.

2. The lamp house apparatus of claim 1, wherein the cooling air of the second chamber is used to cool the heat sink and the light source.

3. The lamp chamber device of claim 1, wherein parameters of the cooling wind blown into the first chamber through the first wind inlet and the cooling wind blown into the second chamber through the second wind inlet are set respectively, and the parameters comprise temperature, flow rate and/or type.

4. The apparatus as claimed in claim 1, wherein the light source has a bulb and an anode and a cathode respectively disposed at two ends of the bulb, the anode is closer to the light outlet than the cathode, and the heat sink comprises:

the upper heat dissipation cover wraps the anode of the light source and a light path between the bulb shell and the light outlet;

the reflector heat dissipation cover wraps the ellipsoidal reflector;

the lower heat dissipation cover wraps the cathode of the light source;

and a gap is formed at the joint of the ellipsoidal reflector heat dissipation cover and the upper heat dissipation cover, so that the first chamber and the second chamber are communicated with each other.

5. The lamp chamber device of claim 4, wherein the upper heat dissipation cover is shaped as a multi-stage boss.

6. The lamp house device of claim 1, wherein a splitter box is disposed at the first air inlet, and a plurality of splitter outlets are disposed on the splitter box.

7. A lamp chamber device of a lithography machine according to claim 6, wherein the diversion outlets are provided with direction adjusting plates.

8. The apparatus of claim 1, wherein a plurality of baffles are disposed within the lamp housing.

9. The lamp chamber apparatus of claim 1, wherein the heat sink has fins on its outer surface for enhancing heat dissipation efficiency.

10. The lamp chamber device of claim 1, wherein the first air outlet is disposed opposite to the air inlet, and the height of the air outlet and the height of the air inlet are both aligned with the height of the ellipsoidal reflector.

11. The lamp chamber device of claim 1, wherein a filter is further disposed at the first air inlet.

12. A lamp chamber device of a lithography machine according to claim 1, wherein the lamp chamber housing is provided with a heat shield on an inner surface thereof.

13. The lithography lamp chamber apparatus of claim 1, further comprising a flow control system, said flow control system comprising:

the detector is used for monitoring the temperature, the air pressure and/or the flow of the cooling air of the first chamber and the second chamber in real time;

and the automatic butterfly valve is used for adjusting the flow of the cooling air according to the detection result of the detector.

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