CN116891237B - Silicon dioxide as toothpaste additive and production process thereof - Google Patents
Silicon dioxide as toothpaste additive and production process thereof Download PDFInfo
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- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
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- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
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- A61K8/00—Cosmetics or similar toiletry preparations
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- A61K8/19—Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
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- A61K2800/00—Properties of cosmetic compositions or active ingredients thereof or formulation aids used therein and process related aspects
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Abstract
本申请涉及牙膏添加剂技术领域，具体公开一种作为牙膏添加剂的二氧化硅及其生产工艺。该生产工艺首先将石英砂和纯碱混合，在1400~1600℃中反应4‑6h，得到熔融态物料，冷却得到固态物，使用100~150℃的水蒸汽，加压至0.4~1MPa，对所述固态物进行喷淋溶解，得到硅酸钠水溶液；加热所述硅酸钠水溶液保持在70~100℃，再加入氨基三（亚甲基膦酸）五钠，混合均匀后在搅拌条件下加入酸和水，使得溶液最终pH达到2~4，过程中产生白色沉淀并不再析出后，过滤取得沉淀物，洗涤所述沉淀物，接着将所述沉淀物喷雾干燥得到白色粉末，最后将所述白色粉末在150~200℃温度中烘烤，使得白色粉末中少量的未分解的硅酸完全分解为二氧化硅，得到纯度高、均一度好、高分散性不易结块的二氧化硅粉末。The present application relates to the technical field of toothpaste additives, and specifically discloses a kind of silicon dioxide as a toothpaste additive and its production process. The production process first mixes quartz sand and soda ash, reacts at 1400-1600°C for 4-6h, obtains a molten material, cools to obtain a solid, uses 100-150°C water vapor, pressurizes to 0.4-1MPa, sprays and dissolves the solid, and obtains a sodium silicate aqueous solution; heats the sodium silicate aqueous solution to maintain at 70-100°C, then adds aminotri(methylenephosphonic acid) pentasodium, mixes evenly, adds acid and water under stirring conditions, so that the final pH of the solution reaches 2-4, and after a white precipitate is generated and no longer precipitates during the process, the precipitate is filtered to obtain the precipitate, the precipitate is washed, and then the precipitate is spray-dried to obtain a white powder, and finally the white powder is baked at a temperature of 150-200°C, so that a small amount of undecomposed silicic acid in the white powder is completely decomposed into silicon dioxide, and a silicon dioxide powder with high purity, good uniformity, high dispersibility and not easy to agglomerate is obtained.
Description
Technical Field
The application relates to the technical field of toothpaste additives, in particular to silicon dioxide serving as a toothpaste additive and a production process thereof.
Background
The main components of the general toothpaste comprise an abrasive, a humectant, a thickening agent, a surfactant, a flavoring agent and a medicament with therapeutic efficacy. Wherein the friction agent has the function of rubbing the tooth surface to remove dirt, and representative components are silicon dioxide, calcium hydrophosphate, calcium carbonate and the like. The thickener is used for binding other ingredients to form toothpaste with stable form, and the representative ingredients are silicon dioxide, sodium carboxymethyl cellulose, carbomer, etc.
The diameter of the silica particles for toothpaste is 5-45 mu m, the particle size is too large, and the toothpaste has obvious sand feel during brushing. The toothpaste body prepared by the friction agent with proper granularity has smooth and fine appearance and comfortable friction to the oral cavity and gum during tooth brushing. Too fine particle size (e.g., less than 1 μm) may cause thickening during storage of the toothpaste due to flocculation of the too fine abrasive during long-term storage of the toothpaste due to brownian motion.
Some toothpaste silica in the market has the problems of overlarge or undersize particle size, poor uniformity, easy caking and the like.
Disclosure of Invention
In order to solve the problems of overlarge or undersize particle size, poor uniformity and easy caking of silica for toothpaste in the market, the application provides silica serving as a toothpaste additive and a production process thereof.
In a first aspect, the present application provides a process for producing silica as an additive for toothpaste, and adopts the following technical scheme.
A process for producing silica as a toothpaste additive, the process comprising:
Mixing quartz sand and sodium carbonate, reacting for 4-6 hours at 1400-1600 ℃ to obtain a molten state material, cooling to obtain a solid state material, pressurizing to 0.4-1 MPa by using 100-150 ℃ water vapor, spraying and dissolving the solid state material to obtain a sodium silicate aqueous solution, heating the sodium silicate aqueous solution to be kept at 70-100 ℃, adding pentasodium aminotri (methylene phosphonic acid) and water under the stirring condition after uniformly mixing, adding acid and water to enable the final pH value of the solution to reach 2-4, filtering to obtain a precipitate after white precipitate is generated in the process and is not separated out, washing the precipitate, spraying and drying the precipitate to obtain white powder, and finally baking the white powder at 150-200 ℃ to obtain the silicon dioxide.
By adopting the technical scheme, quartz sand (SiO 2) and sodium carbonate (Na 2CO3) can be mixed in a kiln and reacted for 4-6 hours at 1400-1600 ℃ to obtain molten sodium silicate, and the sodium silicate obtained by adopting the temperature reaction has low impurity content. The sodium silicate becomes solid after being cooled, and can be loaded in a rotary spherical digester, pressurized to 0.4-1 MPa by using high-temperature steam at 100-150 ℃ and dissolved to form colorless transparent viscous liquid, namely sodium silicate aqueous solution. Heating the sodium silicate aqueous solution to be kept at 70-100 ℃, adding pentasodium aminotri (methylenephosphonic acid), uniformly mixing, and then adding acid and water under stirring to enable the final pH value of the solution to be 2-4, wherein the acid can be sulfuric acid, hydrochloric acid, phosphoric acid, nitric acid and the like, the sodium silicate reacts with the acid to generate silicic acid, the heating of the aqueous solution is kept at 70-100 ℃, and the stability of the reaction rate is kept. The pentasodium aminotri (methylene phosphonic acid) is easy to dissolve in water, can form hydrogen bonds with silicic acid on the first aspect to prevent excessive aggregation of silicic acid, and on the second aspect, because the pentasodium aminotri (methylene phosphonic acid) molecular chain is short and three-dimensional, the wrapping property of silicic acid is moderate, the diameter of microparticles aggregated by silicic acid is proper, and the pentasodium aminotri (methylene phosphonic acid) can not be too large or too small. And after acid is added, white precipitate is separated out to be silicic acid, and at the moment, pentasodium aminotri (methylene phosphonic acid) and the silicic acid are completely desorbed, so that the desorption efficiency is high. The silicic acid is decomposed into silicon dioxide by heating, and the precipitated silicon dioxide has uniform particle size, high purity and good whiteness. The final pH value of the solution reaches 2-4, excessive sodium carbonate can be reacted, ionization of silicic acid can be prevented, ionization balance is converted to a molecular state, silicic acid molecules are easy to be heated and decomposed to separate out silicon dioxide, if the pH value is too low, the solubility of silicic acid is high, silicon dioxide is not easy to separate out, and if the pH value is too high, ionization balance is converted to an ionic state, and silicon dioxide is not easy to separate out. After the white precipitate is no longer precipitated, the silicic acid/silicon dioxide is no longer precipitated, white powder is obtained through filtering, washing and spray drying, and the white powder is baked at the temperature of 150-200 ℃ to ensure that a small amount of non-decomposed silicic acid in the white powder is completely decomposed into silicon dioxide, so that the silicon dioxide powder with high purity, good uniformity and high dispersibility and difficult caking is obtained.
Optionally, the mass ratio of the sodium carbonate to the quartz sand is 1 (1.5-3.5).
According to the technical scheme, sodium silicate in a molten state is obtained by reacting sodium carbonate and quartz sand for 4-6 hours at 1400-1600 ℃, the molecular formula is Na 2O·nSiO2, according to the proportion of the added sodium carbonate and quartz sand, the modulus n is 1.5-3.5, sodium silicate generated when n is too large is not easy to dissolve in water, is not easy to be dissolved by water vapor, and also affects the subsequent reaction with acid and the particle size concentration of generated silicon dioxide, and the consumption of sodium carbonate is increased when n is too small.
Optionally, the mass ratio of the sodium carbonate to the quartz sand is 1:3.
By adopting the technical scheme, the generated sodium silicate has high purity, high efficiency of being dissolved by high-temperature steam and small sodium carbonate consumption.
Optionally, the mass ratio of the quartz sand to the pentasodium aminotri (methylene phosphonic acid) is 1 (0.01-0.03).
By adopting the technical scheme, sodium silicate is generated by the quartz sand and sodium carbonate, and in the process of generating silicic acid by the reaction of sodium silicate and acid, hydrogen bonds are formed between aminotri (methylene phosphonic acid) pentasodium and silicic acid to prevent excessive aggregation of silicic acid, so that the size of aggregated silicic acid particles is controlled within the range of 23-45 mu m, and the silicon dioxide has better grinding effect and thickening effect when being applied to toothpaste.
Optionally, the mass ratio of the quartz sand to the pentasodium aminotri (methylenephosphonic acid) is 1:0.02.
By adopting the technical scheme, sodium silicate is generated by the quartz sand and sodium carbonate, and in the process of generating silicic acid by the reaction of sodium silicate and acid, hydrogen bonds are formed between aminotri (methylene phosphonic acid) pentasodium and silicic acid to prevent excessive aggregation of silicic acid, so that the proportion of silicic acid aggregation particles in the range of 33-38 mu m is obviously increased, the particle size uniformity is high, caking is not easy to occur, and the silicon dioxide has better grinding effect and thickening effect when being applied to toothpaste.
Optionally, adding acid and water under the stirring condition, and adjusting the final pH of the aqueous solution to 2.8-3.2.
By adopting the technical scheme, the silicic acid basically exists in a solution in a molecular state and is extremely easy to be decomposed into silicon dioxide by heating, so that highly dispersed silicon dioxide particles are obtained, the particle size is mostly in a uniform range of 23-45 mu m, and the proportion can reach more than 30% in a range of 33-38 mu m.
Optionally, mixing the quartz sand and the sodium carbonate, and reacting for 4.8-5.2 hours at 1550-1560 ℃ to obtain the molten state material.
By adopting the technical scheme, the purity of sodium silicate generated by the reaction of quartz sand and sodium carbonate is high in the temperature range, and the purity of the subsequently produced silicon dioxide is correspondingly improved to more than 98%.
Optionally, the volume of the sodium silicate aqueous solution is V, the flow of the added acid is V/(20-40) per minute, and the stirring speed is kept at 200-300 r/min in the acid adding process.
By adopting the technical scheme, the acid adding speed and the stirring speed are controlled, so that the dispersibility and the granularity uniformity of the generated silicic acid are improved.
Optionally, heating the aqueous solution of sodium silicate to 84-86 ℃, adding pentasodium aminotri (methylenephosphonic acid), mixing uniformly, and adding acid and water under stirring.
By adopting the technical scheme, at the temperature, the activity of the pentasodium aminotri (methylene phosphonic acid) is strong, and the hydrogen bond effect generated by silicic acid is large, so that the silicic acid has proper particle size and uniform dispersion.
In a second aspect, the application also provides silica as an additive for toothpaste, and adopts the following technical scheme.
Silica as an additive for toothpaste is prepared according to the above-mentioned production process.
By adopting the technical scheme, the silicon dioxide which has proper particle size, good uniformity and difficult caking and is suitable for being used as a toothpaste friction agent and a thickening agent simultaneously is prepared.
In summary, the silica serving as the toothpaste additive and the production process thereof have the following beneficial effects:
By controlling the reaction temperature of 1400-1600 ℃, quartz sand (SiO 2) and sodium carbonate (Na 2CO3) react to obtain molten sodium silicate, and the sodium silicate obtained by adopting the temperature reaction has low impurity content.
And pressurizing to 0.4-1 MPa by using high-temperature steam at 100-150 ℃, so that the solid sodium silicate can be efficiently dissolved to form colorless transparent viscous liquid, namely sodium silicate aqueous solution.
Heating the sodium silicate aqueous solution to 70-100 ℃, adding pentasodium aminotri (methylene phosphonic acid), uniformly mixing, adding acid and water under stirring, and reacting the sodium silicate and the acid to generate silicic acid. Wherein, the temperature of the aqueous solution is kept between 70 ℃ and 100 ℃ by heating, and the stability of the reaction rate is kept. The first aspect of the pentasodium aminotri (methylene phosphonic acid) can form hydrogen bonds with silicic acid to prevent excessive aggregation of silicic acid, the second aspect of the pentasodium aminotri (methylene phosphonic acid) has the advantages that the pentasodium aminotri (methylene phosphonic acid) molecular chain is short and three-dimensional, the wrapping property of silicic acid is moderate, the diameter of microparticles aggregated by silicic acid is proper, the density of pentasodium aminotri (methylene phosphonic acid) is not too large or too small, the density of the aminotri (methylene phosphonic acid) is larger than 1.4g/cm 3, the density of an aqueous solution can be moderately increased, the interfacial tension of silicic acid microparticles and water is reduced, the dispersion of the microparticles is facilitated, the silicic acid microparticles are suspended in the aqueous solution, the too fast sedimentation aggregation of silicic acid microparticles is prevented, and the silicic acid microparticles are uniformly dispersed. The silicic acid is decomposed into silicon dioxide by heating, and the precipitated silicon dioxide has uniform particle size, high purity and good whiteness.
Adding acid, reacting sodium silicate with the acid to generate silicic acid, controlling the final pH value of the solution to be 2-4, not only reacting excessive sodium carbonate, but also preventing ionization of the silicic acid, wherein ionization balance is changed to a molecular state, silicic acid molecules are easy to be heated to decompose and separate out silicon dioxide, if the pH value is too low, the solubility of the silicic acid is high, silicon dioxide is not easy to separate out, and if the pH value is too high, ionization balance is changed to an ionic state, and silicon dioxide is not easy to separate out.
And finally baking the white powder obtained by spray drying at the temperature of 150-200 ℃ to ensure that a small amount of non-decomposed silicic acid in the white powder is completely decomposed into silicon dioxide, so as to obtain the silicon dioxide powder with high purity, good uniformity and high dispersibility and difficulty in caking.
Detailed Description
Some examples of the silica as a toothpaste additive and its production process according to the present application are specifically described below. The mass of the following materials has been converted into relative parts by mass.
Example 1
Mixing 3 parts of quartz sand and 1 part of sodium carbonate, reacting for 5 hours at 1555 ℃ to obtain molten sodium silicate, cooling to obtain solid sodium silicate, pressurizing to 0.4MPa by using 125 ℃ of water vapor, spraying and dissolving the sodium silicate to obtain a sodium silicate aqueous solution with the volume of V, heating the sodium silicate aqueous solution to be kept at 85 ℃, adding 0.02 part of pentasodium aminotri (methylenephosphonic acid), adding sulfuric acid and water under the stirring condition after uniformly mixing, adding the flow of the sulfuric acid to be V/30 per minute, keeping the stirring speed at 250 revolutions per minute in the sulfuric acid adding process, controlling the amount of the sulfuric acid to ensure that the final pH value of the solution reaches 3, filtering to obtain a precipitate after white precipitate is generated in the process and is not separated out, washing the precipitate, spray-drying the precipitate to obtain white powder, and finally baking the white powder at the temperature of 150 ℃ to obtain the silicon dioxide.
Example 2
The only difference between this example and example 1 is that 3.5 parts of quartz sand was added, the solid was sprayed and dissolved by pressurizing to 1MPa with 125 ℃ water vapor, the dissolution time was 16% higher than that of example 1 under the same conditions, and an aqueous sodium silicate solution was obtained after dissolution, and finally silica was prepared.
Example 3
The only difference between this example and example 1 is that 0.01 part of pentasodium aminotri (methylenephosphonic acid) was added and finally a silica was prepared.
Example 4
The only difference between this example and example 1 is that 0.03 parts of pentasodium aminotri (methylenephosphonic acid) was added and finally a silica was prepared.
Example 5
The only difference between this example and example 1 is that the amount of sulfuric acid added is controlled so that the final pH of the solution reaches 2, and finally silica is produced.
Example 6
The only difference between this example and example 1 is that the amount of sulfuric acid added is controlled so that the final pH of the solution reaches 4, and finally silica is produced.
Example 7
The only difference between this example and example 1 is that silica was prepared by mixing silica sand and soda ash and then reacting for 5 hours at 1400 ℃ to obtain molten sodium silicate.
Example 8
The only difference between this example and example 1 is that silica is produced by mixing silica sand and soda ash and reacting for 5 hours at 1600 ℃ to obtain molten sodium silicate.
Example 9
The only difference between this example and example 1 is that the aqueous sodium silicate solution was heated to 70 ℃ and pentasodium aminotri (methylenephosphonic acid) was added to finally prepare silica.
Comparative example 1
The only difference between this comparative example and example 1 is that pentasodium aminotri (methylenephosphonic acid) was not added and finally a silica was prepared.
Comparative example 2
The only difference between this comparative example and example 1 is that 0.02 parts of sodium dodecylbenzenesulfonate was added to finally prepare silica.
Comparative example 3
The only difference between this comparative example and example 1 is that 0.02 parts of sodium dodecyl sulfate was added and finally a silica was prepared.
Comparative example 4
The only difference between this comparative example and example 1 is that the amount of sulfuric acid added is controlled so that the final pH of the solution reaches 1, and finally silica is produced.
Comparative example 5
The only difference between this comparative example and example 1 is that the amount of sulfuric acid added is controlled so that the final pH of the solution reaches 5, and finally silica is produced.
Comparative example 6
The only difference between this comparative example and example 1 is that silica was prepared by mixing silica sand and soda ash and then reacting at 1300 ℃ for 5 hours to obtain molten sodium silicate.
Comparative example 7
The only difference between this comparative example and example 1 is that the aqueous sodium silicate solution was heated to 50 ℃ and pentasodium aminotri (methylenephosphonic acid) was added to finally prepare silica.
Comparative example 8
The only difference between this comparative example and example 1 is that the flow of sulfuric acid was V/10 per minute, and finally silica was produced.
Test example 1
The silica prepared in examples 1-9 and comparative examples 1-8 were tested according to QB/T2346-2007 Standard for silica tests for toothpastes. The test results are shown in Table 1.
Table 1 results of silica property test prepared in each of examples and comparative examples
The test was conducted using a 600 mesh sieve (passing through particle size 23 μm), a 425 mesh sieve (passing through particle size 33 μm), a 400 mesh sieve (passing through particle size 38 μm) and a 325 mesh sieve (passing through particle size 45 μm) for increasing the particle size of silica prepared in each of examples and comparative examples, and the results are shown in Table 2 below.
Table 2 silica particle size detection prepared in each example and comparative example
From tables 1 and 2 above, it can be seen that the particle size concentration of examples 1 to 9 is significantly improved, the proportion in the range of 23 to 45 μm can be more than 70%, and the proportion in the range of 33 to 38 μm can be more than 30%, compared with the silica prepared in comparative examples 1 to 8. When the diameter of the silica particles is 23-45 mu m, even 33-38 mu m, the silica particles are not easy to adhere, have good friction property when being applied to toothpaste, are not easy to damage teeth, have thickening effect on the toothpaste, and enable the toothpaste to have elasticity and shape retention under low shearing force.
Example 1 has the best particle size concentration and purity compared to the other examples.
In example 2, the amount of silica sand was increased as compared with example 1, and the particle size concentration was somewhat decreased.
Examples 3 and 4, in which the addition ratio of pentasodium aminotri (methylenephosphonic acid) was adjusted as compared to example 1, examples 5 and 6, in which the final pH of the solution was adjusted as compared to example 1, had both a slight decrease in silica purity and particle size concentration.
Example 7 compared with example 1, the melting reaction temperature of quartz sand and sodium carbonate is reduced to 1400 ℃, the purity of the finally prepared silicon dioxide is reduced by 1.5%, and the reduction of the particle size concentration is not obvious.
Example 8 compared to example 1, the silica prepared by increasing the temperature of the fused silica sand and soda ash to 1600 ℃ had a purity and particle size concentration comparable to example 1.
Example 9 compared with example 1, the temperature of the aqueous sodium silicate solution is reduced from 85 ℃ to 70 ℃, the purity of the finally prepared silicon dioxide is reduced by 1.1%, the concentration of the particle size is also obviously reduced, and the reaction temperature has obvious influence on the reaction of sodium silicate and sulfuric acid and the dispersing effect of the pentasodium aminotri (methylenephosphonic acid).
Comparative example 1 compared with example 1, no pentasodium aminotri (methylenephosphonic acid) was added, and finally the silica prepared had a higher proportion of particles size range dispersion, both less than 23 μm and greater than 45 μm.
Comparative example 2 compared with example 1, the use of sodium dodecyl benzene sulfonate instead of pentasodium aminotri (methylenephosphonic acid) finally produced silica with a significant increase in dry agent burn weight loss ratio in 900 ℃, which may be less likely to be washed clean after the combination of sodium dodecyl benzene sulfonate and silicic acid, resulting in residual effects.
Comparative example 3 compared with example 1, the use of sodium dodecyl sulfonate instead of pentasodium aminotri (methylenephosphonic acid) finally produced silica with a significant increase in dry agent burn weight loss ratio in 900 ℃, which may be less likely to be washed clean after the combination of sodium dodecyl benzene sulfonate and silicic acid, resulting in residual effects.
Comparative example 4 and comparative example 5 have the effect of adjusting the final pH of the solution, affecting the dispersing effect of silicic acid, and have a certain decrease in the particle size concentration of silica, compared with example 1.
Compared with the comparative example 6, the melting reaction temperature of quartz sand and sodium carbonate is reduced to 1300 ℃, the purity of the finally prepared silicon dioxide is reduced by 3.3%, the particle size concentration is also reduced to a certain extent, and the excessively low temperature is not beneficial to removing impurities.
Comparative example 7 compared with example 1, the heating of the aqueous sodium silicate solution was reduced from 85 ℃ to 50 ℃, the particle size concentration of silica was significantly reduced, and it was found that the reaction temperature had a certain effect on the dispersing effect.
Compared with the example 1, the flow rate of sulfuric acid is increased from V/30 to V/10 per minute, and the concentration of the particle size of the finally prepared silicon dioxide is reduced to a certain extent, which shows that the excessively rapid sulfuric acid addition rate has a certain destructive effect on the dispersion of the generated silicic acid.
In conclusion, the melting reaction temperature of quartz sand (SiO 2) and sodium carbonate (Na 2CO3) is controlled to be 1400-1600 ℃, and the impurity content of sodium silicate obtained by the reaction is low.
The reaction temperature of sodium silicate and sulfuric acid is kept at 70-100 ℃, the final pH of the solution is controlled to be 2-4, and the aminotri (methylene phosphonic acid) pentasodium added in the reaction has a remarkable effect on the uniform dispersion of the silicon dioxide of the final product to form a proper particle size. And finally baking the white powder obtained by spray drying at the temperature of 150-200 ℃ to ensure that a small amount of non-decomposed silicic acid in the white powder is completely decomposed into silicon dioxide, so as to obtain the silicon dioxide powder with high purity, good uniformity and high dispersibility and difficulty in caking.
The above is merely a preferred embodiment of the present application, the protective scope of the present application is not limited to the above examples, it should be noted that modifications and alterations will be apparent to those skilled in the art without departing from the principle of the present application, and these modifications and alterations should also be regarded as falling within the protective scope of the present application.
Claims (8)
1. A process for producing silica as a toothpaste additive, the process comprising:
Mixing quartz sand and sodium carbonate, reacting for 4-6 hours at 1400-1600 ℃ to obtain a molten state material, cooling to obtain a solid state material, pressurizing to 0.4-1 MPa by using 100-150 ℃ water vapor, spraying and dissolving the solid state material to obtain a sodium silicate aqueous solution, heating the sodium silicate aqueous solution to be kept at 70-100 ℃, adding pentasodium aminotri (methylene phosphonic acid) and water under the stirring condition after uniformly mixing, adding acid and water to enable the final pH value of the solution to reach 2-4, filtering to obtain a precipitate after white precipitate is generated in the process and is not separated out, washing the precipitate, spraying and drying the precipitate to obtain white powder, and finally baking the white powder at 150-200 ℃ to obtain the silicon dioxide;
The mass ratio of the quartz sand to the aminotri (methylene phosphonic acid) pentasodium is 1 (0.01-0.03);
The volume of the sodium silicate aqueous solution is V, and the flow of the added acid is V/(20-40) per minute.
2. The process for producing silica as an additive for toothpaste according to claim 1, wherein the mass ratio of the soda ash to the silica sand is 1 (1.5-3.5).
3. The process for producing silica as a toothpaste additive according to claim 2, wherein the mass ratio of the soda ash to the silica sand is 1:3.
4. The process for producing silica as a toothpaste additive according to claim 1, wherein the mass ratio of the quartz sand and the aminotri (methylenephosphonic acid) pentasodium is 1:0.02.
5. The process for producing silica as an additive for toothpaste according to claim 1, wherein the acid and water are added under stirring, and the final pH of the aqueous solution is adjusted to 2.8 to 3.2.
6. The process for producing silica as claimed in claim 1, wherein the silica sand and the soda ash are mixed and reacted at 1550-1560 ℃ for 4.8-5.2 hours to obtain the molten material.
7. The process for producing silica as claimed in claim 1, wherein the stirring speed is maintained at 200 to 300 rpm during the acid addition.
8. The process for producing silica as claimed in claim 1, wherein the aqueous solution of sodium silicate is heated to 84-86 ℃ and pentasodium aminotri (methylenephosphonic acid) is added thereto, and the acid and water are added under stirring after being uniformly mixed.
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| CA2009035A1 (en) * | 1989-01-31 | 1990-07-31 | Rudolf Novotny | Process for hydrothermal production of sodium silicate solutions |
| KR100503705B1 (en) * | 1996-06-06 | 2005-09-27 | 로디아 쉬미 | Silica capable of being used in toothpaste compositions |
| JP3691048B1 (en) * | 2004-08-09 | 2005-08-31 | 日本化学工業株式会社 | Method for producing high purity colloidal silica |
| FR2891836B1 (en) * | 2005-10-06 | 2010-12-17 | Rhodia Recherches & Tech | SURFACE SILICA MODIFIED BY PHOSPHONIC ACIDS. |
| US8512664B1 (en) * | 2007-07-20 | 2013-08-20 | The National Titanium Dioxide Co. Ltd. (Cristal) | Sodium silicate solutions |
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| CN103539129B (en) * | 2013-10-30 | 2015-11-11 | 武汉大学 | A kind of method of purification of silicon-dioxide |
| WO2023035097A1 (en) * | 2021-09-07 | 2023-03-16 | 无锡恒诚硅业有限公司 | Preparation method for particle size-controllable white carbon black |
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