CN118315519A - Composite bonding wire and preparation method thereof - Google Patents
Composite bonding wire and preparation method thereof Download PDFInfo
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- CN118315519A CN118315519A CN202410420407.3A CN202410420407A CN118315519A CN 118315519 A CN118315519 A CN 118315519A CN 202410420407 A CN202410420407 A CN 202410420407A CN 118315519 A CN118315519 A CN 118315519A
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- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
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- H—ELECTRICITY
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Abstract
Description
技术领域Technical Field
本发明涉及半导体以及LED封装技术领域,具体而言,涉及一种复合型键合线及其制备方法。The present invention relates to the technical field of semiconductor and LED packaging, and in particular to a composite bonding wire and a preparation method thereof.
背景技术Background technique
键合线是用于半导体以及LED封装的核心材料,是连接引脚和硅片或者两端子的、并进行电信号传输的部件,用于汽车运输、航空航天和电子通信领域等集成电路系统。随着电子器件高性能、多功能、小型化和便携化的发展趋势,电子封装技术对键合线材料的性能提出了更高的要求。Bonding wire is the core material for semiconductor and LED packaging. It is a component that connects pins and silicon wafers or two terminals and transmits electrical signals. It is used in integrated circuit systems such as automobile transportation, aerospace and electronic communications. With the development trend of high performance, multi-function, miniaturization and portability of electronic devices, electronic packaging technology has put forward higher requirements on the performance of bonding wire materials.
目前在封装领域主要用到的键合线为金线、银线、铜线、铝线以及其合金线,而焊盘上的主要材质为铝。对于金线而言,在键合后,随着电子器件的工作运行,键合界面处金与铝会形成金属间化合物,如Au4Al,而此种金属间化合物容易被卤素腐蚀,从而导致键合失效。而对于银键合线,由于银在空气中容易被硫化,从而应用较少,目前市场上主要用银合金线用于半导体封装。此外,金线和银线及其合金线的使用造成封装成本较高,难以批量性投入。铝线的工艺成熟、价格低廉、种类丰富,然而由于铝的热膨胀系数与硅芯片的热膨胀系数相差较大,在长时间的功率循环过程中会在封装体内积累热量,使模块温度升高,产生并积累热应力,容易导致键合引线断裂或键合接触表面脱落,最终导致模块的整体失效。而铜线虽然价格低廉,但是其硬度大,在键合时容易损坏基板,并且在键合时需要采用惰性气体保护,避免铜氧化造成键合界面虚焊等不良连接对产品的质量和可靠性造成严重影响。At present, the main bonding wires used in the packaging field are gold wire, silver wire, copper wire, aluminum wire and their alloy wires, and the main material on the pad is aluminum. For gold wire, after bonding, as the electronic device works, gold and aluminum at the bonding interface will form intermetallic compounds, such as Au 4 Al, and this intermetallic compound is easily corroded by halogen, resulting in bonding failure. As for silver bonding wire, silver is easily sulfided in the air, so it is less used. At present, silver alloy wire is mainly used in semiconductor packaging in the market. In addition, the use of gold wire, silver wire and their alloy wires results in high packaging costs and is difficult to invest in batches. The process of aluminum wire is mature, the price is low, and the variety is rich. However, due to the large difference in the thermal expansion coefficient of aluminum and the thermal expansion coefficient of silicon chips, heat will accumulate in the package body during a long power cycle, causing the module temperature to rise, generating and accumulating thermal stress, which is easy to cause the bonding wire to break or the bonding contact surface to fall off, and ultimately leading to the overall failure of the module. Although copper wire is cheap, it is very hard and can easily damage the substrate during bonding. In addition, inert gas protection is required during bonding to prevent copper oxidation from causing poor connections such as cold solder joints at the bonding interface, which can seriously affect product quality and reliability.
因此可见,单一质地种类的键合线均存在不同类型的缺陷;针对目前半导体和LED键合材料成本高、键合界面老化严重等各种问题,亟需开发新型键合线制备方法。Therefore, it can be seen that bonding wires of a single texture type have different types of defects; in view of the current high cost of semiconductor and LED bonding materials, severe aging of the bonding interface and other problems, it is urgent to develop new bonding wire preparation methods.
有鉴于此,特提出本发明。In view of this, the present invention is proposed.
发明内容Summary of the invention
本发明的第一目的在于提供一种复合型键合线,主要用于解决键合线的界面处容易出现老化缺陷、以及键合线原料贵金属成本高昂的技术问题,本发明提供了一种包括键合段和主体段的段结构的键合线,且不同段中采用不同的金属料,能够有效解决上述技术问题。The first purpose of the present invention is to provide a composite bonding wire, which is mainly used to solve the technical problems that aging defects are prone to occur at the interface of the bonding wire and the high cost of precious metals as raw materials of the bonding wire. The present invention provides a bonding wire with a segment structure including a bonding segment and a main segment, and different metal materials are used in different segments, which can effectively solve the above technical problems.
本发明的第二目的在于提供一种所述的复合型键合线的制备方法,通过合金锭制备、超声冲击、扩散连接、多道次轧制和激光裁剪等工序完成;方法简单易行,且具有良好的可定制性,适合批量化推广。The second purpose of the present invention is to provide a method for preparing the composite bonding wire, which is completed through processes such as alloy ingot preparation, ultrasonic impact, diffusion connection, multi-pass rolling and laser cutting; the method is simple and easy to implement, has good customizability, and is suitable for mass promotion.
为了实现本发明的上述目的,特采用以下技术方案:In order to achieve the above-mentioned purpose of the present invention, the following technical solutions are particularly adopted:
一种复合型键合线,包括主体段,以及与所述主体段的至少一端扩散连接的键合段;A composite bonding wire comprises a main body segment and a bonding segment diffusely connected to at least one end of the main body segment;
所述主体段包括银及银基合金、铜及铜基合金中的至少一种;The main body segment comprises at least one of silver and silver-based alloys, copper and copper-based alloys;
所述键合段包括金、银、钯或铋中的至少一种元素。The bonding segment includes at least one element of gold, silver, palladium or bismuth.
所述复合型键合线的制备方法包括如下步骤:The method for preparing the composite bonding wire comprises the following steps:
(1)、独立地对主体段和键合段的金属材料进行熔炼并浇铸,得到主体段铸锭和键合段铸锭;(1) independently smelting and casting the metal materials of the main section and the bonding section to obtain a main section ingot and a bonding section ingot;
(2)、将所述键合段铸锭设置于所述主体段铸锭的至少一侧,将施压固定后的铸锭置于真空环境中进行保温处理,得到复合锭;(2) placing the bonding segment ingot on at least one side of the main segment ingot, placing the pressed and fixed ingot in a vacuum environment for heat preservation treatment, and obtaining a composite ingot;
(3)、将所述复合锭进行轧制,所述轧制进行2~20次后得到合金带;(3) rolling the composite ingot, wherein the rolling is performed 2 to 20 times to obtain an alloy strip;
(4)、将所述合金线依次进行退火处理,得到键合线。(4) The alloy wires are subjected to annealing treatment in sequence to obtain bonding wires.
与现有技术相比,本发明的有益效果为:Compared with the prior art, the present invention has the following beneficial effects:
(1)本发明中所述的键合线包括主体段和键合段并通过扩散结合相连接,既可大大降低键合线的原料成本,又可以保证键合线不会损坏集成电路基板,同时也可以解决键合界面处老化失效的问题。(1) The bonding wire described in the present invention includes a main body section and a bonding section which are connected by diffusion bonding, which can not only greatly reduce the raw material cost of the bonding wire, but also ensure that the bonding wire will not damage the integrated circuit substrate, and also solve the problem of aging failure at the bonding interface.
(2)本发明所述的键合线为固定尺寸,且可以根据需求进行可控的规格定制,可以大幅降低在制备过程中裁切导致产品浪费的问题。(2) The bonding wires described in the present invention are of fixed size and can be customized to controllable specifications according to demand, which can greatly reduce the problem of product waste caused by cutting during the preparation process.
(3)本发明所述的键合线制造方法工艺适用性强,既可制造半导体封装用键合线,也可以制造LED封装用键合线等多个应用领域。(3) The bonding wire manufacturing method of the present invention has strong process applicability and can be used to manufacture bonding wires for semiconductor packaging, as well as bonding wires for LED packaging and other application fields.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
为了更清楚地说明本发明具体实施方式或现有技术中的技术方案,下面将对具体实施方式或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图是本发明的一些实施方式,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the specific implementation methods of the present invention or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.
图1提供了一种键合线产品示意图;FIG1 provides a schematic diagram of a bonding wire product;
图2提供了一种键合线产品示意图;FIG2 provides a schematic diagram of a bonding wire product;
图3提供了一种键合线制备工艺中轧制示意图;FIG3 provides a schematic diagram of rolling in a bonding wire preparation process;
图4提供了一种键合线制备工艺中轧制示意图;FIG4 provides a schematic diagram of rolling in a bonding wire preparation process;
图5提供了一种键合线制备工艺中分切线设置示意图。FIG5 is a schematic diagram of a slitting line setting in a bonding wire preparation process.
具体实施方式Detailed ways
下面将结合附图和具体实施方式对本发明的技术方案进行清楚、完整地描述,但是本领域技术人员将会理解,下列所描述的实施例是本发明一部分实施例,而不是全部的实施例,仅用于说明本发明,而不应视为限制本发明的范围。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。实施例中未注明具体条件者,按照常规条件或制造商建议的条件进行。所用试剂或仪器未注明生产厂商者,均为可以通过市售购买获得的常规产品。The technical scheme of the present invention will be clearly and completely described below in conjunction with the accompanying drawings and specific embodiments, but it will be appreciated by those skilled in the art that the following described embodiments are part of embodiments of the present invention, rather than all embodiments, and are only used to illustrate the present invention, and should not be considered as limiting the scope of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by those of ordinary skill in the art without making creative work, all belong to the scope of protection of the present invention. If the specific conditions are not indicated in the embodiments, they are carried out according to the normal conditions or the conditions recommended by the manufacturer. If the manufacturer is not indicated in the reagents or instruments used, they are all conventional products that can be purchased commercially.
本发明的第一方面在于提供一种复合型键合线。A first aspect of the present invention is to provide a composite bonding wire.
一种复合型键合线,包括主体段,以及与所述主体段的至少一侧扩散连接的键合段;所述主体段包括银及银基合金、铜及铜基合金中的至少一种;所述键合段包括金、银、钯或铋中的至少一种元素。A composite bonding wire comprises a main body segment and a bonding segment diffusely connected to at least one side of the main body segment; the main body segment comprises at least one of silver and silver-based alloys, copper and copper-based alloys; the bonding segment comprises at least one element of gold, silver, palladium or bismuth.
作为一种优选的实施方式,所述键合线可以采用键合段-主体段-键合段的三段复合结构,如图1所示;也可以采用主体段-键合段的双段结构,在整体结构上符合键合线产品的线类产品的结构,如图2所示。As a preferred embodiment, the bonding wire can adopt a three-section composite structure of bonding section-main section-bonding section, as shown in FIG1 ; or a two-section structure of main section-bonding section can be adopted, and the overall structure conforms to the structure of wire products of bonding wire products, as shown in FIG2 .
作为一种优选的实施方式,当所述主体段的一端连接有所述键合段时,所述键合段的长度与所述主体段的长度之比为1/6~1/3;或者,当所述主体段的两端分别连接有所述键合段时,每个所述键合段的长度与所述主体段的长度之比为1/6~1/3。在本发明中通过对所述键合段与所述主体段的长度比例进行限定,能够在降低金属原料成本的前提下,保证键合线的键合性能,并实现更加便捷的封装键合操作。As a preferred embodiment, when one end of the main body segment is connected to the bonding segment, the ratio of the length of the bonding segment to the length of the main body segment is 1/6 to 1/3; or, when the two ends of the main body segment are respectively connected to the bonding segments, the ratio of the length of each bonding segment to the length of the main body segment is 1/6 to 1/3. In the present invention, by limiting the length ratio of the bonding segment to the main body segment, the bonding performance of the bonding wire can be guaranteed while reducing the cost of metal raw materials, and a more convenient packaging bonding operation can be achieved.
作为一种优选的实施方式,所述键合线的截面为方形,且所述方形的长边长度≤1mm;需要注意的是,所述截面指的是与主体段和键合段的扩散连接界面相平行的、在键合线上任何一处进行铅直切割所获得的截面。As a preferred embodiment, the cross-section of the bonding wire is square, and the long side length of the square is ≤1 mm; it should be noted that the cross-section refers to the cross-section obtained by vertically cutting at any point on the bonding wire, which is parallel to the diffusion connection interface between the main section and the bonding section.
作为一种可选的实施方式,所述方形的规格可以依据应用场景或市场需求进行调整,所述方形的长宽规格即意味着所述键合线的侧宽或高度规格。所述方形的边长包括但不限于20μm、23μm、25μm、30μm、35μm、38μm、50μm、100μm等。As an optional implementation, the specifications of the square can be adjusted according to the application scenario or market demand, and the length and width specifications of the square mean the side width or height specifications of the bonding wire. The side length of the square includes but is not limited to 20μm, 23μm, 25μm, 30μm, 35μm, 38μm, 50μm, 100μm, etc.
作为一种更优选的实施方式,方形的长边长度为16μm~70μm;在所述主体段的一端和两端分别扩散连接有所述键合段的不同情况时,本领域技术人员应当依据所述键合段的数量适应性调整所述截面的参数规格。As a more preferred embodiment, the length of the long side of the square is 16 μm to 70 μm; when the bonding segments are diffusely connected at one end and both ends of the main segment, the technical personnel in this field should adaptively adjust the parameter specifications of the cross-section according to the number of the bonding segments.
作为一种优选的实施方式,所述主体段中的金属元素的至少一种与所述键合段中的金属元素相同。As a preferred embodiment, at least one of the metal elements in the main segment is the same as the metal element in the bonding segment.
作为一种优选的实施方式,针对所述主体段的原料组分:所述银的纯度≥99.99%,所述铜的纯度≥99.99%;As a preferred embodiment, for the raw material components of the main body segment: the purity of the silver is ≥99.99%, and the purity of the copper is ≥99.99%;
所述银基合金中银的含量≥99.95%,所述银基合金中除银外还包括微量的Au、Mg、Pd或Cu等元素中的至少一种;The silver content of the silver-based alloy is ≥ 99.95%, and the silver-based alloy includes at least one of trace elements such as Au, Mg, Pd or Cu in addition to silver;
所述铜基合金中铜的含量≥99.90%,所述铜基合金中除银外还包括微量的Au、Ag、Ce或Mg等元素中的至少一种。The copper content in the copper-based alloy is ≥99.90%, and the copper-based alloy includes at least one of trace elements such as Au, Ag, Ce or Mg in addition to silver.
作为一种优选的实施方式,所述键合段包括金、金钯合金、银金钯合金或银铋合金中的至少一种。As a preferred embodiment, the bonding segment includes at least one of gold, gold-palladium alloy, silver-gold-palladium alloy or silver-bismuth alloy.
作为一种更优选的实施方式,针对所述键合段的原料组分:所述金的纯度≥99.99%;As a more preferred embodiment, with respect to the raw material components of the bonding segment: the purity of the gold is ≥99.99%;
所述金钯合金中金的含量≥90.00%,所述金钯合金中钯的含量为1%~10%;The gold content in the gold-palladium alloy is ≥90.00%, and the palladium content in the gold-palladium alloy is 1% to 10%;
所述银金钯合金中银的含量≥90.00%,所述银金钯合金中钯的含量为1%~10%,所述银金钯合金中金的含量≥1.00%;The silver content in the silver-gold-palladium alloy is ≥90.00%, the palladium content in the silver-gold-palladium alloy is 1% to 10%, and the gold content in the silver-gold-palladium alloy is ≥1.00%;
所述银铋合金中银的含量≥90.00%,所述银铋合金中铋的含量为1%~10%;The silver content in the silver-bismuth alloy is ≥ 90.00%, and the bismuth content in the silver-bismuth alloy is 1% to 10%;
上述合金中可能还包含有Au、Ag、Cu、Mg等极微量的杂质组分,这些杂质通常是在冶炼过程中不可避免地掺杂出现;且杂质含量≤0.01%。The above alloys may also contain trace amounts of impurity components such as Au, Ag, Cu, Mg, etc. These impurities are usually inevitably doped during the smelting process; and the impurity content is ≤0.01%.
在本发明中主体段采用高导电性且成本相对低廉的金属为原料,而键合段采用低硬度、不易氧化的金属材料;通过对键合线的结构与原料进行设计,一方面能够抑制或解决键合界面易老化的缺陷,另一方面能够有效降低键合线的高成本问题。In the present invention, the main segment uses a metal with high conductivity and relatively low cost as the raw material, while the bonding segment uses a metal material with low hardness and not easy to oxidize; by designing the structure and raw materials of the bonding wire, on the one hand, it can suppress or solve the defect of easy aging of the bonding interface, and on the other hand, it can effectively reduce the high cost problem of the bonding wire.
作为一种优选的实施方式,所述键合线的长度为电子元器件端子与目标器件之间键合点之间的距离;即本领域技术人员可以依据所述键合线的应用场景对所述键合线的长度进行定制,而不存在技术层面的限制。As a preferred embodiment, the length of the bonding wire is the distance between the bonding points between the electronic component terminals and the target device; that is, technicians in this field can customize the length of the bonding wire according to the application scenario of the bonding wire without any technical limitations.
本发明的第二方面在于提供一种所述的键合线的制备方法。所述的键合线的制备方法包括如下步骤:(1)、独立地对主体段和键合段的金属材料进行熔炼并浇铸,得到主体段铸锭和键合段铸锭;(2)、将所述键合段铸锭设置于所述主体段铸锭的至少一侧,将施压固定后的铸锭置于真空环境中进行保温处理,得到复合锭;(3)、将所述复合锭进行轧制,所述轧制进行2~20次后得到合金带;(4)、将所述合金线依次进行退火处理,得到键合线。The second aspect of the present invention is to provide a method for preparing the bonding wire. The method for preparing the bonding wire comprises the following steps: (1) independently smelting and casting the metal materials of the main section and the bonding section to obtain a main section ingot and a bonding section ingot; (2) arranging the bonding section ingot on at least one side of the main section ingot, placing the pressed and fixed ingot in a vacuum environment for heat preservation treatment to obtain a composite ingot; (3) rolling the composite ingot, and obtaining an alloy strip after rolling for 2 to 20 times; (4) annealing the alloy wire in sequence to obtain a bonding wire.
作为一种优选的实施方式,在步骤(1)中,分别对所述主体段和所述键合段的金属材料进行真空熔炼,并对应得到均匀的金属熔液;所述真空熔炼的温度依据各结构段所采用的金属原料的熔点决定。As a preferred embodiment, in step (1), the metal materials of the main segment and the bonding segment are vacuum melted respectively, and a uniform metal melt is obtained accordingly; the temperature of the vacuum melting is determined according to the melting point of the metal raw materials used in each structural segment.
作为一种优选的实施方式,在步骤(1)中,所述主体段铸锭和所述键合段铸锭的长度与宽度相同;作为一种更优选的实施方式,所述主体段和所述键合段的金属熔液在进行所述浇铸时可以采用相同规格的模具,以保证两种铸锭的长宽保持一致;通过控制所述浇铸过程中的熔液体积,以获得不同高度的铸锭。As a preferred embodiment, in step (1), the length and width of the main segment ingot and the bonding segment ingot are the same; as a more preferred embodiment, the molten metal of the main segment and the bonding segment can be cast using molds of the same specifications to ensure that the length and width of the two ingots remain consistent; and ingots of different heights can be obtained by controlling the volume of the molten metal during the casting process.
作为一种优选的实施方式,在步骤(1)中,所述主体段铸锭的高度为1mm~4mm,包括但不限于1、1.5、2、2.5、3、3.5、4(mm)中的一种或是任意两种所构成的数值区间。As a preferred embodiment, in step (1), the height of the main section ingot is 1 mm to 4 mm, including but not limited to one of 1, 1.5, 2, 2.5, 3, 3.5, 4 (mm) or a numerical range consisting of any two of them.
作为一种优选的实施方式,在步骤(1)中,所述键合段铸锭的高度为1mm~3mm,包括但不限于1、1.5、2、2.5、3(mm)中的一种或是任意两种所构成的数值区间;当所述主体段铸锭的两侧均设置有所述键合段铸锭时,每个所述键合段铸锭的高度均独立地选自1mm~3mm。As a preferred embodiment, in step (1), the height of the bonding segment ingot is 1 mm to 3 mm, including but not limited to one of 1, 1.5, 2, 2.5, 3 (mm) or a numerical range consisting of any two of them; when the bonding segment ingots are provided on both sides of the main segment ingot, the height of each bonding segment ingot is independently selected from 1 mm to 3 mm.
作为一种优选的实施方式,在步骤(1)后还包括:独立地对所述主体段铸锭和所述键合段铸锭的待复合表面进行超声冲击处理、抛光处理或酸洗处理中的至少一种;作为一种更优选的实施方式,独立地对所述主体段铸锭和所述键合段铸锭的待复合表面依次进行超声冲击处理、抛光处理和酸洗处理。As a preferred embodiment, after step (1), it also includes: independently performing at least one of ultrasonic impact treatment, polishing treatment or pickling treatment on the surfaces to be composited of the main section ingot and the bonding section ingot; as a more preferred embodiment, independently performing ultrasonic impact treatment, polishing treatment and pickling treatment on the surfaces to be composited of the main section ingot and the bonding section ingot in sequence.
在本发明中采用超声冲击合金锭的待复合表面,一方面可以清洁合金锭表面,保证扩散焊接时不引入杂质;另一方面超声冲击以实现塑性变形储能和表面晶粒细化,细化合金锭表面的晶粒,降低扩散焊温度(约降低10℃~50℃左右),达到扩散焊接更加牢固的效果。In the present invention, ultrasonic impact is used to impact the surface of the alloy ingot to be composited. On the one hand, the surface of the alloy ingot can be cleaned to ensure that no impurities are introduced during diffusion welding; on the other hand, ultrasonic impact is used to realize plastic deformation energy storage and surface grain refinement, refine the grains on the surface of the alloy ingot, and reduce the diffusion welding temperature (by about 10°C to 50°C), so as to achieve a more solid diffusion welding effect.
作为一种更优选的实施方式,所述超声冲击处理的超声输出振幅为20μm~60μm,所述超声冲击处理的时间为30min~50min。As a more preferred embodiment, the ultrasonic output amplitude of the ultrasonic impact treatment is 20 μm to 60 μm, and the time of the ultrasonic impact treatment is 30 min to 50 min.
作为一种更优选的实施方式,所述抛光处理的操作方法可以以本领域的常规操作进行,如以抛光机、砂带机等对合金锭表面进行打磨,或以抛光垫、研磨盘等进行摩擦等,本发明不对所述抛光处理的操作进行限制;经所述抛光处理后的金属表面的粗糙度Ra<0.1μm。As a more preferred embodiment, the polishing operation method can be carried out according to conventional operations in the field, such as grinding the surface of the alloy ingot with a polishing machine, a sanding machine, etc., or rubbing with a polishing pad, a grinding disc, etc. The present invention does not limit the operation of the polishing treatment; the roughness of the metal surface after the polishing treatment Ra is less than 0.1μm.
作为一种更优选的实施方式,通过所述酸洗处理以去除铸锭表面的氧化膜;所述酸洗处理的时间为30s~60s,所述酸洗处理所采用的酸包括但不限于盐酸、硫酸、硝酸等,所述酸洗处理所采用的酸的浓度为4mol/L~6mol/L。As a more preferred embodiment, the oxide film on the surface of the ingot is removed by the pickling treatment; the time of the pickling treatment is 30s to 60s, the acid used in the pickling treatment includes but is not limited to hydrochloric acid, sulfuric acid, nitric acid, etc., and the concentration of the acid used in the pickling treatment is 4mol/L to 6mol/L.
作为一种优选的实施方式,在步骤(2)前还包括:打磨所述键合段铸锭和所述主体段铸锭至光滑,以便于后续步骤中界面处的扩散熔合;所述打磨包括机械抛光、化学抛光、电化学抛光、喷砂等方式中的任意一种,但需要注意的是,针对所述铸锭高度的限定应当是基于打磨后的高度而决定的。As a preferred embodiment, before step (2), it also includes: grinding the bonding segment ingot and the main segment ingot until they are smooth to facilitate diffusion fusion at the interface in subsequent steps; the grinding includes any one of mechanical polishing, chemical polishing, electrochemical polishing, sand blasting, etc., but it should be noted that the limitation on the ingot height should be determined based on the height after grinding.
作为一种优选的实施方式,在步骤(2)中,通过在相互接触的主体段和键合段的铸锭的表面,通过温度和压力的作用,局部发生塑性变形,原子间产生相互扩散,从而在界面接触处形成扩散段合金,以实现段间的扩散连接;在本发明中可以通过压具进行所述固定施压,所述施压的压力值为100MPa~500MPa,包括但不限于100、150、200、250、300、350、400、450、500(MPa)中的一种或是任意两种所构成的数值区间。As a preferred embodiment, in step (2), local plastic deformation occurs on the surface of the ingot of the main segment and the bonding segment in contact with each other due to the action of temperature and pressure, and mutual diffusion occurs between atoms, thereby forming a diffusion segment alloy at the interface contact to achieve diffusion connection between segments; in the present invention, the fixed pressure can be performed by a press, and the pressure value of the pressure is 100MPa to 500MPa, including but not limited to one of 100, 150, 200, 250, 300, 350, 400, 450, 500 (MPa) or a numerical range composed of any two of them.
作为一种优选的实施方式,在步骤(2)中,所述保温处理的温度不低于200℃;且所述保温处理的温度小于所述主体段铸锭和所述键合段铸锭的熔点;所述保温处理的保温时间为3h~10h,包括但不限于3、3.5、4、4.5、5、5.5、6、6.5、7、7.5、8、8.5、9、9.5、10(h)中的一种或是任意两种所构成的数值区间。As a preferred embodiment, in step (2), the temperature of the insulation treatment is not lower than 200°C; and the temperature of the insulation treatment is lower than the melting point of the main section ingot and the bonding section ingot; the insulation time of the insulation treatment is 3h to 10h, including but not limited to 3, 3.5, 4, 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5, 10 (h) or a numerical range composed of any two of them.
作为一种更优选的实施方式,在步骤(2)中,所述保温处理在真空条件下进行。As a more preferred embodiment, in step (2), the heat preservation treatment is carried out under vacuum conditions.
作为一种优选的实施方式,在步骤(3)中,所述轧制包括:将扩散界面紧贴轧辊,且平行于轧制方向进行辊压。如图3、图4分别给出了两种情况下的轧制过程示意图,进行若干次轧制后所得到的前体产品如图5所示。As a preferred embodiment, in step (3), the rolling includes: placing the diffusion interface close to the roller and rolling in parallel to the rolling direction. Figures 3 and 4 show schematic diagrams of the rolling process in two cases, respectively. The precursor product obtained after several rollings is shown in Figure 5.
作为一种优选的实施方式,在步骤(3)中,所述轧制通过多道次进行,具体的轧制次数依据所述复合锭的厚度和键合线产品的预设直径而定,并得到厚度<1mm的合金带;在一些常规的实施方法中,所述轧制包括但不限于2、3、4、5、6、7、8、9、10、11、12、13、14、15、16、17、18、19、20次等。As a preferred embodiment, in step (3), the rolling is carried out through multiple passes, and the specific number of rolling passes is determined according to the thickness of the composite ingot and the preset diameter of the bonding wire product, and an alloy strip with a thickness of less than 1 mm is obtained; in some conventional implementation methods, the rolling includes but is not limited to 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20 times, etc.
作为一种优选的实施方式,在步骤(3)中,每次所述轧制的变形量为10%~30%,其中,变形量为本领域常规的定义:即轧制前后的厚度差与轧制前厚度的比值;作为一种可选的实施方式,每次所述轧制的变形量包括但不限于10%、12%、14%、15%、16%、18%、20%、22%、24%、25%、26%、28%、30%中的一种或是任意两种所构成的数值区间。As a preferred embodiment, in step (3), the deformation amount of each rolling is 10% to 30%, wherein the deformation amount is the conventional definition in the art: that is, the ratio of the thickness difference before and after rolling to the thickness before rolling; as an optional embodiment, the deformation amount of each rolling includes but is not limited to 10%, 12%, 14%, 15%, 16%, 18%, 20%, 22%, 24%, 25%, 26%, 28%, 30% or a numerical range consisting of any two of them.
作为一种优选的实施方式,在步骤(4)中,所述退火处理的温度为200℃~500℃,包括但不限于200、250、300、350、400、450、500(℃)中的一种或是任意两种所构成的数值区间;所述退火处理的时间为120min~180min,包括但不限于120、130、140、150、160、170、180(min)中的一种或是任意两种所构成的数值区间。As a preferred embodiment, in step (4), the annealing temperature is 200°C to 500°C, including but not limited to one of 200, 250, 300, 350, 400, 450, 500 (°C) or a numerical range consisting of any two of them; the annealing time is 120min to 180min, including but not limited to one of 120, 130, 140, 150, 160, 170, 180 (min) or a numerical range consisting of any two of them.
作为一种优选的实施方式,在步骤(4)中,所述退火处理在真空状态下进行。As a preferred embodiment, in step (4), the annealing treatment is performed under a vacuum state.
作为一种优选的实施方式,在步骤(4)中,所述退火处理后还包括剪裁处理,所述剪裁处理通过激光进行切割,并获得特定长宽需求的键合线产品;或者,所述退火处理后还包括设置分切线,以便在使用过程中,通过简单的分离操作就可以获得若干独立的键合线产品。如图5所示给出一种分切线示意图。As a preferred embodiment, in step (4), the annealing treatment further includes a trimming treatment, wherein the trimming treatment is performed by laser cutting to obtain a bonding wire product with a specific length and width requirement; or, the annealing treatment further includes setting a slitting line, so that during use, a number of independent bonding wire products can be obtained by a simple separation operation. A schematic diagram of a slitting line is shown in FIG5 .
作为一种更优选的实施方式,在步骤(4)后,将所述剪裁处理后的余料进行机械分离,并用于重新熔炼铸锭和钎料合金;其中,存在扩散元素的余料主要用于钎料合金的制备。As a more preferred embodiment, after step (4), the trimming residue is mechanically separated and used for remelting ingots and solder alloys; wherein the residue containing diffusing elements is mainly used for the preparation of solder alloys.
实施例1Example 1
(1)合金锭制备(1) Alloy ingot preparation
通过真空熔炼炉分别将用于键合线主体部分的纯铜原料和用于键合部分的金钯合金(3wt.%钯)进行熔炼,获得成分均匀的液态金属;然后分别在尺寸大小相同的长方体模具(模具长宽为20cm*1cm)中浇铸,浇铸时用于键合部分的液态金属所浇铸的体积小于用于键合线主体部分所用的液态金属,然后在室温下冷却凝固,得到厚度为4mm主体段铸锭和厚度为3mm的键合段铸锭。The pure copper raw material for the main part of the bonding wire and the gold-palladium alloy (3wt.% palladium) for the bonding part are melted in a vacuum melting furnace to obtain liquid metals with uniform composition; then they are cast in rectangular molds of the same size (the length and width of the mold are 20cm*1cm), and the volume of the liquid metal used for the bonding part is smaller than the liquid metal used for the main part of the bonding wire. Then they are cooled and solidified at room temperature to obtain a main section ingot with a thickness of 4mm and a bonding section ingot with a thickness of 3mm.
(2)表面处理(2) Surface treatment
通过超声冲击设备处理铜锭和金钯铸锭的待复合表面,超声输出振幅设定为40μm,冲击时间设定为40min;待超声冲击结束后分别将表面打磨光滑(Ra<0.1μm),再通过盐酸溶液(5mol/L)进行表面酸洗,酸洗时间为40s,而后洗去残余酸液,干燥。The surfaces of the copper ingot and the gold-palladium ingot to be composited were treated by ultrasonic impact equipment, the ultrasonic output amplitude was set to 40 μm, and the impact time was set to 40 min; after the ultrasonic impact was completed, the surfaces were polished smooth (Ra < 0.1 μm), and then the surfaces were pickled with hydrochloric acid solution (5 mol/L) for 40 s, and then the residual acid was washed away and dried.
(3)扩散连接(3) Diffusion bonding
将铜铸锭放置于金钯铸锭的单侧,尺寸相同且面积较大的表面紧密贴合,并采用工装夹具固定,施压300MPa,然后将固定好的金属铸锭放置于真空扩散炉中进行高温扩散连接,保温时间为3h,真空炉温度为900℃。The copper ingot is placed on one side of the gold-palladium ingot, with the surfaces of the same size and larger area fitting tightly together, and fixed with a fixture and a pressure of 300 MPa. The fixed metal ingot is then placed in a vacuum diffusion furnace for high-temperature diffusion connection. The insulation time is 3 hours, and the vacuum furnace temperature is 900°C.
(4)多道次轧制(4) Multi-pass rolling
将扩散完成后的铸锭在轧机上轧制,扩散界面紧贴轧辊,且平行于轧制方向,经过多道次轧制,且每道次轧制时合金的变形量在40%左右,获得一定宽度且厚度为1mm的合金带。轧制完成后,将合金带再次放置于真空炉中进行退火处理以消除残余应力,退火温度为200℃,退火时间为180min。The ingot after diffusion is rolled on the rolling mill, with the diffusion interface close to the roller and parallel to the rolling direction. After multiple rolling passes, the deformation of the alloy is about 40% during each rolling pass, and an alloy strip with a certain width and a thickness of 1mm is obtained. After rolling, the alloy strip is placed in a vacuum furnace again for annealing to eliminate residual stress. The annealing temperature is 200°C and the annealing time is 180 minutes.
(5)激光裁剪(5) Laser cutting
采用激光切割机对退火完成后的合金带进行裁剪,并裁边,获得20mm长、厚度为1mm的复合型键合线。The alloy strip after annealing is cut and trimmed by a laser cutting machine to obtain a composite bonding wire with a length of 20 mm and a thickness of 1 mm.
实施例2Example 2
与实施例1基本相同,区别仅在于:It is basically the same as Example 1, except that:
步骤(1)中,金钯合金替换为银金钯合金(5wt.%钯、2wt.%金);In step (1), the gold-palladium alloy is replaced with a silver-gold-palladium alloy (5 wt.% palladium, 2 wt.% gold);
步骤(3)中,保温时间为5h,真空炉温度为850℃;In step (3), the holding time is 5 h and the vacuum furnace temperature is 850° C.;
步骤(4)中,每道次轧制时合金的变形量在30%左右,获得一定宽度且厚度为0.5mm的合金带。In step (4), the deformation of the alloy is about 30% in each rolling process, and an alloy strip with a certain width and a thickness of 0.5 mm is obtained.
实施例3Example 3
与实施例2基本相同,区别仅在于:It is basically the same as Example 2, except that:
步骤(1)中,纯铜替换为纯银,金钯合金替换为银金钯合金(6wt.%钯、2wt.%金);In step (1), pure copper is replaced by pure silver, and gold-palladium alloy is replaced by silver-gold-palladium alloy (6wt.% palladium, 2wt.% gold);
步骤(3)中,在铜锭的两侧均放置有银金钯铸锭;In step (3), silver-gold-palladium ingots are placed on both sides of the copper ingot;
步骤(4)中,每道次轧制时合金的变形量在50%左右,获得一定宽度且厚度为0.05mm的合金带;退火温度为250℃;In step (4), the deformation of the alloy during each rolling process is about 50%, and an alloy strip with a certain width and a thickness of 0.05 mm is obtained; the annealing temperature is 250° C.;
步骤(5)中,键合线长度为10mm。In step (5), the bonding wire length is 10 mm.
实施例4Example 4
与实施例1基本相同,区别仅在于:It is basically the same as Example 1, except that:
步骤(1)中,纯铜替换为银基合金(Ag-4Pd),金钯合金替换为银铋合金(5wt.%铋);同时,浇铸时用于键合部分的液态金属所浇铸的体积大于用于键合线主体部分所用的液态金属,然后在室温下冷却凝固,得到厚度为3mm主体段铸锭和厚度为5mm的键合段铸锭;In step (1), pure copper is replaced by a silver-based alloy (Ag-4Pd), and gold-palladium alloy is replaced by a silver-bismuth alloy (5wt.% bismuth); at the same time, during casting, the volume of the liquid metal used for the bonding part is larger than the liquid metal used for the main body of the bonding wire, and then cooled and solidified at room temperature to obtain a main body section ingot with a thickness of 3 mm and a bonding section ingot with a thickness of 5 mm;
步骤(3)中,施压500MPa。In step (3), a pressure of 500 MPa is applied.
实施例5Example 5
与实施例1基本相同,区别仅在于:It is basically the same as Example 1, except that:
步骤(1)中,纯铜替换为铜基合金(Cu-3Pd),金钯合金替换为纯金;同时,浇铸时用于键合部分的液态金属所浇铸的体积大于用于键合线主体部分所用的液态金属,然后在室温下冷却凝固,得到厚度为1mm主体段铸锭和厚度为3mm的键合段铸锭;In step (1), pure copper is replaced by copper-based alloy (Cu-3Pd), and gold-palladium alloy is replaced by pure gold; at the same time, the volume of liquid metal cast for the bonding part is larger than the liquid metal used for the main body of the bonding wire during casting, and then cooled and solidified at room temperature to obtain a main body section ingot with a thickness of 1 mm and a bonding section ingot with a thickness of 3 mm;
步骤(3)中,施压100MPa。In step (3), a pressure of 100 MPa is applied.
对比例:4N纯金键合线,规格与实施例1一致。Comparative Example: 4N pure gold bonding wire, the specifications are consistent with those of Example 1.
试验例:耐老化性能实验Test example: Aging resistance test
将单根键合线穿入键合机的劈刀中,采用键合机在铝基板上进行键合形成键合点,而后放入温度冲击试验箱中进行热冲击实验,选用-55~150℃作为热冲击条件,循环周期1h/周,于极限温度停留30min,实验循环600次终止。A single bonding wire is inserted into the splitter of the bonding machine, and a bonding point is formed on the aluminum substrate using the bonding machine. It is then placed in a temperature shock test chamber for a thermal shock test. -55 to 150°C is selected as the thermal shock condition, the cycle period is 1h/week, and it stays at the extreme temperature for 30min. The experiment is terminated after 600 cycles.
将键合点解剖,分析其微观组织,在金相显微镜与扫描电子显微镜观察下观测键合点界面中间化合物的生长深度,以衡量老化的程度。试验结果如下表1所示。The bonding point was dissected and its microstructure was analyzed. The growth depth of the intermediate compound at the bonding point interface was observed under a metallographic microscope and a scanning electron microscope to measure the degree of aging. The test results are shown in Table 1 below.
表1Table 1
尽管已用具体实施例来说明和描述了本发明,然而应意识到,以上各实施例仅用以说明本发明的技术方案,而非对其限制;本领域的普通技术人员应当理解:在不背离本发明的精神和范围的情况下,可以对前述各实施例所记载的技术方案进行修改,或者对其中部分或者全部技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本发明各实施例技术方案的范围;因此,这意味着在所附权利要求中包括属于本发明范围内的所有这些替换和修改。Although the present invention has been illustrated and described with specific embodiments, it should be appreciated that the above embodiments are only used to illustrate the technical solutions of the present invention rather than to limit it. Those skilled in the art should understand that the technical solutions described in the above embodiments may be modified, or some or all of the technical features thereof may be replaced by equivalents without departing from the spirit and scope of the present invention. However, these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present invention. Therefore, this means that all such replacements and modifications within the scope of the present invention are included in the appended claims.
Claims (10)
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