CN1203103C - Naphthyl type epoxy resin and its preparing method - Google Patents
Naphthyl type epoxy resin and its preparing method Download PDFInfo
- Publication number
- CN1203103C CN1203103C CN 03113923 CN03113923A CN1203103C CN 1203103 C CN1203103 C CN 1203103C CN 03113923 CN03113923 CN 03113923 CN 03113923 A CN03113923 A CN 03113923A CN 1203103 C CN1203103 C CN 1203103C
- Authority
- CN
- China
- Prior art keywords
- epoxy
- dinaphthalene
- dihydroxyl
- resins
- epoxy chloropropane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 125000001624 naphthyl group Chemical group 0.000 title claims abstract description 19
- 238000000034 method Methods 0.000 title claims abstract description 18
- 229920000647 polyepoxide Polymers 0.000 title abstract description 15
- 239000003822 epoxy resin Substances 0.000 title abstract description 13
- LRWZZZWJMFNZIK-UHFFFAOYSA-N 2-chloro-3-methyloxirane Chemical compound CC1OC1Cl LRWZZZWJMFNZIK-UHFFFAOYSA-N 0.000 claims abstract description 45
- 239000000203 mixture Substances 0.000 claims abstract description 12
- 239000003513 alkali Substances 0.000 claims abstract description 11
- 239000004593 Epoxy Substances 0.000 claims description 69
- 229920005989 resin Polymers 0.000 claims description 67
- 239000011347 resin Substances 0.000 claims description 67
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 51
- 238000006243 chemical reaction Methods 0.000 claims description 16
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 12
- 238000001914 filtration Methods 0.000 claims description 10
- 238000005406 washing Methods 0.000 claims description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 8
- 238000006266 etherification reaction Methods 0.000 claims description 7
- 239000002585 base Substances 0.000 claims description 6
- 238000002360 preparation method Methods 0.000 claims description 5
- 238000007363 ring formation reaction Methods 0.000 claims description 5
- 239000011261 inert gas Substances 0.000 claims description 4
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims description 4
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 claims description 2
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 claims description 2
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 claims description 2
- 238000009833 condensation Methods 0.000 claims description 2
- 230000005494 condensation Effects 0.000 claims description 2
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 abstract description 5
- 230000009477 glass transition Effects 0.000 abstract description 3
- 239000003054 catalyst Substances 0.000 abstract 1
- 230000002349 favourable effect Effects 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 11
- 230000006835 compression Effects 0.000 description 7
- 238000007906 compression Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 6
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 5
- 230000035484 reaction time Effects 0.000 description 5
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 4
- 150000002790 naphthalenes Chemical class 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- 239000002250 absorbent Substances 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 229940015043 glyoxal Drugs 0.000 description 3
- 239000004843 novolac epoxy resin Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- AJARGPYJMXPADH-UHFFFAOYSA-N 1,1'-biphenyl methanediamine Chemical compound NCN.C1(=CC=CC=C1)C1=CC=CC=C1 AJARGPYJMXPADH-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- -1 phenolic aldehyde Chemical class 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000002305 electric material Substances 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
Abstract
Description
| Oxirane value | 0.3696 | 0.4015 | 0.4353 |
| Solidifying agent | Mphenylenediamine | Dicyanodiamide | Phenylbenzene diamino methane |
| Glass transition temperature Tg (℃) | 153.69℃ | 147.52℃ | 163.54℃ |
| Ultimate compression strength (MPa) | 87.6 | 68.7 | 90.5 |
Claims (10)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03113923 CN1203103C (en) | 2003-03-17 | 2003-03-17 | Naphthyl type epoxy resin and its preparing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03113923 CN1203103C (en) | 2003-03-17 | 2003-03-17 | Naphthyl type epoxy resin and its preparing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1445256A CN1445256A (en) | 2003-10-01 |
| CN1203103C true CN1203103C (en) | 2005-05-25 |
Family
ID=27814763
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 03113923 Expired - Fee Related CN1203103C (en) | 2003-03-17 | 2003-03-17 | Naphthyl type epoxy resin and its preparing method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1203103C (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101024680B (en) * | 2007-04-05 | 2010-09-01 | 中国科学院广州化学研究所 | Binaphthyl-radicle-contained di-phenol A-type resin and its preparing method |
| WO2014073600A1 (en) * | 2012-11-08 | 2014-05-15 | 日本化薬株式会社 | Epoxy resin mixture, epoxy resin composition, and cured product thereof |
| WO2015008560A1 (en) * | 2013-07-19 | 2015-01-22 | Dic株式会社 | Compound containing phenolic hydroxy group, photosensitive composition, composition for resists, resist coating film, curable composition, composition for resist underlayer films, and resist underlayer film |
| CN105062304A (en) * | 2015-07-22 | 2015-11-18 | 安徽圣德建材科技有限公司 | High-flame-retardant corrosion-resisting powder coating |
| CN105062303A (en) * | 2015-07-22 | 2015-11-18 | 安徽圣德建材科技有限公司 | Heat-resistant flame-retardant powder coating |
| CN111303382B (en) * | 2020-03-03 | 2020-11-10 | 深圳市勇泰运科技有限公司 | A rigid-flex integrated epoxy resin and reworkable underfill |
-
2003
- 2003-03-17 CN CN 03113923 patent/CN1203103C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1445256A (en) | 2003-10-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| EE01 | Entry into force of recordation of patent licensing contract |
Assignee: Yike Inks & Paints (Shengzhen) Co., Ltd. Assignor: Guangzhou Inst. of Chemistry, Chinese Academy of Sciences Contract fulfillment period: 2009.5.20 to 2014.5.20 contract change Contract record no.: 2009990000673 Denomination of invention: Naphthyl type epoxy resin and its preparing method Granted publication date: 20050525 License type: Exclusive license Record date: 2009.6.17 |
|
| LIC | Patent licence contract for exploitation submitted for record |
Free format text: EXCLUSIVE LICENSE; TIME LIMIT OF IMPLEMENTING CONTACT: 2009.5.20 TO 2014.5.20; CHANGE OF CONTRACT Name of requester: YIKE INK+PAINT(SHENZHEN)CO.,LTD Effective date: 20090617 |
|
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20050525 Termination date: 20130317 |


