Disclosure of Invention
In order to solve the technical problems, the application provides an online precision calibration method of a laser line module in a high-low temperature environment so as to solve the existing problems.
The online precision calibration method of the laser line module in the high-low temperature environment adopts the following technical scheme:
the embodiment of the application provides an online precision calibration method of a laser line module in a high-low temperature environment, which comprises the following steps:
acquiring horizontal and vertical offset of a projected facula of a laser line module, and acquiring the temperature of the position of a laser transmitter;
the method comprises the steps of analyzing temperature change conditions of laser emitter positions at each acquisition time to obtain high and low temperature change sequences at each acquisition time, extracting horizontal and vertical residual sequences at each acquisition time according to horizontal and vertical offset of light spots at each acquisition time, and respectively obtaining horizontal offset interference degrees and vertical offset interference degrees at each acquisition time according to correlation between the high and low temperature change sequences at each acquisition time and the horizontal and vertical residual sequences, so as to obtain horizontal interference duty ratio and vertical interference duty ratio;
Respectively obtaining horizontal and vertical interference variation amounts of each acquisition time according to the variation trend of the horizontal offset interference degree and the vertical offset interference degree in a preset time before each acquisition time, and respectively obtaining compensation adjustment factors of the horizontal offset and the vertical offset of each acquisition time by combining the horizontal interference ratio and the vertical interference ratio so as to carry out compensation correction on the horizontal offset and the vertical offset to obtain compensation correction values of the horizontal offset and the vertical offset;
And calibrating the projection accuracy of the laser line module according to the horizontal offset and the vertical offset of the projection facula of the laser line module after compensation and correction.
Preferably, the method for acquiring the high-low temperature change sequence at each acquisition time comprises the following steps:
Carrying out normalization processing on the temperatures in a preset time period before each acquisition time, obtaining a temperature sequence of each acquisition time according to time sequence arrangement, fitting the temperature sequence, and obtaining a temperature gradient sequence of each acquisition time according to time sequence arrangement by fitting slopes of all temperatures after fitting;
multiplying the temperature sequence at each acquisition time by elements at the same position in the temperature gradient sequence, and normalizing, wherein normalized results obtained at all positions form high and low temperature change sequences at each acquisition time.
Preferably, the extracting the horizontal and vertical residual sequences at each acquisition time further comprises respectively carrying out normalization processing on the horizontal offset and the vertical offset in a preset time before each acquisition time, arranging the normalized data according to time sequence to obtain a horizontal offset sequence and a vertical offset sequence at each acquisition time, and respectively carrying out time sequence decomposition on the horizontal offset sequence and the vertical offset sequence at each acquisition time to obtain the horizontal residual sequence at each acquisition time.
Preferably, the method for calculating the horizontal offset interference degree at each acquisition time comprises the following steps:
;
In the formula, For the level shift interference at the t-th acquisition instant,For the number of elements in the horizontal residual sequence at the t-th acquisition instant,The correlation degree between the horizontal residual sequence and the high-low temperature change sequence at the t-th acquisition time,AndThe ith element and the ith-1 element in the horizontal residual sequence at the t-th acquisition time are respectively adopted.
Preferably, the method for acquiring the horizontal interference ratio and the vertical interference ratio comprises the following steps:
and counting the sum value of the horizontal offset interference degree and the vertical offset interference degree at each acquisition time, and taking the ratio of the horizontal offset interference degree, the vertical offset interference degree and the sum value as the horizontal interference duty ratio and the vertical interference duty ratio at each acquisition time respectively.
Preferably, the calculation method of the horizontal interference variation at the current acquisition time comprises the following steps:
wherein F is the horizontal interference variation of the current acquisition time, For the number of elements in the horizontal interference sequence at the current acquisition instant,AndThe j-1 elements in the horizontal interference sequence at the current acquisition time are respectively the j-1 elements.
Preferably, the method for acquiring the horizontal interference sequence at the current acquisition time further comprises the step of arranging the horizontal offset interference degrees of all the acquisition times in a preset time before the current acquisition time according to a time sequence to obtain the horizontal interference sequence at the current acquisition time.
Preferably, the calculation method of the compensation adjustment factor of the horizontal offset at the current acquisition time is as follows:
In the formula (I), in the formula (II), For the compensation adjustment factor of the horizontal offset at the current acquisition instant,In order to adjust the proportion, F is the horizontal disturbance variable quantity at the current acquisition moment,The horizontal interference duty ratio at the current acquisition time.
Preferably, the method for calculating the compensation correction value of the horizontal offset at the current acquisition time comprises the following steps:
In the formula (I), in the formula (II), For the compensation correction value of the horizontal offset at the current acquisition instant,For the compensation adjustment factor of the horizontal offset at the current acquisition instant,Is the horizontal offset of the current acquisition time.
Preferably, the calibration of the projection precision of the laser line module further comprises the steps of taking the compensation correction values of horizontal offset and vertical offset at the current moment as the horizontal offset compensation amount and the vertical offset compensation amount of the laser calibrator respectively, acquiring the calibration directions of the horizontal offset and the vertical offset through the positive and negative of the horizontal offset compensation amount and the vertical offset compensation amount, and acquiring the calibration forces of the horizontal offset and the vertical offset respectively by utilizing the absolute value of the horizontal offset compensation amount and the absolute value of the vertical offset compensation amount.
The application has at least the following beneficial effects:
The application considers that the prior art does not fully analyze the influence of the high-low temperature change in the laser line emission environment on the light spot offset, so that the offset compensation in different directions of the laser line module is easy to generate the problem of under compensation or over compensation, and the precision of the projection calibration of the laser line module is influenced;
Further, the application accurately measures the light spot offset interference characteristics in different projection directions by considering the relation between random interference error changes of the light spot offset in different directions and the change characteristics of high and low temperatures in the laser line emission environment, and obtains offset interference duty ratios in different projection directions for carrying out error compensation on the offset in different directions more accurately;
Meanwhile, the application fully considers the interference influence of high and low temperature change in the laser line emission environment on the light spot offset, combines the offset interference duty ratio in different projection directions and the trend change of offset interference in different directions, sets the compensation adjustment factor in the horizontal direction, compensates and corrects the horizontal offset and the vertical offset, solves the problem that the offset compensation in different directions of the laser line module is easy to cause under compensation or over compensation, and improves the precision of the projection calibration of the laser line module.
Detailed Description
In order to further describe the technical means and effects adopted for achieving the preset purpose of the application, the following detailed description is given below of the specific implementation, structure, characteristics and effects of the on-line precision calibration method of the laser line module set forth in the present application under the high-low temperature environment in combination with the accompanying drawings and the preferred embodiments. In the following description, different "one embodiment" or "another embodiment" means that the embodiments are not necessarily the same. Furthermore, the particular features, structures, or characteristics of one or more embodiments may be combined in any suitable manner.
Unless otherwise defined, terms such as "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a circuit structure, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such article or apparatus. Without further limitation, the statement "comprises an" or "comprising" does not exclude that an additional identical element is present in an article or device comprising the element. In addition, the term "and/or" as used herein includes any and all combinations of one or more of the associated listed items. All technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs.
The specific scheme of the on-line precision calibration method of the laser line module provided by the application under the high-low temperature environment is specifically described below with reference to the accompanying drawings.
The method for calibrating on-line precision of a laser line module in a high-low temperature environment provided by an embodiment of the application, referring to fig. 1 specifically, comprises the following steps:
Step one, acquiring horizontal and vertical offset of a projected light spot of a laser line module, and acquiring the temperature of the position of a laser transmitter.
In building construction by using a laser line projector, in order to ensure the quality of building construction, the projection precision of a laser line module in the laser line projector needs to be calibrated. The laser line module is used as a laser emission part and comprises a laser emitter, a laser calibrator, a temperature sensor, a mechanical structure and a driving circuit.
Meanwhile, temperature data on the position of the laser transmitter is acquired in real time through a temperature sensor and used for analyzing the interference influence of high-low temperature change in the environment on the spot offset, wherein the data acquisition frequency is 10Hz, and an implementer can carry out self-adaptive value on the acquisition frequency according to actual conditions.
Further, in order to facilitate the follow-up accurate analysis of the interference influence of the high-low temperature change on the spot offset in the laser line emission environment, the horizontal offset, the vertical offset and the temperature data in a preset time period before each acquisition time are subjected to extremely poor normalization processing respectively, and the normalized data are arranged according to a time sequence to obtain a horizontal offset sequence, a vertical offset sequence and a temperature sequence at each acquisition time. Preferably, in this embodiment, the preset time period is 1min.
Analyzing the temperature change condition of the laser transmitter at each acquisition time to obtain high and low temperature change sequences at each acquisition time, extracting horizontal and vertical residual sequences at each acquisition time according to the horizontal and vertical offset of the light spot at each acquisition time, and respectively obtaining the horizontal offset interference degree and the vertical offset interference degree at each acquisition time according to the correlation between the high and low temperature change sequences at each acquisition time and the horizontal and vertical residual sequences, thereby obtaining the horizontal interference duty ratio and the vertical interference duty ratio.
Because the light spot offset emitted by the laser line is interfered by the high and low temperature change in the environment, the precision of the projected light spot of the laser line module can be affected. Therefore, in order to more accurately determine the horizontal offset compensation amount and the vertical offset compensation amount of the laser line module, so as to calibrate the light spot projection precision of the laser line module, the interference influence of the high-low temperature change in the environment on the light spot offset amount needs to be fully considered.
In order to analyze the high and low temperature change condition in the laser line emitting environment, the temperature sequence at each collecting moment is used as the input of a least square fitting algorithm, a fitting function of the temperature sequence is obtained by using the least square fitting algorithm, fitting slopes of all data points in the temperature sequence are obtained by adopting a first order function derivation mode through the fitting function, the fitting slopes are arranged according to a time sequence, and a temperature gradient sequence at each collecting moment is obtained, wherein the least square fitting algorithm and the calculation of the fitting slopes are known techniques, and redundant description is omitted.
Generally, if the temperature in the laser line emitting environment is higher and the temperature gradient change is larger, the phenomenon of increasing the high temperature in the laser line emitting environment can be reflected, and the stability of the laser line module light spot projection is not maintained. Therefore, the temperature sequence at each acquisition time and the elements corresponding to the same position in the temperature gradient sequence are multiplied and subjected to extremely poor normalization, and the normalization results obtained at all the positions form high and low temperature change sequences at each acquisition time, so that the change characteristics of high and low temperatures in the laser line emission environment are reflected, and the interference influence of the high and low temperature change in the laser line emission environment on the light spot offset is more accurately identified.
Because the high-low temperature change in the laser line emitting environment can generate different interference effects on horizontal offset and vertical offset of the light spots, if the interference degree of the offset in a certain direction is higher, the offset in the certain direction is more required to be subjected to error compensation.
Therefore, the horizontal offset sequence and the vertical offset sequence at each acquisition time are respectively used as input of the STL time sequence decomposition (Seasonal and Trend decomposition using Loess), and the STL time sequence decomposition is utilized to respectively obtain the horizontal residual sequence and the vertical residual sequence at each acquisition time, wherein the STL time sequence decomposition is a known technology and redundant description is not made.
The horizontal residual sequence and the vertical residual sequence reflect random interference errors generated in the horizontal direction and the vertical direction when being influenced by high-low temperature change in the laser emission environment, and if the correlation between the random interference error change and the high-low temperature change in the laser emission environment is higher, the random interference error is more unstable, the influence interference characteristics of the high-low temperature change in the laser emission environment on the position of the projected light spot can be reflected.
Through the analysis, according to the correlation between the horizontal residual sequence and the high-low temperature change sequence at each acquisition time, the data difference in the horizontal residual sequence at each acquisition time is combined to calculate the horizontal offset interference degree at the t-th acquisition timeIn this embodiment, the specific calculation formula is:
;
In the formula, For the level shift interference at the t-th acquisition instant,For the number of elements in the horizontal residual sequence at the t-th acquisition instant,The correlation degree between the horizontal residual sequence and the high-low temperature change sequence at the t-th acquisition time,AndThe ith element and the ith-1 element in the horizontal residual sequence at the t-th acquisition time are respectively adopted.
The method for measuring the correlation degree can be mutual information degree, covariance or pearson correlation coefficient, and the mutual information degree is adopted to measure the correlation degree in the embodiment.
It can be understood that the interference degree of the horizontal offset reflects the interference effect of the high-low temperature change in the laser emission environment on the horizontal offset of the light spot, and the larger the interference degree of the horizontal offset is, the stronger the interference effect of the high-low temperature change in the laser emission environment on the horizontal offset of the light spot is, and the more the error compensation is needed for the offset in the direction.
Similarly, a calculation method of the horizontal offset interference degree is adopted, the vertical offset interference degree of each acquisition time is calculated according to the vertical residual sequence and the high-low temperature change sequence of each acquisition time, and the interference influence of the high-low temperature change in the laser emission environment on the vertical offset of the light spot is reflected.
Further, the sum value of the horizontal offset interference degree and the vertical offset interference degree at each acquisition time is calculated, the ratio of the horizontal offset interference degree and the vertical offset interference degree to the sum value is respectively used as the horizontal interference ratio and the vertical interference ratio at each acquisition time, and the greater the offset interference ratio in a certain direction is, the deeper the interference influence degree of the high-low temperature change in the laser line emitting environment on the light spot in the direction is, the more the offset in the direction is biased to be subjected to error compensation, so that the problem of under compensation or over compensation of the offset compensation is avoided.
And thirdly, respectively obtaining horizontal and vertical interference variable amounts of each acquisition time according to the change trend of the horizontal offset interference degree and the vertical offset interference degree in a preset time before each acquisition time, and respectively obtaining compensation adjustment factors of the horizontal offset and the vertical offset of each acquisition time by combining the horizontal interference duty ratio and the vertical interference duty ratio so as to carry out compensation correction on the horizontal offset and the vertical offset to obtain compensation correction values of the horizontal offset and the vertical offset.
In order to avoid the problem of under-compensation or over-compensation of offset compensation in different directions of the laser line module, besides considering the offset interference ratio in different directions, the trend change condition of offset interference in different directions needs to be considered, if the offset interference characteristic in a certain direction shows stronger trend change, the high-low temperature change in the laser emission environment can seriously interfere with the change of the facula offset, and the intensity of compensating the facula offset needs to be improved.
Therefore, for the current acquisition time, the horizontal offset interference degrees and the vertical offset interference degrees of all the acquisition times in a preset time period before the current acquisition time are respectively arranged according to the time sequence to respectively obtain the horizontal interference sequence and the vertical interference sequence of the current acquisition time, and preferably, in the embodiment, the preset time period is 1min.
Through the analysis, the horizontal interference variation quantity at the current acquisition time is calculated according to the change trend of elements in the horizontal interference sequence and the vertical interference sequence at the current acquisition timeIn this embodiment, the specific calculation formula is:
;
Wherein F is the horizontal interference variation of the current acquisition time, For the number of elements in the horizontal interference sequence at the current acquisition instant,AndThe j-1 elements in the horizontal interference sequence at the current acquisition time are respectively the j-1 elements.
The horizontal interference variation reflects the trend change of horizontal offset interference in a short time before the current moment, and the larger the horizontal interference variation is, the more serious the horizontal interference degree of the light spots projected by the laser line module is, and the more the strength of compensating the horizontal offset of the light spots is required to be improved.
Accordingly, the method of the embodiment is repeated to obtain the vertical interference variation at the current acquisition time.
Further, by means of the horizontal interference variable quantity and the horizontal interference duty ratio at the current acquisition time, a compensation adjustment factor in the horizontal direction is set, and a compensation correction value of the adjusted horizontal offset is calculated, so that the problem that under compensation or over compensation occurs to offset compensation in different directions of the laser line module is avoided.
Therefore, according to the horizontal interference variation, in combination with the horizontal interference duty ratio at the current acquisition time, the compensation adjustment factor of the horizontal offset at the current acquisition time is obtained, and preferably, the calculation formula in this embodiment is as follows:
;
In the formula, For the compensation adjustment factor of the horizontal offset at the current acquisition instant,In order to adjust the proportion, the range of the compensation adjustment factor is controlled to avoid the condition that the light spot offset compensation is too large or too small, the value is 0.5 in the embodiment, F is the horizontal interference variation of the current acquisition time,The horizontal interference duty ratio at the current acquisition time.
Further, according to the compensation adjustment factor, the horizontal offset of the current acquisition time is combined, and a compensation correction value of the horizontal offset of the current acquisition time is calculatedIn this embodiment, the specific calculation formula is:
;
In the formula, For the compensation correction value of the horizontal offset at the current acquisition instant,For the compensation adjustment factor of the horizontal offset at the current acquisition instant,Is the horizontal offset of the current acquisition time.
Accordingly, the method in this embodiment is repeated, the vertical interference variation in the current collection time can be obtained according to the vertical interference sequence in the current collection time and by adopting a calculation method of the horizontal interference variation, and the compensation correction value of the vertical offset in the current collection time can be obtained by adopting a calculation method of the compensation correction value through the vertical interference variation, the vertical interference duty ratio and the vertical offset in the current collection time.
In the embodiment, the influence of high-low temperature change in the laser line emission environment on the light spot offset is fully considered, the offset adjustment factors of horizontal offset and vertical offset are set through the offset interference duty ratio and the interference change quantity in different directions, and offset compensation in different directions is corrected through the offset adjustment factors of horizontal offset and vertical offset, so that the problem that under compensation or over compensation occurs in offset compensation in different directions is avoided, and the accuracy of subsequent projection calibration of a laser line module is improved.
And fourthly, calibrating the projection accuracy of the laser line module according to the horizontal offset and the vertical offset of the projection facula of the laser line module after compensation and correction.
Further, in order to calibrate the projection precision of the laser line module on line, the compensation correction values of the horizontal offset and the vertical offset at the current moment are respectively used as the horizontal offset compensation amount and the vertical offset compensation amount of the laser calibrator, the projection precision of the laser line module is calibrated through the laser calibrator in the laser line module, specifically, the direction of the horizontal offset and the vertical offset calibration is determined according to the positive and negative of the horizontal offset compensation amount and the vertical offset compensation amount, and the calibrated force of the horizontal offset and the vertical offset is obtained according to the absolute value of the horizontal offset compensation amount and the vertical offset compensation amount, so that the on-line precision calibration of the laser line module is realized, wherein the projection precision calibration of the laser calibrator is a known technology, and redundant description is not made.
It is appreciated that references to "one embodiment" or "some embodiments" or the like described in this specification mean that a particular feature, structure, or characteristic described in connection with the embodiment is included in one or more embodiments of the application. Thus, appearances of the phrases "in one embodiment," "in some embodiments," "in other embodiments," and the like in this specification are not necessarily all referring to the same embodiment, but mean "one or more but not all embodiments" unless expressly specified otherwise. The terms "comprising," "including," "having," and variations thereof mean "including but not limited to," unless expressly specified otherwise.
It should be noted that the sequence of the embodiments of the present application is only for description, and does not represent the advantages and disadvantages of the embodiments. And the foregoing description has been directed to specific embodiments of this specification. In addition, the processes depicted in the accompanying figures do not necessarily require the particular order shown, or sequential order, to achieve desirable results. In some embodiments, multitasking and parallel processing are also possible or may be advantageous. Meanwhile, the sequence number of each step in the embodiment does not mean that the execution sequence is sequential, and the execution sequence of each process should be determined by the function and the internal logic, and should not be construed as limiting the implementation process of the embodiment in the present specification.
Although the present application has been described in detail with reference to the foregoing embodiments, it should be understood by those skilled in the art that the foregoing embodiments may be modified or equivalents may be substituted for some of the features thereof, and that the modification or substitution does not depart from the scope of the embodiments of the present application.