CN121380902A - A coating, a cutting tool, its preparation method and application - Google Patents
A coating, a cutting tool, its preparation method and applicationInfo
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- CN121380902A CN121380902A CN202511548463.6A CN202511548463A CN121380902A CN 121380902 A CN121380902 A CN 121380902A CN 202511548463 A CN202511548463 A CN 202511548463A CN 121380902 A CN121380902 A CN 121380902A
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Abstract
The invention discloses a coating, a cutter and a preparation method and application thereof, wherein the coating comprises a Ti 1‑xAlxNy layer, and the texture coefficient of the Ti 1‑xAlxNy layer comprises at least one of the following conditions (a) - (d), (a) TC (111) is less than or equal to 1.3, (b) TC (200) is less than or equal to 1.3, (c) TC (220) is less than or equal to 1.2, and (d) TC (311) is less than or equal to 1.2. The crystal grains of the Ti 1‑xAlxNy coating are equiaxed crystals without obvious texture, and the toughness of the coating is obviously improved on the basis of ensuring the nano hardness of 30 Gpa of the coating. The coating has smooth surface and excellent cutting performance. The cutter has excellent toughness and anti-adhesion performance, and is suitable for wet cutting and dry cutting under severe working conditions, especially rough milling and turning of difficult-to-machine materials.
Description
Technical Field
The invention belongs to the technical field of cutters, and particularly relates to a coating, a cutter, a preparation method and application thereof.
Background
The high temperatures and high loads generated during high-speed metalworking place high demands on the mechanical and chemical stability of the cutting tools. With the increasing diversity of workpiece materials, it is a challenge to synthesize new wear resistant coatings that improve tool performance. It is known that TiN having a cubic structure has been widely used in the cutting tool industry, and a cemented carbide coating material having more excellent hardness, hot hardness and wear resistance can be obtained by substituting part of Ti with Al to form Ti 1-xAlx N phase.
The excellent performance of TiAlN coating is closely related to the microstructure thereof, the atomic radius (0.143 nm) of Al is smaller than the atomic radius (0.146 nm) of Ti, when Al atoms replace Ti atoms in TiN crystal lattice, the crystal plane spacing is reduced, the TiN crystal lattice is distorted, the dislocation movement can be restrained, and the hardness of the coating is further increased. In addition, when the TiAlN coating oxidizes, the top layer may form a dense Al 2O3 protective layer that exhibits a higher oxidation resistance than the TiN layer.
Initially, the synthesis of TiAlN coatings used PVD processes, but this process limited the highest aluminum content within the coating. In recent years, with the development of LPCVD technology, researchers have successfully synthesized textured fcc-Ti 1-xAlx N (x > 0.8) coatings.
Patent CN 105247099A discloses a CVD coated tool comprising a substrate and an abrasion resistant coating deposited by CVD and having a total thickness of 1 to 25 μm, wherein the abrasion resistant coating comprises a Ti 1-xAlxCyNz layer, wherein 0.7 +.x +.1, 0 +.y < 0.25 and 0.75 +.z < 1.15, and the Ti 1-xAlxCyNz layer has a preferred growth orientation of {111} texture as demonstrated by X-ray diffraction studies.
Patent CN 110100046A discloses a CVD coated tool comprising a substrate and a coated cutting tool, the coating of which comprises an inner layer of Ti 1-xAlx N4-14 μm thick, wherein the Ti 1-xAlx N layer has a face-centered cubic crystal structure, TC (111) >3. The scanning electron microscope image shows that the Ti 1-xAlx N layer is in a columnar microstructure.
The columnar crystal structure coating has obvious crystal preferred orientation (strong texture), the grain boundary of the columnar crystal structure coating is relatively straight and is approximately parallel to the growth direction, and the characteristic ensures that the columnar crystal structure coating has better wear resistance in the milling process, but cracks of the columnar crystal structure coating are easy to rapidly expand along the straight and continuous columnar grain boundary in the cutting process, especially in the intermittent cutting process of bearing high mechanical impact and thermal cycle. Namely, the columnar crystal coating has poor crack propagation resistance and insufficient toughness, is extremely easy to cause early spalling and tipping failure of the coating, and severely restricts the reliability and service life of the cutter when processing difficult-to-cut materials.
The coating with the nano granular equiaxed grain structure is reversely observed, and because the grains are multi-directional equiaxed, the grain boundary is tortuous and random in direction, and cracks can frequently deflect or diverge when encountering the tortuous grain boundary during expansion, so that more energy is consumed. In the field of cutter coating, the nano equiaxed crystal structure coating has more excellent toughness, tipping resistance and the like compared with the columnar crystal structure coating. For example, wet cutting and dry cutting under rough machining/severe working conditions, especially rough milling of difficult-to-machine materials, a combination of dual high combinations of a high-toughness substrate and a high-toughness coating is required, and the toughness of the columnar crystal Ti 1-xAlx N coating with single texture cannot be adapted.
Disclosure of Invention
The present invention aims to provide a coating that solves at least one of the problems and drawbacks set forth in the background art above.
In order to achieve the above purpose, the invention provides a coating, which comprises a Ti 1-xAlxNy layer, wherein the texture coefficient of the Ti 1-xAlxNy layer comprises at least one of the following conditions (a) - (d);
(a)TC(111)≤1.3;
(b)TC(200)≤1.3;
(c)TC(220)≤1.2;
(d)TC(311)≤1.2。
according to one of the coating technical schemes, the coating has at least the following beneficial effects:
the Ti 1-xAlxNy coating is subjected to process adjustment, the crystal grains are equiaxed crystals without obvious texture, and the toughness of the coating is obviously improved on the basis of ensuring the nano hardness of 30 Gpa of the coating.
The Ti 1-xAlxNy coating of the invention has smooth surface and excellent cutting performance.
The coated cutting tool has excellent toughness and anti-adhesion performance, and is suitable for wet cutting and dry cutting under severe working conditions, especially rough milling and turning of difficult-to-machine materials.
According to some embodiments of the invention, 0.2< x≤0.97 in the Ti 1-xAlxNy layer.
According to some embodiments of the invention, 0.5< y≤1.2 in the Ti 1-xAlxNy layer.
According to some embodiments of the invention, the grains of the Ti 1-xAlxNy layer are nanoparticulate.
According to some embodiments of the invention, the grains of the Ti 1-xAlxNy layer are equiaxed grain structures.
According to some embodiments of the invention, the grain size of the Ti 1-xAlxNy layer is 0 nm-50 nm.
According to some embodiments of the invention, the nano-hardness of the Ti 1-xAlxNy layer is >30GPa.
According to some embodiments of the invention, the Ti 1-xAlxNy layer has a thickness of 1 μm to 25 μm.
A second aspect of the invention provides a method of producing a coating according to the first aspect of the invention, comprising the step of depositing the Ti 1-xAlxNy layer by LPCVD.
According to some embodiments of the invention, a titanium source, a nitrogen source, and an aluminum source are selected for use in the LPCVD deposition process.
According to some embodiments of the invention, the titanium source comprises titanium chloride.
According to some embodiments of the invention, the aluminum source comprises aluminum chloride.
According to some embodiments of the invention, the nitrogen source comprises ammonia and/or nitrogen.
According to some embodiments of the invention, a carrier gas is also selected for the deposition process.
According to some embodiments of the invention, the carrier gas comprises hydrogen.
According to some embodiments of the invention, the LPCVD deposition process uses a first precursor gas and a second precursor gas, and the first precursor gas and the second precursor gas are mixed to produce a mixture.
According to some embodiments of the invention, the first precursor gas comprises a titanium source, an aluminum source, and a carrier gas;
according to some embodiments of the invention, the volume fraction of the titanium source in the gas mixture is 0.05% -0.2%.
According to some embodiments of the invention, the volume fraction of the aluminum source in the gas mixture is 0.3% -1.65%.
According to some embodiments of the invention, the second precursor gas includes a nitrogen source and a carrier gas.
According to some embodiments of the invention, the volume fraction of the nitrogen source in the gas mixture is 0.5% -20%.
According to some embodiments of the invention, the volume fraction of ammonia in the gas mixture is 0.5% -1.5%.
According to some embodiments of the invention, the volume fraction of nitrogen in the mixed gas is 5% -15%.
According to some embodiments of the invention, the temperature during the LPCVD deposition is 700-850 ℃.
According to some embodiments of the invention, the temperature during the LPCVD deposition is 750 ℃ to 800 ℃.
According to some embodiments of the invention, the pressure during the LPCVD deposition is 0.2kPa to 1.8kPa.
According to some embodiments of the invention, the pressure during the LPCVD deposition is 0.4kPa to 1.0kPa.
The third aspect of the invention also discloses a tool comprising a coating according to the first aspect of the invention.
According to some embodiments of the invention, the tool further comprises a base body.
According to some embodiments of the invention, the substrate comprises a hard material substrate.
According to some embodiments of the invention, the substrate comprises a cemented carbide substrate, a cermet substrate, a ceramic substrate, a steel substrate or a boron nitride substrate.
According to some embodiments of the invention, the substrate surface is further provided with a primer layer.
According to some embodiments of the invention, the primer layer comprises at least one of a TiN layer, a TiCN layer, and a TiC layer.
According to some embodiments of the invention, the thickness of the primer layer is 0.1 μm to 1.5 μm.
According to some embodiments of the invention, the tool comprises, in order from inside to outside, a substrate, a primer layer, and a coating.
According to some embodiments of the invention, the coating is a plurality of layers.
Drawings
The present invention is further described below with reference to the accompanying drawings for the convenience of understanding by those skilled in the art.
Fig. 1 is an SEM morphology of a coating fracture of a tool according to an embodiment of the invention.
FIG. 2 is an X-ray diffraction pattern of a Ti 1-xAlxNy coating according to an embodiment of the present invention.
Fig. 3 is a cutting edge of an indexable cutting insert having Ti 1-xAlxNy (C) according to the present invention C after milling test (superalloy).
Fig. 4 is a cutting edge of an indexable cutting insert having a PVD coating according to the prior art after milling test (superalloy).
Detailed Description
Embodiments of the present invention are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the drawings are illustrative only and are not to be construed as limiting the invention.
In the description of the present invention, it should be understood that references to orientation descriptions such as upper, lower, front, rear, left, right, etc. are based on the orientation or positional relationship shown in the drawings, are merely for convenience of description of the present invention and to simplify the description, and do not indicate or imply that the apparatus or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the present invention.
In the description of the present invention, a number means one or more, a number means two or more, and greater than, less than, exceeding, etc. are understood to not include the present number, and above, below, within, etc. are understood to include the present number. The description of the first and second is for the purpose of distinguishing between technical features only and should not be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.
In the description of the present invention, unless explicitly defined otherwise, terms such as arrangement, installation, connection, etc. should be construed broadly and the specific meaning of the terms in the present invention can be reasonably determined by a person skilled in the art in combination with the specific contents of the technical scheme.
The present invention will be described in further detail with reference to the drawings and examples, in order to make the objects, technical solutions and advantages of the present invention more apparent. It should be understood that the particular embodiments described herein are illustrative only and are not intended to limit the invention, i.e., the embodiments described are merely some, but not all, of the embodiments of the invention. The components of the embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the invention, as presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be made by a person skilled in the art without making any inventive effort, are intended to be within the scope of the present invention.
It is an object of the present invention to provide a cutting tool for cutting metal machining, in particular a cutting insert for milling and turning of difficult-to-machine materials, which cutting insert has improved toughness compared to the prior art.
The object is achieved by a method for manufacturing a tool having a tool body made of cemented carbide, cermet, ceramics, steel or cubic boron nitride etc. superhard material and a single-or multi-layer wear protection coating applied to the body in a CVD process;
Wherein the wear resistant coating has at least one layer of Ti 1-xAlxNy deposited by LPCVD, wherein 0.2< x≤0.97 and 0.5 < y≤1.2, the Ti 1-xAlxNy layer having a thickness of 1 μm to 15 μm;
Wherein for preparing the Ti 1-xAlxNy layer:
a) Placing a body to be coated in a cylindrical CVD reactor;
b) Providing a mixture of two precursor gases to prepare a mixed gas, wherein a first precursor gas and a second precursor gas are mixed to prepare the mixed gas;
The mixed gas contains 0.05 to 0.2 volume percent of TiCl 4, 0.3 to 1.65 volume percent of AlCl 3, 0.5 to 1.5 volume percent of ammonia (NH 3) and 5 to 15 volume percent of nitrogen (N 2), and hydrogen (H 2) is used as carrier gas;
c) The two precursor gas mixtures were thoroughly mixed prior to preheating in a chamber and then passed into a CVD reactor at a temperature in the range 700 ℃ to 850 ℃ and a pressure in the range 0.2 kPa to 1.8 kPa.
According to the invention, the percentage by volume of the precursor gas mixture relates to the total volume of the gas mixture introduced into the reaction zone and comprising the first precursor gas mixture and the second precursor gas mixture.
The process implementation according to the invention makes it possible to produce a layer of Ti 1-xAlxNy having a stoichiometric coefficient 0.2< x≤0.97 and 0.5< y≤1.2 and of nanoparticulate structure, which coating does not have a significant preferential orientation for crystal growth.
The coating according to the invention has excellent properties in milling and turning machining of difficult-to-machine materials due to the high toughness compared to known coatings with TiAlCN and TiAlN layers, in particular coatings with a preferred orientation of crystal growth with respect to {111} planes of the crystal lattice.
In the CVD process according to the invention, two precursor gas mixtures are prepared, wherein the first precursor gas mixture contains chlorides of the metals Ti and Al (TiCl 4 and AlCl 3) and a carrier gas and the second precursor gas mixture contains N-donor ammonia (NH 3) and nitrogen (N 2) and a carrier gas.
According to the process of the present invention, the N donor is thoroughly mixed with chlorides of the metals Ti and Al in a preheating chamber before entering the CVD reactor.
In a preferred embodiment of the invention, the process temperature in the CVD reactor is in the range of 700 ℃ to 850 ℃, preferably in the range of 750 ℃ to 800 ℃.
If the process temperature in the reverse CVD reactor is too low, the deposition rate can fall to an uneconomical range.
In another preferred embodiment of the invention, the process pressure in the CVD reactor is in the range of 0.2 kPa to 1.0 kPa, preferably in the range of 0.4 kPa to 1.0 kPa.
If the process pressure in the CVD reactor is too high, the coating thickness at the tool edge may increase due to the dog bone effect. In contrast, the process pressure is too low to ensure uniform coating of the tool.
The invention also includes a cutting tool having a substrate made of cemented carbide and a single or multi-layer wear protection coating applied to the substrate in a CVD process, wherein the wear protection coating has at least one layer of Ti 1-xAlxNy deposited by LPCVD, wherein 0.2< x≤0.97 and 0.5< y≤1.2, the Ti 1-xAlxNy layer having a thickness of 1 μm to 15 μm and no significant crystallographic orientation, a texture coefficient TC (111) <1.3, TC (200) <1.3, TC (220) <1.2 and TC (311) <1.2.
In the present invention, TC (hkl) is defined as follows:
wherein, the
I (hkl) = (hkl) reflected measurement intensity,
I 0 (hkl) =standard intensity of (hkl) reflection according to standard powder diffraction data of applied JCPDF card No. 00-46-1200,
I (hkl) = (hkl) reflected measurement intensity,
I 0 (hkl) =standard intensity of (hk 1) i reflection according to standard powder diffraction data of applied JCPDF card No. 00-46-1200,
N=the number of reflections used in the calculation, whereby the (hk 1) reflections used are (111), (200), (220) and (311).
The texture coefficient of the Ti 1-xAlxNy layer is more than or equal to 0.7 and less than or equal to TC (111) and less than or equal to 1.3.
The texture coefficient of the Ti 1-xAlxNy layer is more than or equal to 1.1 and less than or equal to TC (111) and less than or equal to 1.3.
The texture coefficient of the Ti 1-xAlxNy layer is more than or equal to 1.1 and less than or equal to TC (111) and less than or equal to 1.2.
The texture coefficient of the Ti 1-xAlxNy layer is more than or equal to 0.8 and less than or equal to TC (200) and less than or equal to 1.3.
The texture coefficient of the Ti 1-xAlxNy layer is more than or equal to 0.8 and less than or equal to TC (200) and less than or equal to 1.1.
The texture coefficient of the Ti 1-xAlxNy layer is more than or equal to 0.8 and less than or equal to TC (200) and less than or equal to 0.9.
The texture coefficient of the Ti 1-xAlxNy layer is more than or equal to 1.0 and less than or equal to TC (220) and less than or equal to 1.2.
The texture coefficient of the Ti 1-xAlxNy layer is more than or equal to 1.0 and less than or equal to TC (220) and less than or equal to 1.1.
The texture coefficient of the Ti 1-xAlxNy layer is more than or equal to 0.9 and less than or equal to TC (311) and less than or equal to 1.2.
The texture coefficient of the Ti 1-xAlxNy layer is more than or equal to 0.9 and less than or equal to TC (311) and less than or equal to 1.1.
In the Ti 1-xAlxNy layer, x is more than or equal to 0.3 and less than or equal to 0.97.
In the Ti 1-xAlxNy layer, x is more than or equal to 0.4 and less than or equal to 0.97.
In the Ti 1-xAlxNy layer, x is more than or equal to 0.5 and less than or equal to 0.97.
In the Ti 1-xAlxNy layer, x is more than or equal to 0.6 and less than or equal to 0.97.
In the Ti 1-xAlxNy layer, x is more than or equal to 0.7 and less than or equal to 0.97.
In the Ti 1-xAlxNy layer, x is more than or equal to 0.8 and less than or equal to 0.97.
In the Ti 1-xAlxNy layer, x is more than or equal to 0.8 and less than or equal to 0.9.
In the Ti 1-xAlxNy layer, x is more than or equal to 0.84 and less than or equal to 0.9.
In the Ti 1-xAlxNy layer, y is more than or equal to 0.6 and less than or equal to 1.2.
In the Ti 1-xAlxNy layer, y is more than or equal to 0.7 and less than or equal to 1.2.
In the Ti 1-xAlxNy layer, y is more than or equal to 0.8 and less than or equal to 1.2.
In the Ti 1-xAlxNy layer, y is more than or equal to 0.9 and less than or equal to 1.2.
In the Ti 1-xAlxNy layer, y is more than or equal to 0.9 and less than or equal to 1.1.
In the Ti 1-xAlxNy layer, y is more than or equal to 0.9 and less than or equal to 1.06.
In the Ti 1-xAlxNy layer, y is more than or equal to 0.95 and less than or equal to 1.06.
The Ti 1-xAlxNy layer has at least 80% by volume face-centered-cubic (fcc) crystal structure, more preferably the Ti 1-xAlxNy layer has at least 85% by volume face-centered-cubic (fcc) crystal structure, still more preferably the Ti 1-xAlxNy layer has at least 90% by volume face-centered-cubic (fcc) crystal structure.
The Ti 1-xAlxNy layer crystal grains have a granular equiaxed crystal structure, and AlN precipitates with a hexagonal crystal structure (hcp) exist at the crystal boundary of the microcrystals.
Studies have shown that a softer AlN of hexagonal crystal structure (hcp) reduces the wear resistance of the coating, but precipitates at the grain boundaries lead to an increase in residual compressive stress due to volume expansion, thereby improving the wear resistance and crack resistance of the coating, in particular comb crack resistance. In addition, aiming at different working conditions, such as difficult processing/rough milling of specific materials, the toughness requirement on the coating is higher, and at the moment, the toughness of the columnar crystal Ti 1-xAlx N coating with single texture cannot be adapted, and granular equiaxed crystal Ti 1-xAlxNy grains can not be adapted.
The nano-hardness of the Ti 1-xAlxNy layer is >30 GPa. The AlN with equiaxed cubic Ti 1-xAlxNy crystal grains and micro hexagonal crystal structure (hcp) can improve the toughness of the coating on the basis of not reducing the hardness of the coating.
The nano hardness of the Ti 1-xAlxNy layer is more than or equal to 33 GPa.
The nano hardness of the Ti 1-xAlxNy layer is 33 GPa-36 GPa.
The nano hardness of the Ti1-xAlxNy layer is 33.5 GPa-36 GPa.
Compared with the prior art, the invention has the advantages that:
1. aiming at the problem of limiting the Al content in the PVD-Ti 1-xAlxNy coating, the invention successfully deposits a Ti 1-xAlxNy coating with high Al content on the surface of a cutting tool.
2. The Ti 1-xAlxNy coating is subjected to process adjustment, the crystal grains are equiaxed crystals without obvious texture, and the toughness of the coating is obviously improved on the basis of ensuring the nano hardness of 30 Gpa of the coating.
3. The Ti 1-xAlxNy coating of the invention has smooth surface and excellent cutting performance.
The coated cutting tool has excellent toughness and anti-adhesion performance, and is suitable for wet cutting and dry cutting under severe working conditions, especially rough milling and turning of difficult-to-machine materials.
The invention relates to a cutting tool having a substrate made of cemented carbide and a single-layer or multi-layer wear protection coating applied to the substrate in a CVD process, wherein the wear protection coating has at least one Ti 1-xAlxNy layer deposited by LPCVD, wherein 0.2 < x < 0.97 and 0.5 < y <1.2, and wherein the Ti 1-xAlxNy layer has a thickness of 1 μm to 15 μm, a granular grain morphology without significant crystallographic preferential orientation, a texture coefficient TC (111) <1.3, TC (200) <1.3 and TC (220) <1.2.
In this example, the Ti 1-xAlxNy layer had a face-centered cubic crystal structure, and the ratio of the face-centered cubic crystal structure was 90%.
In this embodiment, the Ti 1-xAlxNy layer grains have a granular equiaxed crystal structure.
In this example, the nano-hardness of the Ti 1-xAlxNy layer was >30 GPa.
In the present embodiment, the tool body 1 is a cemented carbide body, but not limited thereto, and may be a body made of a superhard material such as cermet, ceramics, steel or cubic boron nitride.
In this embodiment, the wear-resistant coating further includes a hard primer layer disposed between the Ti 1-xAlxNy layer and the tool substrate, where the primer layer has a thickness of 0.1 μm to 1.5 μm, and the primer layer includes at least one of a TiN layer, a TiCN layer, and a TiC layer by chemical vapor deposition.
The embodiment specifically adopts a TiN layer as a hard base layer.
In this embodiment, the wear-resistant coating has a total thickness of 2 μm to 15 μm.
The preparation method of the coated cutting tool with preferred orientation of the embodiment comprises the following steps:
(1) The substrate is selected from alloy strips or numerical control cutters.
Wherein, the alloy strip or the numerical control cutter is prepared by a powder metallurgy method.
Mixing coarse-grain WC particles, 12 wt percent of Co simple substance powder and 3 wt percent of TaC powder, ball milling, pressing and sintering to prepare the hard alloy numerical control blade blank meeting the ISOGB/T3851-2015 standard.
And (3) carrying out deep processing procedures such as grinding, passivation and the like on the blank to obtain a grinding product capable of being coated.
(2) Indexable coated cutting tools were prepared and coating deposition was performed in a BPXpro 530L coating oven equipped with low pressure vapor deposition techniques.
(3) In order to enhance the bonding force of the Ti 1-xAlxNy coating of the present invention to the cemented carbide aggregate, a TiN layer with a thickness of about 0.5 μm was first deposited as a primer layer on the cemented carbide substrate in two steps by CVD process under the deposition conditions listed in Table 1.
TABLE 1 TiN preparation reaction conditions:
(4) Depositing Ti 1-xAlxNy coating, namely continuously depositing Ti 1-xAlxNy coating on the TiN base coat by adopting an LP-CVD process.
Specifically, two independently configured precursor gas mixtures (a first gas mixture and a second gas mixture) are preheated in a preheating chamber and thoroughly mixed, and then introduced into a CVD reactor for deposition at a set temperature.
Wherein the first precursor gas mixture contains TiCl 4 and AlCl 3 and hydrogen (H 2) is used as carrier gas, and the second precursor gas mixture contains ammonia (NH 3) and nitrogen (N 2) and hydrogen (H 2) is used as carrier gas.
Table 2 ti 1-xAlxNy coating deposition process parameters:
And (3) detecting the thickness of the coating:
The thickness of each layer of the coating is determined by a metallographic microscope after the vertical section containing the coating is obtained by cutting the diamond saw blade along the direction vertical to the upper surface and the lower surface of the blade, the specific result is shown in the table 3, the thickness of the Ti 1-xAlxNy coating has a certain positive correlation with the deposition time, and the thickness of the coating can be adjusted by the deposition time.
Table 3 coating thickness in the examples:
And (3) detecting chemical components of the coating:
the coating was cut with a diamond saw blade along the direction perpendicular to the upper and lower surfaces of the blade to obtain a vertical section containing the coating, and the coating composition of Ti 1-xAlxNy was analyzed by scanning electron microscope SEM-EDS after mounting, grinding, and polishing, and the results are shown in Table 4.
Coating composition (at%) in the examples of table 4:
Coating crystallization orientation detection:
The coating crystallographic texture orientation was determined using X-ray diffraction (XRD) methods. Table 5 shows the texture orientation detection results of the prepared coated blade.
Table 5 Ti 1-xAlxNy coating orientation in the examples:
And (3) coating nano hardness detection:
The example coated inserts were polished with prior art PVD coated inserts and then subjected to nanohardness testing as shown in table 6.
Table 6 coating hardness test results for the examples and prior art PVD coatings:
performance comparative test:
cutting performance comparative tests were performed on cutting tools C1 produced according to example 1, each having the present invention, and comparative coated tools P1 having the same tool base.
Wherein, the comparative coated tool P1 was coated with Ti 0.5Al0.5 N (thickness 4 μm) using the prior art PVD process.
Cutting experiment-milling (1)
The cutting tool described above was subjected to milling test (1) as shown in table 8.
TABLE 8 milling experiment (1) conditions
Table 9 comparison of experimental results:
according to table 9, the coated tool C1 of the present invention has a significantly longer life than the comparative tool P1, showing excellent wear resistance.
Cutting experiment-milling (2)
The cutting tool described above was subjected to milling test (2) as shown in table 10.
TABLE 10 milling experiment (2) conditions
Table 11 comparison of experimental results:
According to table 11, the coated tool C1 of the present invention has a significantly longer life than the comparative tool P1, showing excellent wear resistance.
The foregoing is merely illustrative of the structures of this invention and various modifications, additions and substitutions for those skilled in the art can be made to the described embodiments without departing from the scope of the invention or from the scope of the invention as defined in the accompanying claims.
Claims (10)
1. The coating is characterized by comprising a Ti 1-xAlxNy layer, wherein the texture coefficient of the Ti 1-xAlxNy layer comprises at least one of the following conditions (a) - (d);
(a)TC(111)≤1.3;
(b)TC(200)≤1.3;
(c)TC(220)≤1.2;
(d)TC(311)≤1.2。
2. The coating of claim 1, wherein 0.2< x +.0.97 in the Ti 1-xAlxNy layer;
And/or 0.5< y < 1.2 in the Ti 1-xAlxNy layer;
And/or, the crystal grains of the Ti 1-xAlxNy layer are nano-granular;
And/or the crystal grains of the Ti 1-xAlxNy layer are in an equiaxed crystal structure.
3. The coating of claim 2, wherein the Ti 1-xAlxNy layer has a grain size of 0nm to 50 nm.
4. A coating according to any one of claims 1 to 3, wherein the nano-hardness of the Ti 1-xAlxNy layer is >30GPa;
And/or the thickness of the Ti 1-xAlxNy layer is 1-25 μm.
5. A process for the preparation of a coating according to any one of claims 1 to 4, comprising the step of depositing the Ti 1-xAlxNy layer by LPCVD.
6. The method according to claim 5, wherein the LPCVD deposition process is performed using a titanium source, a nitrogen source, and an aluminum source;
And/or, the titanium source comprises titanium chloride;
And/or, the aluminum source comprises aluminum chloride;
And/or, the nitrogen source comprises ammonia and/or nitrogen;
And/or, carrier gas is also selected in the deposition process;
and/or, the carrier gas comprises hydrogen;
and/or, selecting a first precursor gas and a second precursor gas in the LPCVD deposition process, and mixing the first precursor gas and the second precursor gas to prepare a mixed gas;
And/or the first precursor gas comprises a titanium source, an aluminum source and a carrier gas;
and/or the volume fraction of the titanium source in the mixed gas is 0.05% -0.20%;
And/or the volume fraction of the aluminum source in the mixed gas is 0.3% -1.65%;
And/or, the second precursor gas comprises a nitrogen source and a carrier gas;
And/or the volume fraction of the nitrogen source in the mixed gas is 0.5% -20%;
And/or the volume fraction of ammonia in the mixed gas is 0.5% -1.5%;
and/or the volume fraction of nitrogen in the mixed gas is 5% -15%.
7. The method according to claim 5, wherein the temperature during the LPCVD deposition is 700 ℃ to 850 ℃;
and/or the temperature in the LPCVD deposition process is 750-800 ℃;
And/or the pressure in the LPCVD deposition process is 0.2kPa to 1.8kPa;
and/or the pressure in the LPCVD deposition process is 0.4kPa to 1.0kPa.
8. A tool comprising a coating according to any one of claims 1 to 4.
9. The tool according to claim 8, wherein the tool further comprises a base;
and/or, the matrix comprises a hard material matrix;
and/or the substrate comprises a cemented carbide substrate, a cermet substrate, a ceramic substrate, a steel substrate or a boron nitride substrate.
10. The tool according to claim 9, wherein the substrate surface is further provided with a primer layer;
And/or the priming layer comprises at least one of a TiN layer, a TiCN layer and a TiC layer;
And/or the thickness of the bottom layer is 0.1-1.5 mu m;
And/or the cutter sequentially comprises a substrate, a priming layer and a coating layer from inside to outside;
and/or the coating is a plurality of layers.
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| CN202511548463.6A CN121380902A (en) | 2025-10-28 | 2025-10-28 | A coating, a cutting tool, its preparation method and application |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202511548463.6A CN121380902A (en) | 2025-10-28 | 2025-10-28 | A coating, a cutting tool, its preparation method and application |
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