CN1318151C - 涂敷膜形成装置及涂敷膜形成方法 - Google Patents

涂敷膜形成装置及涂敷膜形成方法 Download PDF

Info

Publication number
CN1318151C
CN1318151C CNB2005100016570A CN200510001657A CN1318151C CN 1318151 C CN1318151 C CN 1318151C CN B2005100016570 A CNB2005100016570 A CN B2005100016570A CN 200510001657 A CN200510001657 A CN 200510001657A CN 1318151 C CN1318151 C CN 1318151C
Authority
CN
China
Prior art keywords
substrate
stage
coating film
coating
lcd substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2005100016570A
Other languages
English (en)
Chinese (zh)
Other versions
CN1651155A (zh
Inventor
山崎刚
宫崎一仁
立山清久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of CN1651155A publication Critical patent/CN1651155A/zh
Application granted granted Critical
Publication of CN1318151C publication Critical patent/CN1318151C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
CNB2005100016570A 2004-02-05 2005-02-03 涂敷膜形成装置及涂敷膜形成方法 Expired - Fee Related CN1318151C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004029031A JP4049751B2 (ja) 2004-02-05 2004-02-05 塗布膜形成装置
JP2004029031 2004-02-05

Publications (2)

Publication Number Publication Date
CN1651155A CN1651155A (zh) 2005-08-10
CN1318151C true CN1318151C (zh) 2007-05-30

Family

ID=34879177

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2005100016570A Expired - Fee Related CN1318151C (zh) 2004-02-05 2005-02-03 涂敷膜形成装置及涂敷膜形成方法

Country Status (4)

Country Link
JP (1) JP4049751B2 (ja)
KR (1) KR101061707B1 (ja)
CN (1) CN1318151C (ja)
TW (1) TWI268533B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10067123B2 (en) 2006-10-13 2018-09-04 Theranos Ip Company Llc Reducing optical interference in a fluidic device

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4413789B2 (ja) * 2005-01-24 2010-02-10 東京エレクトロン株式会社 ステージ装置および塗布処理装置
JP4634265B2 (ja) * 2005-09-27 2011-02-16 東京エレクトロン株式会社 塗布方法及び塗布装置
JP4884871B2 (ja) * 2006-07-27 2012-02-29 東京エレクトロン株式会社 塗布方法及び塗布装置
JP4743716B2 (ja) * 2007-03-06 2011-08-10 東京エレクトロン株式会社 基板処理装置
JP5303125B2 (ja) * 2007-07-24 2013-10-02 東京応化工業株式会社 塗布装置及び塗布方法
JP5188759B2 (ja) * 2007-08-07 2013-04-24 東京応化工業株式会社 塗布装置及び塗布方法
JP2009043829A (ja) * 2007-08-07 2009-02-26 Tokyo Ohka Kogyo Co Ltd 塗布装置及び塗布方法
JP4942589B2 (ja) * 2007-08-30 2012-05-30 東京応化工業株式会社 塗布装置及び塗布方法
JP4541396B2 (ja) * 2007-11-02 2010-09-08 東京エレクトロン株式会社 塗布膜形成装置、基板搬送方法及び記憶媒体
JP4495752B2 (ja) * 2007-11-06 2010-07-07 東京エレクトロン株式会社 基板処理装置及び塗布装置
JP5169162B2 (ja) * 2007-11-14 2013-03-27 凸版印刷株式会社 着色フォトレジストの塗布方法及び塗布装置
CN101502822B (zh) * 2008-02-04 2012-05-30 联华电子股份有限公司 喷嘴的校准装置及喷嘴的校准方法
JP5315013B2 (ja) * 2008-02-05 2013-10-16 オリンパス株式会社 基板搬送装置、及び、基板搬送方法
KR101431146B1 (ko) * 2008-05-09 2014-08-18 주식회사 디엠에스 약액도포장치
JP2011056335A (ja) * 2009-09-07 2011-03-24 Toray Eng Co Ltd 予備乾燥装置及び予備乾燥方法
JP5550882B2 (ja) * 2009-10-19 2014-07-16 東京応化工業株式会社 塗布装置
JP2011165691A (ja) * 2010-02-04 2011-08-25 Tokyo Electron Ltd 減圧乾燥方法及び減圧乾燥装置
JP2011213435A (ja) * 2010-03-31 2011-10-27 Toray Eng Co Ltd 搬送装置及び塗布システム
CN101856647B (zh) * 2010-05-14 2012-08-29 方刚 自动涂布机
KR101179736B1 (ko) 2010-06-24 2012-09-04 주식회사 나래나노텍 개선된 부상 스테이지 및 이를 구비한 기판 부상 유닛 및 코팅 장치
TWI590365B (zh) * 2011-05-13 2017-07-01 尼康股份有限公司 物體更換系統、物體更換方法、物體搬出方法、物體保持裝置、曝光裝置、平面顯示器之製造方法、及元件製造方法
JP5789416B2 (ja) 2011-06-03 2015-10-07 東京応化工業株式会社 塗布装置及び塗布方法
KR101818070B1 (ko) 2012-01-18 2018-01-12 주식회사 케이씨텍 기판 처리 장치
JP6095394B2 (ja) * 2013-02-13 2017-03-15 東レエンジニアリング株式会社 基板処理システム及び基板処理方法
CN104051562B (zh) * 2013-03-13 2017-02-08 北京北方微电子基地设备工艺研究中心有限责任公司 硅片表面处理装置
JP5778224B2 (ja) * 2013-08-19 2015-09-16 東京応化工業株式会社 塗布装置
CN103771719B (zh) * 2014-01-16 2015-09-09 北京京东方光电科技有限公司 一种涂布装置
KR101570169B1 (ko) 2014-05-09 2015-11-20 세메스 주식회사 광 배향막 형성 장치
CN106489212B (zh) * 2014-07-18 2019-07-12 科迪华公司 利用多区域循环及过滤的气体封闭系统和方法
JP6689595B2 (ja) * 2015-11-20 2020-04-28 Ａｉメカテック株式会社 塗布装置および塗布方法
JP6791255B2 (ja) * 2016-09-30 2020-11-25 株式会社ニコン 搬送装置、露光装置、露光方法、フラットパネルディスプレイの製造方法、デバイス製造方法、及び搬送方法
JP6860356B2 (ja) * 2017-01-20 2021-04-14 株式会社Ｓｃｒｅｅｎホールディングス 塗布装置および塗布方法
JP6860379B2 (ja) * 2017-03-03 2021-04-14 株式会社Ｓｃｒｅｅｎホールディングス 塗布装置および塗布方法
JP6855334B2 (ja) * 2017-06-22 2021-04-07 東レエンジニアリング株式会社 基板処理装置及び基板処理方法
CN107457154A (zh) * 2017-09-20 2017-12-12 大碇电脑配件(上海)有限公司 一种四轴点胶机台
KR102134271B1 (ko) * 2018-04-25 2020-07-15 세메스 주식회사 기판 처리 장치
JP7232596B2 (ja) * 2018-08-30 2023-03-03 東京エレクトロン株式会社 基板処理装置および基板処理方法
KR102134272B1 (ko) * 2018-09-17 2020-07-15 세메스 주식회사 부상식 기판 이송 장치
CN111483235A (zh) * 2019-06-21 2020-08-04 广东聚华印刷显示技术有限公司 发光器件的喷墨印刷方法和喷墨印刷装置
CN110802000B (zh) * 2019-11-08 2020-12-29 武汉城市职业学院 一种润滑油定量出油涂抹机器人
CN111215264A (zh) * 2020-01-16 2020-06-02 重庆奥丽特建材有限公司 负氧离子高晶板喷涂装置及其控制方法
KR102134274B1 (ko) * 2020-03-10 2020-07-15 세메스 주식회사 기판 처리 장치
JP2021150351A (ja) * 2020-03-17 2021-09-27 東レエンジニアリング株式会社 基板浮上搬送装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10156255A (ja) * 1996-11-27 1998-06-16 Tokyo Electron Ltd 塗布膜形成装置
JP2000062950A (ja) * 1998-08-19 2000-02-29 Daiichi Shisetsu Kogyo Kk 浮上装置
JP2000191137A (ja) * 1998-12-28 2000-07-11 Nippon Electric Glass Co Ltd 板状物の非接触搬送装置
JP2002181714A (ja) * 2000-12-19 2002-06-26 Ishikawajima Harima Heavy Ind Co Ltd 薄板検査装置
JP2003279495A (ja) * 2002-03-22 2003-10-02 V Technology Co Ltd ガラス基板の検査装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002346463A (ja) 2001-05-24 2002-12-03 Toppan Printing Co Ltd 単板塗布装置
JP2003290697A (ja) 2002-04-02 2003-10-14 Toppan Printing Co Ltd 単板連続塗布装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10156255A (ja) * 1996-11-27 1998-06-16 Tokyo Electron Ltd 塗布膜形成装置
JP2000062950A (ja) * 1998-08-19 2000-02-29 Daiichi Shisetsu Kogyo Kk 浮上装置
JP2000191137A (ja) * 1998-12-28 2000-07-11 Nippon Electric Glass Co Ltd 板状物の非接触搬送装置
JP2002181714A (ja) * 2000-12-19 2002-06-26 Ishikawajima Harima Heavy Ind Co Ltd 薄板検査装置
JP2003279495A (ja) * 2002-03-22 2003-10-02 V Technology Co Ltd ガラス基板の検査装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10067123B2 (en) 2006-10-13 2018-09-04 Theranos Ip Company Llc Reducing optical interference in a fluidic device
US11215610B2 (en) 2006-10-13 2022-01-04 Labrador Diagnostics Llc Reducing optical interference in a fluidic device
US11442061B2 (en) 2006-10-13 2022-09-13 Labrador Diagnostics Llc Reducing optical interference in a fluidic device

Also Published As

Publication number Publication date
JP2005223119A (ja) 2005-08-18
TWI268533B (en) 2006-12-11
KR20050079637A (ko) 2005-08-10
JP4049751B2 (ja) 2008-02-20
CN1651155A (zh) 2005-08-10
TW200527493A (en) 2005-08-16
KR101061707B1 (ko) 2011-09-01

Similar Documents

Publication Publication Date Title
CN1318151C (zh) 涂敷膜形成装置及涂敷膜形成方法
KR101046486B1 (ko) 스테이지 장치 및 도포 처리 장치
TWI294639B (en) Stage equipment and coating processing equipment
JP4040025B2 (ja) 塗布膜形成装置
CN102005402B (zh) 基板输送装置以及基板输送方法
JP4272230B2 (ja) 減圧乾燥装置
KR101845090B1 (ko) 도포막 형성 장치 및 도포막 형성 방법
JP4743716B2 (ja) 基板処理装置
JP5771432B2 (ja) 塗布装置
KR20090031271A (ko) 상압 건조 장치 및 기판 처리 장치 및 기판 처리 방법
CN101344725B (zh) 涂敷装置、基板的交接方法及涂敷方法
JP5550882B2 (ja) 塗布装置
JP4069980B2 (ja) 塗布膜形成装置
JP3930278B2 (ja) 液処理装置および液処理方法
JP4353530B2 (ja) 基板処理方法及び基板処理装置
KR101432825B1 (ko) 기판처리장치
JP2014013804A (ja) 塗布処理装置、塗布処理方法、プログラム及びコンピュータ記憶媒体
JP2002324740A (ja) 処理装置
JP4643630B2 (ja) 処理装置
JP2003017392A (ja) 基板処理装置
JP2011083748A (ja) 塗布方法、及び塗布装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20070530