CN201724738U - High Power Laser Near Field Tester - Google Patents
High Power Laser Near Field Tester Download PDFInfo
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- CN201724738U CN201724738U CN 201020143440 CN201020143440U CN201724738U CN 201724738 U CN201724738 U CN 201724738U CN 201020143440 CN201020143440 CN 201020143440 CN 201020143440 U CN201020143440 U CN 201020143440U CN 201724738 U CN201724738 U CN 201724738U
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Abstract
本实用新型提供了一种高功率激光近场测试仪。所述测试仪的光路中,高功率激光束依次经过第一透镜、小孔滤波器、第二透镜和衰减器,入射到CCD。第一透镜和第二透镜组成大口径缩束系统,缩束后的准直光通过衰减器,被测光束经过缩束系统和衰减器成象于CCD上,在第一透镜和第二透镜的公共焦点上设置有小孔滤波器。衰减器由组合固定衰减平板和可变衰减片组成,组合固定衰减平板和可变衰减片第一入射表面镀不同反射率的反射膜,第二入射表面镀减反膜。采用数个固定衰减平板组合以及可变衰减片可以得到各种不同的衰减倍率,被测激光经过衰减器的信号在CCD的线性响应范围内。本实用新型结构简单,调节方便,近场测试精度高。
The utility model provides a high-power laser near-field tester. In the optical path of the tester, the high-power laser beam sequentially passes through the first lens, the pinhole filter, the second lens and the attenuator, and enters the CCD. The first lens and the second lens form a large-diameter beam reduction system. The collimated light after the beam reduction passes through the attenuator, and the measured beam is imaged on the CCD through the beam reduction system and the attenuator. A pinhole filter is provided on the common focus. The attenuator is composed of a fixed attenuation plate and a variable attenuation plate. The first incident surface of the combination of the fixed attenuation plate and the variable attenuation plate is coated with a reflective film with different reflectivity, and the second incident surface is coated with an anti-reflection film. Various attenuation magnifications can be obtained by using a combination of several fixed attenuation plates and variable attenuation plates. The signal of the measured laser passing through the attenuator is within the linear response range of the CCD. The utility model has the advantages of simple structure, convenient adjustment and high near-field test precision.
Description
技术领域technical field
本实用新型属于高功率激光参数测试领域,主要涉及一种高功率激光近场测试仪。 The utility model belongs to the field of high-power laser parameter testing, and mainly relates to a high-power laser near-field tester. the
背景技术Background technique
对于高功率激光装置,近场分布是指特定空间位置激光束截面上的光能量密度分布,由于高功率激光装置的非线性效应使得近场出现很强的调制,昂贵的大口径光学元件一般处在近场位置,破坏风险比较大,极大限制了装置的负载能力。近场测试的目的是保证光束准直、评估光束空间质量、监测激光器光学元件损伤情况,通过近场测试为高功率激光装置运行和维护提供依据。 For high-power laser devices, the near-field distribution refers to the optical energy density distribution on the cross-section of the laser beam at a specific spatial position. Due to the nonlinear effect of high-power laser devices, the near-field is strongly modulated. In the near-field position, the risk of damage is relatively high, which greatly limits the load capacity of the device. The purpose of near-field testing is to ensure beam alignment, evaluate beam spatial quality, monitor damage to laser optical components, and provide a basis for the operation and maintenance of high-power laser devices through near-field testing. the
发明内容Contents of the invention
本实用新型提供一种高功率激光近场测试仪。 The utility model provides a high-power laser near-field tester. the
本实用新型解决其技术问题所采用的技术方案是:本实用新型高功率激光近场测试仪的光路中,高功率激光束依次经过第一透镜、小孔滤波器、第二透镜和衰减器,入射到CCD。第一透镜和第二透镜组成大口径缩束系统,缩束后的准直光通过衰减器,被测光束经过缩束系统和衰减器成象于CCD上,在第一透镜和第二透镜的公共焦点上设置了一小孔滤波器。衰减器由第一固定衰减平板、第二固定衰减平板、第三固定衰减平板、第四固定衰减平板和可变衰减片组成,第一固定衰减平板、第二固定衰减平板、第三固定衰减平板、第四固定衰减平板和可变衰减片第一入射表面镀不同反射率的反射膜,第二入射表面镀减反膜。 The technical solution adopted by the utility model to solve the technical problem is: in the optical path of the high-power laser near-field tester of the utility model, the high-power laser beam passes through the first lens, the pinhole filter, the second lens and the attenuator in sequence, incident on the CCD. The first lens and the second lens form a large-diameter beam reduction system. The collimated light after the beam reduction passes through the attenuator, and the measured beam is imaged on the CCD through the beam reduction system and the attenuator. A small hole filter is set on the common focus. The attenuator is composed of the first fixed attenuation plate, the second fixed attenuation plate, the third fixed attenuation plate, the fourth fixed attenuation plate and the variable attenuation plate, the first fixed attenuation plate, the second fixed attenuation plate, the third fixed attenuation plate 1. The fourth fixed attenuation plate and the first incident surface of the variable attenuation plate are coated with reflective films with different reflectivity, and the second incident surface is coated with anti-reflection film. the
本实用新型的有益效果是,采用高衰减倍率的固定衰减平板与可变衰减片对被测高功率激光进行透射式大倍率衰减,可得到无畸变的近场分布。本实用新型结构简单,调节方便,近场测试精度高。 The beneficial effect of the utility model is that the high-power attenuation of the measured high-power laser is transmitted through the fixed attenuation plate and the variable attenuation plate with high attenuation magnification, and near-field distribution without distortion can be obtained. The utility model has the advantages of simple structure, convenient adjustment and high near-field test precision. the
附图说明Description of drawings
下面结合附图和实施例对本实用新型进一步说明。 Below in conjunction with accompanying drawing and embodiment the utility model is further described. the
图1是本实用新型高功率激光近场测试仪光路结构示意图。 Figure 1 is a schematic diagram of the optical path structure of the high-power laser near-field tester of the present invention. the
图2是本实用新型中的衰减器光学结构示意图。 Fig. 2 is a schematic diagram of the optical structure of the attenuator in the utility model. the
图中1.第一透镜 2.小孔滤波器 3.第二透镜 4.衰减器 5.CCD 21.第一固定衰减平板 22.第二固定衰减平板 23.第三固定衰减平板 24.第四固定衰减平板 25.可变衰减片。 In the figure 1. First lens 2.
具体实施方式Detailed ways
图1是本实用新型高功率激光近场测试仪光路结构示意图。如图1所示,波长为1.054μm,光束口径为70mm×70mm的高功率激光依次经过第一透镜1、小孔滤波器2、第二透镜3和衰减器4,进入CCD5,第一透镜1和第二透镜3组成大口径缩束系统,为防止环境杂散光进入测试系统影响象的对比度及清晰度,在第一透镜1和第二透镜3公共焦点上设置了一小孔滤波器2,缩束后的10 mm×10mm 准直光通过衰减器4,被测光束经过缩束系统和衰减器4成象于CCD5上得到近场能量分布。图2中,衰减器4由第一固定衰减平板21、第二固定衰减平板22、第三固定衰减平板23、第四固定衰减平板24和可变衰减片25组成,第一固定衰减平板21、第二固定衰减平板22、第三固定衰减平板23、第四固定衰减平板24进行大倍率衰减,可变衰减片25用于小倍率衰减。第一固定衰减平板21、第二固定衰减平板22、第三固定衰减平板23、第四固定衰减平板24和可变衰减片25的第一入射表面按要求镀不同反射率的反射膜,第二入射表面镀减反膜。通过衰减平板和可变衰减片对入射光束进行透射衰减,采用不同的衰减平板和衰减片组合得到各种不同的衰减倍率,被测激光经过衰减器4的信号到CCD5的线性响应范围内。 Figure 1 is a schematic diagram of the optical path structure of the high-power laser near-field tester of the present invention. As shown in Figure 1, a high-power laser with a wavelength of 1.054 μm and a beam diameter of 70mm×70mm passes through the first lens 1, the pinhole filter 2, the
为保证成象关系,采用有实焦点的缩束系统使光束从70mm×70mm口径缩束到10mm×10mm。由于缩束比例较大,采用由两个透镜构成的单透镜缩束系统共轭距大,仪器结构庞大,采用组合透镜结构,且使组合透镜各表面反射象均不能聚焦在其它光学元件上。 In order to ensure the imaging relationship, a beam reduction system with a real focus is used to reduce the beam from 70mm×70mm to 10mm×10mm. Due to the large beam reduction ratio, the conjugate distance of the single-lens contraction system composed of two lenses is large, and the instrument structure is huge. The combined lens structure is used, and the reflection images on the surfaces of the combined lens cannot be focused on other optical elements. the
对于被测的高功率激光,为使进入探测器CCD5上的信号不饱和,需要在光路中插入高衰减倍率的衰减器4,该衰减器4应具有足够大的衰减倍率,且衰减器4引入的波象差尽可能小。若衰减器4置于第一透镜1前面,需要大口径的衰减平板,这样将增加造价,若放在会聚光路中,将产生很大的附加象差,故将衰减器4放置在缩束后的平行光中。衰减器4由第一固定衰减平板21、第二固定衰减平板22、第三固定衰减平板23、第四固定衰减平板24和可变衰减片25组成。第一固定衰减平板21、第二固定衰减平板22、第三固定衰减平板23、第四固定衰减平板24用于大倍率衰减。为了减少第一固定衰减平板21、第二固定衰减平板22、第三固定衰减平板23、第四固定衰减平板24光学表面片间光束形成的干涉,将衰减平板呈450放置,固定衰减平板由K9玻璃镀膜组成,第一入射面镀高反膜,45度放置时反射率为99%,第二入射面镀减反膜,45度放置时反射率小于0.5%,固定衰减平板两个面的平面度为λ/10;固定衰减平板固定安架在各自的移动支架上,该支架可以手动或自动移进或移出光路,并具有自动定位功能。置于固定衰减平板后的可变衰减片25用于小倍率衰减,为便于调节,呈00放置,可变衰减片25有六片,每片由K9玻璃镀膜组成,第一入射面镀反射膜,反射率分别为90%,80%,60%,50%,20%,10%,第二入射面镀减反膜,反射率小于0.5%,可变衰减片25的两个面的平面度为λ/10。可变衰减片25放置于旋臂式转盘上,该转盘可手动转动,具有定位、识别功能,转动转盘可方便地得到六个不同的衰减值,可变衰减片25的调节方式也可通过平移实现六个衰减片的转换。 For the measured high-power laser, in order to make the signal entering the detector CCD5 not saturated, it is necessary to insert an attenuator 4 with a high attenuation factor in the optical path. The wave aberration is as small as possible. If the attenuator 4 is placed in front of the first lens 1, a large-diameter attenuation plate is required, which will increase the cost. If it is placed in the converging optical path, a large additional aberration will be generated, so the attenuator 4 is placed after the narrowing beam in parallel light. The attenuator 4 is composed of a first
为避免第一固定衰减平板21、第二固定衰减平板22、第三固定衰减平板23、第四固定衰减平板24和可变衰减片25内发生多光束干涉,可将上述衰减平板加工成具有一定锲角的劈板,如锲角为10度;衰减器筒内壁全部涂黑,以吸收杂散光。CCD5在水平面内可二维可调,通过移动CCD5使被测物面成像于CCD5上,CCD5具有实时采集功能,整个仪器内壁采用吸收玻璃,所有挡光面涂黑色无光漆,以吸收散射光和反射光,提高CCD5采集图象的信噪比。 In order to avoid multi-beam interference in the first fixed
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| CN102175310A (en) * | 2011-03-07 | 2011-09-07 | 中国工程物理研究院应用电子学研究所 | Device for measuring laser light near field intensity distribution |
| CN102183299A (en) * | 2011-03-21 | 2011-09-14 | 中国科学院西安光学精密机械研究所 | 4f optical system for laser near-field distribution measurement |
| CN102902032A (en) * | 2012-09-13 | 2013-01-30 | 北京国科世纪激光技术有限公司 | Attenuation slice placing device |
| CN102901620A (en) * | 2012-10-31 | 2013-01-30 | 中国科学院长春光学精密机械与物理研究所 | General-purpose high-precision laser beam combining system assembly and adjustment detection device and its application |
| CN102944302A (en) * | 2012-11-12 | 2013-02-27 | 中国科学院西安光学精密机械研究所 | Laser focal spot light intensity distribution test device and test method |
| CN103148931A (en) * | 2013-01-18 | 2013-06-12 | 华北电力大学(保定) | Device of detecting large power laser beam by using small power detector and method |
| CN103196552A (en) * | 2013-03-28 | 2013-07-10 | 宁波高新区通尚光电技术有限公司 | Measuring device for light intensity of narrow-light-beam light-emitting diode (LED) lamp |
| CN103308278A (en) * | 2012-03-16 | 2013-09-18 | 山东华光光电子有限公司 | Method for measuring near-field nonlinear effect of semiconductor bar laser device |
| CN103616163A (en) * | 2013-11-25 | 2014-03-05 | 中国科学院长春光学精密机械与物理研究所 | Solar blind ultraviolet filter out-of-band cut-off depth testing method |
| CN104155085A (en) * | 2014-07-07 | 2014-11-19 | 中国科学院西安光学精密机械研究所 | Large-diameter sampling splitting plate sampling rate test device and test method |
| CN104655408A (en) * | 2015-01-29 | 2015-05-27 | 大族激光科技产业集团股份有限公司 | Laser power monitoring device |
| CN105352596A (en) * | 2015-12-09 | 2016-02-24 | 广州江元医疗科技有限公司 | Monochromatic light collection device |
| CN105675265A (en) * | 2016-01-25 | 2016-06-15 | 中国科学院上海光学精密机械研究所 | Large-aperture light beam collimating and measuring device |
| CN105842832A (en) * | 2016-04-24 | 2016-08-10 | 湖南戴斯光电有限公司 | Attenuation device for measuring distribution of high-power laser focused light beam |
| CN108548660A (en) * | 2018-03-26 | 2018-09-18 | 中国科学院西安光学精密机械研究所 | Sampling rate and sampling uniformity interferometric system and method of sampling splitting board |
| CN113945276A (en) * | 2021-10-25 | 2022-01-18 | 中国科学院光电技术研究所 | Detector linearity calibration method |
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2010
- 2010-03-29 CN CN 201020143440 patent/CN201724738U/en not_active Expired - Lifetime
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| CN102175310A (en) * | 2011-03-07 | 2011-09-07 | 中国工程物理研究院应用电子学研究所 | Device for measuring laser light near field intensity distribution |
| CN102183299A (en) * | 2011-03-21 | 2011-09-14 | 中国科学院西安光学精密机械研究所 | 4f optical system for laser near-field distribution measurement |
| CN103308278A (en) * | 2012-03-16 | 2013-09-18 | 山东华光光电子有限公司 | Method for measuring near-field nonlinear effect of semiconductor bar laser device |
| CN103308278B (en) * | 2012-03-16 | 2015-08-19 | 山东华光光电子有限公司 | A kind of method measuring semiconductor bar bar laser instrument near field nonlinear effect |
| CN102902032A (en) * | 2012-09-13 | 2013-01-30 | 北京国科世纪激光技术有限公司 | Attenuation slice placing device |
| CN102902032B (en) * | 2012-09-13 | 2015-01-21 | 北京国科世纪激光技术有限公司 | Attenuation slice placing device |
| CN102901620A (en) * | 2012-10-31 | 2013-01-30 | 中国科学院长春光学精密机械与物理研究所 | General-purpose high-precision laser beam combining system assembly and adjustment detection device and its application |
| CN102901620B (en) * | 2012-10-31 | 2014-12-24 | 中国科学院长春光学精密机械与物理研究所 | General-purpose high-precision laser beam combining system assembly and adjustment detection device and its application |
| CN102944302A (en) * | 2012-11-12 | 2013-02-27 | 中国科学院西安光学精密机械研究所 | Laser focal spot light intensity distribution test device and test method |
| CN102944302B (en) * | 2012-11-12 | 2015-07-29 | 中国科学院西安光学精密机械研究所 | Laser focal spot light intensity distribution test device and test method |
| CN103148931B (en) * | 2013-01-18 | 2015-04-22 | 华北电力大学(保定) | Device of detecting large power laser beam by using small power detector and method |
| CN103148931A (en) * | 2013-01-18 | 2013-06-12 | 华北电力大学(保定) | Device of detecting large power laser beam by using small power detector and method |
| CN103196552A (en) * | 2013-03-28 | 2013-07-10 | 宁波高新区通尚光电技术有限公司 | Measuring device for light intensity of narrow-light-beam light-emitting diode (LED) lamp |
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| CN104155085A (en) * | 2014-07-07 | 2014-11-19 | 中国科学院西安光学精密机械研究所 | Large-diameter sampling splitting plate sampling rate test device and test method |
| CN104155085B (en) * | 2014-07-07 | 2017-02-15 | 中国科学院西安光学精密机械研究所 | Large-diameter sampling splitting plate sampling rate test device and test method |
| CN104655408A (en) * | 2015-01-29 | 2015-05-27 | 大族激光科技产业集团股份有限公司 | Laser power monitoring device |
| CN105352596A (en) * | 2015-12-09 | 2016-02-24 | 广州江元医疗科技有限公司 | Monochromatic light collection device |
| CN105675265A (en) * | 2016-01-25 | 2016-06-15 | 中国科学院上海光学精密机械研究所 | Large-aperture light beam collimating and measuring device |
| CN105675265B (en) * | 2016-01-25 | 2018-03-20 | 中国科学院上海光学精密机械研究所 | Heavy caliber beam collimation measurement apparatus |
| CN105842832A (en) * | 2016-04-24 | 2016-08-10 | 湖南戴斯光电有限公司 | Attenuation device for measuring distribution of high-power laser focused light beam |
| CN108548660A (en) * | 2018-03-26 | 2018-09-18 | 中国科学院西安光学精密机械研究所 | Sampling rate and sampling uniformity interferometric system and method of sampling splitting board |
| CN108548660B (en) * | 2018-03-26 | 2019-11-15 | 中国科学院西安光学精密机械研究所 | Interferometric measurement system and method for sampling rate and sampling uniformity of sampling chopping plate |
| CN113945276A (en) * | 2021-10-25 | 2022-01-18 | 中国科学院光电技术研究所 | Detector linearity calibration method |
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