CN202492581U - Acid etching solution cyclic regeneration unit for printed wiring board - Google Patents
Acid etching solution cyclic regeneration unit for printed wiring board Download PDFInfo
- Publication number
- CN202492581U CN202492581U CN2012200346133U CN201220034613U CN202492581U CN 202492581 U CN202492581 U CN 202492581U CN 2012200346133 U CN2012200346133 U CN 2012200346133U CN 201220034613 U CN201220034613 U CN 201220034613U CN 202492581 U CN202492581 U CN 202492581U
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- Prior art keywords
- etching
- etching solution
- cylinder
- tank
- regeneration
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- Expired - Lifetime
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- 238000005530 etching Methods 0.000 title claims abstract description 132
- 230000008929 regeneration Effects 0.000 title claims description 47
- 238000011069 regeneration method Methods 0.000 title claims description 47
- 125000004122 cyclic group Chemical group 0.000 title claims description 13
- 239000002253 acid Substances 0.000 title 1
- 239000007788 liquid Substances 0.000 claims abstract description 37
- 239000002699 waste material Substances 0.000 claims abstract description 27
- 230000002378 acidificating effect Effects 0.000 claims abstract description 17
- 239000002131 composite material Substances 0.000 claims abstract description 16
- 238000003860 storage Methods 0.000 claims abstract description 16
- 239000000460 chlorine Substances 0.000 claims description 20
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 18
- 229910052801 chlorine Inorganic materials 0.000 claims description 18
- 239000003513 alkali Substances 0.000 claims description 7
- 239000007921 spray Substances 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000003973 paint Substances 0.000 claims description 3
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 5
- 150000002500 ions Chemical class 0.000 abstract description 5
- 230000001590 oxidative effect Effects 0.000 abstract description 4
- 239000002351 wastewater Substances 0.000 abstract description 4
- 239000012535 impurity Substances 0.000 abstract description 3
- 239000007800 oxidant agent Substances 0.000 abstract description 3
- 238000002360 preparation method Methods 0.000 abstract 1
- 238000004064 recycling Methods 0.000 abstract 1
- 230000001172 regenerating effect Effects 0.000 abstract 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 12
- 239000010949 copper Substances 0.000 description 12
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 7
- 239000002912 waste gas Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 238000005868 electrolysis reaction Methods 0.000 description 4
- 239000002585 base Substances 0.000 description 3
- 229910001431 copper ion Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 2
- LBJNMUFDOHXDFG-UHFFFAOYSA-N copper;hydrate Chemical compound O.[Cu].[Cu] LBJNMUFDOHXDFG-UHFFFAOYSA-N 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 238000012958 reprocessing Methods 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Manufacturing Of Printed Circuit Boards (AREA)
- ing And Chemical Polishing (AREA)
Abstract
本实用新型公开了一种用于印制线路板酸性蚀刻液循环再生装置，包括蚀刻废液储存槽、复合隔膜电解槽、蚀刻液中转槽和再生蚀刻液调配槽，所述复合隔膜电解槽通过复合隔膜分为阳极室和阴极室；所述蚀刻液中转槽一端连通所述蚀刻缸，另一端连通所述阴极室；所述蚀刻废液储存槽一端连通所述蚀刻缸，另一端连通所述阴极室；所述再生蚀刻液槽将所述阳极室和所述蚀刻缸相连通。本实用新型既解决了现有技术中额外地添加氧化剂来氧化亚铜离子的技术问题，降低了生成成本，而且不添加杂质到再生的蚀刻液中，保证了再生的蚀刻液和新鲜的蚀刻液的一致性；同时还可以回收纯度很高的阴极铜，而且没有废水排放，实现了蚀刻工序清洁生产。
The utility model discloses an acidic etching liquid recycling device for printed circuit boards, which comprises an etching waste liquid storage tank, a composite diaphragm electrolytic tank, an etching liquid transfer tank and a regenerated etching liquid preparation tank. The composite diaphragm electrolytic tank passes through The composite diaphragm is divided into an anode chamber and a cathode chamber; one end of the etching solution transfer tank is connected to the etching cylinder, and the other end is connected to the cathode chamber; one end of the etching waste liquid storage tank is connected to the etching cylinder, and the other end is connected to the A cathode chamber; the regenerative etching solution tank communicates the anode chamber with the etching cylinder. The utility model not only solves the technical problem of adding an oxidant to oxidize cuprous ions in the prior art, reduces the production cost, but also does not add impurities to the regenerated etching solution, ensuring that the regenerated etching solution and fresh etching solution Consistency; At the same time, cathode copper with high purity can be recovered, and there is no waste water discharge, which realizes the clean production of the etching process.
Description
Technical field
The utility model relates to the circuit board etching technical field, is specifically related to a kind of printed circuit board acidic etching liquid cyclic regeneration device that is used for.
Background technology
The World PCB industry production value accounts for more than 1/4th of the electronic component industry gross output value, is the maximum industry of proportion in each electronic component segmentation industry, and industry size reaches 40,000,000,000 dollars.Simultaneously, because its unique status in the electronics basic industry has become most active industry in the contemporary electronic component industry.
Etching is as the important process in the PCB processing procedure, and acidic etching liquid is widely used because have that lateral erosion is little, speed is easy to control and be prone to characteristics such as regeneration.In etching process, Cu
2+Generate Cu with the Cu effect
+, along with the carrying out of etching reaction, Cu
+Quantity is more and more, Cu
2+Reduce, the etching solution etch capabilities descends very soon, for keeping stablizing etch capabilities, needs to add oxygenant and makes Cu
+Be converted into Cu as early as possible
2+Simultaneously as the interior Cu of etching cylinder
2+When concentration reaches certain numerical value or the solution of etching cylinder when surpassing certain volume, need timely exclusive segment etching solution to guarantee the normal operation of etching work procedure, this discharge etching solution is referred to as etching waste liquor.
At present, acidic etching liquid is generally and adds H
2O
2Or NaClO
3Deng oxygenant regeneration, but relative cost is higher; Etching waste liquor is then dragged away Chemicals such as being used for producing copper sulfate, copper sponge, causes a large amount of discharge of wastewater, the one side contaminate environment, and some effective constituents in the waste water have also been discharged thereupon on the other hand, waste resource.
The utility model content
The purpose of the utility model is intended to provide a kind of printed circuit board acidic etching liquid cyclic regeneration device that is used for, and solves the technical problem that the regeneration of prior art acidic etching liquid needs extra interpolation oxygenant and reprocessing cycle.
For realizing above-mentioned technical purpose, reach above-mentioned technique effect, the utility model is realized through following technical scheme:
A kind of printed circuit board acidic etching liquid cyclic regeneration device that is used for comprises turn trough and regeneration etching solution make-up tank in etching waste liquor storage tanks, composite diaphragm electrolyzer, the etching solution, and said composite diaphragm electrolyzer is divided into anolyte compartment and cathode compartment through composite diaphragm; Turn trough one end is communicated with said etching cylinder in the said etching solution, and the other end is communicated with said cathode compartment; Said etching waste liquor storage tanks one end is communicated with said etching cylinder, and the other end is communicated with said cathode compartment; Said regeneration etching liquid bath is connected said anolyte compartment and said etching cylinder; Between said anolyte compartment and the said regenerated liquid make-up tank, be respectively arranged with fluidic device between the turn trough in said anolyte compartment and the said etching solution, and the chlorine in the said anolyte compartment is directed into said fluidic device
Further, the turn trough storage comes from the etching solution in the said etching cylinder in the said etching solution.
Further, the storage of said etching waste liquor storage tanks is from the waste liquid of said etching cylinder and be supplied to said cathode compartment.
Further, said regeneration etching liquid bath stores in the said anolyte compartment regeneration etching solution and is used to provide to said etching cylinder.
Further, be provided with positive plate in the said anolyte compartment, said positive plate is the titanium paint sheet; Be provided with negative plate in the said cathode compartment, said negative plate is a stainless steel plate.
Further, said regeneration system rapidly also comprises emission-control equipment, said emission-control equipment respectively with said cathode compartment, said regeneration etching solution make-up tank and said etching solution in turn trough be connected.
Further, said emission-control equipment also comprises the alkali lye spray equipment.
The beneficial effect of the utility model is:
The utility model utilizes the cl ions electrolysis principle to produce strong oxidizer chlorine; Cuprous ion in the oxide etch waste liquid; Reduce the copper ion concentration in the etching waste liquor simultaneously, both solved and added oxygenant in the prior art extraly and come Red copper oxide ionic technical problem, reduced manufacturing cost; And do not add impurity in the regenerated etching solution, guaranteed the consistence of regenerated etching solution and fresh etching solution; Simultaneously can also reclaim the very high cathode copper of purity, and not have discharge of wastewater, realize the etching work procedure cleaner production.
Description of drawings
Accompanying drawing described herein is used to provide the further understanding to the utility model, constitutes the application's a part, and illustrative examples of the utility model and explanation thereof are used to explain the utility model, do not constitute the improper qualification to the utility model.In the accompanying drawings:
Fig. 1 is the regeneration system rapidly synoptic diagram of the utility model embodiment one;
Fig. 2 is the composite diaphragm cell construction synoptic diagram of the utility model;
Fig. 3 is the regeneration system rapidly structural representation of the utility model;
Fig. 4 is the regeneration system rapidly synoptic diagram of the utility model embodiment two;
Fig. 5 is the regeneration system rapidly synoptic diagram of the utility model embodiment three.
Label declaration among the figure: 1, etching cylinder, 2, turn trough in the etching solution, 3, the composite diaphragm electrolyzer, 4, the etching waste liquor storage tanks; 5, composite diaphragm, 6, regeneration etching solution make-up tank, 7, fluidic device; 8, emission-control equipment, 9, the alkali lye spray equipment, 31, the anolyte compartment; 32, cathode compartment, 33, positive plate, 34, negative plate.
Embodiment
Below with reference to accompanying drawing and combine embodiment, specify the utility model.
Referring to shown in Figure 1; A kind of printed circuit board acidic etching liquid cyclic regeneration device that is used for; Comprise turn trough 2 and regeneration etching solution make-up tank 6 in etching waste liquor storage tanks 4, composite diaphragm electrolyzer 3, the etching solution, said composite diaphragm electrolyzer 3 is divided into anolyte compartment 31 and cathode compartment 32 through composite diaphragm 5; Turn trough 2 one ends are communicated with said etching cylinder 1 in the said etching solution, and the other end is communicated with said cathode compartment 32; Said etching waste liquor storage tanks 4 one ends are communicated with said etching cylinder 1, and the other end is communicated with said cathode compartment 32; Said regeneration etching liquid bath 6 is connected said anolyte compartment 31 with said etching cylinder 1.
Further, turn trough 2 storages come from the etching solution in the said etching cylinder 1 in the said etching solution.
Further, 4 storages of said etching waste liquor storage tanks are from the waste liquid of said etching cylinder 1 and be supplied to said cathode compartment 32.
Further, said regeneration etching liquid bath 6 stores in the said anolyte compartment 31 the regeneration etching solution and is used to provide to said etching cylinder 1.
Etching waste liquor contains a large amount of cupric ions and a certain amount of cuprous ion among the embodiment, and the cupric ion total amount surpassed certain numerical value, has no longer possessed etch capabilities.
Etching solution contains cupric ion among the embodiment, and cupric ion plays a major role to etching; Along with the carrying out that produces, cupric ion can reduce gradually in the etching solution in process of production, and cuprous ion increases gradually, and this makes the etch capabilities of etching solution reduce greatly.
Referring to shown in Figure 2, further, be provided with positive plate 33 in the said anolyte compartment 31, said positive plate 33 is the titanium paint sheet; Be provided with negative plate 34 in the said cathode compartment 32, said negative plate 34 is a stainless steel plate.Said positive plate 33, said negative plate 34 are connected with corresponding current device respectively.
Referring to shown in Figure 3, further, said cathode compartment 32 is connected with said etching waste liquor groove 4, and this etching waste liquor is separated out elemental copper on the said negative plate 34 of said cathode compartment 32, and concrete reaction formula is expressed as: Cu
2++ 2e=Cu greatly reduces the copper ion concentration in the etching waste liquor, under said composite diaphragm 5 and electric field action, migrates in the said anolyte compartment 32 then, and under electrolytic action, cl ions loses electronics, generates chlorine, and concrete reaction formula is expressed as: 2Cl
--2e=Cl
2, because the strong oxidation of chlorine is oxidized to cupric ion with the cuprous ion in the said anolyte compartment 31, concrete reaction formula is expressed as: Cl
2+ 2Cu
+=2Cu
2++ 2Cl
-In the said anolyte compartment 31, because oxidizing reaction, cuprous ion is oxidized to cupric ion, thereby has realized the regeneration of copper ions acidic etching liquid.
Referring to shown in Figure 4; Further; In the regeneration system rapidly of embodiment one and embodiment two; Between said anolyte compartment 31 and the said regenerated liquid make-up tank 6, be respectively arranged with fluidic device 7 between the turn trough 2 in said anolyte compartment 31 and the said etching solution, and the chlorine in the said anolyte compartment 31 is directed into said fluidic device 7.Oxidation cuprous ion wherein; Fluidic device 7 is connected the gas circuit of anolyte compartment 31 with regenerated liquid make-up tank 6, its effect is that the chlorine that does not react in the anolyte compartment 31 is directed in the etching cylinder 1 through regenerated liquid make-up tank 6.
Described in front embodiment one, in said anolyte compartment 31, have chlorine and produce, though chlorine can and cuprous ion further react, can not guarantee that all chlorine all participates in to oxidizing reaction.This part is not participated in oxidizing reaction with said fluidic device 8 and the chlorine that overflows is directed in the said etching cylinder 1; In said etching cylinder 1, chlorine generates cupric ion with cuprous ion oxidation wherein, and reaction formula is expressed as CL
2+ 2Cu
+=2Cu
2++ 2CL
-, can increase the concentration of cupric ion in the said etching cylinder 1 so on the one hand, can also prevent that chlorine from discharging and contaminate environment as waste gas.
Referring to shown in Figure 5, further, compare with the regeneration system rapidly of the utility model embodiment two; The regeneration system rapidly of embodiment three also comprises an emission-control equipment 8; Said emission-control equipment 8 respectively with said cathode compartment 32, said regeneration etching solution make-up tank 6, said etching solution in turn trough 2 be connected, collect the waste gas (chlorine and hydrogenchloride) in the turn trough 2 in said cathode compartment 32, said regeneration etching solution make-up tank 6, the said etching solution, in said emission-control equipment 8; Comprise an aqueous alkali feeding mechanism; Said aqueous alkali feeding mechanism provides strong base solution, utilizes strong base solution and above-mentioned waste gas to carry out neutralization reaction, thereby realizes the zero release of waste gas.In a specific embodiment, said aqueous alkali feeding mechanism is an aqueous alkali spray equipment 9, and this strong base solution is restriction not, can be sodium hydroxide, aqua ammonia etc.
The utility model regeneration system rapidly utilizes electrolysis principle to separate out elemental copper at negative electrode, reduces the content of cupric ion in the etching waste liquor, thereby reaches the purpose of etching waste liquor reprocessing cycle; Utilize the cl ions electrolysis principle to produce strong oxidizer chlorine; Come the cuprous ion in the oxide etch waste liquid; Solved and added oxygenant in the prior art extraly and come Red copper oxide ionic technical problem; Reduce manufacturing cost, and do not added impurity in the regenerated etching solution, guaranteed the consistence of regenerated etching solution and fresh etching solution.
The chlorine that the fluidic device assurance electrolysis of the utility model regeneration system rapidly produces does not directly discharge but is back in the etching cylinder, has improved the utilization ratio of chlorine on the one hand, has also reduced the exhaust gas discharging amount on the other hand, reduces environmental pollution.
The emission-control equipment of the utility model regeneration system rapidly, waste gas that this regeneration system rapidly is produced such as chlorine, hydrogen chloride gas carry out neutralizing treatment, have guaranteed the zero release of waste gas, have realized environmental protection requirement.
It is emphasized that; Though above-mentioned facility example is to the utility model detailed explanation of contrasting; But these explanations are just illustrative to the utility model; Rather than to the restriction of utility model, any utility model that does not exceed in the utility model connotation is created, and all drops within the utility model rights protection scope.
Claims (7)
1. one kind is used for printed circuit board acidic etching liquid cyclic regeneration device; Comprise turn trough (2) and regeneration etching solution make-up tank (6) in etching waste liquor storage tanks (4), composite diaphragm electrolyzer (3), the etching solution, said composite diaphragm electrolyzer (3) is divided into anolyte compartment (31) and cathode compartment (32) through composite diaphragm (5); Turn trough (2) one ends are communicated with said etching cylinder (1) in the said etching solution, and the other end is communicated with said cathode compartment (32); Said etching waste liquor storage tanks (4) one ends are communicated with said etching cylinder (1), and the other end is communicated with said cathode compartment (32); Said regeneration etching liquid bath (6) is connected said anolyte compartment (31) and said etching cylinder (1); It is characterized in that: between said anolyte compartment (31) and the said regenerated liquid make-up tank (6), be respectively arranged with fluidic device (7) between the turn trough (2) in said anolyte compartment (31) and the said etching solution, and the chlorine in said anolyte compartment (31) is directed into said fluidic device (7).
2. the printed circuit board acidic etching liquid cyclic regeneration device that is used for according to claim 1 is characterized in that: turn trough in the said etching solution (2) stores and comes from the etching solution in the said etching cylinder (1).
3. the printed circuit board acidic etching liquid cyclic regeneration device that is used for according to claim 1 is characterized in that: said etching waste liquor storage tanks (4) is stored from the waste liquid of said etching cylinder (1) and is supplied to said cathode compartment (32).
4. the printed circuit board acidic etching liquid cyclic regeneration device that is used for according to claim 1 is characterized in that: said regeneration etching liquid bath (6) stores said anolyte compartment (31) middle regeneration etching solution and is used to provide to said etching cylinder (1).
5. the printed circuit board acidic etching liquid cyclic regeneration device that is used for according to claim 1, it is characterized in that: be provided with positive plate (33) in said anolyte compartment (31), said positive plate (33) is the titanium paint sheet; Be provided with negative plate (34) in the said cathode compartment (32), said negative plate (34) is a stainless steel plate.
6. the printed circuit board acidic etching liquid cyclic regeneration device that is used for according to claim 1; It is characterized in that: said regeneration system rapidly also comprises emission-control equipment (8), said emission-control equipment respectively with said cathode compartment (32), said regeneration etching solution make-up tank (6) and said etching solution in turn trough (2) be connected.
7. the printed circuit board acidic etching liquid cyclic regeneration device that is used for according to claim 1, it is characterized in that: said emission-control equipment (8) also comprises alkali lye spray equipment (9).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012200346133U CN202492581U (en) | 2012-02-03 | 2012-02-03 | Acid etching solution cyclic regeneration unit for printed wiring board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012200346133U CN202492581U (en) | 2012-02-03 | 2012-02-03 | Acid etching solution cyclic regeneration unit for printed wiring board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202492581U true CN202492581U (en) | 2012-10-17 |
Family
ID=46998817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012200346133U Expired - Lifetime CN202492581U (en) | 2012-02-03 | 2012-02-03 | Acid etching solution cyclic regeneration unit for printed wiring board |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202492581U (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105039989A (en) * | 2015-06-26 | 2015-11-11 | 无锡市瑞思科环保科技有限公司 | Electrodeposition decoppering and regenerating method of waste copper-bearing etching liquor of acidic chlorination system |
| CN105177581A (en) * | 2015-09-09 | 2015-12-23 | 成都虹华环保科技股份有限公司 | System for circulating and regenerating waste acidic etching solutions with tail gas treatment function |
| CN106498401A (en) * | 2017-01-06 | 2017-03-15 | 深圳市新锐思环保科技有限公司 | A kind of recoverying and utilizing method of acidic etching waste liquid and recovery and processing system |
| WO2017041471A1 (en) * | 2015-09-09 | 2017-03-16 | 成都虹华环保科技股份有限公司 | Resource-saving acidic etching waste solution reuse and recovery system |
| WO2017041470A1 (en) * | 2015-09-09 | 2017-03-16 | 成都虹华环保科技股份有限公司 | Acidic etching waste solution reuse and recovery system having tail-gas treatment function |
| WO2020211400A1 (en) * | 2019-04-19 | 2020-10-22 | 惠州市臻鼎环保科技有限公司 | System and method for improving regeneration and reuse rate of acidic etching solution |
| CN112095121A (en) * | 2019-06-17 | 2020-12-18 | 昆山卫司特环保设备有限公司 | Method and device for regenerating and recycling waste copper liquid of printed circuit board |
-
2012
- 2012-02-03 CN CN2012200346133U patent/CN202492581U/en not_active Expired - Lifetime
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105039989A (en) * | 2015-06-26 | 2015-11-11 | 无锡市瑞思科环保科技有限公司 | Electrodeposition decoppering and regenerating method of waste copper-bearing etching liquor of acidic chlorination system |
| CN105039989B (en) * | 2015-06-26 | 2017-10-17 | 无锡市瑞思科环保科技有限公司 | A kind of acid chlorization system copper-containing etching waste solution electrodeposition decopper(ing) and regeneration method |
| CN105177581A (en) * | 2015-09-09 | 2015-12-23 | 成都虹华环保科技股份有限公司 | System for circulating and regenerating waste acidic etching solutions with tail gas treatment function |
| WO2017041471A1 (en) * | 2015-09-09 | 2017-03-16 | 成都虹华环保科技股份有限公司 | Resource-saving acidic etching waste solution reuse and recovery system |
| WO2017041470A1 (en) * | 2015-09-09 | 2017-03-16 | 成都虹华环保科技股份有限公司 | Acidic etching waste solution reuse and recovery system having tail-gas treatment function |
| CN106498401A (en) * | 2017-01-06 | 2017-03-15 | 深圳市新锐思环保科技有限公司 | A kind of recoverying and utilizing method of acidic etching waste liquid and recovery and processing system |
| WO2020211400A1 (en) * | 2019-04-19 | 2020-10-22 | 惠州市臻鼎环保科技有限公司 | System and method for improving regeneration and reuse rate of acidic etching solution |
| CN112095121A (en) * | 2019-06-17 | 2020-12-18 | 昆山卫司特环保设备有限公司 | Method and device for regenerating and recycling waste copper liquid of printed circuit board |
| CN112095121B (en) * | 2019-06-17 | 2023-05-09 | 昆山卫司特环保设备有限公司 | Method and device for regenerating and recycling waste copper liquid of printed circuit board |
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