CN208819846U - A kind of wafer precision scrubbing unit - Google Patents
A kind of wafer precision scrubbing unit Download PDFInfo
- Publication number
- CN208819846U CN208819846U CN201821694451.XU CN201821694451U CN208819846U CN 208819846 U CN208819846 U CN 208819846U CN 201821694451 U CN201821694451 U CN 201821694451U CN 208819846 U CN208819846 U CN 208819846U
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- CN
- China
- Prior art keywords
- fixedly connected
- manipulator
- mechanical arm
- workbench
- wafer
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Links
- 238000005201 scrubbing Methods 0.000 title claims abstract description 19
- 230000007246 mechanism Effects 0.000 claims abstract description 51
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 49
- 238000004140 cleaning Methods 0.000 claims abstract description 48
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 24
- 238000005406 washing Methods 0.000 claims abstract description 19
- 238000001035 drying Methods 0.000 claims abstract description 15
- 238000005520 cutting process Methods 0.000 claims abstract description 8
- 238000007599 discharging Methods 0.000 claims description 10
- 239000007787 solid Substances 0.000 claims description 4
- 230000001680 brushing effect Effects 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 10
- 239000007921 spray Substances 0.000 description 2
- 241001417955 Agonidae Species 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model provides a kind of wafer precision scrubbing unit, is related to cleaning and brushing machine field.The wafer precision scrubbing unit, including carrier is cleaned, it include workbench at the top of the cleaning carrier.The wafer precision scrubbing unit, pass through the robot of setting, and first mechanical arm, first manipulator, second mechanical arm, second manipulator, vacuum cups and rotary connector are equipped with, it allows the robot to rotate first mechanical arm and second mechanical arm by rotary connector, vacuum cups to make first mechanical arm and second mechanical arm be able to drive on the first manipulator and the second manipulator is round movable workbench, to enable vacuum cups that wafer is sucked by feed mechanism, to enable the vacuum cups that wafer is sucked successively to send by the first manipulator and the second manipulator to thick washing machine structure, fine purifiation mechanism and nitrogen drying mechanism carry out cleaning drying, the wafer after scrub is obtained finally by cutting agency.
Description
Technical field
The utility model relates to cleaning and brushing machine technical field, specially a kind of wafer precision scrubbing unit.
Background technique
Wafer currently on the market can all carry out scrub process during production and processing, but wafer current piece
Cleaning process, be all manually to be cleaned by worker mostly, and such working method low efficiency, and operation technique is not marked
Standard, therefore it is proposed that a kind of wafer precision scrubbing unit solves the problems, such as above-mentioned propose.
Utility model content
The purpose of the utility model is to provide a kind of structurally reasonable and novel, working efficiency is improved, operation technique is unitized,
Standardized wafer precision scrubbing unit.
Technical solution
In order to achieve the above object, the utility model is achieved by the following technical programs: a kind of wafer precision scrub
Machine, including carrier is cleaned, it include workbench at the top of the cleaning carrier, the bottom of the workbench and the top of cleaning carrier
Portion is fixedly connected, and includes feeding-discharging mechanism, thick washing machine structure, robot, nitrogen drying mechanism and essence at the top of the workbench
Washing machine structure is fixedly connected on the left of the bottom of the feeding-discharging mechanism and bench-top, the bottom of the thick washing machine structure and work
Make the Right Inboard at the top of platform to be fixedly connected, be fixedly connected in the middle part of the bottom of the robot and bench-top, the nitrogen
Drying mechanism is fixedly connected with the right outside of bench-top, and the bottom of the fine purifiation mechanism and the right side of bench-top are fixed
Connection, the feeding-discharging mechanism include feed mechanism and cutting agency, the bottom of the feed mechanism and bench-top
Left inside side is fixedly connected, and the bottom of the cutting agency is fixedly connected with the left-external side of bench-top, and the robot includes
There are first mechanical arm, the first manipulator, second mechanical arm, the second manipulator, vacuum cups and rotary connector, the rotation connects
It is fixedly connected on the right side of the side of fitting and robot, the fixed company in the side of the first mechanical arm and the right side of rotary connector
It connects, is fixedly connected on the right side of the left side of first manipulator and first mechanical arm, the side of the second mechanical arm and rotation
Connector is fixedly connected far from the side of first mechanical arm, and the side of second manipulator and the other side of second mechanical arm are solid
It is fixed to connect, it is fixedly connected at the top of the bottom of the vacuum cups and the second manipulator, nitrogen drying mechanism includes nitrogen
Gas nozzle, the bottom end of the nitrogen sprayer head and the top grafting of workbench.
Further, the bottom of the cleaning carrier includes supporting leg and universal wheel, the top of the supporting leg and clear
The side for washing carrier base is fixedly connected, and the side of top and cleaning carrier top far from supporting leg of the universal wheel is fixed to pacify
Dress.
Further, the side of the cleaning carrier top includes cloche, the side of the cloche bottom and clear
The side for washing carrier top is fixedly connected.
Further, the side of the cloche includes hermetyic window and cleaning control panel, the side of the hermetyic window
It is fixedly connected with the side of cloche, the side of the control panel and cloche are arranged far from the side of hermetyic window.
It further, include cabinet at the top of the cloche, the bottom and the middle part at the top of cloche of the cabinet
It is fixedly connected, the inside of the cabinet includes blower, and the side of the blower and the inside of cabinet are arranged.
Further, the side of the cleaning carrier includes industrial personal computer, side and the cleaning carrier of the industrial personal computer
Side is electrically connected.
Further, there are two the quantity of the vacuum cups, the bottom of described two vacuum cups is located at first
It is fixedly connected at the top of manipulator and the second manipulator.
A kind of wafer precision scrubbing unit provided by the utility model.Have it is following the utility model has the advantages that
1, the wafer precision scrubbing unit, passes through the robot and first mechanical arm of setting, the first manipulator, second
Mechanical arm, the second manipulator, vacuum cups and rotary connector are equipped with, and allow the robot to turn by rotary connector
Dynamic first mechanical arm and second mechanical arm, so that first mechanical arm and second mechanical arm be made to be able to drive the first manipulator and second
Vacuum cups on manipulator is round movable workbench, thus enable vacuum cups that wafer is sucked by feed mechanism, from
And the vacuum cups that wafer is sucked is enable successively to send by the first manipulator and the second manipulator to thick washing machine structure, poacher
Structure and nitrogen drying mechanism carry out cleaning drying, the wafer after scrub are obtained finally by cutting agency, to make effectively to make
The cleaning of wafer can be carried out efficiently, solve the low efficiency by way of manually cleaning of wafer currently on the market
Problem.
2, the wafer precision scrubbing unit dries mechanism by the thick washing machine structure and fine purifiation mechanism and nitrogen of setting
It is equipped with, the wafer when wafer on the second manipulator being made to reach the lower section of thick washing machine structure on the first manipulator reaches essence
The lower section of washing machine structure, to enable the wafer on the first manipulator and the second manipulator respectively by thick washing machine structure and fine purifiation
Mechanism carries out preliminary cleaning and final cleaning, thus when reaching the wafer on the first manipulator in drying mechanism, the second machine
The wafer of tool on hand reaches the lower section of fine mechanism, thus make wafer on the second manipulator by fine mechanism finely most
It cleans eventually, the wafer on the first manipulator carries out drying process by the nitrogen that nitrogen sprayer head sprays, to effectively make wafer
The cleaning process of piece standardized can carry out, and solve the manipulator by way of manually cleaning of wafer currently on the market
The non-type problem of method.
Detailed description of the invention
Fig. 1 is the utility model structural perspective；
Fig. 2 is the utility model structure top view；
Fig. 3 is the enlarged drawing of feeding-discharging mechanism in the utility model structure chart 1；
Fig. 4 is the enlarged drawing of robot in the utility model structure chart 1.
Wherein, 1 cleaning carrier, 101 supporting legs, 102 universal wheels, 2 cloches, 201 hermetyic windows, 202 cleaning control panels,
3 workbench, 4 cabinets, 401 blowers, 5 feeding-discharging mechanisms, 501 feed mechanisms, 502 cutting agencies, 6 thick washing machine structures, 7 robots,
701 first mechanical arms, 702 first manipulators, 703 second mechanical arms, 704 second manipulators, 705 vacuum cups, 706 rotations connect
Fitting, 8 nitrogen dry mechanism, 801 nitrogen sprayer heads, 9 fine purifiation mechanisms, 10 industrial personal computers.
Specific embodiment
As shown in Figs 1-4, the utility model embodiment provides a kind of wafer precision scrubbing unit, including cleaning carrier 1, clearly
The bottom for washing carrier 1 includes supporting leg 101 and universal wheel 102, the side on the top and cleaning 1 bottom of carrier of supporting leg 101
It is fixedly connected, the top and 1 top of cleaning carrier of universal wheel 102 are fixedly mounted far from the side of supporting leg 101, make supporting leg
101 can support cleaning carrier 1, keep universal wheel 102 mobile convenient for cleaning carrier 1, and the one of 1 top of cleaning carrier
Side includes cloche 2, and the side of 2 bottom of cloche is fixedly connected with the side at 1 top of cleaning carrier, enables cloche 2
Ensureing dustless can clean in the wafer processed in cleaning carrier 1, and the top of cloche 2 includes cabinet 4, the bottom of cabinet 4
Portion is fixedly connected with the middle part at 2 top of cloche, and the inside of cabinet 4 includes blower 401, side and the cabinet 4 of blower 401
Inside setting, enables blower 401 that nitrogen extra in cloche 2 to be discharged, and the side of cleaning carrier 1 includes industrial personal computer
10, the side of industrial personal computer 10 and the side of cleaning carrier 1 are electrically connected, and industrial personal computer 10 is enable to control the work of cleaning carrier 1
Mode, the top of cleaning carrier 1 include workbench 3, and the bottom of workbench 3 is fixedly connected with the top of cleaning carrier 1, works
The top of platform 3 includes feeding-discharging mechanism 5, thick washing machine structure 6, robot 7, nitrogen drying mechanism 8 and fine purifiation mechanism 9, input and output material
The bottom of mechanism 5 is fixedly connected with the left side at 3 top of workbench, and the Right Inboard at 3 top of bottom and workbench of thick washing machine structure 6 is solid
The bottom of fixed connection, robot 7 is fixedly connected with the middle part at 3 top of workbench, and nitrogen dries 3 top of mechanism 8 and workbench
Right outside is fixedly connected, and the bottom of fine purifiation mechanism 9 is fixedly connected with the right side at 3 top of workbench, on feeding-discharging mechanism 5 includes
Expect mechanism 501 and cutting agency 502, the bottom of feed mechanism 501 is fixedly connected with the left inside side at 3 top of workbench, blanking machine
The bottom of structure 502 is fixedly connected with the left-external side at 3 top of workbench, and robot 7 includes that first mechanical arm 701, first is mechanical
Hand 702, second mechanical arm 703, the second manipulator 704, vacuum cups 705 and rotary connector 706, rotary connector 706
Side is fixedly connected with the right side of robot 7, and the side of first mechanical arm 701 is fixedly connected with the right side of rotary connector 706,
The left side of first manipulator 702 is fixedly connected with the right side of first mechanical arm 701, and the side of second mechanical arm 703 and rotation connect
Fitting 706 is fixedly connected far from the side of first mechanical arm 701, and the side of the second manipulator 704 is another with second mechanical arm 703
Side is fixedly connected, and the bottom of vacuum cups 705 is fixedly connected with the top of the second manipulator 704, the quantity of vacuum cups 705
There are two, the bottom of two vacuum cups 705 is located at the fixed company in top of the first manipulator 702 and the second manipulator 704
It connects, makes the vacuum cups 705 on the first manipulator 702 and the second manipulator 704 and can adsorb wafer to be cleaned, nitrogen
Drying mechanism 8 includes nitrogen sprayer head 801, the bottom end of nitrogen sprayer head 801 and the top grafting of workbench 3.
In use, robot 7 is enable to rotate first mechanical arm 701 and second mechanical arm by rotary connector 706
703, so that first mechanical arm 701 and second mechanical arm 703 be made to be able to drive on the first manipulator 702 and the second manipulator 704
Vacuum cups 705 it is mobile round workbench 3, to enable vacuum cups 705 that wafer is sucked by feed mechanism 501,
Wafer when to make the wafer on the second manipulator 704 reach the lower section of thick washing machine structure 6 on first manipulator 702 reaches
The lower section of fine purifiation mechanism 9, to enable the wafer on the first manipulator 702 and the second manipulator 704 respectively by slightly washing
Mechanism 6 and fine purifiation mechanism 9 tentatively clean and finally clean, so that the wafer on the first manipulator 702 be made to reach drying
When in mechanism, the wafer on the second manipulator 704 reaches the lower section of fine mechanism, to make the crystalline substance on the second manipulator 704
Disk is finely finally cleaned by fine mechanism, and the wafer on the first manipulator 702 passes through the nitrogen that nitrogen sprayer head 801 sprays
Drying process is carried out, to keep the cleaning process of wafer efficient and standardized progress, is solved currently on the market
Wafer by way of manually cleaning the non-type problem of operation technique.
Claims (7)
1. a kind of wafer precision scrubbing unit, including cleaning carrier (1), it is characterised in that: the top packet of cleaning carrier (1)
It has included workbench (3), has been fixedly connected at the top of the bottom of the workbench (3) and cleaning carrier (1), the workbench (3)
Top includes feeding-discharging mechanism (5), thick washing machine structure (6), robot (7), nitrogen drying mechanism (8) and fine purifiation mechanism (9), institute
The bottom for stating feeding-discharging mechanism (5) is fixedly connected with the left side at the top of workbench (3), the bottom of the thick washing machine structure (6) and work
To make the Right Inboard at the top of platform (3) to be fixedly connected, the bottom of the robot (7) is fixedly connected with the middle part at the top of workbench (3),
Nitrogen drying mechanism (8) is fixedly connected with the right outside at the top of workbench (3), the bottom of the fine purifiation mechanism (9) and work
Make the right side at the top of platform (3) to be fixedly connected, the feeding-discharging mechanism (5) includes feed mechanism (501) and cutting agency
(502), the bottom of the feed mechanism (501) is fixedly connected with the left inside side at the top of workbench (3), the cutting agency
(502) bottom is fixedly connected with the left-external side at the top of workbench (3), and the robot (7) includes first mechanical arm
(701), the first manipulator (702), second mechanical arm (703), the second manipulator (704), vacuum cups (705) and rotation connection
Part (706) is fixedly connected on the right side of the side and robot (7) of the rotary connector (706), the first mechanical arm
(701) it is fixedly connected on the right side of side and rotary connector (706), the left side of first manipulator (702) and the first machine
Tool arm is fixedly connected on the right side of (701), and the side and rotary connector (706) of the second mechanical arm (703) are far from the first machine
The side of tool arm (701) is fixedly connected, and the side of second manipulator (704) and the other side of second mechanical arm (703) are solid
It is fixed to connect, it is fixedly connected at the top of the bottom and the second manipulator (704) of the vacuum cups (705), the nitrogen dryer
Structure (8) includes nitrogen sprayer head (801), the top grafting of the bottom end and workbench (3) of the nitrogen sprayer head (801).
2. a kind of wafer precision scrubbing unit according to claim 1, it is characterised in that: the bottom of cleaning carrier (1)
Portion includes supporting leg (101) and universal wheel (102), the side on the top and cleaning carrier (1) bottom of the supporting leg (101)
It is fixedly connected, the side far from supporting leg (101) is fixedly mounted at the top of the top of the universal wheel (102) and cleaning carrier (1).
3. a kind of wafer precision scrubbing unit according to claim 1, it is characterised in that: at the top of the cleaning carrier (1)
Side include cloche (2), the side of cloche (2) bottom is fixedly connected with the side at the top of cleaning carrier (1).
4. a kind of wafer precision scrubbing unit according to claim 3, it is characterised in that: the side of the cloche (2)
It include hermetyic window (201) and cleaning control panel (202), the side of the hermetyic window (201) and the side of cloche (2) are solid
Fixed connection, the side and cloche (2) of the control panel are arranged far from the side of hermetyic window (201).
5. a kind of wafer precision scrubbing unit according to claim 3, it is characterised in that: the top of the cloche (2)
Include cabinet (4), the bottom of the cabinet (4) is fixedly connected with the middle part at the top of cloche (2), the cabinet (4) it is interior
Portion includes blower (401), and the side of the blower (401) and the inside of cabinet (4) are arranged.
6. a kind of wafer precision scrubbing unit according to claim 1, it is characterised in that: the one of cleaning carrier (1)
Side includes industrial personal computer (10), and the side of the industrial personal computer (10) and the side of cleaning carrier (1) are electrically connected.
7. a kind of wafer precision scrubbing unit according to claim 1, it is characterised in that: the vacuum cups (705)
There are two quantity, and the bottom of described two vacuum cups (705) is located at the first manipulator (702) and the second manipulator
(704) it is fixedly connected at the top of.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821694451.XU CN208819846U (en) | 2018-10-18 | 2018-10-18 | A kind of wafer precision scrubbing unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821694451.XU CN208819846U (en) | 2018-10-18 | 2018-10-18 | A kind of wafer precision scrubbing unit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208819846U true CN208819846U (en) | 2019-05-03 |
Family
ID=66279849
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821694451.XU Active CN208819846U (en) | 2018-10-18 | 2018-10-18 | A kind of wafer precision scrubbing unit |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208819846U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113013070A (en) * | 2021-03-16 | 2021-06-22 | 无锡锐思智能焊接装备有限公司 | Wafer cleaning and spin-drying method |
-
2018
- 2018-10-18 CN CN201821694451.XU patent/CN208819846U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113013070A (en) * | 2021-03-16 | 2021-06-22 | 无锡锐思智能焊接装备有限公司 | Wafer cleaning and spin-drying method |
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