CN211264068U - exposure machine - Google Patents

exposure machine Download PDF

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CN211264068U
CN211264068U CN201922435548.XU CN201922435548U CN211264068U CN 211264068 U CN211264068 U CN 211264068U CN 201922435548 U CN201922435548 U CN 201922435548U CN 211264068 U CN211264068 U CN 211264068U
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exposure
span
exposure machine
along
walking frame
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张雷
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Yuanzhuo Micro Nano Technology Suzhou Co ltd
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Advanced Micro Intelligent System & Creative Optics Inc
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Abstract

The utility model provides an exposure machine, it includes: the exposure platform, it has a table surface, large-span running gear, and it includes: the large-span walking frame is arranged along the X direction and positioned above the exposure platform, and the at least one first driving mechanism drives the large-span walking frame to walk along the Y direction; the exposure assembly is arranged on the large-span walking frame and is driven by the second driving mechanism to walk along the X direction; the span of the large-span walking frame along the X direction covers the width dimension of the exposure machine, and the motion stroke of the large-span walking frame along the Y direction covers the length dimension of the exposure machine. The utility model discloses an exposure machine can be suitable for the exposure of jumbo size half tone through large-span running gear, has increased the scope of exposure. Meanwhile, the motion of the large-span walking frame is driven by adopting a double-drive mode, so that the motion stability is improved, and the exposure precision is ensured.

Description

曝光机exposure machine

技术领域technical field

本实用新型涉及曝光技术领域,尤其涉及一种曝光机。The utility model relates to the technical field of exposure, in particular to an exposure machine.

背景技术Background technique

光刻技术是用于在衬底表面上印刷具有特征的构图。上述衬底可包括用于制造半导体器件、多种集成电路、平面显示器(例如液晶显示器)、电路板、生物芯片、微机械电子芯片、光电子线路芯片等的基片。Photolithography is used to print patterns with features on the surface of a substrate. Such substrates may include substrates for the manufacture of semiconductor devices, various integrated circuits, flat panel displays (eg, liquid crystal displays), circuit boards, biochips, micromechanical electronic chips, optoelectronic circuit chips, and the like.

直写光刻技术以替代传统的掩膜版或菲林底片等曝光的影像直接转移技术,在半导体及PCB生产领域有着非常重要的作用。曝光网版的尺寸影响曝光技术的重要因素,尤其是针对大尺寸的产品而言,需要提供与之配合的曝光机。此外,在实际生产中,需要对网板、PCB板、PS板等不同的产品进行曝光,单独的一台曝光机则无法适应上述多种产品。因此,针对上述问题,有必要提出进一步的解决方案。Direct-write lithography is a very important method in the field of semiconductor and PCB production to replace the traditional direct transfer technology of exposed images such as masks or film negatives. The size of the exposure screen is an important factor affecting the exposure technology, especially for large-size products, it is necessary to provide a matching exposure machine. In addition, in actual production, it is necessary to expose different products such as stencils, PCB boards, PS boards, etc., and a single exposure machine cannot adapt to the above-mentioned products. Therefore, it is necessary to propose further solutions for the above problems.

实用新型内容Utility model content

本实用新型旨在提供一种曝光机,以克服现有技术中存在的不足。The utility model aims to provide an exposure machine to overcome the deficiencies in the prior art.

为解决上述技术问题,本实用新型的技术方案是:For solving the above-mentioned technical problems, the technical scheme of the present utility model is:

一种曝光机,其包括:An exposure machine comprising:

曝光台,其具有一工作台面、Exposure table, which has a work surface,

大跨度行走机构,其包括:沿X方向布置且位于所述曝光台上方的大跨度行走架、驱动所述大跨度行走架沿Y方向行走的至少一个第一驱动机构;A large-span traveling mechanism, comprising: a large-span traveling frame arranged along the X direction and located above the exposure table, and at least one first driving mechanism for driving the large-span traveling frame to travel along the Y direction;

曝光组件,其设置于所述大跨度行走架上,并由第二驱动机构带动沿X方向行走;an exposure assembly, which is arranged on the large-span walking frame and is driven by the second driving mechanism to travel along the X direction;

所述大跨度行走架沿X方向的跨距覆盖所述曝光机的宽度尺寸,所述大跨度行走架沿Y方向的运动行程覆盖所述曝光机的长度尺寸。The span of the large-span traveling frame along the X direction covers the width dimension of the exposure machine, and the movement stroke of the large-span traveling frame along the Y direction covers the length dimension of the exposure machine.

作为本实用新型的曝光机的改进,所述曝光台的工作台面上还开设有若干真空吸孔。As an improvement of the exposure machine of the present invention, a plurality of vacuum suction holes are also opened on the work surface of the exposure table.

作为本实用新型的曝光机的改进,所述若干真空吸孔以阵列形式均匀地分布于所述曝光台的工作台面上。As an improvement of the exposure machine of the present invention, the plurality of vacuum suction holes are evenly distributed on the work surface of the exposure table in the form of an array.

作为本实用新型的曝光机的改进,所述第一驱动机构为两个,两个第一驱动机构同步地驱动所述大跨度行走架沿Y方向行走,两个第一驱动机构位于所述曝光台上,并对称地分布于所述工作台面的两侧。As an improvement of the exposure machine of the present invention, there are two first drive mechanisms, the two first drive mechanisms synchronously drive the large-span travel frame to travel along the Y direction, and the two first drive mechanisms are located in the exposure on the table and symmetrically distributed on both sides of the work table.

作为本实用新型的曝光机的改进,所述第一驱动机构为一沿Y方向设置的第一直线电机,其包括动子和定子,所述动子沿所述定子在Y方向进行运动,所述大跨度行走架的端部与所述动子相连接。As an improvement of the exposure machine of the present invention, the first driving mechanism is a first linear motor arranged along the Y direction, which includes a mover and a stator, and the mover moves in the Y direction along the stator, The end of the large-span walking frame is connected with the mover.

作为本实用新型的曝光机的改进,所述曝光机还包括夹持机构,其设置于所述工作台面的两侧,任一侧的夹持机构与所在侧工作台面的边缘保持工作距离。As an improvement of the exposure machine of the present invention, the exposure machine further includes a clamping mechanism, which is arranged on both sides of the work table, and the clamping mechanism on either side maintains a working distance from the edge of the work table.

作为本实用新型的曝光机的改进,一侧的夹持机构为固定设置,另一侧的夹持机构沿X方向调节设置,或两侧夹持机构均沿X方向调节。As an improvement of the exposure machine of the present invention, the clamping mechanism on one side is fixed and the clamping mechanism on the other side is adjusted along the X direction, or the clamping mechanisms on both sides are adjusted along the X direction.

作为本实用新型的曝光机的改进,任一侧的夹持机构为若干个,两侧的夹持机构对称分布,任一侧的夹持机构包括一压紧气缸。As an improvement of the exposure machine of the present invention, there are several clamping mechanisms on either side, the clamping mechanisms on both sides are symmetrically distributed, and the clamping mechanisms on either side include a pressing cylinder.

作为本实用新型的曝光机的改进,所述曝光组件包括:至少一个曝光镜头,其朝向所述工作台面竖直设置。As an improvement of the exposure machine of the present invention, the exposure assembly includes: at least one exposure lens, which is vertically arranged toward the work table.

作为本实用新型的曝光机的改进,所述第二驱动机构为一沿X方向设置的第二直线电机,其包括动子和定子,所述动子沿所述定子在X方向进行运动,所述曝光组件与所述动子相连接。As an improvement of the exposure machine of the present invention, the second driving mechanism is a second linear motor arranged along the X direction, which includes a mover and a stator, and the mover moves in the X direction along the stator, so The exposure assembly is connected with the mover.

与现有技术相比,本实用新型的有益效果是:本实用新型的曝光机通过大跨度行走机构,能够适于大尺寸网版的曝光,增大了曝光的范围。同时,通过采用双驱的方式驱动大跨度行走架的运动,有利于提高运动的稳定性,保证曝光的精度。Compared with the prior art, the beneficial effects of the present utility model are: the exposure machine of the present utility model can be adapted to the exposure of large-size screen plates through the large-span traveling mechanism, thereby increasing the exposure range. At the same time, the movement of the long-span walking frame is driven by the double-drive method, which is beneficial to improve the stability of the movement and ensure the accuracy of exposure.

此外,通过设置具有吸附功能的工作台面以及在工作台面的两侧设置夹持机构,从而通过工作台面能够吸附小尺寸的产品,配合两侧的夹持机构可固定大尺寸的产品,从而实现了一台曝光机适应不同产品的曝光需求。In addition, by setting a worktable with adsorption function and setting clamping mechanisms on both sides of the worktable, small-sized products can be adsorbed through the worktable, and large-sized products can be fixed with the clamping mechanisms on both sides, thereby realizing One exposure machine can adapt to the exposure needs of different products.

附图说明Description of drawings

为了更清楚地说明本实用新型实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本实用新型中记载的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the embodiments of the present utility model or the technical solutions in the prior art, the following briefly introduces the accompanying drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description These are only some embodiments described in the present utility model. For those of ordinary skill in the art, other drawings can also be obtained from these drawings without any creative effort.

图1为本实用新型的曝光机一实施例的立体示意图;Fig. 1 is the three-dimensional schematic diagram of one embodiment of the exposure machine of the present invention;

图2为本实用新型的曝光机一实施例的立体示意图,其中曝光的产品为网板;Fig. 2 is a perspective view of an embodiment of the exposure machine of the present invention, wherein the exposed product is a stencil;

图3为本实用新型的曝光机一实施例的立体示意图,其中曝光的产品为PCB板;3 is a perspective view of an embodiment of the exposure machine of the present invention, wherein the exposed product is a PCB board;

图4为本实用新型的曝光机一实施例的立体示意图,其中曝光的产品为PS板。4 is a schematic perspective view of an embodiment of the exposure machine of the present invention, wherein the exposed product is a PS board.

具体实施方式Detailed ways

下面将结合本实用新型实施例中的附图,对本实用新型实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本实用新型一部分实施例,而不是全部的实施例。基于本实用新型中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本实用新型保护的范围。The technical solutions in the embodiments of the present utility model will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the implementations. example. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the protection scope of the present invention.

如图1所示,本实用新型一实施例的曝光机包括:曝光台1、大跨度行走机构2、曝光组件3。As shown in FIG. 1 , an exposure machine according to an embodiment of the present invention includes an exposure table 1 , a large-span traveling mechanism 2 , and an exposure assembly 3 .

所述曝光台1用于放置以及固定待曝光的网版。具体地,所述曝光台1具有一工作台面11,待曝光的网版可放置并固定于该工作台面11上。相应的,所述曝光台1的工作台面11上还开设有若干真空吸孔。一个实施方式中,所述若干真空吸孔以阵列形式均匀地分布于所述曝光台1的工作台面11上,以提供均匀的吸附固定作用力。The exposure table 1 is used for placing and fixing the screen plate to be exposed. Specifically, the exposure table 1 has a work surface 11 on which the screen plate to be exposed can be placed and fixed. Correspondingly, a plurality of vacuum suction holes are also opened on the work surface 11 of the exposure table 1 . In one embodiment, the plurality of vacuum suction holes are evenly distributed on the work surface 11 of the exposure table 1 in an array form, so as to provide a uniform suction and fixing force.

所述大跨度行走机构2用于适应大尺寸网版的曝光,增大了曝光的范围。The large-span traveling mechanism 2 is used to adapt to the exposure of large-size screen plates, thereby increasing the exposure range.

具体地,所述大跨度行走机构2包括:沿X方向布置且位于所述曝光台1上方的大跨度行走架、驱动所述大跨度行走架21沿Y方向行走的至少一个第一驱动机构22。Specifically, the large-span traveling mechanism 2 includes: a large-span traveling frame arranged along the X-direction and located above the exposure table 1, and at least one first driving mechanism 22 for driving the large-span traveling frame 21 to travel along the Y-direction .

其中,所述大跨度行走架21沿X方向的跨距覆盖所述曝光机的宽度尺寸,一个实施方式中,所述大跨度行走架21为一龙门架。所述大跨度行走架21沿Y方向的运动行程覆盖所述曝光机的长度尺寸。如此保证了,放置于曝光台1上的网版都处于曝光的范围之内。Wherein, the span of the large-span traveling frame 21 along the X direction covers the width dimension of the exposure machine. In one embodiment, the large-span traveling frame 21 is a gantry. The movement stroke of the large-span traveling frame 21 along the Y direction covers the length dimension of the exposure machine. This ensures that the screen plates placed on the exposure table 1 are all within the exposure range.

一个实施方式中,为了保证大跨度行走架21运动的稳定性,采用两个第一驱动机构22同步驱动大跨度行走架21进行运动。本实施方式是考虑到,由于采用了大跨度行走架21,如果仍然采用单驱的方式,会导致两边不同步,降低了曝光精度,容易损坏机械设备,影响设备整体的使用寿命。In one embodiment, in order to ensure the stability of the movement of the large-span walking frame 21 , two first driving mechanisms 22 are used to drive the large-span walking frame 21 to move synchronously. In this embodiment, due to the use of the large-span walking frame 21, if the single-drive mode is still adopted, the two sides will be out of synchronization, the exposure accuracy will be reduced, the mechanical equipment will be easily damaged, and the overall service life of the equipment will be affected.

本实施方式中,采用双驱的方式,两个第一驱动机构22对称地分布于所述工作台面11的两侧。In this embodiment, a dual-drive mode is adopted, and the two first drive mechanisms 22 are symmetrically distributed on both sides of the work surface 11 .

具体地,所述第一驱动机构22为一沿Y方向设置的第一直线电机,其包括动子和定子,所述动子沿所述定子在Y方向进行运动,所述大跨度行走架21的一端与所述动子相连接。Specifically, the first driving mechanism 22 is a first linear motor arranged along the Y direction, which includes a mover and a stator, the mover moves in the Y direction along the stator, and the large-span walking frame One end of 21 is connected with the mover.

如图2-4所示,为了适应不同尺寸的产品的曝光,本实用新型一实施例的曝光机中,所述曝光台1的两侧还设置有夹持机构23。从而,当小尺寸的产品曝光时,可通过工作台面11进行固定;当需要曝光大尺寸的产品时,可通过工作台面11对产品的中间区域进行固定,并通过夹持机构23对产品的两侧边缘进行夹持固定。任一侧的夹持机构23为若干个,两侧的夹持机构对称分布,任一侧的夹持机构23包括一压紧气缸。As shown in FIGS. 2-4 , in order to adapt to the exposure of products of different sizes, in the exposure machine according to an embodiment of the present invention, clamping mechanisms 23 are further provided on both sides of the exposure table 1 . Therefore, when a small-sized product is exposed, it can be fixed by the worktable 11; when a large-sized product needs to be exposed, the middle area of the product can be fixed by the worktable 11, and the two sides of the product can be fixed by the clamping mechanism 23. The side edge is clamped and fixed. There are several clamping mechanisms 23 on either side, the clamping mechanisms on both sides are symmetrically distributed, and the clamping mechanisms 23 on either side include a pressing cylinder.

一个实施方式中,所述夹持机构23与所述工作台面11的两侧边缘保持工作距离。具体地,任一侧的夹持机构23为若干个,两侧的夹持机构23对称分布,任一侧的夹持机构23包括一压紧气缸。其中,一侧的夹持机构23为固定设置,另一侧的夹持机构23沿X方向调节设置,相应的,曝光台1上设置有方便夹持机构23活动调节的导轨。可替代地,或两侧夹持机构23均沿X方向调节设置。此外,曝光台1上还设置有起到支撑作用的型材231。In one embodiment, the clamping mechanism 23 maintains a working distance from the edges on both sides of the work surface 11 . Specifically, there are several clamping mechanisms 23 on either side, the clamping mechanisms 23 on both sides are symmetrically distributed, and the clamping mechanisms 23 on either side include a pressing cylinder. The clamping mechanism 23 on one side is fixed and the clamping mechanism 23 on the other side is adjusted along the X direction. Correspondingly, the exposure table 1 is provided with a guide rail that facilitates the movable adjustment of the clamping mechanism 23 . Alternatively, the clamping mechanisms 23 on both sides can be adjusted along the X direction. In addition, the exposure table 1 is also provided with a profile 231 that plays a supporting role.

如此设置,当需要固定大尺寸的产品时,可将产品首先与固定侧的夹持机构23对齐,该固定侧的夹持机构23的压紧气缸压紧产品的一侧边缘,然后另一侧的夹持机构23的压紧气缸调节地运动至适宜的位置,对产品的另一侧边缘进行压紧固定。In this way, when a large-sized product needs to be fixed, the product can be first aligned with the clamping mechanism 23 on the fixed side, and the pressing cylinder of the clamping mechanism 23 on the fixed side presses one edge of the product, and then the other side The pressing cylinder of the clamping mechanism 23 is adjusted to move to an appropriate position to press and fix the other side edge of the product.

所述曝光组件3用于提供曝光时的光照。具体地,所述曝光组件3设置于所述大跨度行走架21上,并由第二驱动机构带动沿X方向行走。The exposure assembly 3 is used to provide light during exposure. Specifically, the exposure assembly 3 is arranged on the large-span traveling frame 21, and is driven by the second driving mechanism to travel along the X direction.

一个实施方式中,所述曝光组件3包括:至少一个曝光镜头,其朝向所述工作台面11竖直设置,并收容安装在保护壳体中。其中,所述第二驱动机构为一沿X方向设置的第二直线电机31,其包括动子和定子,所述动子沿所述定子在X方向进行运动,所述曝光组件3与所述动子相连接。In one embodiment, the exposure assembly 3 includes: at least one exposure lens, which is vertically disposed toward the work table 11 and is accommodated and installed in a protective casing. Wherein, the second driving mechanism is a second linear motor 31 arranged along the X direction, which includes a mover and a stator, the mover moves along the stator in the X direction, and the exposure assembly 3 is connected to the The movers are connected.

综上所述,本实用新型的曝光机通过大跨度行走机构,能够适于大尺寸网版的曝光,增大了曝光的范围。同时,通过采用双驱的方式驱动大跨度行走架的运动,有利于提高运动的稳定性,保证曝光的精度。To sum up, the exposure machine of the present invention can be suitable for the exposure of large-size screen plates through the large-span traveling mechanism, and the exposure range is increased. At the same time, the movement of the long-span walking frame is driven by the double-drive method, which is beneficial to improve the stability of the movement and ensure the accuracy of exposure.

此外,通过设置具有吸附功能的工作台面以及在工作台面的两侧设置夹持机构,从而通过工作台面能够吸附小尺寸的产品,配合两侧的夹持机构可固定大尺寸的产品,从而实现了一台曝光机适应不同产品的曝光需求。In addition, by setting a worktable with adsorption function and setting clamping mechanisms on both sides of the worktable, small-sized products can be adsorbed through the worktable, and large-sized products can be fixed with the clamping mechanisms on both sides, thereby realizing One exposure machine can adapt to the exposure needs of different products.

对于本领域技术人员而言,显然本实用新型不限于上述示范性实施例的细节,而且在不背离本实用新型的精神或基本特征的情况下,能够以其他的具体形式实现本实用新型。因此,无论从哪一点来看,均应将实施例看作是示范性的,而且是非限制性的,本实用新型的范围由所附权利要求而不是上述说明限定,因此旨在将落在权利要求的等同要件的含义和范围内的所有变化囊括在本实用新型内。不应将权利要求中的任何附图标记视为限制所涉及的权利要求。It will be apparent to those skilled in the art that the present invention is not limited to the details of the above-described exemplary embodiments, and that the present invention may be implemented in other specific forms without departing from the spirit or essential characteristics of the present invention. Therefore, the embodiments are to be considered in all respects as exemplary and not restrictive, and the scope of the present invention is defined by the appended claims rather than the foregoing description, and it is therefore intended that the All changes within the meaning and range of the required equivalents are embraced within the present invention. Any reference signs in the claims shall not be construed as limiting the involved claim.

此外,应当理解,虽然本说明书按照实施方式加以描述,但并非每个实施方式仅包含一个独立的技术方案,说明书的这种叙述方式仅仅是为清楚起见,本领域技术人员应当将说明书作为一个整体,各实施例中的技术方案也可以经适当组合,形成本领域技术人员可以理解的其他实施方式。In addition, it should be understood that although this specification is described in terms of embodiments, not each embodiment only includes an independent technical solution, and this description in the specification is only for the sake of clarity, and those skilled in the art should take the specification as a whole , the technical solutions in each embodiment can also be appropriately combined to form other implementations that can be understood by those skilled in the art.

Claims (10)

1. An exposure machine, characterized by comprising:
an exposure stage having a table top,
Large-span running gear, it includes: the large-span walking frame is arranged along the X direction and positioned above the exposure table, and the at least one first driving mechanism drives the large-span walking frame to walk along the Y direction;
the exposure assembly is arranged on the large-span walking frame and is driven by the second driving mechanism to walk along the X direction;
the span of the large-span walking frame along the X direction covers the width dimension of the exposure machine, and the motion stroke of the large-span walking frame along the Y direction covers the length dimension of the exposure machine.
2. The exposure machine of claim 1, wherein the worktable of the exposure table is further provided with a plurality of vacuum suction holes.
3. Exposure machine according to claim 2, characterised in that the vacuum suction holes are evenly distributed in an array over the work surface of the exposure table.
4. The exposure machine according to claim 1, wherein the number of the first driving mechanisms is two, two first driving mechanisms drive the large-span traveling frame to travel in the Y direction synchronously, and two first driving mechanisms are located on the exposure stage and symmetrically distributed on both sides of the work table.
5. Exposure machine according to claim 1 or 4, characterised in that the first drive means is a first linear motor arranged in the Y-direction, comprising a mover and a stator, along which the mover is moved in the Y-direction, the end of the large-span walking frame being connected to the mover.
6. Exposure machine according to claim 1, characterised in that the exposure machine further comprises clamping means which are arranged on both sides of the table top, the clamping means on either side being at a working distance from the edge of the table top on which it is arranged.
7. Exposure machine according to claim 6, characterised in that the clamping means on one side are fixedly arranged and the clamping means on the other side are adjustably arranged in the X-direction or that both clamping means are adjustably arranged in the X-direction.
8. Exposure machine according to claim 6, characterised in that: the fixture on any side is a plurality of, and the fixture symmetric distribution of both sides, the fixture on any side includes one and compresses tightly the cylinder.
9. The exposure machine according to claim 1, wherein the exposure assembly comprises: and the at least one exposure lens is vertically arranged towards the working table top.
10. Exposure machine according to claim 1, wherein the second drive means is a second linear motor arranged in the X-direction and comprising a mover and a stator, the mover being movable in the X-direction along the stator, the exposure assembly being coupled to the mover.
CN201922435548.XU 2019-12-30 2019-12-30 exposure machine Active CN211264068U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117289556A (en) * 2023-09-14 2023-12-26 深圳市海目芯微电子装备科技有限公司 Display panel edge exposure equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117289556A (en) * 2023-09-14 2023-12-26 深圳市海目芯微电子装备科技有限公司 Display panel edge exposure equipment

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