CN212069727U - Groove type wet cleaning machine - Google Patents

Abstract

The utility model belongs to the technical field of the wet cleaning technique and specifically relates to slot type wet cleaner washs the slot type wet cleaner that case, upper cover and pipe are constituteed outward, the inner chamber cover that washs the case outward is equipped with hollow interior washing case, and the inner chamber that washs the case in communicates with each other with the pipe, set up on the lateral wall of interior washing case and run through and extend to the outside arbitrary groove that washs the case outside, the arbitrary inslot is located and washs one side that the case is close to the upper cover and its inner chamber movable mounting have to its sealed, with commercial power continuous electromagnet assembly, shift out from the arbitrary groove to its sealed electromagnet assembly during the circular telegram. The utility model discloses simple structure, the simple operation, slot type wet process cleaning process among the solution prior art that can be fine causes secondary pollution's shortcoming to the silicon chip that washs the completion, has stronger practicality.

Description

Tank Type Wet Cleaning Machine

technical field

The utility model relates to the technical field of wet cleaning, in particular to a trough type wet cleaning machine.

Background technique

In the field of semiconductor manufacturing, the wet etching process is usually processed by a tank wet cleaning machine, which is mainly used to remove particle contamination on the surface.

The utility model patent with the existing application number of 201711178278.8 discloses a type of wet cleaning machine, in order to solve the problem that the cleaning dead angle caused by the silicon wafer pattern cannot be removed in the prior art, and the secondary pollution of the silicon wafer during the wet cleaning process. , but, in the actual technical solution:

Even if the user can set the angle of the silicon wafer through the main equipment computer, adjust the circumferential angle of the silicon wafer to be cleaned, avoid the cleaning dead angle caused by the silicon wafer pattern, and reduce the probability of contamination particles stuck in the product pattern and cannot be removed. During the process of wafer cleaning and removal, because the wafer is in the contaminated chemical cleaning solution, it will still directly lead to secondary pollution of the wafer.

Utility model content

The purpose of this utility model is to solve the problem that in the prior art tank type wet cleaning process, in the process of completing and taking out the silicon wafer, because the silicon wafer is in the contaminated chemical cleaning solution, it will still directly lead to silicon The disadvantage of the secondary pollution of the sheet, and the proposed trough type wet cleaning machine.

In order to achieve the above-mentioned purpose, the utility model adopts the following technical solutions:

Design a trough type wet cleaning machine, including a trough type wet cleaning machine composed of an outer cleaning box, an upper cover and a conduit. The inner cavity of the outer cleaning box is set with a hollow inner cleaning box, and the inner cavity of the inner cleaning box and the conduit The joints between the conduit and the inner cleaning box and the outer cleaning box are respectively provided with sealing sleeves to ensure the tightness of the connection.

The side wall of the inner cleaning box is provided with a diffuser penetrating through and extending to the outside of the outer cleaning box. The electromagnet assembly that is electrically connected, and the electromagnet assembly that is sealed to it, moves out of the diffuser when it is energized.

Preferably, the electromagnet assembly includes an inner magnetic plate and an outer magnetic cover that are magnetically different in the energized state, the inner magnetic plate is fitted into the diffused groove of the cavity wall of the inner cleaning box, and the outer magnetic cover is installed outside the outer cleaning box Corresponding to the position of the diffuser groove, a guide plate for guiding the movement path of the inner magnetic plate is installed between the outer magnetic cover and the inner magnetic plate.

Preferably, a fixing plate for fixing it on the inner cavity wall of the outer cleaning box is installed on the outer surface of the inner cleaning box, and the fixing plate and the diffuser groove are dislocated and distributed.

Preferably, the bottom of the upper diffuser of the inner cleaning box is inclined along a side close to the outer cleaning box.

Preferably, an elastic connecting conduit is connected between the inner magnetic plate and the outer magnetic cover.

Preferably, a storage cavity for storing liquid is provided between the bottom end of the inner cleaning box and the cavity bottom of the outer cleaning box.

The utility model has the advantages of simple structure and convenient operation, can well solve the disadvantage of secondary pollution to the cleaned silicon wafer in the prior art in the groove type wet cleaning process, and has strong practicability.

Description of drawings

Fig. 1 is the left side view structure schematic diagram of the present utility model;

Fig. 2 is the right side view structure schematic diagram of the present utility model;

Fig. 3 is the partial sectional structure schematic diagram of the present utility model;

Fig. 4 is the side sectional structure schematic diagram of the utility model;

FIG. 5 is a partial enlarged schematic view of the structure at A in FIG. 4 of the present invention.

In the picture: 1-outer cleaning box, 11-upper cover, 2-inner cleaning box, 3-conduit, 31-sealing sleeve, 4-diffuse groove, 41-inner magnetic plate, 42-guide plate, 43-outer magnetic hood, 44-connecting conduit, 5-fixing plate.

Detailed ways

The technical solutions in the embodiments of the present utility model will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the implementations. example.

1-5, the trough-type wet cleaning machine includes a trough-type wet cleaning machine composed of an outer cleaning box 1, an upper cover 11 and a conduit 3, the inner cavity of the outer cleaning box 1 is set with a hollow inner cleaning box 2, The inner cavity of the inner cleaning box 2 is communicated with the conduit 3. The side wall of the inner cleaning box 2 is provided with a diffuser groove 4 which penetrates and extends to the outside of the outer cleaning box 1. There is an electromagnet assembly on the side and its inner cavity that is sealed and connected to the mains. When the power is turned on, the electromagnet assembly sealed to it is removed from the diffuser groove 4. The conduit 3 is connected to the inner cleaning box 2 and the outer cleaning box 1. Sealing sleeves 31 are respectively installed at the joints to ensure the tightness of the joints.

In the process of wet cleaning, firstly put 6 into the inner cavity of the inner cleaning box 2 vertically. When the chemical liquid is introduced into the inner cavity of the inner cleaning box 2 through the conduit 3 from bottom to top, the chemical liquid is from bottom to top. 6 is cleaned. After the chemical liquid is completely immersed in 6 to clean it, the electromagnet assembly is energized to remove it from the diffuser tank 4, and then the chemical liquid in the inner cavity of the inner cleaning tank 2 flows through the diffuser tank 4 from top to bottom. , because in the process that the chemical liquid is introduced into the inner cavity of the inner cleaning box 2 through the conduit 3 from bottom to top, and the chemical liquid is exported from the top to the bottom through the inner cleaning box 2 through the diffuser 4, the cleaned The contaminated chemicals are firstly exported through the diffuser tank 4, so after the chemical solution in the upper part of Taking out the contaminated chemical liquid, the problem of secondary pollution during the taking out process is well avoided, and the realization method and structure are simple.

The electromagnet assembly includes an inner magnetic plate 41 and an outer magnetic cover 43 that are magnetically different in the energized state. The inner magnetic plate 41 is fitted into the diffuser groove 4 of the cavity wall of the inner cleaning box 2 , and the outer magnetic cover 43 is installed outside the outer cleaning box 1 . And corresponding to the position of the diffuser groove 4, a guide plate 42 is installed between the outer magnetic cover 43 and the inner magnetic plate 41 to guide the moving path of the inner magnetic plate 41. When the electromagnet assembly is energized, the inner magnetic plate 42 is installed. 41 and the outer magnetic cover 43 attract each other, which drives the inner magnetic plate 41 to move out of the diffuser groove 4 along the guide plate 42. At this time, it is ensured that the chemical liquid in the inner cleaning box 2 is diffused through the electric current of the electromagnet assembly. The groove 4 is led out, and after the 6 is taken out, the inner magnetic plate 41 can be plugged in the diffuser groove 4 to be sealed.

A fixing plate 5 is installed on the outer surface of the inner cleaning box 2 to fix it on the inner cavity wall of the outer cleaning box 1. The fixing plate 5 and the diffuser groove 4 are dislocated, and the inner cleaning box 2 and the outer cleaning box 1 are ensured by the fixing plate 5. They are relatively fixed, and the installation gap generated between the inner cleaning box 2 and the outer cleaning box 1 ensures the storage of the chemical liquid led out through the diffuser 4 .

The bottom of the diffuser tank 4 on the inner cleaning tank 2 is inclined along the side close to the outer cleaning tank 1. During the process of exporting the chemical liquid through the diffuser tank 4, it flows along the inclined bottom of the diffuser tank 4, which effectively speeds up its export. speed and improve the efficiency of the whole process.

An elastic connecting conduit 44 is connected between the inner magnetic plate 41 and the outer magnetic cover 43. When the outer magnetic cover 43 and the inner magnetic plate 41 attract each other, the connecting conduit 44 ensures that the relative position between the two does not shift while preventing chemical liquid Under the impact, the inner magnetic plate 41 is displaced relative to the diffuser groove 4 on the outer cleaning box 1 .

Between the bottom end of the inner cleaning box 2 and the cavity bottom of the outer cleaning box 1, there is a storage cavity for storing liquid. The storage cavity formed between the cavity bottom of the outer cleaning box 1 centrally stores the exported chemical solution, preventing the chemical solution from directly adhering to the outside of the inner cleaning box 2 and increasing the difficulty of subsequent chemical solution cleaning.

In the description of the present invention, although the embodiments of the present invention have been shown and described, it will be understood by those of ordinary skill in the art that these The embodiments are subject to various changes, modifications, substitutions and alterations, and the scope of the present invention is defined by the appended claims and their equivalents.

Claims (6)

1. The trough type wet cleaning machine, comprising the trough type wet cleaning machine composed of an outer cleaning box, an upper cover and a conduit, it is characterized in that: the inner cavity of the outer cleaning box is set with a hollow inner cleaning box, and the inner cleaning box is The inner cavity of the inner cleaning box is communicated with the conduit, the side wall of the inner cleaning box is provided with a diffused groove that penetrates and extends to the outside of the outer cleaning box, the diffused groove is located on the side of the inner cleaning box close to the upper cover and its inner cavity is movably installed There is an electromagnet assembly sealed to it and connected to the mains, and the electromagnet assembly sealed to it is removed from the diffuser when the power is turned on. 2 . The trough-type wet cleaning machine according to claim 1 , wherein the electromagnet assembly comprises an inner magnetic plate and an outer magnetic cover that are magnetically different in an energized state, and the inner magnetic plate is sleeved for cleaning inside. 3 . In the diffuser groove of the box cavity wall, the outer magnetic cover is installed outside the outer cleaning box and corresponds to the position of the diffuser groove, and a guide plate for guiding the movement path of the inner magnetic plate is installed between the outer magnetic cover and the inner magnetic plate. 3. The trough-type wet cleaning machine according to claim 1 or 2, characterized in that: a fixing plate is installed on the outer surface of the inner cleaning box to fix it on the inner cavity wall of the outer cleaning box, and the fixing plate is installed on the outer surface of the inner cleaning box. The plate and the diffuser are dislocated. 4 . The trough-type wet cleaning machine according to claim 1 , wherein the bottom of the upper diffuser of the inner cleaning box is inclined along the side close to the outer cleaning box. 5 . 5 . The trough-type wet cleaning machine according to claim 2 , wherein an elastic connecting conduit is connected between the inner magnetic plate and the outer magnetic cover. 6 . 6 . The trough type wet cleaning machine according to claim 1 , wherein a storage cavity for storing liquid is provided between the bottom end of the inner cleaning box and the cavity bottom of the outer cleaning box. 7 .

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