CS205020B2 - Process for metalplating aluminium substrate - Google Patents

Process for metalplating aluminium substrate Download PDF

Info

Publication number: CS205020B2
Authority: CS; Czechoslovakia
Prior art keywords: metal; substrate; aluminum; temperature; coating
Prior art date: 1975-04-18

Application number

CS762544A

Other languages

Czech (cs)

English (en)

Inventor

Miguel Coll-Palagos

Original Assignee

Stauffer Chemical Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1975-04-18

Filing date

1976-04-16

Publication date

1981-04-30

1976-04-16 Application filed by Stauffer Chemical Co filed Critical Stauffer Chemical Co

1981-04-30 Publication of CS205020B2 publication Critical patent/CS205020B2/cs

Links

239000000758 substrate Substances 0.000 title claims abstract description 42
229910052782 aluminium Inorganic materials 0.000 title claims abstract description 33
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims description 31
238000000034 method Methods 0.000 title claims description 21
239000004411 aluminium Substances 0.000 title 1
229910052751 metal Inorganic materials 0.000 claims abstract description 114
239000002184 metal Substances 0.000 claims abstract description 114
239000000203 mixture Substances 0.000 claims abstract description 35
238000000576 coating method Methods 0.000 claims abstract description 33
239000011248 coating agent Substances 0.000 claims abstract description 26
229910052802 copper Inorganic materials 0.000 claims abstract description 22
238000010438 heat treatment Methods 0.000 claims abstract description 19
229910052759 nickel Inorganic materials 0.000 claims abstract description 17
229910052718 tin Inorganic materials 0.000 claims abstract description 15
150000002739 metals Chemical class 0.000 claims abstract description 14
229910052725 zinc Inorganic materials 0.000 claims abstract description 8
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 32
239000010949 copper Substances 0.000 claims description 21
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 19
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 14
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 9
229910052804 chromium Inorganic materials 0.000 claims description 8
239000011651 chromium Substances 0.000 claims description 8
239000011701 zinc Substances 0.000 claims description 6
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 5
238000007740 vapor deposition Methods 0.000 claims description 3
238000001465 metallisation Methods 0.000 claims description 2
238000009792 diffusion process Methods 0.000 abstract description 15
238000007747 plating Methods 0.000 abstract description 12
239000000126 substance Substances 0.000 abstract description 7
RGHNJXZEOKUKBD-SQOUGZDYSA-M D-gluconate Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O RGHNJXZEOKUKBD-SQOUGZDYSA-M 0.000 abstract 1
230000003213 activating effect Effects 0.000 abstract 1
229940050410 gluconate Drugs 0.000 abstract 1
229940071182 stannate Drugs 0.000 abstract 1
125000005402 stannate group Chemical group 0.000 abstract 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 24
239000010410 layer Substances 0.000 description 14
239000000243 solution Substances 0.000 description 14
229910000838 Al alloy Inorganic materials 0.000 description 10
238000010587 phase diagram Methods 0.000 description 9
239000012086 standard solution Substances 0.000 description 7
238000009713 electroplating Methods 0.000 description 6
238000000151 deposition Methods 0.000 description 5
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
239000000853 adhesive Substances 0.000 description 4
230000001070 adhesive effect Effects 0.000 description 4
229910045601 alloy Inorganic materials 0.000 description 4
239000000956 alloy Substances 0.000 description 4
229910000765 intermetallic Inorganic materials 0.000 description 4
239000011777 magnesium Substances 0.000 description 4
229910052749 magnesium Inorganic materials 0.000 description 4
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical group [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
239000012790 adhesive layer Substances 0.000 description 3
238000007605 air drying Methods 0.000 description 3
230000015572 biosynthetic process Effects 0.000 description 3
KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
238000007654 immersion Methods 0.000 description 3
150000002736 metal compounds Chemical class 0.000 description 3
-1 0.01 to 99.98 wt% Chemical compound 0.000 description 2
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
230000004913 activation Effects 0.000 description 2
230000008021 deposition Effects 0.000 description 2
238000010586 diagram Methods 0.000 description 2
239000012535 impurity Substances 0.000 description 2
WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
CLDVQCMGOSGNIW-UHFFFAOYSA-N nickel tin Chemical compound [Ni].[Sn] CLDVQCMGOSGNIW-UHFFFAOYSA-N 0.000 description 2
229910017604 nitric acid Inorganic materials 0.000 description 2
238000010791 quenching Methods 0.000 description 2
230000000171 quenching effect Effects 0.000 description 2
229910052710 silicon Inorganic materials 0.000 description 2
KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
GEZAUFNYMZVOFV-UHFFFAOYSA-J 2-[(2-oxo-1,3,2$l^{5},4$l^{2}-dioxaphosphastannetan-2-yl)oxy]-1,3,2$l^{5},4$l^{2}-dioxaphosphastannetane 2-oxide Chemical compound [Sn+2].[Sn+2].[O-]P([O-])(=O)OP([O-])([O-])=O GEZAUFNYMZVOFV-UHFFFAOYSA-J 0.000 description 1
RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 description 1
KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 description 1
KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
108010010803 Gelatin Proteins 0.000 description 1
229910004039 HBF4 Inorganic materials 0.000 description 1
229910018487 Ni—Cr Inorganic materials 0.000 description 1
MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
230000001464 adherent effect Effects 0.000 description 1
AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
229910000147 aluminium phosphate Inorganic materials 0.000 description 1
239000007864 aqueous solution Substances 0.000 description 1
KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
239000004327 boric acid Substances 0.000 description 1
KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
238000004140 cleaning Methods 0.000 description 1
BWFPGXWASODCHM-UHFFFAOYSA-N copper monosulfide Chemical compound [Cu]=S BWFPGXWASODCHM-UHFFFAOYSA-N 0.000 description 1
KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical group [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
238000005260 corrosion Methods 0.000 description 1
230000007797 corrosion Effects 0.000 description 1
238000005520 cutting process Methods 0.000 description 1
238000005238 degreasing Methods 0.000 description 1
239000003599 detergent Substances 0.000 description 1
PEVJCYPAFCUXEZ-UHFFFAOYSA-J dicopper;phosphonato phosphate Chemical compound [Cu+2].[Cu+2].[O-]P([O-])(=O)OP([O-])([O-])=O PEVJCYPAFCUXEZ-UHFFFAOYSA-J 0.000 description 1
HTHDWDSBYOUAFF-UHFFFAOYSA-N dipotassium;dioxido(oxo)tin;trihydrate Chemical compound O.O.O.[K+].[K+].[O-][Sn]([O-])=O HTHDWDSBYOUAFF-UHFFFAOYSA-N 0.000 description 1
238000001035 drying Methods 0.000 description 1
238000010291 electrical method Methods 0.000 description 1
238000007772 electroless plating Methods 0.000 description 1
230000007613 environmental effect Effects 0.000 description 1
238000005530 etching Methods 0.000 description 1
AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
229920000159 gelatin Polymers 0.000 description 1
239000008273 gelatin Substances 0.000 description 1
235000019322 gelatine Nutrition 0.000 description 1
235000011852 gelatine desserts Nutrition 0.000 description 1
230000007062 hydrolysis Effects 0.000 description 1
238000006460 hydrolysis reaction Methods 0.000 description 1
239000007788 liquid Substances 0.000 description 1
229910001338 liquidmetal Inorganic materials 0.000 description 1
229910052748 manganese Inorganic materials 0.000 description 1
239000011572 manganese Substances 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
230000008018 melting Effects 0.000 description 1
238000002844 melting Methods 0.000 description 1
238000005272 metallurgy Methods 0.000 description 1
238000006386 neutralization reaction Methods 0.000 description 1
RRIWRJBSCGCBID-UHFFFAOYSA-L nickel sulfate hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O RRIWRJBSCGCBID-UHFFFAOYSA-L 0.000 description 1
DQZXOIPVJBKPAK-UHFFFAOYSA-L potassium;sodium;phosphono phosphate Chemical compound [Na+].[K+].OP(O)(=O)OP([O-])([O-])=O DQZXOIPVJBKPAK-UHFFFAOYSA-L 0.000 description 1
238000007790 scraping Methods 0.000 description 1
239000010703 silicon Substances 0.000 description 1
239000000176 sodium gluconate Substances 0.000 description 1
235000012207 sodium gluconate Nutrition 0.000 description 1
229940005574 sodium gluconate Drugs 0.000 description 1
229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
229920005552 sodium lignosulfonate Polymers 0.000 description 1
239000007921 spray Substances 0.000 description 1
238000005507 spraying Methods 0.000 description 1
238000006467 substitution reaction Methods 0.000 description 1
238000004381 surface treatment Methods 0.000 description 1
229950011008 tetrachloroethylene Drugs 0.000 description 1
HERBOKBJKVUALN-UHFFFAOYSA-K trisodium;2-[bis(carboxylatomethyl)amino]acetate;hydrate Chemical compound O.[Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CC([O-])=O HERBOKBJKVUALN-UHFFFAOYSA-K 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
- C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
- C25D5/44—Aluminium
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S205/00—Electrolysis: processes, compositions used therein, and methods of preparing the compositions
- Y10S205/917—Treatment of workpiece between coating steps
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12736—Al-base component
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12736—Al-base component
- Y10T428/1275—Next to Group VIII or IB metal-base component
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12785—Group IIB metal-base component
- Y10T428/12792—Zn-base component

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Electrochemistry (AREA)
Mechanical Engineering (AREA)
Electroplating Methods And Accessories (AREA)
Chemically Coating (AREA)
Other Surface Treatments For Metallic Materials (AREA)
Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)

CS762544A 1975-04-18 1976-04-16 Process for metalplating aluminium substrate CS205020B2 (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US56952675A	1975-04-18	1975-04-18

Publications (1)

Publication Number	Publication Date
CS205020B2 true CS205020B2 (en)	1981-04-30

Family

ID=24275800

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CS762544A CS205020B2 (en)	1975-04-18	1976-04-16	Process for metalplating aluminium substrate

Country Status (12)

Country	Link
US (1)	US4092448A (sv)
JP (1)	JPS51124635A (sv)
AR (1)	AR217625A1 (sv)
BR (1)	BR7601948A (sv)
CA (1)	CA1090212A (sv)
CS (1)	CS205020B2 (sv)
DE (1)	DE2615515A1 (sv)
FR (1)	FR2307890A1 (sv)
GB (1)	GB1525868A (sv)
IT (1)	IT1058137B (sv)
NL (1)	NL7602264A (sv)
SE (1)	SE7601702L (sv)

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JPS58187260A (ja) *	1982-04-26	1983-11-01	Mitsubishi Electric Corp	アルミニウム金属への半田被着法
DE3343251A1 (de) *	1983-11-30	1985-06-05	W.C. Heraeus Gmbh, 6450 Hanau	Systemtraeger fuer elektrische bauelemente
US4655884A (en) *	1985-08-19	1987-04-07	General Electric Company	Nickel plating of refractory metals
US4786324A (en) *	1986-01-10	1988-11-22	Rieger Franz Metallveredelung	Nickel-plating bath
US4938999A (en) *	1988-07-11	1990-07-03	Jenkin William C	Process for coating a metal substrate by chemical vapor deposition using a metal carbonyl
JPH0611917B2 (ja) *	1988-08-23	1994-02-16	日本鋼管株式会社	陽極酸化処理用多層アルミニウムめっき基体
JP2574016B2 (ja) *	1988-11-22	1997-01-22	日本碍子株式会社	ナトリウム−硫黄電池
US5127998A (en) *	1990-01-02	1992-07-07	General Electric Company	Area-selective metallization process
US5230965A (en) *	1990-01-02	1993-07-27	General Electric Company	High density interconnect with electroplated conductors
DE4136038C2 (de) *	1990-11-02	1994-06-16	Usui Kokusai Sangyo Kk	Geschweißtes Stahlrohr mit hoher Korrosionsbeständigkeit der Innenoberfläche sowie Verfahren zu seiner Herstellung
JPH05311188A (ja) *	1992-05-08	1993-11-22	Toyota Motor Corp	成形加工性に優れたアルミニウム板
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US6413588B1 (en)	1999-01-11	2002-07-02	E. I. Du Pont De Nemours And Company	Method of producing durable layered coatings
US7417290B2 (en) *	2006-01-09	2008-08-26	International Business Machines Corporation	Air break for improved silicide formation with composite caps
EP2049696B1 (en)	2006-06-30	2016-03-02	Constellium Rolled Products Ravenswood, LLC	High strength, heat treatable al-zn-mg aluminum alloy
US20080308425A1 (en) *	2007-06-12	2008-12-18	Honeywell International, Inc.	Corrosion and wear resistant coating for magnetic steel
IT1399805B1 (it)	2009-03-27	2013-05-03	Torino Politecnico	Procedimento per il rivestimento di particolari in lega di alluminio, in particolare in lega di alluminio pressocolata, e particolari realizzati tramite tale procedimento
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1976
- 1976-02-16 SE SE7601702A patent/SE7601702L/sv unknown
- 1976-02-23 CA CA246,337A patent/CA1090212A/en not_active Expired
- 1976-02-25 JP JP51019849A patent/JPS51124635A/ja active Pending
- 1976-02-26 GB GB7613/76A patent/GB1525868A/en not_active Expired
- 1976-03-04 NL NL7602264A patent/NL7602264A/xx not_active Application Discontinuation
- 1976-03-26 AR AR262686A patent/AR217625A1/es active
- 1976-03-31 BR BR7601948A patent/BR7601948A/pt unknown
- 1976-04-09 DE DE19762615515 patent/DE2615515A1/de not_active Withdrawn
- 1976-04-15 FR FR7611128A patent/FR2307890A1/fr active Granted
- 1976-04-15 IT IT49040/76A patent/IT1058137B/it active
- 1976-04-16 CS CS762544A patent/CS205020B2/cs unknown
- 1976-11-22 US US05/743,551 patent/US4092448A/en not_active Expired - Lifetime

Also Published As

Publication number	Publication date
FR2307890A1 (fr)	1976-11-12
AR217625A1 (es)	1980-04-15
BR7601948A (pt)	1976-10-12
SE7601702L (sv)	1976-10-19
FR2307890B1 (sv)	1980-09-05
JPS51124635A (en)	1976-10-30
NL7602264A (nl)	1976-10-20
US4092448A (en)	1978-05-30
CA1090212A (en)	1980-11-25
GB1525868A (en)	1978-09-20
DE2615515A1 (de)	1976-10-28
IT1058137B (it)	1982-04-10

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