CS215215B1 - Photoelectric master form and method of producing the same - Google Patents

Photoelectric master form and method of producing the same Download PDF

Info

Publication number
CS215215B1
CS215215B1 CS708579A CS708579A CS215215B1 CS 215215 B1 CS215215 B1 CS 215215B1 CS 708579 A CS708579 A CS 708579A CS 708579 A CS708579 A CS 708579A CS 215215 B1 CS215215 B1 CS 215215B1
Authority
CS
Czechoslovakia
Prior art keywords
photoelectric
layer
producing
coating
masking
Prior art date
Application number
CS708579A
Other languages
Czech (cs)
English (en)
Inventor
Nina M Gunina
Igor I Pojarkov
Ljudmila V Logutova
Konstantin A Lavrentev
Anatolij M Cernikov
Original Assignee
Nina M Gunina
Igor I Pojarkov
Ljudmila V Logutova
Konstantin A Lavrentev
Anatolij M Cernikov
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nina M Gunina, Igor I Pojarkov, Ljudmila V Logutova, Konstantin A Lavrentev, Anatolij M Cernikov filed Critical Nina M Gunina
Publication of CS215215B1 publication Critical patent/CS215215B1/cs

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • G03F1/56Organic absorbers, e.g. of photo-resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • G03F1/58Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Glass Compositions (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CS708579A 1978-10-30 1979-10-18 Photoelectric master form and method of producing the same CS215215B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU782675175A SU938338A1 (ru) 1978-10-30 1978-10-30 Фотошаблон и способ его изготовлени

Publications (1)

Publication Number Publication Date
CS215215B1 true CS215215B1 (en) 1982-08-27

Family

ID=20789759

Family Applications (1)

Application Number Title Priority Date Filing Date
CS708579A CS215215B1 (en) 1978-10-30 1979-10-18 Photoelectric master form and method of producing the same

Country Status (6)

Country Link
JP (1) JPS5560946A (de)
CS (1) CS215215B1 (de)
DD (1) DD148177A3 (de)
DE (1) DE2930416C2 (de)
FR (1) FR2440568A1 (de)
SU (1) SU938338A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3525800A1 (de) * 1985-07-19 1987-01-22 Philips Patentverwaltung Schaltungsanordnung fuer einen fernsehempfaenger mit einem regelbaren zf-videosignalverstaerker
DE69133169D1 (de) * 1990-05-09 2003-01-16 Canon Kk Verfahren zur Erzeugung einer Struktur und Verfahren zum Vorbereiten einer halbleitenden Anordnung mit Hilfe dieses Verfahrens
DE19721524A1 (de) * 1997-05-22 1998-11-26 Hsm Gmbh Verfahren zur Herstellung eines Prägezylinders

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3622319A (en) * 1966-10-20 1971-11-23 Western Electric Co Nonreflecting photomasks and methods of making same

Also Published As

Publication number Publication date
DE2930416A1 (de) 1980-05-14
JPS5560946A (en) 1980-05-08
DE2930416C2 (de) 1982-05-13
SU938338A1 (ru) 1982-06-23
DD148177A3 (de) 1981-05-13
FR2440568A1 (fr) 1980-05-30

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