DD127137B1 - Vorrichtung zum kompensieren der waermeeinwirkung an justier- und belichtungseinrichtungen - Google Patents

Vorrichtung zum kompensieren der waermeeinwirkung an justier- und belichtungseinrichtungen

Info

Publication number
DD127137B1
DD127137B1 DD19435876A DD19435876A DD127137B1 DD 127137 B1 DD127137 B1 DD 127137B1 DD 19435876 A DD19435876 A DD 19435876A DD 19435876 A DD19435876 A DD 19435876A DD 127137 B1 DD127137 B1 DD 127137B1
Authority
DD
German Democratic Republic
Prior art keywords
compensating
adjusting
heat effect
exposure devices
exposure
Prior art date
Application number
DD19435876A
Other languages
English (en)
Other versions
DD127137A1 (de
Inventor
Sieghard Dipl Phys Landgraf
Ulf Dipl Phys Weber
Michael Dipl Ing Stapf
Martin Dipl Ing Wenzel
Michael Dipl Ing Heyne
Original Assignee
Elektromat Veb
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elektromat Veb filed Critical Elektromat Veb
Priority to DD19435876A priority Critical patent/DD127137B1/de
Priority to DE19772735043 priority patent/DE2735043A1/de
Priority to SU772510857A priority patent/SU664245A1/ru
Priority to GB34360/77A priority patent/GB1534450A/en
Priority to CS775407A priority patent/CS206603B1/cs
Priority to FR7725193A priority patent/FR2362419A1/fr
Publication of DD127137A1 publication Critical patent/DD127137A1/de
Publication of DD127137B1 publication Critical patent/DD127137B1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B17/00—Details of cameras or camera bodies; Accessories therefor
    • G03B17/55—Details of cameras or camera bodies; Accessories therefor with provision for heating or cooling, e.g. in aircraft
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Metallurgy (AREA)
  • Atmospheric Sciences (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Fastening Of Light Sources Or Lamp Holders (AREA)
DD19435876A 1976-08-17 1976-08-17 Vorrichtung zum kompensieren der waermeeinwirkung an justier- und belichtungseinrichtungen DD127137B1 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DD19435876A DD127137B1 (de) 1976-08-17 1976-08-17 Vorrichtung zum kompensieren der waermeeinwirkung an justier- und belichtungseinrichtungen
DE19772735043 DE2735043A1 (de) 1976-08-17 1977-08-03 Vorrichtung zum kompensieren der waermeeinwirkung an justier- und belichtungseinrichtungen
SU772510857A SU664245A1 (ru) 1976-08-17 1977-08-16 Система компенсации теплового воздействи в устройствах дл освещени покрытых фотолаком субстратов
GB34360/77A GB1534450A (en) 1976-08-17 1977-08-16 Exposure apparatus
CS775407A CS206603B1 (en) 1976-08-17 1977-08-17 Device for heat influence compensation in the adjusting and illuminating apparatus
FR7725193A FR2362419A1 (fr) 1976-08-17 1977-08-17 Installation pour compenser l'effet de la chaleur dans des installations d'ajustage et d'eclairage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD19435876A DD127137B1 (de) 1976-08-17 1976-08-17 Vorrichtung zum kompensieren der waermeeinwirkung an justier- und belichtungseinrichtungen

Publications (2)

Publication Number Publication Date
DD127137A1 DD127137A1 (de) 1977-09-07
DD127137B1 true DD127137B1 (de) 1979-11-28

Family

ID=5505450

Family Applications (1)

Application Number Title Priority Date Filing Date
DD19435876A DD127137B1 (de) 1976-08-17 1976-08-17 Vorrichtung zum kompensieren der waermeeinwirkung an justier- und belichtungseinrichtungen

Country Status (6)

Country Link
CS (1) CS206603B1 (de)
DD (1) DD127137B1 (de)
DE (1) DE2735043A1 (de)
FR (1) FR2362419A1 (de)
GB (1) GB1534450A (de)
SU (1) SU664245A1 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1578259A (en) * 1977-05-11 1980-11-05 Philips Electronic Associated Methods of manufacturing solid-state devices apparatus for use therein and devices manufactured thereby
DE2922642C2 (de) * 1979-06-02 1981-10-01 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe Verfahren zum Herstellen von Platten für den Aufbau von Trenndüsenelementen
DD150263A1 (de) * 1980-05-02 1981-08-19 Schneider Hans Joachim Temperiervorrichtung,insbesondere fuer lithografische geraete
US4391034A (en) * 1980-12-22 1983-07-05 Ibm Corporation Thermally compensated shadow mask
JPS57169244A (en) * 1981-04-13 1982-10-18 Canon Inc Temperature controller for mask and wafer
DD160756A3 (de) * 1981-04-24 1984-02-29 Gudrun Dietz Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten
DE3306999A1 (de) * 1982-03-31 1983-10-06 Censor Patent Versuch Einrichtung zum festhalten eines werkstueckes
US4864356A (en) * 1987-04-21 1989-09-05 Brother Kogyo Kabushiki Kaisha Exposure device for image recording apparatus
EP0349208A3 (de) * 1988-06-27 1991-01-16 Seiko Instruments Inc. Bilderzeugungsvorrichtung
DE68921687T2 (de) * 1988-09-02 1995-08-03 Canon K.K., Tokio/Tokyo Belichtungseinrichtung.
JPH0276212A (ja) * 1988-09-13 1990-03-15 Canon Inc 多重露光方法
JP2731950B2 (ja) * 1989-07-13 1998-03-25 キヤノン株式会社 露光方法
IT1235478B (it) * 1989-09-26 1992-08-19 Achille Fiorentini Dorso con elementi riscaldanti per pellicola a sviluppo immediato.
US5138643A (en) * 1989-10-02 1992-08-11 Canon Kabushiki Kaisha Exposure apparatus
DE29704681U1 (de) * 1997-03-14 1998-07-16 Wündsch, Dieter, 50259 Pulheim Kühlvorrichtung für Filmprojektoren
EP3093873B1 (de) 2004-02-04 2017-10-11 Nikon Corporation Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung einer vorrichtung

Also Published As

Publication number Publication date
DD127137A1 (de) 1977-09-07
FR2362419B3 (de) 1980-07-11
FR2362419A1 (fr) 1978-03-17
CS206603B1 (en) 1981-06-30
GB1534450A (en) 1978-12-06
SU664245A1 (ru) 1979-05-25
DE2735043A1 (de) 1978-02-23

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