DD237501A5 - Verfahren zur beschichtung eines alkalimetallionen enthaltenen glases und glaeser mit einer barriereschicht - Google Patents

Verfahren zur beschichtung eines alkalimetallionen enthaltenen glases und glaeser mit einer barriereschicht Download PDF

Info

Publication number: DD237501A5
Authority: DD; German Democratic Republic
Prior art keywords: glass; coating; layer; alkali metal; silane
Prior art date: 1984-08-13

Application number

DD85279600A

Other languages

German (de)

English (en)

Inventor

David A Porter

Original Assignee

��@��@�K�K�Kk��

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1984-08-13

Filing date

1985-08-12

Publication date

1986-07-16

1985-08-12 Application filed by ��@��@�K�K�Kk�� filed Critical ��@��@�K�K�Kk��

1986-07-16 Publication of DD237501A5 publication Critical patent/DD237501A5/de

Links

238000000576 coating method Methods 0.000 title claims abstract description 111
239000011248 coating agent Substances 0.000 title claims abstract description 72
230000004888 barrier function Effects 0.000 title claims abstract description 50
238000000034 method Methods 0.000 title claims description 28
239000011521 glass Substances 0.000 claims abstract description 148
BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 40
229910001413 alkali metal ion Inorganic materials 0.000 claims abstract description 38
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 35
229910052760 oxygen Inorganic materials 0.000 claims abstract description 35
239000001301 oxygen Substances 0.000 claims abstract description 35
150000001875 compounds Chemical class 0.000 claims abstract description 34
229910000077 silane Inorganic materials 0.000 claims abstract description 33
229910052710 silicon Inorganic materials 0.000 claims abstract description 25
239000010703 silicon Substances 0.000 claims abstract description 25
239000007789 gas Substances 0.000 claims abstract description 21
239000005977 Ethylene Substances 0.000 claims description 24
VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 23
229910044991 metal oxide Inorganic materials 0.000 claims description 17
150000004706 metal oxides Chemical class 0.000 claims description 17
238000009792 diffusion process Methods 0.000 claims description 16
239000005357 flat glass Substances 0.000 claims description 7
238000005507 spraying Methods 0.000 claims description 7
238000005229 chemical vapour deposition Methods 0.000 claims description 6
229910052751 metal Inorganic materials 0.000 claims description 5
239000002184 metal Substances 0.000 claims description 5
230000008569 process Effects 0.000 claims description 5
150000001336 alkenes Chemical class 0.000 claims description 4
JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 3
239000011261 inert gas Substances 0.000 claims description 2
239000007788 liquid Substances 0.000 claims description 2
239000000376 reactant Substances 0.000 claims description 2
239000007787 solid Substances 0.000 claims description 2
125000004432 carbon atom Chemical group C* 0.000 claims 1
230000005012 migration Effects 0.000 abstract description 11
238000013508 migration Methods 0.000 abstract description 11
239000004973 liquid crystal related substance Substances 0.000 abstract description 10
238000000197 pyrolysis Methods 0.000 abstract description 6
229910052783 alkali metal Inorganic materials 0.000 abstract description 3
150000001340 alkali metals Chemical class 0.000 abstract description 3
239000010410 layer Substances 0.000 description 57
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 22
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 22
229910052757 nitrogen Inorganic materials 0.000 description 12
239000000758 substrate Substances 0.000 description 10
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
229910001887 tin oxide Inorganic materials 0.000 description 9
230000005540 biological transmission Effects 0.000 description 8
230000009477 glass transition Effects 0.000 description 8
239000000203 mixture Substances 0.000 description 8
XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 8
QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical class N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 7
CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
210000004027 cell Anatomy 0.000 description 6
239000011734 sodium Substances 0.000 description 6
230000000694 effects Effects 0.000 description 5
238000000605 extraction Methods 0.000 description 5
230000001590 oxidative effect Effects 0.000 description 5
239000002344 surface layer Substances 0.000 description 5
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
239000003513 alkali Substances 0.000 description 4
229910021417 amorphous silicon Inorganic materials 0.000 description 4
229910052799 carbon Inorganic materials 0.000 description 4
238000005530 etching Methods 0.000 description 4
150000002500 ions Chemical class 0.000 description 4
238000004519 manufacturing process Methods 0.000 description 4
239000000463 material Substances 0.000 description 4
230000009467 reduction Effects 0.000 description 4
229910052814 silicon oxide Inorganic materials 0.000 description 4
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 3
CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
229910021529 ammonia Inorganic materials 0.000 description 3
230000015572 biosynthetic process Effects 0.000 description 3
229910002092 carbon dioxide Inorganic materials 0.000 description 3
239000001569 carbon dioxide Substances 0.000 description 3
229910002091 carbon monoxide Inorganic materials 0.000 description 3
238000001816 cooling Methods 0.000 description 3
238000000151 deposition Methods 0.000 description 3
230000008021 deposition Effects 0.000 description 3
125000002534 ethynyl group Chemical class [H]C#C* 0.000 description 3
238000002474 experimental method Methods 0.000 description 3
229910052731 fluorine Inorganic materials 0.000 description 3
239000011737 fluorine Substances 0.000 description 3
238000002156 mixing Methods 0.000 description 3
235000012239 silicon dioxide Nutrition 0.000 description 3
239000005361 soda-lime glass Substances 0.000 description 3
241000894007 species Species 0.000 description 3
230000003068 static effect Effects 0.000 description 3
238000012360 testing method Methods 0.000 description 3
239000008096 xylene Substances 0.000 description 3
VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
150000001298 alcohols Chemical class 0.000 description 2
HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
150000001412 amines Chemical class 0.000 description 2
150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
230000000903 blocking effect Effects 0.000 description 2
230000006866 deterioration Effects 0.000 description 2
229910052739 hydrogen Inorganic materials 0.000 description 2
230000006872 improvement Effects 0.000 description 2
229910003437 indium oxide Inorganic materials 0.000 description 2
PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
230000002401 inhibitory effect Effects 0.000 description 2
230000003993 interaction Effects 0.000 description 2
238000005259 measurement Methods 0.000 description 2
239000000155 melt Substances 0.000 description 2
MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 2
230000003647 oxidation Effects 0.000 description 2
238000007254 oxidation reaction Methods 0.000 description 2
239000000843 powder Substances 0.000 description 2
-1 silicic acid ester Chemical class 0.000 description 2
239000000377 silicon dioxide Substances 0.000 description 2
229920002379 silicone rubber Polymers 0.000 description 2
239000004945 silicone rubber Substances 0.000 description 2
229910052708 sodium Inorganic materials 0.000 description 2
238000002834 transmittance Methods 0.000 description 2
229930195735 unsaturated hydrocarbon Natural products 0.000 description 2
WFLOTYSKFUPZQB-UHFFFAOYSA-N 1,2-difluoroethene Chemical group FC=CF WFLOTYSKFUPZQB-UHFFFAOYSA-N 0.000 description 1
MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
238000004566 IR spectroscopy Methods 0.000 description 1
235000010678 Paulownia tomentosa Nutrition 0.000 description 1
240000002834 Paulownia tomentosa Species 0.000 description 1
BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
230000009102 absorption Effects 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
230000002411 adverse Effects 0.000 description 1
150000001299 aldehydes Chemical class 0.000 description 1
238000004458 analytical method Methods 0.000 description 1
239000005328 architectural glass Substances 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
230000008901 benefit Effects 0.000 description 1
210000002421 cell wall Anatomy 0.000 description 1
239000003086 colorant Substances 0.000 description 1
238000013016 damping Methods 0.000 description 1
239000008367 deionised water Substances 0.000 description 1
229910021641 deionized water Inorganic materials 0.000 description 1
229910001882 dioxygen Inorganic materials 0.000 description 1
238000007598 dipping method Methods 0.000 description 1
238000001035 drying Methods 0.000 description 1
229920001971 elastomer Polymers 0.000 description 1
239000012799 electrically-conductive coating Substances 0.000 description 1
238000003487 electrochemical reaction Methods 0.000 description 1
238000001941 electron spectroscopy Methods 0.000 description 1
238000004993 emission spectroscopy Methods 0.000 description 1
150000002170 ethers Chemical class 0.000 description 1
238000005816 glass manufacturing process Methods 0.000 description 1
239000001257 hydrogen Substances 0.000 description 1
238000010348 incorporation Methods 0.000 description 1
AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
230000005764 inhibitory process Effects 0.000 description 1
238000007733 ion plating Methods 0.000 description 1
238000001659 ion-beam spectroscopy Methods 0.000 description 1
150000002576 ketones Chemical class 0.000 description 1
230000007246 mechanism Effects 0.000 description 1
JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
229910000069 nitrogen hydride Inorganic materials 0.000 description 1
239000001272 nitrous oxide Substances 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
239000002245 particle Substances 0.000 description 1
230000035515 penetration Effects 0.000 description 1
YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 1
230000005855 radiation Effects 0.000 description 1
230000002829 reductive effect Effects 0.000 description 1
238000002310 reflectometry Methods 0.000 description 1
230000009291 secondary effect Effects 0.000 description 1
239000004065 semiconductor Substances 0.000 description 1
RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
AIFMYMZGQVTROK-UHFFFAOYSA-N silicon tetrabromide Chemical compound Br[Si](Br)(Br)Br AIFMYMZGQVTROK-UHFFFAOYSA-N 0.000 description 1
239000005049 silicon tetrachloride Substances 0.000 description 1
HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
238000001179 sorption measurement Methods 0.000 description 1
238000001228 spectrum Methods 0.000 description 1
239000000126 substance Substances 0.000 description 1
QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical class [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 1
239000004408 titanium dioxide Substances 0.000 description 1
UMFCIIBZHQXRCJ-NSCUHMNNSA-N trans-anol Chemical compound C\C=C\C1=CC=C(O)C=C1 UMFCIIBZHQXRCJ-NSCUHMNNSA-N 0.000 description 1
238000007740 vapor deposition Methods 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133337—Layers preventing ion diffusion, e.g. by ion absorption

Landscapes

Chemical & Material Sciences (AREA)
Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Nonlinear Science (AREA)
Organic Chemistry (AREA)
Geochemistry & Mineralogy (AREA)
Life Sciences & Earth Sciences (AREA)
General Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Mathematical Physics (AREA)
Optics & Photonics (AREA)
Crystallography & Structural Chemistry (AREA)
General Physics & Mathematics (AREA)
Surface Treatment Of Glass (AREA)
Chemical Vapour Deposition (AREA)
Laminated Bodies (AREA)

DD85279600A 1984-08-13 1985-08-12 Verfahren zur beschichtung eines alkalimetallionen enthaltenen glases und glaeser mit einer barriereschicht DD237501A5 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
GB848420534A GB8420534D0 (en)	1984-08-13	1984-08-13	Coated products

Publications (1)

Publication Number	Publication Date
DD237501A5 true DD237501A5 (de)	1986-07-16

Family

ID=10565269

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DD85279600A DD237501A5 (de)	1984-08-13	1985-08-12	Verfahren zur beschichtung eines alkalimetallionen enthaltenen glases und glaeser mit einer barriereschicht

Country Status (21)

Country	Link
EP (1)	EP0174727B1 (fr)
JP (1)	JP2585514B2 (fr)
KR (1)	KR920010093B1 (fr)
AR (1)	AR242944A1 (fr)
AT (1)	ATE62897T1 (fr)
AU (1)	AU582178B2 (fr)
BR (1)	BR8503814A (fr)
CA (1)	CA1255976A (fr)
CZ (1)	CZ281584B6 (fr)
DD (1)	DD237501A5 (fr)
DE (1)	DE3582636D1 (fr)
ES (1)	ES8609170A1 (fr)
FI (1)	FI89160C (fr)
GB (2)	GB8420534D0 (fr)
HK (1)	HK21589A (fr)
IN (1)	IN165410B (fr)
MX (1)	MX171998B (fr)
MY (1)	MY101631A (fr)
RU (1)	RU2057730C1 (fr)
TR (1)	TR23260A (fr)
ZA (1)	ZA855896B (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE102007058927A1 (de) *	2007-12-05	2009-06-10	Schott Ag	Substrat mit einer Sol-Gel-Schicht und Verfahren zur Herstellung eines Verbundmaterials
DE102007058926A1 (de) *	2007-12-05	2009-06-10	Schott Ag	Solarglas und Verfahren zur Herstellung eines Solarglases

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB8630918D0 (en) *	1986-12-24	1987-02-04	Pilkington Brothers Plc	Coatings on glass
GB2209176A (en) *	1987-08-28	1989-05-04	Pilkington Plc	Coating glass
GB8814922D0 (en) *	1988-06-23	1988-07-27	Pilkington Plc	Coatings on glass
GB8914047D0 (en) *	1989-06-19	1989-08-09	Glaverbel	Method of and apparatus for pyrolytically forming an oxide coating on a hot glass substrate
US5221352A (en) *	1989-06-19	1993-06-22	Glaverbel	Apparatus for pyrolytically forming an oxide coating on a hot glass substrate
GB2247691B (en) *	1990-08-31	1994-11-23	Glaverbel	Method of coating glass
GB9019117D0 (en) *	1990-09-01	1990-10-17	Glaverbel	Coated glass and method of manufacturing same
GB2248243B (en) *	1990-09-01	1994-06-22	Glaverbel	Coated glass and method of manufacturing same
FR2677639B1 (fr) *	1991-06-14	1994-02-25	Saint Gobain Vitrage Internal	Technique de formation par pyrolyse en voie gazeuse d'un revetement essentiellement a base d'oxygene et de silicium.
CA2084247A1 (fr)	1992-03-18	1993-09-19	Francis Paul Fehlner	Fabrication de panneaux d'affichage a cristaux liquides
US5599387A (en) *	1993-02-16	1997-02-04	Ppg Industries, Inc.	Compounds and compositions for coating glass with silicon oxide
US5356718A (en) *	1993-02-16	1994-10-18	Ppg Industries, Inc.	Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
US5863337A (en) *	1993-02-16	1999-01-26	Ppg Industries, Inc.	Apparatus for coating a moving glass substrate
US5578103A (en) *	1994-08-17	1996-11-26	Corning Incorporated	Alkali metal ion migration control
US6352755B1 (en)	1994-10-04	2002-03-05	Ppg Industries Ohio, Inc.	Alkali metal diffusion barrier layer
CA2157948C (fr) *	1994-10-04	2000-01-11	James J. Finley	Couche barriere empechant la diffusion des metaux alcalins
US5830252A (en) *	1994-10-04	1998-11-03	Ppg Industries, Inc.	Alkali metal diffusion barrier layer
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1984
- 1984-08-13 GB GB848420534A patent/GB8420534D0/en active Pending
1985
- 1985-07-31 EP EP85305470A patent/EP0174727B1/fr not_active Expired - Lifetime
- 1985-07-31 DE DE8585305470T patent/DE3582636D1/de not_active Expired - Lifetime
- 1985-07-31 GB GB08519275A patent/GB2163146B/en not_active Expired
- 1985-07-31 AT AT85305470T patent/ATE62897T1/de not_active IP Right Cessation
- 1985-08-02 IN IN604/MAS/85A patent/IN165410B/en unknown
- 1985-08-05 ZA ZA855896A patent/ZA855896B/xx unknown
- 1985-08-05 AU AU45774/85A patent/AU582178B2/en not_active Ceased
- 1985-08-07 CA CA000488230A patent/CA1255976A/fr not_active Expired
- 1985-08-09 FI FI853064A patent/FI89160C/fi not_active IP Right Cessation
- 1985-08-09 AR AR85301236A patent/AR242944A1/es active
- 1985-08-12 KR KR1019850005800A patent/KR920010093B1/ko not_active Expired
- 1985-08-12 DD DD85279600A patent/DD237501A5/de not_active IP Right Cessation
- 1985-08-12 RU SU853944042A patent/RU2057730C1/ru active
- 1985-08-12 ES ES546099A patent/ES8609170A1/es not_active Expired
- 1985-08-12 TR TR35180/85A patent/TR23260A/xx unknown
- 1985-08-12 BR BR8503814A patent/BR8503814A/pt not_active IP Right Cessation
- 1985-08-13 CZ CS855849A patent/CZ281584B6/cs not_active IP Right Cessation
- 1985-08-13 JP JP60178484A patent/JP2585514B2/ja not_active Expired - Lifetime
- 1985-08-13 MX MX026630A patent/MX171998B/es unknown
1987
- 1987-02-19 MY MYPI87000174A patent/MY101631A/en unknown
1989
- 1989-03-09 HK HK215/89A patent/HK21589A/xx not_active IP Right Cessation

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DE102007058927A1 (de) *	2007-12-05	2009-06-10	Schott Ag	Substrat mit einer Sol-Gel-Schicht und Verfahren zur Herstellung eines Verbundmaterials
DE102007058926A1 (de) *	2007-12-05	2009-06-10	Schott Ag	Solarglas und Verfahren zur Herstellung eines Solarglases
DE102007058927B4 (de) *	2007-12-05	2010-04-29	Schott Ag	Substrat mit einer Sol-Gel-Schicht und Verfahren zur Herstellung eines Verbundmaterials sowie dessen Verwendung
DE102007058926B4 (de) *	2007-12-05	2010-04-29	Schott Ag	Solarglas und Verfahren zur Herstellung eines Solarglases sowie dessen Verwendung

Also Published As

Publication number	Publication date
EP0174727A1 (fr)	1986-03-19
ATE62897T1 (de)	1991-05-15
DE3582636D1 (de)	1991-05-29
ES8609170A1 (es)	1986-09-01
CZ281584B6 (cs)	1996-11-13
FI89160C (fi)	1993-08-25
GB8420534D0 (en)	1984-09-19
BR8503814A (pt)	1986-05-20
MY101631A (en)	1991-12-31
ES546099A0 (es)	1986-09-01
JP2585514B2 (ja)	1997-02-26
CZ584985A3 (en)	1996-08-14
KR870002029A (ko)	1987-03-28
FI89160B (fi)	1993-05-14
GB2163146B (en)	1988-06-29
EP0174727B1 (fr)	1991-04-24
IN165410B (fr)	1989-10-07
GB2163146A (en)	1986-02-19
RU2057730C1 (ru)	1996-04-10
HK21589A (en)	1989-03-17
AR242944A1 (es)	1993-06-30
FI853064L (fi)	1986-02-14
JPS6163545A (ja)	1986-04-01
TR23260A (tr)	1989-08-03
ZA855896B (en)	1986-04-30
MX171998B (es)	1993-11-26
KR920010093B1 (ko)	1992-11-14
AU4577485A (en)	1986-02-20
AU582178B2 (en)	1989-03-16
GB8519275D0 (en)	1985-10-02
FI853064A0 (fi)	1985-08-09
CA1255976A (fr)	1989-06-20

Legal Events

Date	Code	Title	Description
1998-07-02	ENJ	Ceased due to non-payment of renewal fee

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