DD242880A1 - Einrichtung zur fotolithografischen strukturuebertragung - Google Patents

Einrichtung zur fotolithografischen strukturuebertragung Download PDF

Info

Publication number
DD242880A1
DD242880A1 DD24757183A DD24757183A DD242880A1 DD 242880 A1 DD242880 A1 DD 242880A1 DD 24757183 A DD24757183 A DD 24757183A DD 24757183 A DD24757183 A DD 24757183A DD 242880 A1 DD242880 A1 DD 242880A1
Authority
DD
German Democratic Republic
Prior art keywords
image carrier
immersion liquid
optical medium
optical
photolithographic
Prior art date
Application number
DD24757183A
Other languages
English (en)
Inventor
Karl-Heinz Kuch
Original Assignee
Kuch Karl Heinz
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuch Karl Heinz filed Critical Kuch Karl Heinz
Priority to DD24757183A priority Critical patent/DD242880A1/de
Publication of DD242880A1 publication Critical patent/DD242880A1/de

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Bei einer Einrichtung zur fotolithografischen Strukturuebertragung soll die Aufloesung des optischen Systems durch Anwendung einer Immersionsfluessigkeit erhoeht werden. Aufgabengemaess ist fuer die besonderen Anwendungsbedingungen in der Lithografie, speziell Transport und Wechsel des Bildtraegers, eine Moeglichkeit zur Abdichtung der Immersionsfluessigkeit zu schaffen, welche die erforderliche Handhabung des Bildtraegers nicht beeintraechtigt und den Bildtraeger nicht beschaedigt. Erfindungsgemaess ist der Raum fuer die Immersionsfluessigkeit gegenueber dem Bildtraeger durch ein bewegliches, festes, transparentes optisches Medium abgeschlossen, das durch Druckaenderung der Immersionsfluessigkeit nur waehrend der fotolithografischen Strukturuebertragung mit dem Bildtraeger in Kontakt gebracht und waehrend der Bewegung und des Wechsels des Bildtraegers von diesem abgehoben wird. Fig. 2 a b

Description

Δ — £.·*£. OOU
Im ersten Ausführungsbeispiel (Fig. 1 a und 1 b) befindet sich vor der Frontlinse 1 eines Projektionsobjektivs 2 eine Immersionsflüssigkeit 3. Diese ist gegenüber der auf dem Koordinatentisch 4 befestigten Halbleiterscheibe 5 durch eine in einer ringförmigen Membran 6 elastisch aufgehängten Glasplatte 7 abgegrenzt.
Über das Rohr 8 ist die Immersionsflüssigkeit 3 mit einer nicht dargestellten Einrichtung zur Druckregelung verbunden. Während des Belichtungsprozesses wird die Glasplatte 7 durch einen erhöhten Druck gegen die Halbleiterscheibe 5 gedrückt (Fig. 1 a).
Während der Bewegung des Koordinatentisches 4 mit der Halbleiterscheibe 5 wird die Glasplatte 7 durch Druckminderung der Immersionsflüssigkeit 3 von der Halbleiterscheibe 5 abgehoben (Fig. 1 b).
Beim zweiten Ausführungsbeispiel (Fig.2) ist gegenüber dem ersten Ausführungsbeispiel die in der ringförmigen Membran 6 elastisch aufgehängten Glasplatte 7 durch eine durchgehende transparente Membran 9 ersetzt.
Analog zum ersten Ausführungsbeispiel zeigt Fig.2a das Ausführungsbeispiel 2 mit angedrückter Membran 9 und Fig.2b während der Bewegung des Koordinatentisches 4 mit abgehobener Membran 9 durch Druckverminderung der Immersionsflüssigkeit 3.

Claims (4)

  1. — "I — £t£ OOU
    Erfindungsanspruch:
    1. Einrichtung zur fotolithografischen Strukturübertragung mittels eines optischen Projektionsobjektivs auf einen parallel zur Bildebene schrittweise bewegten und in kurzen Zeitabständen vorzugsweise automatisch auswechselbaren Bildträger, gekennzeichnet dadurch, daß sich in einem zwischen Projektionsobjektiv und Bildträger abgegrenzten Raum, der zum Bildträger durch ein bewegliches, transparentes optisches Medium dicht abgeschlossen ist, eine an sich bekannte Immersionsflüssigkeit annähernd gleichen Brechwertes befindet, deren Flüssigkeitsdruck auf das optische Medium für einen ungehinderten Transport bzw. Wechsel des Bildträgers veränderbar ist.
  2. 2. Einrichtung nach Punkt 1, gekennzeichnet durch eine elastische Folie als optisches Medium.
  3. 3. Einrichtung nach Punkt 1 gekennzeichnet durch eine elastisch gelagerte Platte als optisches Medium.
  4. 4. Einrichtung nach Punkt 1, gekennzeichnet dadurch, daß sich zur Vermeidung von Stern- und Interferenzeffekten ein dünner Flüssigkeitsfilm gleichen Brechwertes wie das optische Medium zwischen dem Bildträger und dem optischen Medium befindet. ·
    Hierzu 2 Seiten Zeichnungen :
    Anwendungsgebiet der Erfindung
    Die Erfindung betrifft eine Einrichtung zur fotolithografischen Strukturübertragung mittels eines optischen Projektionsobjektivs auf einen parallel zur Bildebene schrittweise bewegten und in kurzen Zeitabständen vorzugsweise automatisch auswechselbaren Bildträger, insbesondere zur Herstellung mikroelektronischer Bauelemente.
    Charakteristik der bekannten technischen Lösungen
    Die projektionsoptische Strukturierung mikroelektronischer Schaltkreise erfordert mit zunehmender Erhöhung des Integrationsgrades eine immer höhere optische Auflösung, die wiederum von der Apertur der Projektionsoptik abhängt. Die Erhöhung der Apertur verringert die Schärfentiefe und führt in Zusammenhang mit der Unebenheit der Bildträger zu technologischen Problemen.
    Durch das Einbringen einer hochbrechenden Immersionsflüssigkeit zwischen der Frontlinse des Objektivs und dem Bildträger läßt sich die Auflösung der Projektionsobtik erhöhen, ohne die Schärfentiefe zu verringern. Das aus der Mikroskopie bekannte Verfahren (Brockhaus, „ABC der Optik", Brockhaus Verlag Leipzig, 1961 S. 565ff.) ist auf die Mikrolithografie nicht übertragbar, da die durch Adhäsionskräfte zwischen Bildträger und der Frontlinse gehaltene Immersionsflüssigkeit bei der üblichen . schrittweisen Bewegung des Bildträgers oder dessen automatischen Wechsel abreißen würde. Eine schleifende mechanische Dichtung scheidet wegen der Gefahr der Beschädigung des Bildträgers und wegen der hohen Reibkräfte, die ein exaktes Positionieren des Bildträgers behindern, aus.
    Ziel der Erfindung
    Ziel der Erfindung ist die Erhöhung der Auflösung des optischen Systems bei fotolithografischen Einrichtungen mit einer an sich bekannten Immersionsflüssigkeit.
    Darlegung des Wesens der Erfindung
    Der Erfindung liegt die Aufgabe zugrunde, bei einer fotolithografischen Einrichtung eine Möglichkeit zur Abdichtung der Immersionsflüssigkeit zu schaffen, die zu keiner schleifenden Berührung der Dichtung mit dem Bildträger führt und die Bildträgertransport und -wechsel nicht beeinträchtigt.
    Erfindungsgemäß wird diese Aufgabe gelöst, indem sich bei einer Einrichtung zur fotolithografischen Strukturübertragung mittels eines optischen Projektionsobjektivs durch eine Immersionsflüssigkeit hindurch auf einem Bildträger, ζ. Β. eine Fotoplatte oder eine Halbleiterscheibe, die Immersionsflüssigkeit in einem abgeschlossenen Raum befindet; der gegenüber dem Bildträger durch ein bewegliches, festes, transparentes optisches Medium mit gleichem Brechwert abgedichtet wird, das während der Belichtung durch den Druck der Immersionsflüssigkeit auf den Bildträger gedrückt und während der schrittweisen Bewegung des Bildträgers oder bei dessen Wechsel durch Unterdruck der Immersionsflüssigkeit abgehoben wird. Das transparente optische Medium kann eine elastische Membran, z. B. eine Folie oder eine elastisch gelagerte Platte sein. Zur Vermeidung von Streu- und Interferenzerscheinungen ist es zweckmäßig, zwischen dem festen optischen Medium und dem Bildträger, das feste optische Medium oder den Bildträger mit einem dünnen Film einer Immersionsflüssigkeit gleichen Brechwertes zu benetzen.
    Ausführungsbeispiel
    Die Erfindung soll nachstehend anhand zweier in der Zeichnung dargestellter Ausführungsbeispiel erläutert werden. In der Zeichnung zeigen:
    Fig. 1 (1a, 1b): Einrichtung mit einer ebenen elastisch gelagerten Platte als Abdichtmedium Fig.2 (2a, 2b): Einrichtung mit einer elastischen Folie als Abdichtmedium
DD24757183A 1983-01-31 1983-01-31 Einrichtung zur fotolithografischen strukturuebertragung DD242880A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DD24757183A DD242880A1 (de) 1983-01-31 1983-01-31 Einrichtung zur fotolithografischen strukturuebertragung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD24757183A DD242880A1 (de) 1983-01-31 1983-01-31 Einrichtung zur fotolithografischen strukturuebertragung

Publications (1)

Publication Number Publication Date
DD242880A1 true DD242880A1 (de) 1987-02-11

Family

ID=5544666

Family Applications (1)

Application Number Title Priority Date Filing Date
DD24757183A DD242880A1 (de) 1983-01-31 1983-01-31 Einrichtung zur fotolithografischen strukturuebertragung

Country Status (1)

Country Link
DD (1) DD242880A1 (de)

Cited By (93)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006016533A1 (de) * 2006-04-07 2007-11-15 Carl Zeiss Smt Ag Haltevorrichtung für optisches Element
US7379155B2 (en) 2004-10-18 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411650B2 (en) 2003-06-19 2008-08-12 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US7773195B2 (en) 2005-11-29 2010-08-10 Asml Holding N.V. System and method to increase surface tension and contact angle in immersion lithography
US7804574B2 (en) 2003-05-30 2010-09-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using acidic liquid
US7804575B2 (en) 2004-08-13 2010-09-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method having liquid evaporation control
US7812924B2 (en) 2004-12-02 2010-10-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7839483B2 (en) 2005-12-28 2010-11-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a control system
US7852457B2 (en) 2004-11-12 2010-12-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7859644B2 (en) 2005-03-28 2010-12-28 Asml Netherlands B.V. Lithographic apparatus, immersion projection apparatus and device manufacturing method
US7864292B2 (en) 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7898642B2 (en) 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7898643B2 (en) 2003-06-27 2011-03-01 Asml Holding N.V. Immersion photolithography system and method using inverted wafer-projection optics interface
US7914687B2 (en) 2005-02-22 2011-03-29 Asml Netherlands B.V. Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
US7929112B2 (en) 2005-06-28 2011-04-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7928407B2 (en) 2005-11-23 2011-04-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7932999B2 (en) 2002-11-12 2011-04-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7961293B2 (en) 2003-10-15 2011-06-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7978306B2 (en) 2004-11-17 2011-07-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7993008B2 (en) 2003-08-26 2011-08-09 Nikon Corporation Optical element and exposure apparatus
US8004654B2 (en) 2005-10-06 2011-08-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8003968B2 (en) 2005-12-27 2011-08-23 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US8013978B2 (en) 2004-12-28 2011-09-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8018573B2 (en) 2005-02-22 2011-09-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8027026B2 (en) 2004-10-05 2011-09-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
USRE42741E1 (en) 2003-06-27 2011-09-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
USRE42849E1 (en) 2004-02-09 2011-10-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8045135B2 (en) 2006-11-22 2011-10-25 Asml Netherlands B.V. Lithographic apparatus with a fluid combining unit and related device manufacturing method
US8045134B2 (en) 2006-03-13 2011-10-25 Asml Netherlands B.V. Lithographic apparatus, control system and device manufacturing method
US8054445B2 (en) 2005-08-16 2011-11-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8068210B2 (en) 2004-09-28 2011-11-29 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
US8077291B2 (en) 2004-12-10 2011-12-13 Asml Netherlands B.V. Substrate placement in immersion lithography
US8102502B2 (en) 2003-10-28 2012-01-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8102507B2 (en) 2004-12-30 2012-01-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8107053B2 (en) 2005-02-28 2012-01-31 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
US8115903B2 (en) 2005-05-03 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8115905B2 (en) 2004-12-08 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8120749B2 (en) 2005-06-28 2012-02-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8149381B2 (en) 2003-08-26 2012-04-03 Nikon Corporation Optical element and exposure apparatus
US8164734B2 (en) 2004-06-16 2012-04-24 Asml Netherlands B.V. Vacuum system for immersion photolithography
US8174674B2 (en) 2003-10-15 2012-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8203693B2 (en) 2005-04-19 2012-06-19 Asml Netherlands B.V. Liquid immersion lithography system comprising a tilted showerhead relative to a substrate
US8208123B2 (en) 2003-08-29 2012-06-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8208124B2 (en) 2003-08-29 2012-06-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8218125B2 (en) 2003-07-28 2012-07-10 Asml Netherlands B.V. Immersion lithographic apparatus with a projection system having an isolated or movable part
US8233135B2 (en) 2004-12-15 2012-07-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8233137B2 (en) 2004-12-20 2012-07-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8259287B2 (en) 2005-04-05 2012-09-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8344341B2 (en) 2002-11-12 2013-01-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US8390778B2 (en) 2005-03-09 2013-03-05 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US8400615B2 (en) 2003-09-29 2013-03-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8421996B2 (en) 2005-11-16 2013-04-16 Asml Netherlands B.V. Lithographic apparatus
US8427629B2 (en) 2004-09-24 2013-04-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8446579B2 (en) 2008-05-28 2013-05-21 Nikon Corporation Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
US8472002B2 (en) 2002-11-12 2013-06-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8472006B2 (en) 2003-11-24 2013-06-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8514369B2 (en) 2005-03-04 2013-08-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
CN103383527A (zh) * 2003-04-10 2013-11-06 株式会社尼康 包括用于沉浸光刻装置的真空清除的环境系统
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8638418B2 (en) 2003-10-28 2014-01-28 Asml Netherlands B.V. Lithographic apparatus
US8705009B2 (en) 2009-09-28 2014-04-22 Asml Netherlands B.V. Heat pipe, lithographic apparatus and device manufacturing method
US8711323B2 (en) 2003-07-16 2014-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8711333B2 (en) 2003-07-24 2014-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8743339B2 (en) 2005-12-30 2014-06-03 Asml Netherlands Lithographic apparatus and device manufacturing method
US8767171B2 (en) 2003-12-23 2014-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8817231B2 (en) 2004-11-12 2014-08-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8859188B2 (en) 2005-02-10 2014-10-14 Asml Netherlands B.V. Immersion liquid, exposure apparatus, and exposure process
US9099501B2 (en) 2005-06-28 2015-08-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9268236B2 (en) 2005-06-21 2016-02-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder
US9477158B2 (en) 2006-04-14 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9623436B2 (en) 2004-05-18 2017-04-18 Asml Netherlands B.V. Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets
US9632425B2 (en) 2006-12-07 2017-04-25 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9703210B2 (en) 2004-12-20 2017-07-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9746788B2 (en) 2004-08-19 2017-08-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9766555B2 (en) 2003-02-26 2017-09-19 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US9798246B2 (en) 2003-05-13 2017-10-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9952515B2 (en) 2003-11-14 2018-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9964858B2 (en) 2003-06-11 2018-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10025204B2 (en) 2003-08-29 2018-07-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US10180629B2 (en) 2003-06-09 2019-01-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10209624B2 (en) 2010-04-22 2019-02-19 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
US10222706B2 (en) 2002-11-12 2019-03-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10261428B2 (en) 2002-11-12 2019-04-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10338478B2 (en) 2004-07-07 2019-07-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Cited By (228)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9195153B2 (en) 2002-11-12 2015-11-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8472002B2 (en) 2002-11-12 2013-06-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8344341B2 (en) 2002-11-12 2013-01-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10788755B2 (en) 2002-11-12 2020-09-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9097987B2 (en) 2002-11-12 2015-08-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10191389B2 (en) 2002-11-12 2019-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9360765B2 (en) 2002-11-12 2016-06-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9885965B2 (en) 2002-11-12 2018-02-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10222706B2 (en) 2002-11-12 2019-03-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8446568B2 (en) 2002-11-12 2013-05-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9588442B2 (en) 2002-11-12 2017-03-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9740107B2 (en) 2002-11-12 2017-08-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7932999B2 (en) 2002-11-12 2011-04-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10261428B2 (en) 2002-11-12 2019-04-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9766555B2 (en) 2003-02-26 2017-09-19 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US10180632B2 (en) 2003-02-26 2019-01-15 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
CN103383527B (zh) * 2003-04-10 2015-10-28 株式会社尼康 包括用于沉浸光刻装置的真空清除的环境系统
CN103383528A (zh) * 2003-04-10 2013-11-06 株式会社尼康 包括用于沉浸光刻装置的真空清除的环境系统
CN103383527A (zh) * 2003-04-10 2013-11-06 株式会社尼康 包括用于沉浸光刻装置的真空清除的环境系统
CN103383528B (zh) * 2003-04-10 2016-05-04 株式会社尼康 包括用于沉浸光刻装置的真空清除的环境系统
US9798246B2 (en) 2003-05-13 2017-10-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8416385B2 (en) 2003-05-30 2013-04-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7804574B2 (en) 2003-05-30 2010-09-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using acidic liquid
US10180629B2 (en) 2003-06-09 2019-01-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9964858B2 (en) 2003-06-11 2018-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9709899B2 (en) 2003-06-19 2017-07-18 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US8670105B2 (en) 2003-06-19 2014-03-11 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US7411650B2 (en) 2003-06-19 2008-08-12 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US8817230B2 (en) 2003-06-19 2014-08-26 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US9715178B2 (en) 2003-06-19 2017-07-25 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US8004649B2 (en) 2003-06-19 2011-08-23 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US8730450B2 (en) 2003-06-19 2014-05-20 Asml Holdings N.V. Immersion photolithography system and method using microchannel nozzles
US7898643B2 (en) 2003-06-27 2011-03-01 Asml Holding N.V. Immersion photolithography system and method using inverted wafer-projection optics interface
USRE42741E1 (en) 2003-06-27 2011-09-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9383655B2 (en) 2003-07-16 2016-07-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8913223B2 (en) 2003-07-16 2014-12-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10151989B2 (en) 2003-07-16 2018-12-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8823920B2 (en) 2003-07-16 2014-09-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9733575B2 (en) 2003-07-16 2017-08-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8711323B2 (en) 2003-07-16 2014-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9594308B2 (en) 2003-07-24 2017-03-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9213247B2 (en) 2003-07-24 2015-12-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8711333B2 (en) 2003-07-24 2014-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9804509B2 (en) 2003-07-24 2017-10-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10146143B2 (en) 2003-07-24 2018-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9639006B2 (en) 2003-07-28 2017-05-02 Asml Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US8218125B2 (en) 2003-07-28 2012-07-10 Asml Netherlands B.V. Immersion lithographic apparatus with a projection system having an isolated or movable part
US8189170B2 (en) 2003-08-26 2012-05-29 Nikon Corporation Optical element and exposure apparatus
US7993008B2 (en) 2003-08-26 2011-08-09 Nikon Corporation Optical element and exposure apparatus
US8149381B2 (en) 2003-08-26 2012-04-03 Nikon Corporation Optical element and exposure apparatus
US10175584B2 (en) 2003-08-26 2019-01-08 Nikon Corporation Optical element and exposure apparatus
US8804097B2 (en) 2003-08-29 2014-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9606448B2 (en) 2003-08-29 2017-03-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8208123B2 (en) 2003-08-29 2012-06-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10025204B2 (en) 2003-08-29 2018-07-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10146142B2 (en) 2003-08-29 2018-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8208124B2 (en) 2003-08-29 2012-06-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9442388B2 (en) 2003-08-29 2016-09-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8400615B2 (en) 2003-09-29 2013-03-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8174674B2 (en) 2003-10-15 2012-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7961293B2 (en) 2003-10-15 2011-06-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8711330B2 (en) 2003-10-15 2014-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9285685B2 (en) 2003-10-15 2016-03-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8570486B2 (en) 2003-10-15 2013-10-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9182679B2 (en) 2003-10-28 2015-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8102502B2 (en) 2003-10-28 2012-01-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US8860922B2 (en) 2003-10-28 2014-10-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8810771B2 (en) 2003-10-28 2014-08-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8638418B2 (en) 2003-10-28 2014-01-28 Asml Netherlands B.V. Lithographic apparatus
US10248034B2 (en) 2003-10-28 2019-04-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9952515B2 (en) 2003-11-14 2018-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US8472006B2 (en) 2003-11-24 2013-06-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9817321B2 (en) 2003-12-23 2017-11-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8767171B2 (en) 2003-12-23 2014-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9684250B2 (en) 2003-12-23 2017-06-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10768538B2 (en) 2003-12-23 2020-09-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9465301B2 (en) 2003-12-23 2016-10-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
USRE42849E1 (en) 2004-02-09 2011-10-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10234768B2 (en) 2004-04-14 2019-03-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7898642B2 (en) 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9829799B2 (en) 2004-04-14 2017-11-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9989861B2 (en) 2004-04-14 2018-06-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10761438B2 (en) 2004-05-18 2020-09-01 Asml Netherlands B.V. Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets
US9623436B2 (en) 2004-05-18 2017-04-18 Asml Netherlands B.V. Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets
US9857699B2 (en) 2004-06-16 2018-01-02 Asml Netherlands B.V. Vacuum system for immersion photolithography
US9507270B2 (en) 2004-06-16 2016-11-29 Asml Netherlands B.V. Vacuum system for immersion photolithography
US8164734B2 (en) 2004-06-16 2012-04-24 Asml Netherlands B.V. Vacuum system for immersion photolithography
US8830440B2 (en) 2004-06-16 2014-09-09 Asml Netherlands B.V. Vacuum system for immersion photolithography
US10168624B2 (en) 2004-06-16 2019-01-01 Asml Netherlands B.V. Vacuum system for immersion photolithography
US10338478B2 (en) 2004-07-07 2019-07-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9268242B2 (en) 2004-08-13 2016-02-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor
US9188880B2 (en) 2004-08-13 2015-11-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a heater
US10254663B2 (en) 2004-08-13 2019-04-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a heater
US7804575B2 (en) 2004-08-13 2010-09-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method having liquid evaporation control
US9904185B2 (en) 2004-08-19 2018-02-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9746788B2 (en) 2004-08-19 2017-08-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10331047B2 (en) 2004-08-19 2019-06-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8427629B2 (en) 2004-09-24 2013-04-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8068210B2 (en) 2004-09-28 2011-11-29 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
US8027026B2 (en) 2004-10-05 2011-09-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8755027B2 (en) 2004-10-05 2014-06-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving fluid mixing and control of the physical property of a fluid
US7379155B2 (en) 2004-10-18 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9436097B2 (en) 2004-10-18 2016-09-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8934082B2 (en) 2004-10-18 2015-01-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8004652B2 (en) 2004-10-18 2011-08-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9753380B2 (en) 2004-10-18 2017-09-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10248033B2 (en) 2004-10-18 2019-04-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9261797B2 (en) 2004-11-12 2016-02-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US7852457B2 (en) 2004-11-12 2010-12-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9964861B2 (en) 2004-11-12 2018-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US9645507B2 (en) 2004-11-12 2017-05-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10274832B2 (en) 2004-11-12 2019-04-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US8817231B2 (en) 2004-11-12 2014-08-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US9798247B2 (en) 2004-11-12 2017-10-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US9188882B2 (en) 2004-11-17 2015-11-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7978306B2 (en) 2004-11-17 2011-07-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9581916B2 (en) 2004-11-17 2017-02-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7812924B2 (en) 2004-12-02 2010-10-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8115905B2 (en) 2004-12-08 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8860926B2 (en) 2004-12-08 2014-10-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8441617B2 (en) 2004-12-10 2013-05-14 Asml Netherlands B.V. Substrate placement in immersion lithography
US8077291B2 (en) 2004-12-10 2011-12-13 Asml Netherlands B.V. Substrate placement in immersion lithography
US9740106B2 (en) 2004-12-10 2017-08-22 Asml Netherlands B.V. Substrate placement in immersion lithography
US8233135B2 (en) 2004-12-15 2012-07-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9116443B2 (en) 2004-12-20 2015-08-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8233137B2 (en) 2004-12-20 2012-07-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9703210B2 (en) 2004-12-20 2017-07-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9329494B2 (en) 2004-12-20 2016-05-03 Asml Netherlands B.V. Lithographic apparatus
US9417535B2 (en) 2004-12-20 2016-08-16 Asml Netherlands B.V. Lithographic apparatus
US9835960B2 (en) 2004-12-20 2017-12-05 Asml Netherlands B.V. Lithographic apparatus
US8462312B2 (en) 2004-12-20 2013-06-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10248035B2 (en) 2004-12-20 2019-04-02 Asml Netherlands B.V. Lithographic apparatus
US8013978B2 (en) 2004-12-28 2011-09-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8913225B2 (en) 2004-12-28 2014-12-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8102507B2 (en) 2004-12-30 2012-01-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8354209B2 (en) 2004-12-30 2013-01-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9164391B2 (en) 2005-02-10 2015-10-20 Asml Netherlands B.V. Immersion liquid, exposure apparatus, and exposure process
US9454088B2 (en) 2005-02-10 2016-09-27 Asml Netherlands B.V. Immersion liquid, exposure apparatus, and exposure process
US9772565B2 (en) 2005-02-10 2017-09-26 Asml Netherlands B.V. Immersion liquid, exposure apparatus, and exposure process
US8859188B2 (en) 2005-02-10 2014-10-14 Asml Netherlands B.V. Immersion liquid, exposure apparatus, and exposure process
US8018573B2 (en) 2005-02-22 2011-09-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8902404B2 (en) 2005-02-22 2014-12-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8246838B2 (en) 2005-02-22 2012-08-21 Asml Netherlands B.V. Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
US7914687B2 (en) 2005-02-22 2011-03-29 Asml Netherlands B.V. Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
US8958051B2 (en) 2005-02-28 2015-02-17 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
US8107053B2 (en) 2005-02-28 2012-01-31 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
US9477159B2 (en) 2005-03-04 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8514369B2 (en) 2005-03-04 2013-08-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8390778B2 (en) 2005-03-09 2013-03-05 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US7859644B2 (en) 2005-03-28 2010-12-28 Asml Netherlands B.V. Lithographic apparatus, immersion projection apparatus and device manufacturing method
US9429853B2 (en) 2005-04-05 2016-08-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9857695B2 (en) 2005-04-05 2018-01-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8988651B2 (en) 2005-04-05 2015-03-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8976334B2 (en) 2005-04-05 2015-03-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8259287B2 (en) 2005-04-05 2012-09-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10209629B2 (en) 2005-04-05 2019-02-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8203693B2 (en) 2005-04-19 2012-06-19 Asml Netherlands B.V. Liquid immersion lithography system comprising a tilted showerhead relative to a substrate
US9081300B2 (en) 2005-05-03 2015-07-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9146478B2 (en) 2005-05-03 2015-09-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9606449B2 (en) 2005-05-03 2017-03-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10025196B2 (en) 2005-05-03 2018-07-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8115903B2 (en) 2005-05-03 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9477153B2 (en) 2005-05-03 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9229335B2 (en) 2005-05-03 2016-01-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8860924B2 (en) 2005-05-03 2014-10-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9360763B2 (en) 2005-05-12 2016-06-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9268236B2 (en) 2005-06-21 2016-02-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder
US8120749B2 (en) 2005-06-28 2012-02-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9448494B2 (en) 2005-06-28 2016-09-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7929112B2 (en) 2005-06-28 2011-04-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8848165B2 (en) 2005-06-28 2014-09-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9766556B2 (en) 2005-06-28 2017-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9099501B2 (en) 2005-06-28 2015-08-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8687168B2 (en) 2005-06-28 2014-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9952514B2 (en) 2005-06-28 2018-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8054445B2 (en) 2005-08-16 2011-11-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8004654B2 (en) 2005-10-06 2011-08-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8958054B2 (en) 2005-10-06 2015-02-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9618853B2 (en) 2005-11-16 2017-04-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8786823B2 (en) 2005-11-16 2014-07-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10126664B2 (en) 2005-11-16 2018-11-13 Asml Netherlands, B.V. Lithographic apparatus and device manufacturing method
US8421996B2 (en) 2005-11-16 2013-04-16 Asml Netherlands B.V. Lithographic apparatus
US7864292B2 (en) 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9140996B2 (en) 2005-11-16 2015-09-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8138486B2 (en) 2005-11-23 2012-03-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7928407B2 (en) 2005-11-23 2011-04-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8481978B2 (en) 2005-11-23 2013-07-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7773195B2 (en) 2005-11-29 2010-08-10 Asml Holding N.V. System and method to increase surface tension and contact angle in immersion lithography
US8456611B2 (en) 2005-11-29 2013-06-04 Asml Holding N.V. System and method to increase surface tension and contact angle in immersion lithography
US8232540B2 (en) 2005-12-27 2012-07-31 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US8003968B2 (en) 2005-12-27 2011-08-23 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US7839483B2 (en) 2005-12-28 2010-11-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a control system
US8564760B2 (en) 2005-12-28 2013-10-22 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a control system
US8743339B2 (en) 2005-12-30 2014-06-03 Asml Netherlands Lithographic apparatus and device manufacturing method
US9851644B2 (en) 2005-12-30 2017-12-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10222711B2 (en) 2005-12-30 2019-03-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9482967B2 (en) 2006-03-13 2016-11-01 Asml Netherlands B.V. Lithographic apparatus, control system and device manufacturing method
US8045134B2 (en) 2006-03-13 2011-10-25 Asml Netherlands B.V. Lithographic apparatus, control system and device manufacturing method
DE102006016533A1 (de) * 2006-04-07 2007-11-15 Carl Zeiss Smt Ag Haltevorrichtung für optisches Element
US9477158B2 (en) 2006-04-14 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8045135B2 (en) 2006-11-22 2011-10-25 Asml Netherlands B.V. Lithographic apparatus with a fluid combining unit and related device manufacturing method
US9330912B2 (en) 2006-11-22 2016-05-03 Asml Netherlands B.V. Lithographic apparatus, fluid combining unit and device manufacturing method
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10185231B2 (en) 2006-12-07 2019-01-22 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US9645506B2 (en) 2006-12-07 2017-05-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9632425B2 (en) 2006-12-07 2017-04-25 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US10268127B2 (en) 2006-12-07 2019-04-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US8456624B2 (en) 2008-05-28 2013-06-04 Nikon Corporation Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
US8446579B2 (en) 2008-05-28 2013-05-21 Nikon Corporation Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
US8705009B2 (en) 2009-09-28 2014-04-22 Asml Netherlands B.V. Heat pipe, lithographic apparatus and device manufacturing method
US10209624B2 (en) 2010-04-22 2019-02-19 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method

Similar Documents

Publication Publication Date Title
DD242880A1 (de) Einrichtung zur fotolithografischen strukturuebertragung
DD160756A3 (de) Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten
CN104166315A (zh) 曝光方法及曝光机
DE2504214A1 (de) Zentrieren von linsen
DE19809502B4 (de) Vorrichtung zur Herstellung einer Kontaktkopie eines Hologramms
DE3813398C2 (de)
DE2547750C2 (de) Verfahren zum Bestücken bzw. Verdrahten von flachen Baugruppen
DE2932878C2 (de) Filmführungseinrichtung im Bildfensterbereich eines Projektors
DE102020216448A1 (de) Optisches system, lithographieanlage und verfahren zum herstellen eines optischen systems
DD242879A1 (de) Einrichtung zur fotolithografischen strukturuebertragung
DE2744837A1 (de) Maske zur optischen belichtung
DE19529170B4 (de) Verfahren zum Bilden einer Fotolithographiemaske
DE1522285A1 (de) Verfahren zur Erzeugung von Mikrostrukturen auf einem Substrat
DE1902782B2 (de) Fotorepetierkamera
WO2021052734A1 (de) Steckeranordnung, system und lithographieanlage
DE1622225A1 (de) Verfahren und Vorrichtung zum Ausrichten von Originalen und den Traegern der von diesen Originalen herzustellenden Kopien und zum Belichten der Kopien
DE2409039C3 (de) Vorrichtung zum Verfolgen mindestens einer Marke
DE1208097C2 (de) Lichtelektrische Steuervorrichtung, insbesondere Druckmarkensteuergeraet
DE60317407T2 (de) Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
DE3038810A1 (de) Verfahren zur verminderung des einflusses optischer inhomogenitaeten
DD148820A1 (de) Optisches entzerrungsgeraet
WO2025149161A1 (de) Verfahren, vorrichtung und weichstempel zum nanoprägen
DE439370C (de) Vorrichtung zur Herstellung plastisch wirkender Bilder
DE1548422C (de) Verfahren und Vorrichtung zur Her stellung einer Karte
DE2237733A1 (de) Vorrichtung zum elektrochemischen oder chemischen abduennen von technischen und mikroskopischen objekten unter laminaren stroemungsverhaeltnissen

Legal Events

Date Code Title Description
ENJ Ceased due to non-payment of renewal fee