DD275861A5 - Verfahren und Vorrichtung zur Abscheidung einer dünnen Schicht auf einem transparenten Stoff, insbesondere auf Glas - Google Patents

Verfahren und Vorrichtung zur Abscheidung einer dünnen Schicht auf einem transparenten Stoff, insbesondere auf Glas Download PDF

Info

Publication number
DD275861A5
DD275861A5 DD32214888A DD32214888A DD275861A5 DD 275861 A5 DD275861 A5 DD 275861A5 DD 32214888 A DD32214888 A DD 32214888A DD 32214888 A DD32214888 A DD 32214888A DD 275861 A5 DD275861 A5 DD 275861A5
Authority
DD
German Democratic Republic
Prior art keywords
thin layer
anode
glass
atoms
substance
Prior art date
Application number
DD32214888A
Other languages
German (de)
English (en)
Inventor
Liberto Massarelli
Francesco Sebastiano
Original Assignee
Siv Soc Italiana Vetro
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siv Soc Italiana Vetro filed Critical Siv Soc Italiana Vetro
Publication of DD275861A5 publication Critical patent/DD275861A5/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/005—Other surface treatment of glass not in the form of fibres or filaments by irradiation by atoms
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0055—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ion implantation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
  • Chemically Coating (AREA)
  • Glass Compositions (AREA)
DD32214888A 1987-11-27 1988-11-24 Verfahren und Vorrichtung zur Abscheidung einer dünnen Schicht auf einem transparenten Stoff, insbesondere auf Glas DD275861A5 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT8748644A IT1211938B (it) 1987-11-27 1987-11-27 Apparecchiatura e procedimento per la deposizione di uno strato sottile su un substrato trasparente, particolarmente per la realizzazione di vetrature

Publications (1)

Publication Number Publication Date
DD275861A5 true DD275861A5 (de) 1990-02-07

Family

ID=11267817

Family Applications (1)

Application Number Title Priority Date Filing Date
DD32214888A DD275861A5 (de) 1987-11-27 1988-11-24 Verfahren und Vorrichtung zur Abscheidung einer dünnen Schicht auf einem transparenten Stoff, insbesondere auf Glas

Country Status (11)

Country Link
US (1) US4933057A (fr)
EP (1) EP0318441B1 (fr)
JP (1) JPH01168862A (fr)
AT (1) ATE88222T1 (fr)
BR (1) BR8806229A (fr)
DD (1) DD275861A5 (fr)
DE (1) DE3880275T2 (fr)
ES (1) ES2040896T3 (fr)
IT (1) IT1211938B (fr)
PL (1) PL161618B1 (fr)
RU (1) RU1809840C (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5073245A (en) * 1990-07-10 1991-12-17 Hedgcoth Virgle L Slotted cylindrical hollow cathode/magnetron sputtering device
US5437778A (en) * 1990-07-10 1995-08-01 Telic Technologies Corporation Slotted cylindrical hollow cathode/magnetron sputtering device
US5277779A (en) * 1992-04-14 1994-01-11 Henshaw William F Rectangular cavity magnetron sputtering vapor source
US6444100B1 (en) 2000-02-11 2002-09-03 Seagate Technology Llc Hollow cathode sputter source
SG90171A1 (en) * 2000-09-26 2002-07-23 Inst Data Storage Sputtering device
DE10227048A1 (de) * 2002-06-17 2004-01-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Beschichtung von Substraten mittels physikalischer Dampfabscheidung über den Hohlkathodeneffekt
EP1554412B1 (fr) * 2002-09-19 2013-08-14 General Plasma, Inc. Appareil de dépôt chimique en phase vapeur assisté par plasma
US7411352B2 (en) * 2002-09-19 2008-08-12 Applied Process Technologies, Inc. Dual plasma beam sources and method
US7038389B2 (en) * 2003-05-02 2006-05-02 Applied Process Technologies, Inc. Magnetron plasma source
CN109881166B (zh) * 2016-03-30 2021-04-20 京浜乐梦金属科技株式会社 溅射阴极、溅射装置和成膜体的制造方法
US12205805B2 (en) * 2021-07-20 2025-01-21 Canon Kabushiki Kaisha Sputtering apparatus, film formation method, and method for manufacturing product

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1425754A (en) * 1973-07-03 1976-02-18 Electricity Council Methods of and apparatus for coating wire rod or strip material by sputtering
US3878085A (en) * 1973-07-05 1975-04-15 Sloan Technology Corp Cathode sputtering apparatus
DD141932B1 (de) * 1978-12-18 1982-06-30 Guenter Reisse Verfahren und vorrichtung zur teilchenstromionisierung und hochratebeschichtung
US4472259A (en) * 1981-10-29 1984-09-18 Materials Research Corporation Focusing magnetron sputtering apparatus
US4428816A (en) * 1983-05-25 1984-01-31 Materials Research Corporation Focusing magnetron sputtering apparatus
US4690744A (en) * 1983-07-20 1987-09-01 Konishiroku Photo Industry Co., Ltd. Method of ion beam generation and an apparatus based on such method
CH659484A5 (de) * 1984-04-19 1987-01-30 Balzers Hochvakuum Anordnung zur beschichtung von substraten mittels kathodenzerstaeubung.
JPS6277460A (ja) * 1985-09-30 1987-04-09 Tokuda Seisakusho Ltd 放電電極

Also Published As

Publication number Publication date
EP0318441A2 (fr) 1989-05-31
BR8806229A (pt) 1989-08-15
RU1809840C (ru) 1993-04-15
EP0318441A3 (en) 1990-07-25
PL275999A1 (en) 1989-07-24
DE3880275D1 (de) 1993-05-19
EP0318441B1 (fr) 1993-04-14
IT8748644A0 (it) 1987-11-27
ATE88222T1 (de) 1993-04-15
PL161618B1 (pl) 1993-07-30
IT1211938B (it) 1989-11-08
DE3880275T2 (de) 1993-10-21
US4933057A (en) 1990-06-12
JPH01168862A (ja) 1989-07-04
ES2040896T3 (es) 1993-11-01

Similar Documents

Publication Publication Date Title
DE69128195T2 (de) Ionenplattierung mittels magnetronsputtern
EP0205028B1 (fr) Appareil pour le dépôt de couches minces sur un substrat
DE3854276T2 (de) Kathodenzerstäubungsverfahren und Vorrichtung zur Durchführung desselben.
DE3004546A1 (de) Penning-zerstaeubungsquelle
EP1826810A2 (fr) Agencement de séparation de particules à partir d'un plasma
DD275861A5 (de) Verfahren und Vorrichtung zur Abscheidung einer dünnen Schicht auf einem transparenten Stoff, insbesondere auf Glas
EP2585622A1 (fr) Source d'évaporation par arc présentant un champ électrique défini
DE2335821A1 (de) Teilchenbeschleuniger
DE112009001534T5 (de) Sputter-Vorrichtung und Sputter-Verfahren
EP1110234B1 (fr) Dispositif et procede pour appliquer un revetement sur des substrats sous vide
EP0008634A1 (fr) Procédé et appareillage pour le dépôt d'une couche d'un métal ou d'un alliage sur un objet conducteur d'électricité
EP0371252B1 (fr) Procédé et appareil pour le décapage de substrats à l'aide d'une décharge à basse pression assistée par un champ magnétique
DE68919671T2 (de) Universelle Kaltkathoden-Ionenerzeugungs- und -beschleunigungsvorrichtung.
DE3136787A1 (de) "verfahren und vorrichtung zum verstaerkten neutralisieren eines positiv geladenen ionenstrahls"
DE19850218C1 (de) Vorrichtung und Verfahren zur Beschichtung von Substraten im Vakuum
DE1920183A1 (de) Ionenbeschussverfahren
DE2016038A1 (de) Ionenquelle
WO2006000862A1 (fr) Dispositif de revetement pour recouvrir un substrat, et procede de revetement associe
DE3000451A1 (de) Vakuumbedampfungsanlage
DE10240337B4 (de) Vorrichtung und Verfahren zur Separation von Partikeln aus einem von einem Target zur Beschichtung eines Substrates erzeugten Plasma im Vakuum
DE1263935B (de) Lauffeldroehre mit gekreuzten elektrischen und magnetischen Feldern
DE1521561A1 (de) Verfahren und Vorrichtung zum Auftragen duenner Schichten
DE68913920T2 (de) Dampf- und Ionenquelle.
DE102007019982B4 (de) Anordnung zur Ausbildung von Beschichtungen auf Substraten im Vakuum
EP0563609A1 (fr) Dispositif pour la production d'un plasma au moyen d'une pulvérisation cathodique et d'un rayonnement microondes

Legal Events

Date Code Title Description
ENJ Ceased due to non-payment of renewal fee