DD291157A5 - Anordnung zur thermowellenanalyse von schichtsystemen - Google Patents
Anordnung zur thermowellenanalyse von schichtsystemen Download PDFInfo
- Publication number
- DD291157A5 DD291157A5 DD89336625A DD33662589A DD291157A5 DD 291157 A5 DD291157 A5 DD 291157A5 DD 89336625 A DD89336625 A DD 89336625A DD 33662589 A DD33662589 A DD 33662589A DD 291157 A5 DD291157 A5 DD 291157A5
- Authority
- DD
- German Democratic Republic
- Prior art keywords
- laser
- detector
- arrangement according
- excitation
- arrangement
- Prior art date
Links
- 238000004458 analytical method Methods 0.000 title claims abstract description 6
- 230000005284 excitation Effects 0.000 claims abstract description 26
- 238000012360 testing method Methods 0.000 claims abstract description 14
- 230000004044 response Effects 0.000 claims abstract description 13
- 230000003287 optical effect Effects 0.000 claims description 9
- 238000009826 distribution Methods 0.000 claims description 7
- 229910004613 CdTe Inorganic materials 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims description 2
- 230000001131 transforming effect Effects 0.000 claims 1
- 238000005259 measurement Methods 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 5
- 239000002344 surface layer Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 24
- 238000000034 method Methods 0.000 description 8
- 239000002800 charge carrier Substances 0.000 description 7
- 230000001066 destructive effect Effects 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 230000005489 elastic deformation Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229910021419 crystalline silicon Inorganic materials 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000004069 differentiation Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000004867 photoacoustic spectroscopy Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/171—Systems in which incident light is modified in accordance with the properties of the material investigated with calorimetric detection, e.g. with thermal lens detection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/171—Systems in which incident light is modified in accordance with the properties of the material investigated with calorimetric detection, e.g. with thermal lens detection
- G01N2021/1714—Photothermal radiometry with measurement of emission
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials Using Thermal Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD89336625A DD291157A5 (de) | 1989-12-28 | 1989-12-28 | Anordnung zur thermowellenanalyse von schichtsystemen |
| DE4037391A DE4037391A1 (de) | 1989-12-28 | 1990-11-22 | Anordnung zur thermowellenanalyse von schichtsystemen |
| AT90811021T ATE130433T1 (de) | 1989-12-28 | 1990-12-21 | Anordnung zur thermowellenanalyse von schichtsystemen. |
| EP90811021A EP0435829B1 (fr) | 1989-12-28 | 1990-12-21 | Arrangement pour l'analyse d'ondes thermiques dans des systèmes en couches |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD89336625A DD291157A5 (de) | 1989-12-28 | 1989-12-28 | Anordnung zur thermowellenanalyse von schichtsystemen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DD291157A5 true DD291157A5 (de) | 1991-06-20 |
Family
ID=5615549
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DD89336625A DD291157A5 (de) | 1989-12-28 | 1989-12-28 | Anordnung zur thermowellenanalyse von schichtsystemen |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0435829B1 (fr) |
| AT (1) | ATE130433T1 (fr) |
| DD (1) | DD291157A5 (fr) |
| DE (1) | DE4037391A1 (fr) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4301987A1 (de) * | 1993-01-26 | 1994-07-28 | Soelter Nikolai | Apparat und Verfahren zur Bestimmung der spezifischen Wärmekapazität mittels Wärmepuls und gleichzeitig Ermittlung der Temperaturleitfähigkeit |
| DE102004038282B4 (de) * | 2004-08-03 | 2006-09-14 | Salzgitter Flachstahl Gmbh | Verfahren zur Untersuchung auf einem Metallsubstrat aufgebrachter, mit Partikeln durchsetzter Beschichtungen |
| DE102021127596A1 (de) | 2021-10-22 | 2023-04-27 | Linseis Messgeräte Gesellschaft mit beschränkter Haftung | Temperaturleitfähigkeitsmessgerät |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4271355A (en) * | 1979-08-30 | 1981-06-02 | United Technologies Corporation | Method for mitigating 2πN ambiguity in an adaptive optics control system |
| US4513384A (en) * | 1982-06-18 | 1985-04-23 | Therma-Wave, Inc. | Thin film thickness measurements and depth profiling utilizing a thermal wave detection system |
| US4522510A (en) * | 1982-07-26 | 1985-06-11 | Therma-Wave, Inc. | Thin film thickness measurement with thermal waves |
| US4521118A (en) * | 1982-07-26 | 1985-06-04 | Therma-Wave, Inc. | Method for detection of thermal waves with a laser probe |
| US4636088A (en) * | 1984-05-21 | 1987-01-13 | Therma-Wave, Inc. | Method and apparatus for evaluating surface conditions of a sample |
| US4679946A (en) * | 1984-05-21 | 1987-07-14 | Therma-Wave, Inc. | Evaluating both thickness and compositional variables in a thin film sample |
| US4579463A (en) * | 1984-05-21 | 1986-04-01 | Therma-Wave Partners | Detecting thermal waves to evaluate thermal parameters |
| US4869574A (en) * | 1988-05-13 | 1989-09-26 | The United States Of America As Represented By The Secretary Of The Army | Hybrid optical correlator |
-
1989
- 1989-12-28 DD DD89336625A patent/DD291157A5/de not_active IP Right Cessation
-
1990
- 1990-11-22 DE DE4037391A patent/DE4037391A1/de not_active Withdrawn
- 1990-12-21 AT AT90811021T patent/ATE130433T1/de not_active IP Right Cessation
- 1990-12-21 EP EP90811021A patent/EP0435829B1/fr not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| ATE130433T1 (de) | 1995-12-15 |
| DE4037391A1 (de) | 1991-07-04 |
| EP0435829A3 (en) | 1992-06-10 |
| EP0435829B1 (fr) | 1995-11-15 |
| EP0435829A2 (fr) | 1991-07-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RPI | Change in the person, name or address of the patentee (searches according to art. 11 and 12 extension act) | ||
| ENJ | Ceased due to non-payment of renewal fee |