DD97673A1 - - Google Patents

Info

Publication number
DD97673A1
DD97673A1 DD164801A DD16480172A DD97673A1 DD 97673 A1 DD97673 A1 DD 97673A1 DD 164801 A DD164801 A DD 164801A DD 16480172 A DD16480172 A DD 16480172A DD 97673 A1 DD97673 A1 DD 97673A1
Authority
DD
German Democratic Republic
Application number
DD164801A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to DD164801A priority Critical patent/DD97673A1/xx
Publication of DD97673A1 publication Critical patent/DD97673A1/xx
Priority to DE2324719A priority patent/DE2324719A1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
DD164801A 1972-08-01 1972-08-01 DD97673A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DD164801A DD97673A1 (fr) 1972-08-01 1972-08-01
DE2324719A DE2324719A1 (de) 1972-08-01 1973-05-16 Verfahren zur nachbehandlung dielektrischer anorganischer filme auf unterlagen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD164801A DD97673A1 (fr) 1972-08-01 1972-08-01

Publications (1)

Publication Number Publication Date
DD97673A1 true DD97673A1 (fr) 1973-05-14

Family

ID=5487706

Family Applications (1)

Application Number Title Priority Date Filing Date
DD164801A DD97673A1 (fr) 1972-08-01 1972-08-01

Country Status (2)

Country Link
DD (1) DD97673A1 (fr)
DE (1) DE2324719A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2461359A1 (fr) * 1979-07-06 1981-01-30 Commissariat Energie Atomique Procede et appareil d'hydrogenation de dispositifs a semi-conducteurs
JP2934456B2 (ja) * 1989-07-14 1999-08-16 株式会社日立製作所 表面処理方法及びその装置
EP0572704B1 (fr) * 1992-06-05 2000-04-19 Semiconductor Process Laboratory Co., Ltd. Procédé de fabrication d'un dispositif semi-conducteur comportant une méthode de réforme d'une couche isolante obtenue par CVD à basse température

Also Published As

Publication number Publication date
DE2324719A1 (de) 1974-02-07

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