DE163155T1 - Bei niederer temperatur gebrannte keramiken. - Google Patents
Bei niederer temperatur gebrannte keramiken.Info
- Publication number
- DE163155T1 DE163155T1 DE198585105284T DE85105284T DE163155T1 DE 163155 T1 DE163155 T1 DE 163155T1 DE 198585105284 T DE198585105284 T DE 198585105284T DE 85105284 T DE85105284 T DE 85105284T DE 163155 T1 DE163155 T1 DE 163155T1
- Authority
- DE
- Germany
- Prior art keywords
- low temperature
- impurities
- munich
- mixture
- powder containing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/08—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances quartz; glass; glass wool; slag wool; vitreous enamels
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0036—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/12—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances ceramics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/12—Ceramic dielectrics
- H01G4/129—Ceramic dielectrics containing a glassy phase, e.g. glass ceramic
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
- H10W70/69—Insulating materials thereof
- H10W70/692—Ceramics or glasses
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
- H05K3/4629—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating inorganic sheets comprising printed circuits, e.g. green ceramic sheets
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Power Engineering (AREA)
- Dispersion Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Glass Compositions (AREA)
Claims (2)
1. Bei niederer Temperatur gebrannte Keramiken, hergestellt durch Brennen einer Mischung bei niederer Temperatur, dadurch gekennzeichnet,
daß die Mischung, in Gewichtsprozenten, enthält:
(a) 50 bis 65 % Glaspulver, enthaltend 10 bis 55 % CaO, 45 bis
70 % SiO2, 0 bis 30 % Al2O3 und bis zu 10 % Verunreinigungen;
und
(b) 50 bis 35 % Al203-Pulver, enthaltend bis zu 10 % Verunreinigungen.
2. Bei niederer Temperatur gebrannte Keramiken, hergestellt durch Brennen einer Mischung bei niederer Temperatur, dadurch gekennzeichnet,
daß die Mischung, in Gewichtsprozenten, enthält:
(a) 50 bis 65 % Glaspulver, enthaltend
(i) 10 bis 55 % CaO, 45 bis 70 % SiO2, 0 bis 30 % Al3O3 und
bis zu 10 % Verunreinigungen; und
(ii) bis zu 20 %t bezogen auf das Gesamtgewicht der vorherigen
Bestandteile (i), B2O3; und
(b) 50 bis 35 % Al203-Pulver, enthaltend bis zu 10 % Verunreinigungen.
* (089) 988272-74 Telekopierer: (089) 983049 Bankkonten: Bayer. Vereinsbank München 453100 (BLZ 70020270,
Telex: 524560 Swan d KaIIe Infotec 6350 Gr. Il + III Hvoo-Bank München Λ4in 19?mn ml 7 7nnonmi\ <:,...<. rv«<~ uv
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59110973A JPS60260465A (ja) | 1984-06-01 | 1984-06-01 | 低温焼成セラミツクス |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE163155T1 true DE163155T1 (de) | 1986-04-10 |
Family
ID=14549184
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE8585105284T Expired DE3561547D1 (en) | 1984-06-01 | 1985-04-30 | Low temperature fired ceramics |
| DE198585105284T Pending DE163155T1 (de) | 1984-06-01 | 1985-04-30 | Bei niederer temperatur gebrannte keramiken. |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE8585105284T Expired DE3561547D1 (en) | 1984-06-01 | 1985-04-30 | Low temperature fired ceramics |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4621066A (de) |
| EP (1) | EP0163155B1 (de) |
| JP (1) | JPS60260465A (de) |
| DE (2) | DE3561547D1 (de) |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61117163A (ja) * | 1984-06-01 | 1986-06-04 | 鳴海製陶株式会社 | 低温焼成セラミツクスの製造方法並びに装置 |
| JPH0634452B2 (ja) * | 1985-08-05 | 1994-05-02 | 株式会社日立製作所 | セラミツクス回路基板 |
| JPS62113758A (ja) * | 1985-10-25 | 1987-05-25 | 株式会社住友金属セラミックス | 低温焼成セラミツクス |
| JPS6298503A (ja) * | 1985-10-25 | 1987-05-08 | 株式会社住友金属セラミックス | マイクロ波用誘電体磁器組成物 |
| US4748085A (en) * | 1985-11-16 | 1988-05-31 | Narumi China Corporation | Multilayer ceramic circuit board fired at a low temperature |
| DE3774594D1 (de) * | 1986-03-11 | 1992-01-02 | Philips Nv | Verbundkoerper. |
| JPS6345148A (ja) * | 1986-08-11 | 1988-02-26 | Natl Inst For Res In Inorg Mater | 機械加工性の針状結晶析出結晶化ガラスの製造方法 |
| JPH0783180B2 (ja) * | 1987-05-20 | 1995-09-06 | 松下電器産業株式会社 | セラミック多層基板とその製造方法 |
| DE3879301D1 (de) * | 1987-07-06 | 1993-04-22 | Tokuyama Soda Kk | Verfahren zur erzeugung eines koerpers aus gesinterten anorthit. |
| US4861646A (en) * | 1987-08-13 | 1989-08-29 | Ceramics Process Systems Corp. | Co-fired metal-ceramic package |
| JPH0728128B2 (ja) * | 1988-03-11 | 1995-03-29 | 松下電器産業株式会社 | セラミック多層配線基板とその製造方法 |
| US5164342A (en) * | 1988-10-14 | 1992-11-17 | Ferro Corporation | Low dielectric, low temperature fired glass ceramics |
| US5258335A (en) * | 1988-10-14 | 1993-11-02 | Ferro Corporation | Low dielectric, low temperature fired glass ceramics |
| US5071794A (en) * | 1989-08-04 | 1991-12-10 | Ferro Corporation | Porous dielectric compositions |
| WO1991002363A1 (en) * | 1989-08-04 | 1991-02-21 | Ferro Corporation | Porous dielectric compositions |
| WO1991017286A1 (en) * | 1990-05-04 | 1991-11-14 | Battelle Memorial Institute | Process for depositing thin film layers onto surfaces modified with organic functional groups and products formed thereby |
| JP2614778B2 (ja) * | 1990-07-12 | 1997-05-28 | 株式会社住友金属エレクトロデバイス | セラミック多層回路基板の製造方法 |
| JP2611063B2 (ja) * | 1990-07-24 | 1997-05-21 | ティーディーケイ株式会社 | 高周波回路 |
| US5273827A (en) * | 1992-01-21 | 1993-12-28 | Corning Incorporated | Composite article and method |
| JP2943129B2 (ja) * | 1992-12-29 | 1999-08-30 | インターナショナル・ビジネス・マシーンズ・コーポレーション | セラミック組成物、セラミック・グリーン・シートおよび製造方法 |
| JP2505107B2 (ja) * | 1994-02-03 | 1996-06-05 | 株式会社住友金属セラミックス | セラミック多層配線基板およびその製造法 |
| US5660781A (en) * | 1994-06-28 | 1997-08-26 | Sumitomo Metal Industries, Ltd. | Process for preparing glass ceramic green sheets |
| US5601672A (en) * | 1994-11-01 | 1997-02-11 | International Business Machines Corporation | Method for making ceramic substrates from thin and thick ceramic greensheets |
| JP3331083B2 (ja) * | 1995-03-06 | 2002-10-07 | 株式会社住友金属エレクトロデバイス | 低温焼成セラミック回路基板 |
| JP3297569B2 (ja) * | 1995-10-30 | 2002-07-02 | 京セラ株式会社 | 低温焼成磁器組成物 |
| JPH09246723A (ja) * | 1996-03-11 | 1997-09-19 | Sumitomo Kinzoku Electro Device:Kk | 低温焼成セラミック回路基板 |
| EP0892765A4 (de) * | 1996-04-09 | 2000-03-15 | Vortec Corp | Herstellung von keramischen fliesen aus flugaschen |
| US5830251A (en) * | 1996-04-10 | 1998-11-03 | Vortec Corporation | Manufacture of ceramic tiles from industrial waste |
| JPH11335162A (ja) * | 1998-05-25 | 1999-12-07 | Murata Mfg Co Ltd | セラミック基板用組成物およびセラミック回路部品 |
| JP4852778B2 (ja) * | 1999-06-22 | 2012-01-11 | 株式会社村田製作所 | セラミック基板用組成物およびセラミック回路部品 |
| JP3591437B2 (ja) * | 2000-09-07 | 2004-11-17 | 株式会社村田製作所 | 多層セラミック基板およびその製造方法ならびに電子装置 |
| JP4590866B2 (ja) * | 2001-11-05 | 2010-12-01 | 旭硝子株式会社 | ガラスセラミックス組成物 |
| KR100484892B1 (ko) * | 2002-08-28 | 2005-04-28 | 재단법인서울대학교산학협력재단 | 자가발포형 다공성 세라믹 조성물 및 이를 이용한 다공성 세라믹의 제조방법 |
| US7510995B2 (en) * | 2003-04-01 | 2009-03-31 | United Technologies Corporation | Application of a mixed metal oxide catalyst to a metallic substrate |
| JP4748701B2 (ja) * | 2003-04-28 | 2011-08-17 | 日本特殊陶業株式会社 | 低温焼成磁器組成物、およびそれを用いた配線基板 |
| EP1627863B1 (de) | 2003-05-26 | 2010-08-11 | Murata Manufacturing Co., Ltd. | Porzellanzusammensetzung |
| JP2006206378A (ja) * | 2005-01-28 | 2006-08-10 | Murata Mfg Co Ltd | セラミック原料組成物およびセラミック回路部品 |
| JP2009117450A (ja) * | 2007-11-02 | 2009-05-28 | Rohm Co Ltd | モジュールおよびその製造方法 |
| KR100896610B1 (ko) * | 2007-11-05 | 2009-05-08 | 삼성전기주식회사 | 다층 세라믹 기판 및 그 제조방법 |
| US8388678B2 (en) * | 2007-12-12 | 2013-03-05 | Boston Scientific Scimed, Inc. | Medical devices having porous component for controlled diffusion |
| JP2010120849A (ja) * | 2010-01-14 | 2010-06-03 | Nippon Electric Glass Co Ltd | ガラスセラミックス焼結体 |
| JP5429091B2 (ja) * | 2010-07-21 | 2014-02-26 | 日本電気硝子株式会社 | ガラスセラミックス誘電体材料およびその製造方法 |
| JP2014029889A (ja) * | 2010-11-17 | 2014-02-13 | Panasonic Corp | セラミック多層基板、およびセラミック多層基板の製造方法 |
| CN102503137A (zh) * | 2011-10-13 | 2012-06-20 | 天津大学 | 一种钙铝硼硅系玻璃+熔融石英体系低温共烧陶瓷材料及其制备方法 |
| KR20160016392A (ko) * | 2014-08-05 | 2016-02-15 | 삼성전기주식회사 | 적층 세라믹 커패시터 |
| WO2018195257A1 (en) * | 2017-04-21 | 2018-10-25 | Lantec Products, Inc. | Low bake ceramic material |
| US10597186B2 (en) | 2018-06-21 | 2020-03-24 | John Bean Technologies Corporation | Produce label printer and applicator |
| IT201800020944A1 (it) * | 2018-12-21 | 2020-06-21 | Luca Toncelli | Metodo per la produzione di manufatti colorati in lastra vetroceramica a partire da un impasto base, fritta vetrosa per la realizzazione dellimpasto base e manufatto colorato in lastra vetroceramica così ottenuto |
| JP6927251B2 (ja) * | 2019-07-08 | 2021-08-25 | Tdk株式会社 | ガラスセラミックス焼結体および配線基板 |
| JP2021138575A (ja) * | 2020-03-06 | 2021-09-16 | 日本電気硝子株式会社 | 連結基板及びそれを用いた素子基板の製造方法 |
| RU2753522C1 (ru) * | 2020-12-18 | 2021-08-17 | федеральное государственное автономное образовательное учреждение высшего образования «Национальный исследовательский Томский политехнический университет» | Низкотемпературный стеклокерамический материал для электронной техники |
| CN113121116B (zh) * | 2021-05-11 | 2022-11-22 | 景德镇陶瓷大学 | 一种微晶玻璃焊料及其制备方法和连接氧化铝陶瓷的方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL108946C (de) * | 1959-04-08 | |||
| DE1220094B (de) * | 1963-08-06 | 1966-06-30 | Jenaer Glaswerk Schott & Gen | Verwendung von Glaspulvermischungen bei der Herstellung kristalliner, hitzebestaendiger UEberzugs- und Verschmelzmassen |
| US3471306A (en) * | 1968-07-16 | 1969-10-07 | Interspace Corp | Refractory resistant to molten aluminum |
| FR2075173A5 (de) * | 1970-01-20 | 1971-10-08 | Nippon Electric Glass Co | |
| US3847582A (en) * | 1971-06-01 | 1974-11-12 | M Kozmin | Method of continuous fabrication of glass-crystalline materials with rib configuration |
| JPS5122925B2 (de) * | 1973-03-22 | 1976-07-13 | ||
| GB1452849A (en) * | 1974-01-02 | 1976-10-20 | Ibm | Sinterable alumina compositions |
| DE2460931A1 (de) * | 1974-03-08 | 1975-09-11 | Ibm | Bei niedrigen temperaturen sinterbare stoffzusammensetzung |
| JPS5316719A (en) * | 1976-07-31 | 1978-02-16 | Matsushita Electric Works Ltd | Method of manufacturing inorganic moulding materials |
| JPS5361607A (en) * | 1976-11-15 | 1978-06-02 | Matsushita Electric Works Ltd | Process for making inorganic sintered object |
| US4187115A (en) * | 1978-09-01 | 1980-02-05 | Corning Glass Works | Anorthite glass-ceramics |
| JPS58204870A (ja) * | 1982-05-24 | 1983-11-29 | 富士通株式会社 | ガラス・セラミツク組成物 |
| US4522926A (en) * | 1983-03-10 | 1985-06-11 | Combustion Engineering, Inc. | Aluminum resistant refractory composition |
-
1984
- 1984-06-01 JP JP59110973A patent/JPS60260465A/ja active Granted
-
1985
- 1985-03-27 US US06/716,722 patent/US4621066A/en not_active Expired - Lifetime
- 1985-04-30 EP EP85105284A patent/EP0163155B1/de not_active Expired
- 1985-04-30 DE DE8585105284T patent/DE3561547D1/de not_active Expired
- 1985-04-30 DE DE198585105284T patent/DE163155T1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0353269B2 (de) | 1991-08-14 |
| US4621066A (en) | 1986-11-04 |
| JPS60260465A (ja) | 1985-12-23 |
| EP0163155B1 (de) | 1988-02-03 |
| DE3561547D1 (en) | 1988-03-10 |
| EP0163155A1 (de) | 1985-12-04 |
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