Classifications

• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
  • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
  • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
• • G—PHYSICS
  • G01—MEASURING; TESTING
  • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
  • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
  • G01N21/84—Systems specially adapted for particular applications
  • G01N21/88—Investigating the presence of flaws or contamination
  • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
  • G01N21/8901—Optical details; Scanning details
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
  • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
  • G02B26/10—Scanning systems
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
  • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
  • G02B27/0031—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration for scanning purposes
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
  • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
  • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
  • H10P72/57—Mask-wafer alignment
• • G—PHYSICS
  • G01—MEASURING; TESTING
  • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
  • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
  • G01N21/84—Systems specially adapted for particular applications
  • G01N21/88—Investigating the presence of flaws or contamination
  • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
  • G01N21/8901—Optical details; Scanning details
  • G01N2021/8905—Directional selective optics, e.g. slits, spatial filters
  • G01N2021/8907—Cylindrical optics

Landscapes

• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Optics & Photonics (AREA)
• Immunology (AREA)
• Textile Engineering (AREA)
• Chemical & Material Sciences (AREA)
• Analytical Chemistry (AREA)
• Biochemistry (AREA)
• General Health & Medical Sciences (AREA)
• Health & Medical Sciences (AREA)
• Engineering & Computer Science (AREA)
• Pathology (AREA)
• Life Sciences & Earth Sciences (AREA)
• Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
• Length Measuring Devices By Optical Means (AREA)
• Lenses (AREA)
• Mechanical Optical Scanning Systems (AREA)
• Analysing Materials By The Use Of Radiation (AREA)
• Investigating Or Analysing Materials By Optical Means (AREA)
• Light Guides In General And Applications Therefor (AREA)
• Facsimile Scanning Arrangements (AREA)
• Noodles (AREA)
• Epoxy Compounds (AREA)

Applications Claiming Priority (1)

Publications (1)

Family

ID=19856420

Family Applications (1)

Country Status (11)

Families Citing this family (9)

Family Cites Families (6)

• 1990
  • 1990-12-18 ES ES90203396T patent/ES2058766T3/es not_active Expired - Lifetime
  • 1990-12-18 EP EP90203396A patent/EP0437883B1/en not_active Expired - Lifetime
  • 1990-12-18 AT AT90203396T patent/ATE108029T1/de not_active IP Right Cessation
  • 1990-12-18 DK DK90203396.8T patent/DK0437883T3/da active
  • 1990-12-18 DE DE69010318T patent/DE69010318T2/de not_active Expired - Fee Related
• 1991
  • 1991-01-09 JP JP1277191A patent/JP2995238B2/ja not_active Expired - Fee Related
  • 1991-01-10 KR KR1019910000241A patent/KR0170783B1/ko not_active Expired - Fee Related
  • 1991-01-11 FI FI910150A patent/FI104297B1/fi not_active IP Right Cessation
  • 1991-01-11 CA CA002034017A patent/CA2034017C/en not_active Expired - Fee Related
  • 1991-01-15 IL IL96947A patent/IL96947A/xx not_active IP Right Cessation
  • 1991-01-16 US US07/642,249 patent/US5170037A/en not_active Expired - Lifetime

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