DK0741404T3 - Fremgangsmåde og elektrodesystem til excitering af et plasma - Google Patents

Fremgangsmåde og elektrodesystem til excitering af et plasma

Info

Publication number
DK0741404T3
DK0741404T3 DK96610018T DK96610018T DK0741404T3 DK 0741404 T3 DK0741404 T3 DK 0741404T3 DK 96610018 T DK96610018 T DK 96610018T DK 96610018 T DK96610018 T DK 96610018T DK 0741404 T3 DK0741404 T3 DK 0741404T3
Authority
DK
Denmark
Prior art keywords
electrode system
electrode
math
excitation
plasma
Prior art date
Application number
DK96610018T
Other languages
English (en)
Inventor
Kristian Glejbol
Original Assignee
Nkt Res Center As
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nkt Res Center As filed Critical Nkt Res Center As
Application granted granted Critical
Publication of DK0741404T3 publication Critical patent/DK0741404T3/da

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H01J37/32027—DC powered
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DK96610018T 1995-05-02 1996-05-02 Fremgangsmåde og elektrodesystem til excitering af et plasma DK0741404T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NO951682A NO302060B1 (no) 1995-05-02 1995-05-02 Fremgangsmåte og elektrodesystem for eksitering av et plasma

Publications (1)

Publication Number Publication Date
DK0741404T3 true DK0741404T3 (da) 2000-05-01

Family

ID=19898163

Family Applications (1)

Application Number Title Priority Date Filing Date
DK96610018T DK0741404T3 (da) 1995-05-02 1996-05-02 Fremgangsmåde og elektrodesystem til excitering af et plasma

Country Status (7)

Country Link
US (1) US5935455A (da)
EP (1) EP0741404B1 (da)
AT (1) ATE188805T1 (da)
DE (1) DE69606087T2 (da)
DK (1) DK0741404T3 (da)
ES (1) ES2140812T3 (da)
NO (1) NO302060B1 (da)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO304234B1 (no) * 1996-06-28 1998-11-16 Nkt Res Center As FremgangsmÕte for modifisering av overflaten av fast polymersubstrat, det derved oppnÕdde produktet samt anvendelse av fremgangsmÕten
WO2000044207A1 (en) * 1999-01-20 2000-07-27 Nkt Research Center A/S Method for the excitation of a plasma and a use of the method
KR100320197B1 (ko) * 1999-08-21 2002-01-10 구자홍 직류전원 플라즈마중합 연속처리장치
JP2003530481A (ja) * 1999-11-19 2003-10-14 ナノ スケール サーフェイス システムズ インコーポレイテッド 無機／有機誘電体フィルムを堆積させるシステム及び方法
AU779530B2 (en) * 2000-05-10 2005-01-27 Nkt Research A/S A method of coating the surface of an inorganic substrate with an organic material and the product obtained
JP2004522255A (ja) * 2000-10-27 2004-07-22 エヌ・ケー・ティー リサーチ アクティーゼルスカブ プラズマを励起させる方法および装置
JP2004517175A (ja) * 2000-12-29 2004-06-10 エヌ・ケー・ティー リサーチ アンド イノベーション アクティーゼルスカブ 化合物を固定する基質の調製方法、その基質およびその使用方法
US20050061444A1 (en) * 2003-09-24 2005-03-24 Yoshiaki Noda Plasma cleaning device
US7232975B2 (en) * 2003-12-02 2007-06-19 Battelle Energy Alliance, Llc Plasma generators, reactor systems and related methods
EP1841814B1 (en) * 2005-01-17 2009-11-18 Biomodics A method of coating a polymer surface with a polymer containing coating and an item comprising a polymer coated polymer
US7741577B2 (en) * 2006-03-28 2010-06-22 Battelle Energy Alliance, Llc Modular hybrid plasma reactor and related systems and methods
US20080271723A1 (en) * 2006-05-17 2008-11-06 Cowden Ralph A Anti global warming energy power system and method
US8536481B2 (en) 2008-01-28 2013-09-17 Battelle Energy Alliance, Llc Electrode assemblies, plasma apparatuses and systems including electrode assemblies, and methods for generating plasma

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4029995A (en) * 1976-01-06 1977-06-14 Onoda Cement Company, Ltd. Apparatus for producing charged particles
JPS6244576A (ja) * 1984-09-14 1987-02-26 Anelva Corp 多電極放電反応処理装置
US5452177A (en) * 1990-06-08 1995-09-19 Varian Associates, Inc. Electrostatic wafer clamp
US5330606A (en) * 1990-12-14 1994-07-19 Matsushita Electric Industrial Co., Ltd. Plasma source for etching
KR970005035B1 (ko) * 1992-03-31 1997-04-11 마쯔시다덴기산교 가부시기가이샤 플라즈마발생방법 및 그 장치
JPH0645096A (ja) * 1992-03-31 1994-02-18 Matsushita Electric Ind Co Ltd プラズマ発生方法およびその装置
US5404079A (en) * 1992-08-13 1995-04-04 Matsushita Electric Industrial Co., Ltd. Plasma generating apparatus
JPH07226395A (ja) * 1994-02-15 1995-08-22 Matsushita Electric Ind Co Ltd 真空プラズマ処理装置
DE69512371T2 (de) * 1994-05-13 2000-04-06 Applied Materials, Inc. Magnetisch verbesserte multiple kapazitive plasmagenerationsvorrichtung und verfahren
US5535906A (en) * 1995-01-30 1996-07-16 Advanced Energy Industries, Inc. Multi-phase DC plasma processing system
US5677236A (en) * 1995-02-24 1997-10-14 Mitsui Toatsu Chemicals, Inc. Process for forming a thin microcrystalline silicon semiconductor film
US5801489A (en) * 1996-02-07 1998-09-01 Paul E. Chism, Jr. Three-phase alternating current plasma generator

Also Published As

Publication number Publication date
ES2140812T3 (es) 2000-03-01
ATE188805T1 (de) 2000-01-15
US5935455A (en) 1999-08-10
DE69606087D1 (de) 2000-02-17
DE69606087T2 (de) 2000-09-14
EP0741404A1 (en) 1996-11-06
EP0741404B1 (en) 2000-01-12
NO951682L (no) 1996-11-04
NO302060B1 (no) 1998-01-12
NO951682D0 (no) 1995-05-02

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