DK0794266T3 - Indretning til belægning af en substratflade - Google Patents

Indretning til belægning af en substratflade

Info

Publication number
DK0794266T3
DK0794266T3 DK96810130T DK96810130T DK0794266T3 DK 0794266 T3 DK0794266 T3 DK 0794266T3 DK 96810130 T DK96810130 T DK 96810130T DK 96810130 T DK96810130 T DK 96810130T DK 0794266 T3 DK0794266 T3 DK 0794266T3
Authority
DK
Denmark
Prior art keywords
coating
substrate surface
substrate
Prior art date
Application number
DK96810130T
Other languages
English (en)
Inventor
Wolfgang Lohwasser
Andre Wisard
Original Assignee
Alusuisse Tech & Man Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alusuisse Tech & Man Ag filed Critical Alusuisse Tech & Man Ag
Application granted granted Critical
Publication of DK0794266T3 publication Critical patent/DK0794266T3/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DK96810130T 1996-03-06 1996-03-06 Indretning til belægning af en substratflade DK0794266T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP96810130A EP0794266B1 (de) 1996-03-06 1996-03-06 Vorrichtung zum Beschichten einer Substratfläche

Publications (1)

Publication Number Publication Date
DK0794266T3 true DK0794266T3 (da) 2001-04-09

Family

ID=8225556

Family Applications (1)

Application Number Title Priority Date Filing Date
DK96810130T DK0794266T3 (da) 1996-03-06 1996-03-06 Indretning til belægning af en substratflade

Country Status (7)

Country Link
US (1) US5795628A (da)
EP (1) EP0794266B1 (da)
CA (1) CA2198983C (da)
CZ (1) CZ291562B6 (da)
DE (1) DE59606186D1 (da)
DK (1) DK0794266T3 (da)
ES (1) ES2152506T3 (da)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2339800B (en) * 1998-07-24 2003-04-09 Gen Vacuum Equipment Ltd A vacuum process for depositing zinc sulphide and other coatings on flexible moving web
EP1008443A1 (de) * 1998-12-08 2000-06-14 Alusuisse Technology & Management AG Sterilisierbarer Folienverbund für Verpackungszwecke
US6878420B2 (en) * 2001-03-12 2005-04-12 Lucent Technologies Inc. MgB2 superconductors
US7498066B2 (en) * 2002-05-08 2009-03-03 Btu International Inc. Plasma-assisted enhanced coating
US20060102079A1 (en) * 2004-11-15 2006-05-18 Glassman Timothy E Reducing variability in delivery rates of solid state precursors
US8137462B2 (en) * 2006-10-10 2012-03-20 Asm America, Inc. Precursor delivery system
EP1947210A1 (fr) * 2007-01-16 2008-07-23 ARCELOR France Procede de revetement d'un substrat, installation de mise en oeuvre du procede et dispositif d'alimentation en metal d'une telle installation
EP2116629A4 (en) * 2007-02-28 2010-11-24 Ulvac Inc DEPOSITION SOURCE, DEPOSITION APPARATUS, AND METHOD FOR FORMING ORGANIC THIN FILM
WO2017005597A1 (en) 2015-07-03 2017-01-12 Amcor Flexibles Kreuzlingen Flexible multilayer packaging film with ultra-high barrier properties
EP3144140B1 (en) 2015-09-17 2025-08-27 Amcor Flexibles Transpac Corrosion protection film
US11926894B2 (en) 2016-09-30 2024-03-12 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
US10876205B2 (en) 2016-09-30 2020-12-29 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
TW201823501A (zh) * 2016-11-16 2018-07-01 美商陶氏全球科技有限責任公司 用於製造膜上之薄塗層之方法
KR20200020608A (ko) 2018-08-16 2020-02-26 에이에스엠 아이피 홀딩 비.브이. 고체 소스 승화기
US11624113B2 (en) 2019-09-13 2023-04-11 Asm Ip Holding B.V. Heating zone separation for reactant evaporation system

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3552352A (en) * 1968-02-13 1971-01-05 Du Pont Electron beam vaporization coating apparatus
JP2687845B2 (ja) * 1993-07-16 1997-12-08 日本電気株式会社 パルスレーザー蒸着法を用いた複合系材料薄膜の製造方法
JPH0774101A (ja) * 1993-09-02 1995-03-17 Matsushita Electric Ind Co Ltd レーザーアブレーション装置

Also Published As

Publication number Publication date
ES2152506T3 (es) 2001-02-01
CA2198983A1 (en) 1997-09-06
CA2198983C (en) 2003-05-13
CZ291562B6 (cs) 2003-04-16
EP0794266A1 (de) 1997-09-10
US5795628A (en) 1998-08-18
CZ64297A3 (en) 1997-10-15
DE59606186D1 (de) 2001-01-11
EP0794266B1 (de) 2000-12-06

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