DK1379918T3 - Billeddannende element indeholdende podepyolymer - Google Patents

Billeddannende element indeholdende podepyolymer

Info

Publication number
DK1379918T3
DK1379918T3 DK02702061.9T DK02702061T DK1379918T3 DK 1379918 T3 DK1379918 T3 DK 1379918T3 DK 02702061 T DK02702061 T DK 02702061T DK 1379918 T3 DK1379918 T3 DK 1379918T3
Authority
DK
Denmark
Prior art keywords
graft copolymer
imaging element
graft polymer
element containing
containing graft
Prior art date
Application number
DK02702061.9T
Other languages
English (en)
Inventor
S Peter Pappas
Shashikant Saraiya
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of DK1379918T3 publication Critical patent/DK1379918T3/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/494—Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
    • G03C1/498—Photothermographic systems, e.g. dry silver
    • G03C1/49836—Additives
    • G03C1/49863—Inert additives, e.g. surfactants, binders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/10—Developable by an acidic solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Graft Or Block Polymers (AREA)
  • Materials For Photolithography (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Conductive Materials (AREA)
DK02702061.9T 2001-04-04 2002-01-23 Billeddannende element indeholdende podepyolymer DK1379918T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/826,300 US6582882B2 (en) 2001-04-04 2001-04-04 Imageable element comprising graft polymer
PCT/US2002/001929 WO2002082180A1 (en) 2001-04-04 2002-01-23 Imageable element comprising graft polymer

Publications (1)

Publication Number Publication Date
DK1379918T3 true DK1379918T3 (da) 2010-07-19

Family

ID=25246180

Family Applications (1)

Application Number Title Priority Date Filing Date
DK02702061.9T DK1379918T3 (da) 2001-04-04 2002-01-23 Billeddannende element indeholdende podepyolymer

Country Status (8)

Country Link
US (1) US6582882B2 (da)
EP (1) EP1379918B1 (da)
JP (1) JP4053888B2 (da)
AT (1) ATE462990T1 (da)
DE (1) DE60235801D1 (da)
DK (1) DK1379918T3 (da)
ES (1) ES2343783T3 (da)
WO (1) WO2002082180A1 (da)

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6566029B2 (en) * 2000-12-13 2003-05-20 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
JP4266077B2 (ja) * 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
US7049046B2 (en) * 2004-03-30 2006-05-23 Eastman Kodak Company Infrared absorbing compounds and their use in imageable elements
US7592128B2 (en) * 2001-04-04 2009-09-22 Eastman Kodak Company On-press developable negative-working imageable elements
US7045271B2 (en) * 2004-05-10 2006-05-16 Eastman Kodak Company On press developable imageable element
US7261998B2 (en) 2001-04-04 2007-08-28 Eastman Kodak Company Imageable element with solvent-resistant polymeric binder
US6899994B2 (en) * 2001-04-04 2005-05-31 Kodak Polychrome Graphics Llc On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments
US7172850B2 (en) 2002-04-10 2007-02-06 Eastman Kodak Company Preparation of solvent-resistant binder for an imageable element
US7659046B2 (en) * 2002-04-10 2010-02-09 Eastman Kodak Company Water-developable infrared-sensitive printing plate
US7217502B2 (en) * 2003-03-27 2007-05-15 Eastman Kodak Company Nanopastes for use as patterning compositions
US7368215B2 (en) * 2003-05-12 2008-05-06 Eastman Kodak Company On-press developable IR sensitive printing plates containing an onium salt initiator system
US7297462B2 (en) * 2003-11-17 2007-11-20 Agfa Graphics Nv Heat-sensitive lithographic printing plate precursor
EP1531042B1 (en) * 2003-11-17 2009-07-08 Agfa Graphics N.V. Heat-sensitive lithographic printing plate precursor.
US7214469B2 (en) 2003-12-26 2007-05-08 Fujifilm Corporation Lithographic printing plate precursor and lithographic printing method
US20060144270A1 (en) * 2005-01-04 2006-07-06 Prakash Seth Photothermally sensitive compositions and system for CTP imaging processes
EP1756667A2 (en) * 2004-01-05 2007-02-28 Citiplate Inc. Photothermally sensitive compositions and system for ctp imaging processes
EP1582347B1 (en) * 2004-03-29 2008-01-16 FUJIFILM Corporation Lithographic printing plate precursor and lithographic printing method using the same
US7083895B2 (en) * 2004-09-01 2006-08-01 Kodak Polychrome Graphics Llc Adhesion promoting ingredients for on-press developable lithographic printing plate precursors
EP1798031A3 (en) 2005-01-26 2007-07-04 FUJIFILM Corporation Lithographic printing plate precursor and lithographic printing method
US7189494B2 (en) * 2005-05-26 2007-03-13 Eastman Kodak Company On-press developable imageable element comprising a tetraarylborate salt
US7153632B1 (en) 2005-08-03 2006-12-26 Eastman Kodak Company Radiation-sensitive compositions and imageable materials
JP5254958B2 (ja) * 2006-05-17 2013-08-07 アメリカン・ダイ・ソース・インコーポレーテッド 平版印刷版コーティング用新規材料、それを含有する平版印刷版およびコーティング、調製方法ならびに使用
US7524614B2 (en) * 2006-05-26 2009-04-28 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials
WO2008022431A1 (en) * 2006-08-24 2008-02-28 American Dye Source Inc. Reactive near infrared absorbing polymeric particles, methods of preparation and uses thereof
US20080145789A1 (en) * 2006-10-13 2008-06-19 Elizabeth Knight Method of making lithographic printing plates
EP2098367A1 (en) 2008-03-05 2009-09-09 Eastman Kodak Company Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates
US8084182B2 (en) 2008-04-29 2011-12-27 Eastman Kodak Company On-press developable elements and methods of use
US8034538B2 (en) 2009-02-13 2011-10-11 Eastman Kodak Company Negative-working imageable elements
US20100215919A1 (en) 2009-02-20 2010-08-26 Ting Tao On-press developable imageable elements
US8318405B2 (en) 2009-03-13 2012-11-27 Eastman Kodak Company Negative-working imageable elements with overcoat
US8247163B2 (en) 2009-06-12 2012-08-21 Eastman Kodak Company Preparing lithographic printing plates with enhanced contrast
US8257907B2 (en) 2009-06-12 2012-09-04 Eastman Kodak Company Negative-working imageable elements
US9482944B2 (en) 2009-09-15 2016-11-01 Mylan Group Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates
US8426104B2 (en) 2009-10-08 2013-04-23 Eastman Kodak Company Negative-working imageable elements
RU2487882C1 (ru) 2009-10-29 2013-07-20 Майлан Груп Галлотанниновые соединения в композициях для покрытия литографических печатных форм
US8329383B2 (en) 2009-11-05 2012-12-11 Eastman Kodak Company Negative-working lithographic printing plate precursors
KR101471310B1 (ko) 2010-09-14 2014-12-09 밀란 그룹 포지티브형 서멀 리소그래픽 인쇄판을 위한 근적외선-감응 코팅 조성물용 코폴리머
US8900798B2 (en) 2010-10-18 2014-12-02 Eastman Kodak Company On-press developable lithographic printing plate precursors
US20120090486A1 (en) 2010-10-18 2012-04-19 Celin Savariar-Hauck Lithographic printing plate precursors and methods of use
US20120141941A1 (en) 2010-12-03 2012-06-07 Mathias Jarek Developing lithographic printing plate precursors in simple manner
US20120141935A1 (en) 2010-12-03 2012-06-07 Bernd Strehmel Developer and its use to prepare lithographic printing plates
US20120199028A1 (en) 2011-02-08 2012-08-09 Mathias Jarek Preparing lithographic printing plates
US8703381B2 (en) 2011-08-31 2014-04-22 Eastman Kodak Company Lithographic printing plate precursors for on-press development
US8722308B2 (en) 2011-08-31 2014-05-13 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US9029063B2 (en) 2011-09-22 2015-05-12 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8632941B2 (en) 2011-09-22 2014-01-21 Eastman Kodak Company Negative-working lithographic printing plate precursors with IR dyes
CN102504137B (zh) * 2011-11-11 2015-05-06 乐凯华光印刷科技有限公司 一种热塑性纳微米颗粒
CN102582312B (zh) * 2011-12-23 2016-06-29 乐凯华光印刷科技有限公司 一种低化学处理紫激光光聚合型平版印刷版
US8679726B2 (en) 2012-05-29 2014-03-25 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8889341B2 (en) 2012-08-22 2014-11-18 Eastman Kodak Company Negative-working lithographic printing plate precursors and use
US8927197B2 (en) 2012-11-16 2015-01-06 Eastman Kodak Company Negative-working lithographic printing plate precursors
CN103881034B (zh) * 2012-12-21 2016-03-09 乐凯华光印刷科技有限公司 一种激光热塑性纳微米颗粒及其合成方法与用其制作的平印版
US9063423B2 (en) 2013-02-28 2015-06-23 Eastman Kodak Company Lithographic printing plate precursors and use
US9201302B2 (en) 2013-10-03 2015-12-01 Eastman Kodak Company Negative-working lithographic printing plate precursor
JP2015202586A (ja) 2014-04-11 2015-11-16 イーストマン コダック カンパニー 平版印刷版原版
US20160259243A1 (en) 2015-03-03 2016-09-08 Eastman Kodak Company Negative-working lithographic printing plate precursor
US9417524B1 (en) 2015-03-10 2016-08-16 Eastman Kodak Company Infrared radiation-sensitive lithographic printing plate precursors
US20170021656A1 (en) 2015-07-24 2017-01-26 Kevin Ray Lithographic imaging and printing with negative-working photoresponsive printing members
EP3632696B1 (en) 2017-05-31 2023-04-26 FUJIFILM Corporation Lithographic printing plate precursor, production method for lithographic printing plate, polymer particles, and composition
EP3815900A1 (en) 2019-10-31 2021-05-05 Agfa Nv A lithographic printing plate precursor and method for making hydrophobic resin particles
TWI887304B (zh) 2019-11-26 2025-06-21 德商馬克專利公司 非硫醇類基於氮之疏水性高分子刷材料及其用於基板表面修飾之用途
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6068992A (ja) 1983-09-27 1985-04-19 Mitsui Toatsu Chem Inc 画像形成方法
JPH02277695A (ja) * 1989-04-20 1990-11-14 Fuji Photo Film Co Ltd 熱転写受像材料
DE4108496A1 (de) 1990-03-16 1991-10-31 Fuji Photo Film Co Ltd Vorsensibilisierte platte zur verwendung in der herstellung von lithographischen druckplatten, die kein anfeuchtwasser erfordern
JPH06504628A (ja) * 1990-12-20 1994-05-26 エクソン・ケミカル・パテンツ・インク リソグラフィー及び腐食防止コーティング用途向けのｕｖ／ｅｂ硬化性ブチルコポリマー
JP2739387B2 (ja) 1991-04-25 1998-04-15 富士写真フイルム株式会社 水無し平版印刷版及びその製版方法
GB9110417D0 (en) 1991-05-14 1991-07-03 Du Pont Howson Ltd Improvements in or relating to the formation of images
GB2273366B (en) 1992-11-18 1996-03-27 Du Pont Forming images on radiation-sensitive plates
EP0816070B1 (en) 1996-06-24 2000-10-18 Agfa-Gevaert N.V. A heat sensitive imaging element and a method for producing lithographic plates therewith
EP0839647B2 (en) 1996-10-29 2014-01-22 Agfa Graphics N.V. Method for making a lithographic printing plate with improved ink-uptake
US6071369A (en) 1996-10-29 2000-06-06 Agfa-Gevaert, N.V. Method for making an lithographic printing plate with improved ink-uptake
EP0881096B1 (en) 1997-05-27 2001-10-17 Agfa-Gevaert N.V. A heat sensitive imaging element and a method for producing lithographic plates therewith
US6022667A (en) 1997-05-27 2000-02-08 Agfa-Gevaert, N.V. Heat sensitive imaging element and a method for producing lithographic plates therewith
US6352812B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6558872B1 (en) * 2000-09-09 2003-05-06 Kodak Polychrome Graphics Llc Relation to the manufacture of masks and electronic parts

Also Published As

Publication number Publication date
EP1379918A4 (en) 2006-09-27
WO2002082180A1 (en) 2002-10-17
US20020155375A1 (en) 2002-10-24
JP2004525420A (ja) 2004-08-19
EP1379918A1 (en) 2004-01-14
DE60235801D1 (de) 2010-05-12
US6582882B2 (en) 2003-06-24
EP1379918B1 (en) 2010-03-31
JP4053888B2 (ja) 2008-02-27
ES2343783T3 (es) 2010-08-10
ATE462990T1 (de) 2010-04-15

Similar Documents

Publication Publication Date Title
DE60235801D1 (de) Bebilderbares element mit pfropfpolymer
JP2010503016A5 (da)
EP1998364A3 (en) Semiconductor thin film forming system
WO2006124279A3 (en) Making relief image using removable film
DE69818421D1 (de) Verfahren zur herstellung lithographischen druckplatten
ATE544095T1 (de) Verfahren zur herstellung einer druckplatte
WO2005062128A3 (en) Immersion lithographic process using a conforming immersion medium
TW200712763A (en) Photoresist composition for imaging thick films
WO2003010600A3 (en) Method and system for direct-to-press imaging
WO2002042845A3 (en) Photoacid generators and photoresists comprising same
EP2296041A3 (en) Lithographic systems and methods with extended depth of focus
WO2003050613A3 (en) Method and apparatus for modification of chemically amplified photoresist by electron beam exposure
EP1286218A3 (en) Lithographic patterning using a high transmission attenuated phase-shift mask and multiple exposures of optimised coherence
JP2004525420A5 (da)
KR910019132A (ko) 영상 노출 시스템 및 방법
JP2005519456A (ja) 二波長を使用した自己整合パターンの形成
JP3281612B2 (ja) パターン形成方法
ATE520058T1 (de) Flachdruckplatte and lichtempfindliche bilderzeugungszusammensetzung enthaltend ein novolak-harz mit wiederkehrenden einheiten von xylenol.
WO2004044652A3 (en) Positive tone lithography with carbon dioxide development systems
JP3853168B2 (ja) パターン形成方法
Roy et al. Photoresists for microlithography: 1. Role of organic chemistry in microelectronics
KR100680426B1 (ko) 포토레지스트 패턴 코팅용 수용성 조성물 및 이를 이용한미세패턴 형성 방법
EP1553453A3 (en) Water-soluble material, chemically amplified resist and pattern formation method using the same
JP3129266B2 (ja) レジスト材料
Han et al. Deep-UV positive-tone dry-development process using chemically amplified resist and its application to 256 Mbit DRAM