DK1629517T3 - Anordning til zoneopdelt overfladebehandling af et emne ved elektrisk udladning med dielektrisk barriere - Google Patents

Anordning til zoneopdelt overfladebehandling af et emne ved elektrisk udladning med dielektrisk barriere

Info

Publication number
DK1629517T3
DK1629517T3 DK04742679T DK04742679T DK1629517T3 DK 1629517 T3 DK1629517 T3 DK 1629517T3 DK 04742679 T DK04742679 T DK 04742679T DK 04742679 T DK04742679 T DK 04742679T DK 1629517 T3 DK1629517 T3 DK 1629517T3
Authority
DK
Denmark
Prior art keywords
mixture
gas mixture
zone
discharge
central axis
Prior art date
Application number
DK04742679T
Other languages
Danish (da)
English (en)
Inventor
Alain Villermet
Francois Coeuret
Jacques Delumeau
Original Assignee
Air Liquide
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide filed Critical Air Liquide
Application granted granted Critical
Publication of DK1629517T3 publication Critical patent/DK1629517T3/da

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563Gas nozzles
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • C23C16/545Apparatus specially adapted for continuous coating for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Chemical Vapour Deposition (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • External Artificial Organs (AREA)
DK04742679T 2003-05-21 2004-05-07 Anordning til zoneopdelt overfladebehandling af et emne ved elektrisk udladning med dielektrisk barriere DK1629517T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0306084A FR2855322B1 (fr) 2003-05-21 2003-05-21 Dispositif de traitement de surface par zone d'un article
PCT/FR2004/001121 WO2004105079A1 (fr) 2003-05-21 2004-05-07 Dispositif de traitement de surface par zone d'un article par decharge electrique a barriere dielectrique

Publications (1)

Publication Number Publication Date
DK1629517T3 true DK1629517T3 (da) 2007-05-07

Family

ID=33396625

Family Applications (1)

Application Number Title Priority Date Filing Date
DK04742679T DK1629517T3 (da) 2003-05-21 2004-05-07 Anordning til zoneopdelt overfladebehandling af et emne ved elektrisk udladning med dielektrisk barriere

Country Status (10)

Country Link
US (1) US7699022B2 (de)
EP (1) EP1629517B1 (de)
JP (1) JP4728241B2 (de)
AT (1) ATE350760T1 (de)
CA (1) CA2526257C (de)
DE (1) DE602004004112T2 (de)
DK (1) DK1629517T3 (de)
ES (1) ES2280035T3 (de)
FR (1) FR2855322B1 (de)
WO (1) WO2004105079A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5911178B2 (ja) * 2013-05-07 2016-04-27 株式会社イー・スクエア プラズマ表面処理装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3760153A (en) * 1972-02-16 1973-09-18 Du Pont Apparatus for perforating thermoplastic sheet materials with an electric arc
IT1103665B (it) 1978-01-12 1985-10-14 Gianfranco Galimberti Dispositivo per attuare un trattamento superficiale uniforme su materie plastiche mediante scariche elettriche ad effetto corona
US4636640A (en) * 1983-07-01 1987-01-13 Pillar Corporation Corona discharge electrode assembly
US4684803A (en) * 1985-12-09 1987-08-04 Pillar Technologies, Inc. Electrode segments for corona discharge devices
FR2704558B1 (fr) * 1993-04-29 1995-06-23 Air Liquide Procede et dispositif pour creer un depot d'oxyde de silicium sur un substrat solide en defilement.
US6007784A (en) * 1997-07-11 1999-12-28 3Dt, Inc. Electric discharge surface treating electrode and system
FR2782837B1 (fr) * 1998-08-28 2000-09-29 Air Liquide Procede et dispositif de traitement de surface par plasma a pression atmospherique
AU6784600A (en) 1999-08-17 2001-03-13 Progress Software, Inc. Concurrent commit lock
EP1125972A1 (de) 2000-02-11 2001-08-22 L'air Liquide Société Anonyme pour l'étude et l'exploitation des procédés Georges Claude Verfahren zur Oberflächenbehandlung polymerer Substrate
FR2816726B1 (fr) 2000-11-16 2006-06-23 Air Liquide Installation dans laquelle est realisee une operation necessitant un controle de l'atmosphere a l'interieur d'une enceinte
TW200308187A (en) * 2002-04-10 2003-12-16 Dow Corning Ireland Ltd An atmospheric pressure plasma assembly

Also Published As

Publication number Publication date
FR2855322A1 (fr) 2004-11-26
ES2280035T3 (es) 2007-09-01
EP1629517A1 (de) 2006-03-01
EP1629517B1 (de) 2007-01-03
DE602004004112D1 (de) 2007-02-15
JP4728241B2 (ja) 2011-07-20
WO2004105079A8 (fr) 2005-04-14
FR2855322B1 (fr) 2005-07-01
CA2526257C (fr) 2014-03-25
ATE350760T1 (de) 2007-01-15
DE602004004112T2 (de) 2007-07-12
US7699022B2 (en) 2010-04-20
JP2007502524A (ja) 2007-02-08
CA2526257A1 (fr) 2004-12-02
WO2004105079A1 (fr) 2004-12-02
US20070119374A1 (en) 2007-05-31

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