DK1892576T3 - Eksponeringsindretning til at fremstille serigrafiskabeloner - Google Patents

Eksponeringsindretning til at fremstille serigrafiskabeloner

Info

Publication number
DK1892576T3
DK1892576T3 DK06405369.7T DK06405369T DK1892576T3 DK 1892576 T3 DK1892576 T3 DK 1892576T3 DK 06405369 T DK06405369 T DK 06405369T DK 1892576 T3 DK1892576 T3 DK 1892576T3
Authority
DK
Denmark
Prior art keywords
screen printing
exposure device
printing templates
produce screen
templates
Prior art date
Application number
DK06405369.7T
Other languages
English (en)
Inventor
Peter Berner
Original Assignee
Luescher Technologies Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Luescher Technologies Ag filed Critical Luescher Technologies Ag
Application granted granted Critical
Publication of DK1892576T3 publication Critical patent/DK1892576T3/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
DK06405369.7T 2006-08-25 2006-08-25 Eksponeringsindretning til at fremstille serigrafiskabeloner DK1892576T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP06405369.7A EP1892576B1 (de) 2006-08-25 2006-08-25 Belichtungsvorrichtung zur Herstellung von Siebdruckschablonen

Publications (1)

Publication Number Publication Date
DK1892576T3 true DK1892576T3 (da) 2013-09-16

Family

ID=37714290

Family Applications (1)

Application Number Title Priority Date Filing Date
DK06405369.7T DK1892576T3 (da) 2006-08-25 2006-08-25 Eksponeringsindretning til at fremstille serigrafiskabeloner

Country Status (5)

Country Link
US (1) US20080047445A1 (da)
EP (1) EP1892576B1 (da)
CN (1) CN101506738B (da)
DK (1) DK1892576T3 (da)
WO (1) WO2008022485A1 (da)

Families Citing this family (31)

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US8531648B2 (en) * 2008-09-22 2013-09-10 Asml Netherlands B.V. Lithographic apparatus, programmable patterning device and lithographic method
TWI448830B (zh) 2010-02-09 2014-08-11 Ａｓｍｌ荷蘭公司 微影裝置及元件製造方法
EP2360528A1 (de) 2010-02-23 2011-08-24 XPOSE Holding AG Belichtungsvorrichtung zur Herstellung von Druckvorlagen und Verwendung einer Belichtungsvorrichtung.
KR101419330B1 (ko) 2010-02-23 2014-07-15 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
JP5584784B2 (ja) 2010-02-25 2014-09-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
US9696633B2 (en) 2010-04-12 2017-07-04 Asml Netherlands B.V. Substrate handling apparatus and lithographic apparatus
CN103238113B (zh) 2010-12-08 2015-09-09 Asml荷兰有限公司 光刻设备和器件制造方法
JP5793236B2 (ja) 2011-03-29 2015-10-14 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィにおける放射ビームスポットの位置の測定
JP5731063B2 (ja) 2011-04-08 2015-06-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、プログラマブル・パターニングデバイス、及びリソグラフィ方法
US9513561B2 (en) 2011-04-21 2016-12-06 Asml Netherlands B.V. Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method
WO2013023876A1 (en) 2011-08-18 2013-02-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2009342A (en) 2011-10-31 2013-05-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2009797A (en) 2011-11-29 2013-05-30 Asml Netherlands Bv Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method.
WO2013079285A1 (en) 2011-11-29 2013-06-06 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program
KR101607181B1 (ko) 2011-12-05 2016-03-29 에이에스엠엘 네델란즈 비.브이. 리소그래피 노광 장치 및 디바이스 제조 방법
NL2009817A (en) 2011-12-06 2013-06-10 Asml Netherlands Bv A lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program.
NL2009902A (en) 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
WO2013104482A1 (en) 2012-01-12 2013-07-18 Asml Netherlands B.V. A lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program
KR101633761B1 (ko) 2012-01-17 2016-06-27 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
US9715183B2 (en) 2012-02-23 2017-07-25 Asml Netherlands B.V. Device, lithographic apparatus, method for guiding radiation and device manufacturing method
NL2012052A (en) 2013-01-29 2014-08-04 Asml Netherlands Bv A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method.
US9649837B2 (en) 2013-03-15 2017-05-16 M&R Printing Equipment, Inc. Method and apparatus for preparing a screen printing screen
CN105954974A (zh) * 2016-06-27 2016-09-21 深圳劲嘉集团股份有限公司 丝网版激光制版设备及其制版方法
CN106647185A (zh) * 2016-12-31 2017-05-10 江苏九迪激光装备科技有限公司 一种丝网印刷直接制版系统及制版方法
CN106647184B (zh) * 2016-12-31 2019-06-14 江苏九迪激光装备科技有限公司 一种直写式丝网制版设备的曝光方法
US10576733B2 (en) 2017-02-14 2020-03-03 M&R Printing Equipment, Inc. Tuneable flat panel UV exposure system for screen printing
JP7118394B2 (ja) * 2018-01-31 2022-08-16 ミタニマイクロニクス株式会社 スクリーンマスクの製造方法
CN111391475A (zh) * 2020-04-18 2020-07-10 杨林 一种印刷丝网印版线形流动曝光装置
CN112644145A (zh) * 2020-12-18 2021-04-13 林青仕 一种不干胶网版便捷制作用辅助环保设备
CN112937077A (zh) * 2021-04-16 2021-06-11 赵成刚 高精度丝网印刷激光制版机
CN117382297B (zh) * 2023-11-23 2025-12-26 绍兴鑫昌印花机械科技有限公司 立式平网制网机及其控制流程

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US5580698A (en) * 1988-05-05 1996-12-03 Mografo A/S Scanner system for successive irradiation of a working surface, particularly for ultra-violet exposure of a photo emulsion on a serigraphic printing frame
EP0770495B1 (en) * 1995-10-24 2002-06-19 Agfa-Gevaert A method for making a lithographic printing plate involving on press development
JP2001507475A (ja) * 1996-12-31 2001-06-05 リュラオ、フリートリヒ 露光装置の制御方法
ATE256303T1 (de) * 1998-04-29 2003-12-15 Cst Gmbh Verfahren zur herstellung von siebdruckformen sowie eine belichtungsvorrichtung hierfür
JP2002202442A (ja) * 2000-11-06 2002-07-19 Fuji Photo Film Co Ltd 合波レーザー光源および露光装置
US20020192569A1 (en) * 2001-05-15 2002-12-19 The Chromaline Corporation Devices and methods for exposure of photoreactive compositions with light emitting diodes
EP1405143A1 (en) * 2001-07-11 2004-04-07 4109490 Canada Inc. Imaging system utilizing light emitting diodes for preparation of print screens
US7033450B2 (en) * 2002-10-17 2006-04-25 Kodak Graphic Communications Canada Company Flexographic printing method
US20050161426A1 (en) * 2003-10-29 2005-07-28 Fuji Photo Film Co., Ltd. Image-recording apparatus and image-recording process
US20060001849A1 (en) * 2004-07-01 2006-01-05 Ray Kevin B Imaging a violet sensitive printing plate using multiple low power light sources

Also Published As

Publication number Publication date
CN101506738B (zh) 2011-08-10
EP1892576A1 (de) 2008-02-27
EP1892576B1 (de) 2013-06-12
CN101506738A (zh) 2009-08-12
WO2008022485A1 (de) 2008-02-28
US20080047445A1 (en) 2008-02-28

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