DK2088621T3 - Substratbærer - Google Patents

Substratbærer

Info

Publication number
DK2088621T3
DK2088621T3 DK08002322.9T DK08002322T DK2088621T3 DK 2088621 T3 DK2088621 T3 DK 2088621T3 DK 08002322 T DK08002322 T DK 08002322T DK 2088621 T3 DK2088621 T3 DK 2088621T3
Authority
DK
Denmark
Prior art keywords
substrate
elements
inner chamber
carrier element
lower carrier
Prior art date
Application number
DK08002322.9T
Other languages
English (en)
Inventor
Siegfried Renn
Original Assignee
Rena Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rena Gmbh filed Critical Rena Gmbh
Application granted granted Critical
Publication of DK2088621T3 publication Critical patent/DK2088621T3/da

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/15—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Recrystallisation Techniques (AREA)
  • Wire Bonding (AREA)
DK08002322.9T 2008-02-08 2008-02-08 Substratbærer DK2088621T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP08002322A EP2088621B1 (de) 2008-02-08 2008-02-08 Substratträger

Publications (1)

Publication Number Publication Date
DK2088621T3 true DK2088621T3 (da) 2011-05-02

Family

ID=39340204

Family Applications (1)

Application Number Title Priority Date Filing Date
DK08002322.9T DK2088621T3 (da) 2008-02-08 2008-02-08 Substratbærer

Country Status (4)

Country Link
EP (1) EP2088621B1 (da)
AT (1) ATE491224T1 (da)
DE (1) DE502008001992D1 (da)
DK (1) DK2088621T3 (da)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112024519B (zh) * 2020-09-01 2021-08-06 孙丹清 一种翻转式清洗机上的硅片盒

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR890001502B1 (ko) * 1985-06-24 1989-05-06 씨.에프.엠 테크늘러지즈 인코포레이티드 반도체 웨이퍼 흐름 처리공정 및 그 장치
US6833035B1 (en) * 1994-04-28 2004-12-21 Semitool, Inc. Semiconductor processing system with wafer container docking and loading station
JP4256122B2 (ja) * 2002-07-01 2009-04-22 セイコーインスツル株式会社 ウエハキャリアケース
JP2005217258A (ja) * 2004-01-30 2005-08-11 Toko Inc ウェハキャリア

Also Published As

Publication number Publication date
DE502008001992D1 (de) 2011-01-20
EP2088621A1 (de) 2009-08-12
ATE491224T1 (de) 2010-12-15
EP2088621B1 (de) 2010-12-08

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