DK2173176T3 - Fremgangsmåder og formuleringer til reducering og hæmning af vækst af koncentrationen af mikrober i vandbaserede fluider - Google Patents

Fremgangsmåder og formuleringer til reducering og hæmning af vækst af koncentrationen af mikrober i vandbaserede fluider Download PDF

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DK2173176T3
DK2173176T3 DK08826631.7T DK08826631T DK2173176T3 DK 2173176 T3 DK2173176 T3 DK 2173176T3 DK 08826631 T DK08826631 T DK 08826631T DK 2173176 T3 DK2173176 T3 DK 2173176T3
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water
hydroxymethyl
tetrakis
glutaraldehyde
phosphonium sulfate
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DK08826631.7T
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English (en)
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Bei Yin
Jingjun Yang
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Dow Global Technologies Llc
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    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M173/00—Lubricating compositions containing more than 10% water
    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N35/00—Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom having two bonds to hetero atoms with at the most one bond to halogen, e.g. aldehyde radical
    • A01N35/02—Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom having two bonds to hetero atoms with at the most one bond to halogen, e.g. aldehyde radical containing aliphatically bound aldehyde or keto groups, or thio analogues thereof; Derivatives thereof, e.g. acetals
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/50—Treatment of water, waste water, or sewage by addition or application of a germicide or by oligodynamic treatment
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/14—Paints containing biocides, e.g. fungicides, insecticides or pesticides
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M141/00—Lubricating compositions characterised by the additive being a mixture of two or more compounds covered by more than one of the main groups C10M125/00 - C10M139/00, each of these compounds being essential
    • C10M141/10—Lubricating compositions characterised by the additive being a mixture of two or more compounds covered by more than one of the main groups C10M125/00 - C10M139/00, each of these compounds being essential at least one of them being an organic phosphorus-containing compound
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2207/00—Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
    • C10M2207/08—Aldehydes; Ketones
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2215/00—Organic non-macromolecular compounds containing nitrogen as ingredients in lubricant Compositions
    • C10M2215/16—Nitriles
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2215/00—Organic non-macromolecular compounds containing nitrogen as ingredients in lubricant Compositions
    • C10M2215/20—Containing nitrogen-to-oxygen bonds
    • C10M2215/202—Containing nitrogen-to-oxygen bonds containing nitro groups
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2215/00—Organic non-macromolecular compounds containing nitrogen as ingredients in lubricant Compositions
    • C10M2215/22—Heterocyclic nitrogen compounds
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2219/00—Organic non-macromolecular compounds containing sulfur, selenium or tellurium as ingredients in lubricant compositions
    • C10M2219/10—Heterocyclic compounds containing sulfur, selenium or tellurium compounds in the ring
    • C10M2219/104—Heterocyclic compounds containing sulfur, selenium or tellurium compounds in the ring containing sulfur and carbon with nitrogen or oxygen in the ring
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2223/00—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
    • C10M2223/06—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having phosphorus-to-carbon bonds
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2030/00—Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
    • C10N2030/16—Antiseptic; (micro) biocidal or bactericidal
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2040/00—Specified use or application for which the lubricating composition is intended
    • C10N2040/20—Metal working

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Plant Pathology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Dentistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Agronomy & Crop Science (AREA)
  • Zoology (AREA)
  • Environmental Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Materials Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Purification Treatments By Anaerobic Or Anaerobic And Aerobic Bacteria Or Animals (AREA)
  • Pest Control & Pesticides (AREA)
  • Treatment Of Biological Wastes In General (AREA)

Claims (10)

1. Fremgangsmåde til reducering eller hæmning afvækst i koncentrationen af anaerobe mikrober i en vandbaseret fluid i et anaerobt miljø eller i en anaerob del af et system, der anvendes med en vand baseret fluid, hvilken fremgangsmåde omfatter: etablering af kontakt mellem den vandbaserede fluid og glutaraldehyd samt tetrakis(hydroxymethyl)phosphoniumsulfat, hvor vægtforholdet mellem tetrakis(hydroxymethyl)phosphoniumsulfat og glutaraldehyd ligger i intervallet fra 3,5:1 til 6:1; og den vandbaserede fluid under kontakttrinet er i det væsentlige fri for kvaternære ammoniumforbindelser og addukter mellem formaldehyde og C2-C6-alifatisk glycol eller C2-C6-alifatisk glycol(mono-Ci-C4-alkylether).
2. Fremgangsmåde ifølge krav 1, hvor den vandbaserede fluid er vand eller fluid fra et oliefelt eller gasfelt, carbonhydridolie og -gas, pulp- eller papirvand eller opslæmning, kølevand, kedelvand, industrielt procesvand, ballastvand, spildevand, en metalforarbejdningsfluid, en vandbaseret opslæmning, en blæk eller tapesamlingsforbindelse, et vandbaseret husholdningsprodukt eller et personligt plejeprodukt, latex, maling, en belægning eller et system, der anvendes dermed.
3. Fremgangsmåde ifølge krav 1 eller krav 2, hvor den kombinerede koncentration af glutaraldehyd og tetrakis(hydroxymethyl)phosphoniumsulfat i den vandbaserede fluid ligger i intervallet fra 5 ppm til 1500 ppm.
4. Fremgangsmåde ifølge krav 1 eller krav 2, hvor den kombinerede koncentration af glutaraldehyd og tetrakis(hydroxymethyl)phosphoniumsulfat i den vandbaserede fluid ligger i intervallet fra 10 ppm til 500 ppm.
5. Fremgangsmåde ifølge et hvilket som helst af kravene 1-4, hvor den vandbaserede fluid under kontakttrinet indbefatter mindst én anionisk polymer, ét demulgeringsmiddel, én korrosionshæmmer, én kedelstenshæmmer og/eller ét overfladeaktivt stof.
6. Fremgangsmåde ifølge et hvilket som helst af kravene 1-5, hvor glutaraldehyd og tetrakis(hydroxymethyl)phosphoniumsulfat tilsættes til den vandbaserede fluid i det væsentlige samtidig.
7. Fremgangsmåde ifølge krav 1, hvor kontakten omfatter: etablering af kontakt mellem den vandbaserede fluid og glutaraldehyd samt tetrakis(hydroxymethyl)phosphoniumsulfat ved et første forhold mellem tetrakis(hydroxymethyl)phosphoniumsulfatog glutaraldehyd i intervallet fra 3,5:1 til 6:1; og etablering af kontakt mellem den vandbaserede fluid og glutaraldehyd samt tetrakis(hydroxymethyl)phosphoniumsulfat ved et andet forhold mellem tetrakis(hydroxymethyl)phosphoniumsulfatog glutaraldehyd i intervallet fra 3,5:1 til 6:1, hvor det første forhold er forskelligt fra det andet forhold.
8. Formulering til reducering eller hæmning afvækst i koncentrationen af anaerobe mikrober i en vandbaseret fluid i et anaerobt miljø eller i en anaerob del af et system, der anvendes med en vand baseret fluid, hvilken formulering omfatter: glutaraldehyd og tetrakis(hydroxymethyl)phosphoniumsulfat; hvor formuleringen er fri for kvaternære ammoniumforbindelser og addukter mellem formaldehyd og C2-C6-alifatisk glycol eller C2-C6-alifatisk glycol(mono-CrC4-alkylether), og forholdet mellem tetrakis(hydroxymethyl)phosphoniumsulfat og glutaraldehyd ligger i intervallet fra 3,5:1 til 6:1.
9. Formulering ifølge krav 8, der yderligere omfatter vand.
10. Formulering ifølge krav 8 eller krav 9, hvor formuleringen indbefatter mindst én anionisk polymer, ét demulgeringsmiddel, én korrosionshæmmer, én kedelstenshæmmer og/eller ét overfladeaktivt stof.
DK08826631.7T 2007-07-24 2008-07-21 Fremgangsmåder og formuleringer til reducering og hæmning af vækst af koncentrationen af mikrober i vandbaserede fluider DK2173176T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US95161607P 2007-07-24 2007-07-24
PCT/US2008/070652 WO2009015089A2 (en) 2007-07-24 2008-07-21 Methods of and formulations for reducing and inhibiting the growth of the concentration of microbes in water-based fluids and systems used with them

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US (1) US8952199B2 (da)
EP (1) EP2173176B1 (da)
AR (1) AR068085A1 (da)
BR (1) BRPI0812700B1 (da)
DK (1) DK2173176T3 (da)
NO (1) NO2173176T3 (da)
WO (1) WO2009015089A2 (da)

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Publication number Publication date
US8952199B2 (en) 2015-02-10
WO2009015089A3 (en) 2009-11-26
EP2173176B1 (en) 2017-09-06
BRPI0812700B1 (pt) 2020-04-28
US20100298275A1 (en) 2010-11-25
AR068085A1 (es) 2009-11-04
EP2173176A2 (en) 2010-04-14
WO2009015089A2 (en) 2009-01-29
BRPI0812700A2 (pt) 2019-08-27
NO2173176T3 (da) 2018-02-03

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