DK251185A - Hoejfrekvent gasudladningslaser med udvendige, tvaerstillede elektroder - Google Patents

Hoejfrekvent gasudladningslaser med udvendige, tvaerstillede elektroder Download PDF

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Publication number
DK251185A
DK251185A DK251185A DK251185A DK251185A DK 251185 A DK251185 A DK 251185A DK 251185 A DK251185 A DK 251185A DK 251185 A DK251185 A DK 251185A DK 251185 A DK251185 A DK 251185A
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DK
Denmark
Prior art keywords
traced
electrodes
external
gas emissions
frequency gas
Prior art date
Application number
DK251185A
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English (en)
Other versions
DK251185D0 (da
Inventor
Carl L Gruber
Gerald R Willenbring
Original Assignee
Minnesota Laser Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Laser Corp filed Critical Minnesota Laser Corp
Publication of DK251185A publication Critical patent/DK251185A/da
Publication of DK251185D0 publication Critical patent/DK251185D0/da

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/086—One or more reflectors having variable properties or positions for initial adjustment of the resonator
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/0315—Waveguide lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/041—Arrangements for thermal management for gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Pyridine Compounds (AREA)
DK251185A 1983-10-07 1985-06-04 Hoejfrekvent gasudladningslaser med udvendige, tvaerstillede elektroder DK251185D0 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/539,993 US4596018A (en) 1983-10-07 1983-10-07 External electrode transverse high frequency gas discharge laser
PCT/US1984/001597 WO1985001838A1 (en) 1983-10-07 1984-10-03 External electrode transverse high frequency gas discharge laser

Publications (2)

Publication Number Publication Date
DK251185A true DK251185A (da) 1985-06-04
DK251185D0 DK251185D0 (da) 1985-06-04

Family

ID=24153521

Family Applications (1)

Application Number Title Priority Date Filing Date
DK251185A DK251185D0 (da) 1983-10-07 1985-06-04 Hoejfrekvent gasudladningslaser med udvendige, tvaerstillede elektroder

Country Status (10)

Country Link
US (1) US4596018A (da)
EP (1) EP0146509A3 (da)
JP (1) JPS61500141A (da)
CA (1) CA1249649A (da)
DK (1) DK251185D0 (da)
ES (1) ES8601579A1 (da)
FI (1) FI852290A0 (da)
IL (1) IL73160A (da)
NO (1) NO852101L (da)
WO (1) WO1985001838A1 (da)

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US5528613A (en) * 1993-04-12 1996-06-18 Macken; John A. Laser apparatus utilizing a magnetically enhanced electrical discharge with transverse AC stabilization
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US5867517A (en) * 1997-04-30 1999-02-02 Universal Laser Systems, Inc. Integrated gas laser RF feed and fill apparatus and method
US5881087A (en) * 1997-04-30 1999-03-09 Universal Laser Systems, Inc. Gas laser tube design
US5901167A (en) * 1997-04-30 1999-05-04 Universal Laser Systems, Inc. Air cooled gas laser
US6466601B1 (en) * 2001-04-13 2002-10-15 Cymer, Inc. Beam seal for line narrowed production laser
WO2002043197A2 (en) * 2000-11-21 2002-05-30 Zhang Yong F Portable low-power gas discharge laser
US6498832B2 (en) 2001-03-13 2002-12-24 Euv Llc Electrode configuration for extreme-UV electrical discharge source
US6792011B2 (en) * 2001-04-19 2004-09-14 Hrl Laboratories, Llc Frequency modulated laser with high modulation bandwidth
US9771648B2 (en) 2004-08-13 2017-09-26 Zond, Inc. Method of ionized physical vapor deposition sputter coating high aspect-ratio structures
US9123508B2 (en) 2004-02-22 2015-09-01 Zond, Llc Apparatus and method for sputtering hard coatings
US8295319B2 (en) 2010-11-23 2012-10-23 Iradion Laser, Inc. Ceramic gas laser having an integrated beam shaping waveguide
US8422528B2 (en) * 2011-02-24 2013-04-16 Iradion Laser, Inc. Ceramic slab, free-space and waveguide lasers
US8611391B2 (en) 2011-05-03 2013-12-17 Coherent, Inc. Waveguide CO2 laser with mutiply folded resonator
ES2438751T3 (es) 2011-09-05 2014-01-20 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Dispositivo y procedimiento para marcar un objeto por medio de un rayo láser
EP2564972B1 (en) * 2011-09-05 2015-08-26 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Marking apparatus with a plurality of lasers, deflection means and telescopic means for each laser beam
ES2530070T3 (es) * 2011-09-05 2015-02-26 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Aparato de marcado con una pluralidad de láseres y conjuntos ajustables individualmente de medios de desviación
EP2565994B1 (en) 2011-09-05 2014-02-12 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Laser device and method for marking an object
EP2565996B1 (en) 2011-09-05 2013-12-11 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Laser device with a laser unit, and a fluid container for a cooling means of said laser unit
ES2544269T3 (es) * 2011-09-05 2015-08-28 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Aparato de marcado con una pluralidad de láseres de gas con tubos de resonancia y medios de deflexión ajustables individualmente
EP2564976B1 (en) 2011-09-05 2015-06-10 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Marking apparatus with at least one gas laser and heat dissipator
DK2564973T3 (da) * 2011-09-05 2015-01-12 Alltec Angewandte Laserlicht Technologie Ges Mit Beschränkter Haftung Markeringsapparat med en flerhed af lasere og en kombineringsafbøjningsindretning
JP6411120B2 (ja) * 2014-08-04 2018-10-24 株式会社アマダミヤチ レーザ装置
US10404030B2 (en) 2015-02-09 2019-09-03 Iradion Laser, Inc. Flat-folded ceramic slab lasers
US10593776B2 (en) 2016-05-05 2020-03-17 Auroma Technologies, Co., Llc. Dielectric electrode assembly and method of manufacture thereof
US10333268B2 (en) 2016-05-05 2019-06-25 Access Laser Dielectric electrode assembly and method of manufacture thereof
CN109906534B (zh) 2016-09-20 2021-04-23 依拉迪激光有限公司 具有缩进孔口的激光器
DE102023134302A1 (de) * 2023-12-07 2025-06-12 TRUMPF Lasersystems for Semiconductor Manufacturing SE Elektrooptisches system mit mechanisch entkoppelnder emv-dichtung und lasersystem damit

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Also Published As

Publication number Publication date
US4596018A (en) 1986-06-17
FI852290A7 (fi) 1985-06-07
IL73160A (en) 1989-01-31
ES536482A0 (es) 1985-10-16
EP0146509A2 (en) 1985-06-26
IL73160A0 (en) 1985-01-31
CA1249649A (en) 1989-01-31
EP0146509A3 (en) 1987-06-03
ES8601579A1 (es) 1985-10-16
JPS61500141A (ja) 1986-01-23
FI852290L (fi) 1985-06-07
NO852101L (no) 1985-05-24
WO1985001838A1 (en) 1985-04-25
DK251185D0 (da) 1985-06-04
FI852290A0 (fi) 1985-06-07

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment