DK2893536T3 - Negativ ionbaseret neutralstråleninjektor - Google Patents
Negativ ionbaseret neutralstråleninjektor Download PDFInfo
- Publication number
- DK2893536T3 DK2893536T3 DK13765855.5T DK13765855T DK2893536T3 DK 2893536 T3 DK2893536 T3 DK 2893536T3 DK 13765855 T DK13765855 T DK 13765855T DK 2893536 T3 DK2893536 T3 DK 2893536T3
- Authority
- DK
- Denmark
- Prior art keywords
- accelerator
- plasma
- ion
- ion source
- negative
- Prior art date
Links
Classifications
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21B—FUSION REACTORS
- G21B1/00—Thermonuclear fusion reactors
- G21B1/11—Details
- G21B1/15—Particle injectors for producing thermonuclear fusion reactions, e.g. pellet injectors
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/08—Arrangements for injecting particles into orbits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/22—Details of linear accelerators, e.g. drift tubes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/08—Arrangements for injecting particles into orbits
- H05H2007/081—Sources
- H05H2007/082—Ion sources, e.g. ECR, duoplasmatron, PIG, laser sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
- H05H3/02—Molecular or atomic-beam generation, e.g. resonant beam generation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- High Energy & Nuclear Physics (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Combustion & Propulsion (AREA)
- Particle Accelerators (AREA)
- Plasma Technology (AREA)
- Electron Sources, Ion Sources (AREA)
- Saccharide Compounds (AREA)
- Physical Vapour Deposition (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
Claims (6)
1. Negativ ionbaseret neutralstråleinjektor omfattende en ionkilde (110), der er indrettet til at frembringe en negativ ionstråle, en accelerator (150) og en neu-tralisator (170), hvor den negative ionbaserede neutralstråleinjektor endvidere omfatter en præ-accelerator (111), der er koblet til ionkilden, og hvor acceleratoren er anbragt med afstand til ionkilden med en overgangszone (205) anbragt mellem præ-acceleratoren og acceleratoren, og kendetegnet ved at injektoren endvidere omfatter et par afbøjende magneter (130) i overgangszonen og som er anbragt mellem præ-acceleratoren og acceleratoren, hvor parret af afbøjende magneter er udformet til at muliggøre, at en stråle fra præacceleratoren skifter akse fra en akse af præ-acceleratoren og til en akse af acceleratoren, før den kommer ind i acceleratoren, således at indstrømningen af medstrømmende partikler til acceleratoren reduceres, og tilbagestrømning af accelererede partikler til præ-acceleratoren og ionkilden forhindres.
2. Injektor ifølge krav 1, hvor ionkilden indbefatter en plasmaboks og plasma-drivindretninger, og hvor indvendige vægge af plasmaboksen (115) og plas-madrivindretninger (113) er udformet til at virke ved forhøjede temperaturer på ca. 150-200 °C til forhindring af akkumulering af cæsium på overfladerne deraf.
3. Injektor ifølge krav 1 eller 2, hvor ionkilden er indrettet til at producere en negativ ionstråle på ca. 9 A.
4. Injektor ifølge krav 1 eller 2, hvor præ-acceleratoren (111) er et elektrostatisk gitter med flere åbninger i ionkilden, eller hvor ioner fra ionkilden præ-accelereres af præ-acceleratoren til 120 kV før injektion i acceleratoren.
5. Injektor ifølge krav 2, hvor plasmaboksen og -drivindretningerne indbefatter fluid-manifolder og -passager (116) til cirkulering af højtemperaturfluid.
6. Injektor ifølge krav 4, endvidere omfattende en fordelingsmanifold til direkte tilførsel af cæsium på plasmagitre af præ-acceleratoren (111).
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RU2012137795A RU2619923C2 (ru) | 2012-09-04 | 2012-09-04 | Инжектор пучка нейтральных частиц на основе отрицательных ионов |
| US201361775444P | 2013-03-08 | 2013-03-08 | |
| PCT/US2013/058093 WO2014039579A2 (en) | 2012-09-04 | 2013-09-04 | Negative ion-based neutral beam injector |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DK2893536T3 true DK2893536T3 (da) | 2019-04-15 |
Family
ID=50191556
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK13765855.5T DK2893536T3 (da) | 2012-09-04 | 2013-09-04 | Negativ ionbaseret neutralstråleninjektor |
| DK19157605.7T DK3550571T3 (en) | 2012-09-04 | 2013-09-04 | Negative Ion-Based Beam Injector |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK19157605.7T DK3550571T3 (en) | 2012-09-04 | 2013-09-04 | Negative Ion-Based Beam Injector |
Country Status (31)
| Country | Link |
|---|---|
| EP (2) | EP2893536B1 (da) |
| JP (2) | JP6216380B2 (da) |
| KR (2) | KR102144601B1 (da) |
| CN (2) | CN107316662B (da) |
| AU (2) | AU2013312795B2 (da) |
| BR (2) | BR122020018713B1 (da) |
| CA (1) | CA2883669C (da) |
| CL (1) | CL2015000480A1 (da) |
| CY (1) | CY1125123T1 (da) |
| DK (2) | DK2893536T3 (da) |
| EA (2) | EA039453B1 (da) |
| ES (2) | ES2723201T3 (da) |
| HR (2) | HRP20190684T1 (da) |
| HU (2) | HUE058277T2 (da) |
| IL (2) | IL237570A (da) |
| LT (2) | LT2893536T (da) |
| MX (2) | MX378094B (da) |
| MY (2) | MY171879A (da) |
| NZ (3) | NZ745718A (da) |
| PE (1) | PE20151215A1 (da) |
| PH (2) | PH12015500403B1 (da) |
| PL (2) | PL3550571T3 (da) |
| PT (2) | PT2893536T (da) |
| RS (2) | RS63056B1 (da) |
| RU (1) | RU2619923C2 (da) |
| SG (2) | SG10201705839PA (da) |
| SI (2) | SI3550571T1 (da) |
| SM (2) | SMT201900237T1 (da) |
| UA (1) | UA118959C2 (da) |
| WO (1) | WO2014039579A2 (da) |
| ZA (1) | ZA201502214B (da) |
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| US9591740B2 (en) | 2013-03-08 | 2017-03-07 | Tri Alpha Energy, Inc. | Negative ion-based neutral beam injector |
| JP6266399B2 (ja) * | 2014-03-26 | 2018-01-24 | 住友重機械工業株式会社 | 中性子捕捉療法装置 |
| RU2696268C2 (ru) * | 2014-11-19 | 2019-08-01 | Таэ Текнолоджиз, Инк. | Фотонный нейтрализатор для инжекторов пучков нейтральных частиц |
| CN106935278B (zh) * | 2015-12-30 | 2019-03-26 | 核工业西南物理研究院 | 一种中性束注入器支撑与对接装置 |
| CN106932809B (zh) * | 2015-12-30 | 2023-07-14 | 核工业西南物理研究院 | 一种w字形多板变角组合结构的主动水冷量热靶结构 |
| CN106932808B (zh) * | 2015-12-30 | 2023-07-14 | 核工业西南物理研究院 | 一种长脉冲主动水冷量热靶大流量的异形水路结构 |
| CN106507576A (zh) * | 2016-11-04 | 2017-03-15 | 中国工程物理研究院流体物理研究所 | 金属氢化物离子源的离子过滤装置、方法及中子发生器 |
| US9865433B1 (en) * | 2016-12-19 | 2018-01-09 | Varian Semiconductor Equipment Associats, Inc. | Gas injection system for ion beam device |
| CN106783491A (zh) * | 2016-12-23 | 2017-05-31 | 信利（惠州）智能显示有限公司 | 一种离子注入设备及其使用方法 |
| CN107318213B (zh) * | 2017-07-06 | 2019-05-31 | 复旦大学 | 高电荷态离子的实验装置 |
| CN107833817B (zh) * | 2017-10-18 | 2019-05-21 | 东莞中子科学中心 | 一种铯催化负氢离子潘宁源的除铯方法及除铯引出电源 |
| CN107946159B (zh) * | 2017-11-24 | 2019-07-23 | 新奥科技发展有限公司 | 一种可调式离子源及静电约束聚变反应器 |
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| US11482342B2 (en) * | 2018-10-07 | 2022-10-25 | Tanner L. Horne | Nuclear fusion reactor with toroidal superconducting magnetic coils implementing inertial electrostatic heating |
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| CN112927820B (zh) * | 2019-12-05 | 2024-07-16 | 核工业西南物理研究院 | 一种nnbi正负离子束偏及离子吞噬一体化结构 |
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2012
- 2012-09-04 RU RU2012137795A patent/RU2619923C2/ru active
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2013
- 2013-04-09 UA UAA201503114A patent/UA118959C2/uk unknown
- 2013-09-04 ES ES13765855T patent/ES2723201T3/es active Active
- 2013-09-04 EP EP13765855.5A patent/EP2893536B1/en active Active
- 2013-09-04 PE PE2015000285A patent/PE20151215A1/es active IP Right Grant
- 2013-09-04 PT PT13765855T patent/PT2893536T/pt unknown
- 2013-09-04 MY MYPI2015700550A patent/MY171879A/en unknown
- 2013-09-04 HU HUE19157605A patent/HUE058277T2/hu unknown
- 2013-09-04 BR BR122020018713-1A patent/BR122020018713B1/pt active IP Right Grant
- 2013-09-04 EA EA201890602A patent/EA039453B1/ru unknown
- 2013-09-04 MX MX2017000638A patent/MX378094B/es unknown
- 2013-09-04 PL PL19157605T patent/PL3550571T3/pl unknown
- 2013-09-04 KR KR1020157008630A patent/KR102144601B1/ko active Active
- 2013-09-04 CN CN201710416714.4A patent/CN107316662B/zh active Active
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- 2013-09-04 LT LTEP13765855.5T patent/LT2893536T/lt unknown
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- 2013-09-04 EP EP19157605.7A patent/EP3550571B1/en active Active
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- 2013-09-04 KR KR1020207022598A patent/KR102208372B1/ko not_active Expired - Fee Related
- 2013-09-04 NZ NZ745718A patent/NZ745718A/en not_active IP Right Cessation
- 2013-09-04 HU HUE13765855A patent/HUE043299T2/hu unknown
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- 2013-09-04 DK DK13765855.5T patent/DK2893536T3/da active
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- 2013-09-04 MX MX2015002783A patent/MX345053B/es active IP Right Grant
- 2013-09-04 CA CA2883669A patent/CA2883669C/en active Active
- 2013-09-04 PL PL13765855T patent/PL2893536T3/pl unknown
- 2013-09-04 DK DK19157605.7T patent/DK3550571T3/da active
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2015
- 2015-02-24 PH PH12015500403A patent/PH12015500403B1/en unknown
- 2015-02-27 CL CL2015000480A patent/CL2015000480A1/es unknown
- 2015-03-04 IL IL237570A patent/IL237570A/en active IP Right Grant
- 2015-03-31 ZA ZA2015/02214A patent/ZA201502214B/en unknown
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2017
- 2017-08-18 AU AU2017216558A patent/AU2017216558B2/en not_active Ceased
- 2017-08-20 IL IL254061A patent/IL254061B/en unknown
- 2017-09-22 JP JP2017182033A patent/JP6549666B2/ja not_active Expired - Fee Related
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2018
- 2018-04-26 PH PH12018500893A patent/PH12018500893A1/en unknown
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2022
- 2022-03-15 CY CY20221100205T patent/CY1125123T1/el unknown
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