DK318184D0 - Hoejvakuumaflejringsprocesser under anvendelse af et kontinuerligt pnictidleveringssystem - Google Patents

Hoejvakuumaflejringsprocesser under anvendelse af et kontinuerligt pnictidleveringssystem

Info

Publication number
DK318184D0
DK318184D0 DK318184A DK318184A DK318184D0 DK 318184 D0 DK318184 D0 DK 318184D0 DK 318184 A DK318184 A DK 318184A DK 318184 A DK318184 A DK 318184A DK 318184 D0 DK318184 D0 DK 318184D0
Authority
DK
Denmark
Prior art keywords
pnic
continuous
delivery system
time delivery
disposal processes
Prior art date
Application number
DK318184A
Other languages
English (en)
Other versions
DK318184A (da
Inventor
John Andrew Baumann
Susan Wendy Gersten
Mark Allen Kuck
Paul Mordecai Raccah
Original Assignee
Stauffer Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stauffer Chemical Co filed Critical Stauffer Chemical Co
Publication of DK318184D0 publication Critical patent/DK318184D0/da
Publication of DK318184A publication Critical patent/DK318184A/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Chemical Vapour Deposition (AREA)
DK318184A 1984-02-17 1984-06-28 Hoejvakuumaflejringsprocesser under anvendelse af et kontinuerligt pnictidleveringssystem DK318184A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US58110484A 1984-02-17 1984-02-17

Publications (2)

Publication Number Publication Date
DK318184D0 true DK318184D0 (da) 1984-06-28
DK318184A DK318184A (da) 1985-08-18

Family

ID=24323900

Family Applications (1)

Application Number Title Priority Date Filing Date
DK318184A DK318184A (da) 1984-02-17 1984-06-28 Hoejvakuumaflejringsprocesser under anvendelse af et kontinuerligt pnictidleveringssystem

Country Status (4)

Country Link
EP (1) EP0152668A3 (da)
JP (1) JPS60177632A (da)
KR (1) KR850006255A (da)
DK (1) DK318184A (da)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4640221A (en) * 1985-10-30 1987-02-03 International Business Machines Corporation Vacuum deposition system with improved mass flow control
US6541695B1 (en) * 1992-09-21 2003-04-01 Thomas Mowles High efficiency solar photovoltaic cells produced with inexpensive materials by processes suitable for large volume production

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL46111C (da) * 1935-10-12
US2503571A (en) * 1947-05-02 1950-04-11 Bell Telephone Labor Inc Apparatus for coating surfaces by thermal vaporization at atmospheric pressure
DE1204494B (de) * 1956-06-09 1965-11-04 Siemens Ag Verfahren und Vorrichtung zum Aufdampfen von Schichten aus einer bei Aufdampftemperatur nicht bestaendigen, als Halbleiter-Grundstoff verwendbaren Stoechiometrisch genaubestimmten Mehrstoffverbindung
FR1535167A (fr) * 1967-08-24 1968-08-02 Schloemann Ag Procédé et dispositif de dégazage en continu de matériaux métalliques de revêtement
BE728917A (da) * 1968-02-28 1969-08-01
FR2403646A1 (fr) * 1977-09-16 1979-04-13 Anvar Procede de realisation d'un depot de compose semi-conducteur d'elements iii et v
US4392453A (en) * 1981-08-26 1983-07-12 Varian Associates, Inc. Molecular beam converters for vacuum coating systems
AU553091B2 (en) * 1981-12-30 1986-07-03 Stauffer Chemical Company High phosphorus pholyphosphides

Also Published As

Publication number Publication date
EP0152668A2 (en) 1985-08-28
KR850006255A (ko) 1985-10-02
DK318184A (da) 1985-08-18
JPS60177632A (ja) 1985-09-11
EP0152668A3 (en) 1986-06-25

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment