DK3334520T3 - Ikke-monolitisk vakuumkammer til udførelse af vakuumapplikationer og/eller til optag af vakuumkomponenter - Google Patents

Ikke-monolitisk vakuumkammer til udførelse af vakuumapplikationer og/eller til optag af vakuumkomponenter Download PDF

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Publication number
DK3334520T3
DK3334520T3 DK16744785.3T DK16744785T DK3334520T3 DK 3334520 T3 DK3334520 T3 DK 3334520T3 DK 16744785 T DK16744785 T DK 16744785T DK 3334520 T3 DK3334520 T3 DK 3334520T3
Authority
DK
Denmark
Prior art keywords
vacuum
accepting
monolithic
applications
components
Prior art date
Application number
DK16744785.3T
Other languages
English (en)
Inventor
Stephan Wolfgramm
Michael Flämmich
Ute Bergner
Sophie Gottschall
Original Assignee
Vacom Vakuum Komponenten & Messtechnik Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=56551410&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DK3334520(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Vacom Vakuum Komponenten & Messtechnik Gmbh filed Critical Vacom Vakuum Komponenten & Messtechnik Gmbh
Application granted granted Critical
Publication of DK3334520T3 publication Critical patent/DK3334520T3/da

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/02—Apparatus characterised by their chemically-resistant properties
    • B01J2219/025—Apparatus characterised by their chemically-resistant properties characterised by the construction materials of the reactor vessel proper
    • B01J2219/0277—Metal based
    • B01J2219/029—Non-ferrous metals
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16L—PIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
    • F16L23/00—Flanged joints
    • F16L23/16—Flanged joints characterised by the sealing means
    • F16L23/18—Flanged joints characterised by the sealing means the sealing means being rings
    • F16L23/20—Flanged joints characterised by the sealing means the sealing means being rings made exclusively of metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Pressure Vessels And Lids Thereof (AREA)
  • Gasket Seals (AREA)
  • Particle Accelerators (AREA)
DK16744785.3T 2015-08-12 2016-07-29 Ikke-monolitisk vakuumkammer til udførelse af vakuumapplikationer og/eller til optag af vakuumkomponenter DK3334520T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102015215413.0A DE102015215413B9 (de) 2015-08-12 2015-08-12 Nichtmonolithische Vakuumkammer zum Ausführen von Vakuumanwendungen und/oder zur Aufnahme von Vakuum-Komponenten
PCT/EP2016/068122 WO2017025350A1 (de) 2015-08-12 2016-07-29 Nichmonolithische vakuumkammer zum ausführen von vakuumanwendungen und/oder zur aufnahme von vakuum-komponenten

Publications (1)

Publication Number Publication Date
DK3334520T3 true DK3334520T3 (da) 2024-01-29

Family

ID=56551410

Family Applications (1)

Application Number Title Priority Date Filing Date
DK16744785.3T DK3334520T3 (da) 2015-08-12 2016-07-29 Ikke-monolitisk vakuumkammer til udførelse af vakuumapplikationer og/eller til optag af vakuumkomponenter

Country Status (12)

Country Link
EP (1) EP3334520B1 (da)
DE (1) DE102015215413B9 (da)
DK (1) DK3334520T3 (da)
ES (1) ES2970802T3 (da)
FI (1) FI3334520T3 (da)
HR (1) HRP20240092T1 (da)
HU (1) HUE065429T2 (da)
LT (1) LT3334520T (da)
PL (1) PL3334520T3 (da)
PT (1) PT3334520T (da)
SI (1) SI3334520T1 (da)
WO (1) WO2017025350A1 (da)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018101966A1 (de) * 2018-01-30 2019-08-01 Meyer Burger (Germany) Gmbh Vakuumkammer und Verfahren zur Herstellung einer Vakuumkammer
DE102023115004A1 (de) * 2023-06-07 2024-12-12 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Flansch, Flanschverbindung, Vakuum- und/oder Reaktionskammer sowie System für thermische Laser Epitaxie

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5196814A (en) * 1991-11-01 1993-03-23 The United States Of America As Represented By The United States Department Of Energy High power, high frequency, vacuum flange
DE29918170U1 (de) * 1999-10-08 2000-02-03 Deutsches Elektronen-Synchrotron DESY, 22607 Hamburg Flansch für die Anwendung auf dem Gebiet der Ultra-Hoch-Vakuum-Technik
DE102005059208A1 (de) * 2005-12-12 2007-06-28 Pfeiffer Vacuum Gmbh Vakuumgehäuse
KR20110009722U (ko) 2010-04-07 2011-10-13 한국표준과학연구원 나이프 에지 구조를 갖는 고진공 플랜지
DE102013103650A1 (de) * 2013-04-11 2014-10-16 Pfeiffer Vacuum Gmbh Vakuumsystem

Also Published As

Publication number Publication date
EP3334520A1 (de) 2018-06-20
LT3334520T (lt) 2024-01-25
ES2970802T3 (es) 2024-05-30
WO2017025350A1 (de) 2017-02-16
SI3334520T1 (sl) 2024-02-29
DE102015215413B9 (de) 2020-10-22
DE102015215413B4 (de) 2020-08-13
PT3334520T (pt) 2024-02-26
HUE065429T2 (hu) 2024-05-28
HRP20240092T1 (hr) 2024-04-12
FI3334520T3 (fi) 2024-02-22
PL3334520T3 (pl) 2024-04-29
DE102015215413A1 (de) 2017-02-16
EP3334520B1 (de) 2023-11-29

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