EE04694B1 - Laetud osakesi emiteeriv s?lm, keevitusseade ja laetud osakeste kiire s?lm - Google Patents

Laetud osakesi emiteeriv s?lm, keevitusseade ja laetud osakeste kiire s?lm

Info

Publication number
EE04694B1
EE04694B1 EEP200000153A EEP200000153A EE04694B1 EE 04694 B1 EE04694 B1 EE 04694B1 EE P200000153 A EEP200000153 A EE P200000153A EE P200000153 A EEP200000153 A EE P200000153A EE 04694 B1 EE04694 B1 EE 04694B1
Authority
EE
Estonia
Prior art keywords
charged particle
fastener
particle beam
chamber
welding device
Prior art date
Application number
EEP200000153A
Other languages
English (en)
Estonian (et)
Inventor
Sanderson Allan
Original Assignee
The Welding Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by The Welding Institute filed Critical The Welding Institute
Publication of EE200000153A publication Critical patent/EE200000153A/xx
Publication of EE04694B1 publication Critical patent/EE04694B1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/075—Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/301—Arrangements enabling beams to pass between regions of different pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3104—Welding

Landscapes

  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Radiation-Therapy Devices (AREA)
  • Particle Accelerators (AREA)
  • Electrostatic Spraying Apparatus (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Secondary Cells (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Polymerisation Methods In General (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)
  • Generation Of Surge Voltage And Current (AREA)
  • Luminescent Compositions (AREA)
  • Electrophonic Musical Instruments (AREA)
  • Cookers (AREA)
  • Electroluminescent Light Sources (AREA)
EEP200000153A 1997-09-24 1998-09-24 Laetud osakesi emiteeriv s?lm, keevitusseade ja laetud osakeste kiire s?lm EE04694B1 (et)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB9720350.9A GB9720350D0 (en) 1997-09-24 1997-09-24 Improvements relating to charged particle beams
PCT/GB1998/002882 WO1999016101A2 (en) 1997-09-24 1998-09-24 Charged particle beam emitting assembly

Publications (2)

Publication Number Publication Date
EE200000153A EE200000153A (et) 2001-02-15
EE04694B1 true EE04694B1 (et) 2006-08-15

Family

ID=10819590

Family Applications (1)

Application Number Title Priority Date Filing Date
EEP200000153A EE04694B1 (et) 1997-09-24 1998-09-24 Laetud osakesi emiteeriv s?lm, keevitusseade ja laetud osakeste kiire s?lm

Country Status (21)

Country Link
US (1) US6404115B1 (de)
EP (3) EP1018137B1 (de)
JP (1) JP4200656B2 (de)
KR (1) KR100586050B1 (de)
CN (1) CN1205646C (de)
AT (3) ATE406666T1 (de)
AU (1) AU730293B2 (de)
BR (1) BR9812505B1 (de)
CA (1) CA2303148C (de)
CZ (1) CZ294249B6 (de)
DE (3) DE69830664T2 (de)
EE (1) EE04694B1 (de)
ES (1) ES2244081T3 (de)
GB (1) GB9720350D0 (de)
NO (1) NO326142B1 (de)
NZ (1) NZ503060A (de)
PT (1) PT1018137E (de)
RU (1) RU2201006C2 (de)
TR (1) TR200000750T2 (de)
UA (1) UA69394C2 (de)
WO (1) WO1999016101A2 (de)

Families Citing this family (33)

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US6630774B2 (en) * 2001-03-21 2003-10-07 Advanced Electron Beams, Inc. Electron beam emitter
US7147900B2 (en) * 2003-08-14 2006-12-12 Asm Japan K.K. Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation
RU2258973C2 (ru) * 2003-10-06 2005-08-20 Федеральное государственное унитарное предприятие Российский федеральный ядерный центр - Всероссийский научно-исследовательский институт экспериментальной физики-ФГУП РФЯЦ-ВНИИЭФ Способ получения объемного заряда
RU2273070C2 (ru) * 2004-02-24 2006-03-27 Российская Федерация в лице Министерства Российской Федерации по атомной энергии Устройство для облучения водных растворов
RU2281621C1 (ru) * 2005-04-01 2006-08-10 Закрытое акционерное общество "Научно-производственное предприятие "Гамма" (ЗАО "НПП "Гамма") Излучатель электронов
US8159118B2 (en) 2005-11-02 2012-04-17 United Technologies Corporation Electron gun
EP2070631B1 (de) 2006-10-02 2013-12-25 Nippon Steel & Sumitomo Metal Corporation Durch elektronenstrahlen geschweisste verbindung mit hervorragender unempfindlichkeit gegenüber sprödbruch
EP2148354B1 (de) * 2007-05-16 2014-09-24 Denki Kagaku Kogyo Kabushiki Kaisha Elektronenquelle
JP4636082B2 (ja) * 2007-12-27 2011-02-23 日新イオン機器株式会社 カソード保持構造およびそれを備えるイオン源
DK2508290T3 (en) 2009-12-04 2017-04-10 Nippon Steel & Sumitomo Metal Corp STUFF WASTE COLLECTION AND PROCEDURE FOR PREPARING THIS
JP5471380B2 (ja) * 2009-12-04 2014-04-16 新日鐵住金株式会社 洋上風力発電塔用大型溶接鋼管の高能率製造方法
EP2508291B1 (de) 2009-12-04 2017-05-03 Nippon Steel & Sumitomo Metal Corporation Mittels elektronenstrahl stumpfgeschweisste verbindung
ES2542743T3 (es) 2009-12-04 2015-08-11 Nippon Steel & Sumitomo Metal Corporation Estructura soldada con una junta soldada a tope y método para su fabricación
JP2011246804A (ja) 2010-04-30 2011-12-08 Nippon Steel Corp 電子ビーム溶接継手及び電子ビーム溶接用鋼材とその製造方法
WO2012070354A1 (ja) 2010-11-22 2012-05-31 新日本製鐵株式会社 電子ビーム溶接継手及び電子ビーム溶接用鋼材とその製造方法
JP2011246805A (ja) 2010-04-30 2011-12-08 Nippon Steel Corp 電子ビーム溶接継手及び電子ビーム溶接用鋼材とその製造方法
US20110294071A1 (en) * 2010-05-28 2011-12-01 Canon Kabushiki Kaisha Electron gun, lithography apparatus, method of manufacturing article, and electron beam apparatus
KR101425761B1 (ko) 2010-11-22 2014-08-01 신닛테츠스미킨 카부시키카이샤 전자빔 용접 조인트 및 전자빔 용접용 강재와 그 제조 방법
KR101346961B1 (ko) 2010-11-22 2014-01-02 신닛테츠스미킨 카부시키카이샤 전자 빔 용접 조인트 및 전자 빔 용접용 강재와 그 제조 방법
KR101423445B1 (ko) 2010-11-22 2014-07-24 신닛테츠스미킨 카부시키카이샤 전자 빔 용접 조인트 및 전자 빔 용접용 강재와 그의 제조 방법
KR20150127304A (ko) 2010-11-22 2015-11-16 신닛테츠스미킨 카부시키카이샤 전자 빔 용접 조인트 및 전자 빔 용접용 강재와 그의 제조 방법
RU2478974C2 (ru) * 2011-05-31 2013-04-10 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт метрологии им. Д.И. Менделеева" (ФГУП "ВНИИМ им. Д.И. Менделеева") Способ воспроизведения единицы силы постоянного электрического тока и устройство для его осуществления
US20130162136A1 (en) * 2011-10-18 2013-06-27 David A. Baldwin Arc devices and moving arc couples
EA019817B1 (ru) * 2011-12-29 2014-06-30 Федеральное Государственное Бюджетное Образовательное Учреждение Высшего Профессионального Образования "Национальный Исследовательский Томский Политехнический Университет" (Фгбоу Впо Ни Тпу) Ионный диод с магнитной самоизоляцией
RU2680150C1 (ru) * 2017-12-27 2019-02-18 федеральное государственное бюджетное образовательное учреждение высшего образования "Национальный исследовательский университет "МЭИ" (ФГБОУ ВО "НИУ "МЭИ") Катодный блок сварочной электронной пушки
WO2019180242A1 (en) 2018-03-23 2019-09-26 Freemelt Ab Cathode assembly for electron gun
RU183913U1 (ru) * 2018-05-07 2018-10-09 Федеральное государственное бюджетное образовательное учреждение высшего образования "Саратовский государственный технический университет имени Гагарина Ю.А." (СГТУ имени Гагарина Ю.А.) Триодная электронная пушка с автокатодом
GB2583359A (en) * 2019-04-25 2020-10-28 Aquasium Tech Limited Electron beam emitting assembly
US20230330751A1 (en) * 2019-09-23 2023-10-19 Freemelt Ab Electron gun cathode technology
US11965494B2 (en) 2021-02-17 2024-04-23 Accion Systems, Inc. Electrospray emission apparatus
GB202102555D0 (en) 2021-02-23 2021-04-07 Twi Ltd An electron gun cathode mount
WO2024059296A1 (en) * 2022-09-15 2024-03-21 Elve Inc. Cathode heater assembly for vacuum electronic devices and methods of manufacture
SE2350994A1 (en) * 2023-08-23 2025-02-24 Freemelt Ab Electron emitter with emission blocking coating

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FR1599106A (de) * 1968-11-29 1970-07-15
SU490383A1 (ru) * 1974-05-28 1994-01-15 А.А. Камунин Электронная пушка
US4041316A (en) 1974-09-20 1977-08-09 Hitachi, Ltd. Field emission electron gun with an evaporation source
GB1549127A (en) * 1977-05-11 1979-08-01 Inst Elektroswarki Patona Electron beam welding guns
US4333214A (en) 1980-03-31 1982-06-08 Western Electric Company, Inc. Wire weldment deflashing tool
DE3031839C2 (de) 1980-08-23 1983-10-20 Dynamit Nobel Ag, 5210 Troisdorf Verfahren zum kontinuierlichen Herstellen einer gemusterten Bahn aus thermoplastischem Kunststoff
DE3227974A1 (de) * 1982-07-27 1984-02-09 Messer Griesheim Gmbh, 6000 Frankfurt Elektronenstrahlerzeuger, insbesondere zweielektroden-elektronenstrahlerzeuger
JPS6139976A (ja) 1984-07-31 1986-02-26 Nippon Gakki Seizo Kk 記録信号の再生装置におけるジツタ吸収回路
SU1382297A1 (ru) * 1986-07-11 1995-07-09 Объединенный Институт Ядерных Исследований Взрывоэмиссионный источник ионов
US4792688A (en) * 1987-06-15 1988-12-20 The Perkin-Elmer Corporation Differentially pumped seal apparatus
SU1799190A1 (ru) * 1990-03-05 1995-12-20 Московский машиностроительный завод им.А.И.Микояна Электронно-лучевая сварочная пушка
JP2732961B2 (ja) * 1991-07-18 1998-03-30 株式会社日立製作所 荷電粒子線装置
GB9224602D0 (en) * 1992-11-24 1993-01-13 Welding Inst Charged particle generation
US5623183A (en) 1995-03-22 1997-04-22 Litton Systems, Inc. Diverging beam electron gun for a toxic remediation device with a dome-shaped focusing electrode

Also Published As

Publication number Publication date
UA69394C2 (uk) 2004-09-15
CA2303148A1 (en) 1999-04-01
PT1018137E (pt) 2005-10-31
US6404115B1 (en) 2002-06-11
JP4200656B2 (ja) 2008-12-24
KR100586050B1 (ko) 2006-06-07
WO1999016101A3 (en) 1999-06-17
DE69839952D1 (de) 2008-10-09
CZ294249B6 (cs) 2004-11-10
EP1018137A2 (de) 2000-07-12
CN1271460A (zh) 2000-10-25
RU2201006C2 (ru) 2003-03-20
NZ503060A (en) 2001-11-30
EE200000153A (et) 2001-02-15
EP1587129A1 (de) 2005-10-19
TR200000750T2 (tr) 2000-06-21
JP2001517857A (ja) 2001-10-09
CN1205646C (zh) 2005-06-08
BR9812505B1 (pt) 2009-12-01
EP1587130B1 (de) 2008-08-27
ATE406666T1 (de) 2008-09-15
AU730293B2 (en) 2001-03-01
GB9720350D0 (en) 1997-11-26
ATE430375T1 (de) 2009-05-15
EP1587129B1 (de) 2009-04-29
EP1018137B1 (de) 2005-06-22
ES2244081T3 (es) 2005-12-01
AU9176598A (en) 1999-04-12
KR20010015610A (ko) 2001-02-26
EP1587130A1 (de) 2005-10-19
DE69830664D1 (de) 2005-07-28
DE69840801D1 (de) 2009-06-10
WO1999016101A2 (en) 1999-04-01
BR9812505A (pt) 2000-07-25
NO326142B1 (no) 2008-10-06
CZ2000749A3 (cs) 2004-07-14
NO20001513L (no) 2000-03-23
ATE298462T1 (de) 2005-07-15
CA2303148C (en) 2008-06-03
NO20001513D0 (no) 2000-03-23
DE69830664T2 (de) 2005-12-01

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Legal Events

Date Code Title Description
KB4A Valid patent at the end of a year

Effective date: 20061231

KB4A Valid patent at the end of a year

Effective date: 20071231

KB4A Valid patent at the end of a year

Effective date: 20081231

KB4A Valid patent at the end of a year

Effective date: 20101231