EE200900010A - Method and apparatus for ion flow control - Google Patents

Method and apparatus for ion flow control

Info

Publication number
EE200900010A
EE200900010A EEP200900010A EEP200900010A EE200900010A EE 200900010 A EE200900010 A EE 200900010A EE P200900010 A EEP200900010 A EE P200900010A EE P200900010 A EEP200900010 A EE P200900010A EE 200900010 A EE200900010 A EE 200900010A
Authority
EE
Estonia
Prior art keywords
flow control
ion flow
ion
control
flow
Prior art date
Application number
EEP200900010A
Other languages
Estonian (et)
Inventor
Krimanov Aleksander
Sominski Igor
Original Assignee
Krimanov Aleksander
Sominski Igor
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Krimanov Aleksander, Sominski Igor filed Critical Krimanov Aleksander
Priority to EEP200900010A priority Critical patent/EE200900010A/en
Publication of EE200900010A publication Critical patent/EE200900010A/en

Links

EEP200900010A 2008-02-13 2009-02-13 Method and apparatus for ion flow control EE200900010A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EEP200900010A EE200900010A (en) 2008-02-13 2009-02-13 Method and apparatus for ion flow control

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EEU200800023 2008-02-13
EEU200800024 2008-02-13
EEP200900010A EE200900010A (en) 2008-02-13 2009-02-13 Method and apparatus for ion flow control

Publications (1)

Publication Number Publication Date
EE200900010A true EE200900010A (en) 2009-10-15

Family

ID=41149154

Family Applications (1)

Application Number Title Priority Date Filing Date
EEP200900010A EE200900010A (en) 2008-02-13 2009-02-13 Method and apparatus for ion flow control

Country Status (2)

Country Link
EA (1) EA015719B1 (en)
EE (1) EE200900010A (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1953659C3 (en) * 1969-10-21 1979-01-25 N.V. Philips' Gloeilampenfabrieken, Eindhoven (Niederlande) Ion source for atomization with slow ions
US4911814A (en) * 1988-02-08 1990-03-27 Nippon Telegraph And Telephone Corporation Thin film forming apparatus and ion source utilizing sputtering with microwave plasma
US5317148A (en) * 1991-05-22 1994-05-31 Loral Corporation IR/ladar scanner
JP3318595B2 (en) * 1991-12-24 2002-08-26 独立行政法人産業技術総合研究所 Laser ion plating equipment

Also Published As

Publication number Publication date
EA015719B1 (en) 2011-10-31
EA200900191A1 (en) 2009-10-30

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