EP0000082A1 - Procédé de modification sous forme d'images de la surface d'un support pouvant être décapé et matériau à cet effet comprenant une couche colloidale contenant des polymères avec des groupes oxime-ester - Google Patents

Procédé de modification sous forme d'images de la surface d'un support pouvant être décapé et matériau à cet effet comprenant une couche colloidale contenant des polymères avec des groupes oxime-ester Download PDF

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Publication number
EP0000082A1
EP0000082A1 EP78200022A EP78200022A EP0000082A1 EP 0000082 A1 EP0000082 A1 EP 0000082A1 EP 78200022 A EP78200022 A EP 78200022A EP 78200022 A EP78200022 A EP 78200022A EP 0000082 A1 EP0000082 A1 EP 0000082A1
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EP
European Patent Office
Prior art keywords
polymer
radiation
layer
alkyl
image
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP78200022A
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German (de)
English (en)
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EP0000082B1 (fr
Inventor
Hugo Vital Van Goetham
Marcel August Stroobants
Walter Frans De Winter
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Agfa Gevaert NV
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Agfa Gevaert NV
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Publication of EP0000082A1 publication Critical patent/EP0000082A1/fr
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Definitions

  • the present invention relates to a method and materials for producing image-wise modified elements.
  • This method and materials can be used e.g. in the production of printed circuits, in photochemical tooling, in the production of printing forms etc.
  • the surface of an element or the element itself is modified image-wise.
  • the image-wise modification of an element or of its surface in conformity with an image- wise exposure occurs by means of an etchant, whose action is image-wise controlled by means of an etch-resist.
  • etch resists are known.
  • the etch resist controls image-wise the action of the etchant so that the surface of the underlying printing member is modified image-wise so as to obtain more or less depressed areas.
  • the depressed areas or cavities will receive the printing ink, which ink is transferred from these cavities or ink cells to the printing stock.
  • the transfer of ink to the printing stock is e.g. due to the suction of the printing stock, the adhesion power and/or viscosity of the ink etc.
  • the etch resist controlling the action of the etchant on the underlying printing member may consist e.g. of a hardened relief pattern.
  • the thinner said pattern the more intense the etching, in other words the deeper the etchant attacks the element to be etched.
  • Carbon tissue or pigment paper comprises a gelatin layer, which is made sensitive to ultra-violet light by means of an aqueous solution of alkali- or ammonium dichromate. After careful drying, the so-called “dichromated gelatin” layer is exposed e.g. through a continuous tone image and a gravure screen. The gelatin hardens in conformity with this exposure. The carbon tissue is then adhered to the printing surface, while pressure and moisture are applied. By the action of water the gelatin layer swells and firmly adheres to the printing surface, which had been hydrophilized beforehand.
  • Homogeneous mixtures of photopolymerizable monomers and of a photoinitiator in a binder are extremely sensitive to polymerization inhibiting phenomenons caused by oxygen.
  • Non-polymeric as well as polymeric compounds containing oxime ester groups are known from US Patent Specification 3,558,309 of Urbain Leopold Laridon and Gerard Albert Delzenne issued January 26, 1971 for use as photoinitiator in the photopolymerization of ethylenically unsaturated monomers and to make etch resists with the washing-away step according to the method of the above US Patent 2,760,863.
  • photoinitiators can of course also be used in the procedure of the above US Patent Specification 3,718,473 without washing away step.
  • etch resist can be made by image-wise photodegradation of polymers containing oxime ester groups and washing away the decomposed polymer in the exposed areas by means of solvents in which the non- decomposed polymer in the unexposed areas is insoluble.
  • a hydrophilic colloid layer containing a dispersed phase of a polymer with recurring units containing oxime ester groups in the side-chain can be used to form an etch resist, through which after image-wise exposure an etchant diffuses image-wise, without the need of a washing away step before the application of the etchant and without the presence of an ethylenically unsaturated monomer in the layer.
  • the present invention thus provides a process for image-wise modifying the surface of an element by making an etchant diffuse through a layer applied to said surface, this layer forming an etch resist with image-wise differentiations in permeability for an etchant.
  • the said etch resist is formed by the steps of image-wi.se exposing to actinic radiation a layer of a hydrophilic colloid binder containing, in the absence of any ethylenically unsaturated monomeric material, a dispersed phase of at least one radiation-sensitive polymer, the polymer chain of which comprises units with side-substi- tu-ents containing oxime ester groups.
  • the phenomenons taking place in the process of the present invention are believed to be the following.
  • the hydrophilic binder medium wherein a polymer, whose polymer chain comprises units with side-substituents containing oxime ester groups, is heterogeneously dispersed, constitutes the medium, through which an etchant e.g. an Fe(III)chloride solution can diffuse in consequence of the capillary behaviour of said medium.
  • an etchant e.g. an Fe(III)chloride solution
  • the oxime ester units in said polymer form radicals which crosslink with the hydrophilic binder medium so that the capillarity of the layer is reduced and thus the permeability of the layer for a hydrophilic etchant is reduced.
  • Particularly suitable polymeric compounds having side-substituents comprising an oxime ester group are polymers obtained by (1) the reaction of a monooxime of an ⁇ , ⁇ -diketone e.g. 1-phenyl-1,2-propanedione-2- oxime, 1-(p-hydroxyphenyl)-1,2-propanedione-2-oxime, p-hydroxyphenyl glyoxalaldoxime and 2,3-butanedione monooxime with an ethylenically unsaturated acid chloride e.g.
  • a monooxime of an ⁇ , ⁇ -diketone e.g. 1-phenyl-1,2-propanedione-2- oxime, 1-(p-hydroxyphenyl)-1,2-propanedione-2-oxime, p-hydroxyphenyl glyoxalaldoxime and 2,3-butanedione monooxime with an ethylenically unsaturated acid chloride e
  • acryloyl or methacryloyl chloride and polymerization or copolymerization of the thus formed monomer carrying an oxime ester group, or (2) the reaction of an ethylenically unsaturated compound comprising an d,f-diketo monooxime, with a carboxylic acid chloride which includes an aliphatic, aromatic or heterocyclic acid chloride e.g.
  • Particularly suitable polymers are those comprising recurring units corresponding to one of the following general formulae I and II : wherein :
  • the polymers used according to the present invention can be homopolymers or copolymers. They are preferably copolymers comprising besides the units with oxime ester group in the side chain units derived from a variety of monomers, whereof preferably at least one is hydrophobic. Examples of comonomers are (meth)acrylamide, N-alkyl(meth) acrylamide, alkyl(meth)acrylate, styrene, acrylonitrile, N-vinylpyrrolidone, vinyl acetate and other vinyl esters. Preferred copolymers comprise from 5 to 50 mol % recurring units with oxime ester groups in the side chain.
  • the solution was cooled to 25°C and 92.4 g of sodium hydrogen carbonate (1.1 mole) were added.
  • This product may be purified by dissolving in a 10% aqueous solution of sodium hydroxide and again forming a residue with HC1 or by recrystallization from a mixture of ethanol and water (2:1)
  • step f A solution of 3.87 g (0.02 mole) of 2-methyl-indolizine-3-carbonyl chloride (step f) in 50 ml of methylene chloride was added dropwise in 5 min.
  • Monomer 2 was prepared as monomer 1 (step g of preparation 1 using 2.81 g of benzoyl chloride).
  • the molar ratio of methylmethacrylate'units to monomer units 2 was 81:19.
  • the resist-forming layer used according to the present invention comprises dispersed in a hydrophilic colloid binder in the absence of any ethylenically unsaturated monomeric material, at least one radiation sensitive polymer comprising units with oxime-ester groups as side substituents.
  • the hydrophilic colloid used as the binder for the dispersed polymer particles is preferably gelatin, but other hydrophilic colloids can also be used, e.g. colloidal albumin, alginic acid and derivatives thereof, a cellulose derivative e.g. carboxymethylcellulose and hydroxyethylcellulose, a synthetic hydrophilic colloid such as polyvinyl alcohol, poly-N-vinyl pyrrolidone, copolymers of acrylic acid, polyacrylamides and derivatives, etc. If desired, compatible mixtures of two or more of these colloids can be employed for dispersing the polymer particles.
  • hydrophilic colloids e.g. colloidal albumin, alginic acid and derivatives thereof, a cellulose derivative e.g. carboxymethylcellulose and hydroxyethylcellulose, a synthetic hydrophilic colloid such as polyvinyl alcohol, poly-N-vinyl pyrrolidone, copolymers of acrylic acid, polyacrylamides and derivatives, etc. If desired
  • the weight ratio of hydrophilic colloid to polymer is preferably comprised between 20:1 and 1:1.
  • the radiation-sensitive polymers can be dispersed in the hydrophilic colloids using any of the dispersion techniques known for incorporating photographic ingredients e.g. colour couplers in silver halide emulsion layers.
  • a particularly suitable technique is to disperse the polymers from solutions in high-boiling water-immiscible solvents or mixtures of high-boiling and low-boiling water-immiscible solvents, in aqueous solutions of the hydrophilic colloid.
  • high-boiling solvents are tricresyl phosphate, dibutyl phthalate and other esters of organic dicarboxylic acids e.g.
  • aqueous colloid surfactants can be used which include anionic, non-ionic and amphoteric compounds, e.g. sodium alkylnaphthalene sulphonates, sodium lauryl sulphate, sulphonated derivatives of fatty acid amides, sodium dioctylsulphate, sodium isotetradecyl sulphate, sorbiton monolaurate, etc.
  • anionic, non-ionic and amphoteric compounds e.g. sodium alkylnaphthalene sulphonates, sodium lauryl sulphate, sulphonated derivatives of fatty acid amides, sodium dioctylsulphate, sodium isotetradecyl sulphate, sorbiton monolaurate, etc.
  • the polymers are dispersed in the hydrophilic colloid medium in the form of oily droplets.
  • the average diameter of these droplets may be comprised between 0.01 and 20 microns preferably between 0.05 and 5 microns.
  • the radiation sensitive resist-forming layer used according to the present invention may comprise in addition to the binder and radiation sensitive polymer, compounds increasing the sensitivity e.g. Michler's ketone and analogous aromatic ketones which increase the spectral response especially in the range of 270 to 380 pm.
  • the layer may also comprise so-called "filler"-compounds that are substantially non light-sensitive and do not crosslink with the hydrophilic binder.
  • filler compounds are e.g. co(ethylene glycol isophthalate/isopropylene glycol isophthalate 50:50), co(vinyl chloride/ vinyl acetate/maleic acid anhydride), co(vinyl acetate/ vinyl chloride), co(vinyl chloride/vinyl acetate/maleic acid), polyvinyl-n-butyral, polyisobutyl methacrylate, polystyrene, polymethyl methacrylate, cellulose acetate butyrate, co(styrene/butadiene), and an epoxy resin of bisphenol A and epichlorohydrin, marketed by Ciba-Geigy, Basel, Switserland under the name of ARALDITE GY 250 being preferred.
  • the layer may also contain antioxidizing agents, coating aids, dyes, etc.
  • the resist-forming radiation-sensitive layer can be applied to any substrate known in the art.
  • Metal supports or supports coated with metals such as for example zinc, and especially aluminium are excellently suited as base materials for a planographic printing plate.
  • metal base materials suited for etching are used e.g. metal plates or cylinders of zinc, copper, steel or an etchable magnesium alloy.
  • the photoresist composition is applied e.g. to a supported copper layer, which can be easily etched.
  • the present radiation-sensitive layers can likewise be used in the production of microimages.
  • the photoresist coatings are applied to a relatively thin highly opaque black or grey metal coating that can be etched and serves as imaging layer.
  • Suited metal coatings are made of tellurium or a tellurium alloy having a thickness in the range of 50 nm to 500 nm or bismuth coatings having a thickness in the range of 25 nm to 300 nm.
  • tellurium alloys comprising at least 50 atomic percent of tellurium are used.
  • Typical tellurium compositions which are etchable with an opaque hypochlorite solution are described in US Patent Specifications 3,271,591 and 3,530,441 of Stanford R.Ovshinsky issued respectively September 6, 1966 and September 22, 1970.
  • the imaging metal layer consists of bismuth.
  • Bismuth posseses the advantage of directly adhering to organic resin supports such as a polyethylene terephthalate support when deposited thereon from bismuth vapour under reduced pressure con- d itions.
  • Vapour deposition techniques are sufficiently known to those skilled in the art e.g. of preparing photoconductive selenium coatings (see e.g. US Patent Specifications 3,874,917 of Charles Wood, John C.Schottmiller and Francis W.Ryan issued April 1, 1975 and 3,884,688 of John C.Schottmiller, Francis W.Ryan and Charles Wood issued May 20, 1975).
  • aqueous acidic iron(II) chloride solution For the etching of the bismuth layer preference is given to aqueous acidic iron(II) chloride solution.
  • concentration of iron(III) chloride is e.g. in the range of 5 to 20 % by weight.
  • Said solution contains preferably from 0.25 to 1 % by weight of citric acid.
  • a likewise useful etching solution for the removal of bismuth is an aqueous solution containing 3 to 6 % by weight of hydrogen peroxide and 5 to 10 % by weight of sulphuric acid.
  • the radiation-sensitive layers according to the ir-vention can be applied to the surfaces to be modified by any known coating technique e.g. by spin-coating, whirl coating, spraying, dip-coating, roller coating, air-knife coating, doctor-blade coating etc.
  • Preferred temporary supports are transparent film supports which permit exposure through the support. Examples of such transparent supports are cellulose nitrate film, cellulose ester film, polyvinyl acetal film, polystyrene film, polyethylene terephthalate film and related films of resinous materials.
  • Other suitable temporary supports are paper and paper, which has been coated with ⁇ -olefin polymers, e.g. polyethylene, polypropylene, polyisobutylene-polyethylene mixtures etc.
  • an antihalation layer between the radiation-sensitive layer and the temporary support e.g. between the stripping layer and the support or between the radiation sensitive layer and the stripping layer. It is also possible to provide the antihalation layer on the side of the transparent support opposite to that carrying the radiation-sensitive layer.
  • the exposure of the radiation-sensitive resist forming layer preferably occurs by means of UV-radiation sources e.g. carbon arcs and mercury vapour lamps. Exposure may occur through a contacted transparent master pattern or by a projection exposure.
  • UV-radiation sources e.g. carbon arcs and mercury vapour lamps. Exposure may occur through a contacted transparent master pattern or by a projection exposure.
  • Example 1 illustrates the present invention.
  • aqueous phase containing 60 g of gelatine, 340 g of water, 40 g of a 5 % aqueous solution of the sodium salt of diisooctyl sulphosuccinate was prepared as follows: gelatin was allowed to swell for 1 h in water and then heated to 50°C, whereupon the other ingredients of the aqueous phase were added.
  • an oily phase was prepared by dissolving 30 g of tricresyl phosphate, 3 g of Michler's ketone and 20 g of co(ethylene glycol isophthalate/isopropylene glycol isophthalate) (50:50) in 90 g of ethyl acetate and 90 g of m-xylene and then dissolving therein 40 g of the polymer of preparation 4.
  • the oily phase was emulsified in the aqueous phase by means of an homogenizer. Then 760 ml of water and 12.5 g of aqueous formaldehyde (4 % by weight) were added to obtain the desired viscosity.
  • the emulsion was dip-coated on a polyethylene terephthalate support and dried.
  • the thickness of the coated layer varied from 5 to 10 ⁇ m.
  • Preparation of the coating composition and coating occurred under darkroom illumination.
  • the image-wise exposure was performed in contact in a vacuum frame in two stages.
  • An exposure was carried out through a gravure screen of 65 lines per cm, in which the ratio of the dark lines to the transparent parts was 1:2.5.
  • the light source used was a mercury vapour lamp.
  • the time relation between the continuous tone exposure and the screen exposure was 0.66:1.
  • the etch resist layer showing a brown negative image was transferred by pressure to a wet copper surface.
  • the polyethylene terephthalate support was stripped off and the etch resist was dried in the air.
  • the parts of the copper surface that were not covered by etch resist were coated with an asphalt derivative.
  • the etching was performed with an iron(III)chloride solution of 39-43° Baume for about 15 min.
  • the etching was stopped by abundantly rinsing with hot water.
  • the etch resist was rubbed off easily.
  • the resulting etch depths reached 3 to 45 ⁇ m. No undercutting was observed.
  • Example 1 was repeated with the difference that the aqueous phase contained : and the oil phase contained :
  • the oily phase was dispersed in the aqueous phase and after dilution as in example 1 coated on a polyethylene terephthalate support.

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
EP78200022A 1977-06-01 1978-06-01 Procédé de modification sous forme d'images de la surface d'un support pouvant être décapé et matériau à cet effet comprenant une couche colloidale contenant des polymères avec des groupes oxime-ester Expired EP0000082B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB2320377 1977-06-01
GB2320377 1977-06-01

Publications (2)

Publication Number Publication Date
EP0000082A1 true EP0000082A1 (fr) 1978-12-20
EP0000082B1 EP0000082B1 (fr) 1982-07-21

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EP78200022A Expired EP0000082B1 (fr) 1977-06-01 1978-06-01 Procédé de modification sous forme d'images de la surface d'un support pouvant être décapé et matériau à cet effet comprenant une couche colloidale contenant des polymères avec des groupes oxime-ester

Country Status (5)

Country Link
US (1) US4202697A (fr)
EP (1) EP0000082B1 (fr)
JP (1) JPS53149330A (fr)
DE (1) DE2861959D1 (fr)
FR (1) FR2393345A1 (fr)

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US5011626A (en) * 1988-06-13 1991-04-30 Rolls-Royce Inc. Barrier materials for laser drilling
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
US6806024B1 (en) 1999-03-03 2004-10-19 Ciba Specialty Chemicals Corporation Oxime derivatives and the use thereof as photoinitiators
NL1016815C2 (nl) * 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester-fotoinitiatoren.
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
US6783914B1 (en) 2000-02-25 2004-08-31 Massachusetts Institute Of Technology Encapsulated inorganic resists
EP1395615B1 (fr) * 2001-06-11 2009-10-21 Basf Se Photoamorceurs d'oxime ester possedant une structure combinee
CA2505893A1 (fr) * 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Photo-initiateurs a base d'ester d'oxime comportant des groupes heteroaromatiques
CA2575046A1 (fr) * 2004-08-18 2006-02-23 Ciba Specialty Chemicals Holding Inc. Photo-initiateurs a base d'ester d'oxime
KR100799043B1 (ko) * 2004-08-20 2008-01-28 가부시키가이샤 아데카 옥심 에스테르 화합물 및 이 화합물을 함유하는 광중합개시제
KR100763744B1 (ko) * 2005-11-07 2007-10-04 주식회사 엘지화학 옥심 에스테르를 포함하는 트리아진계 광활성 화합물
KR101402636B1 (ko) * 2005-12-01 2014-06-03 시바 홀딩 인크 옥심 에스테르 광개시제
KR100814231B1 (ko) * 2005-12-01 2008-03-17 주식회사 엘지화학 옥심 에스테르를 포함하는 트리아진계 광활성 화합물을포함하는 투명한 감광성 조성물
ATE458010T1 (de) * 2005-12-20 2010-03-15 Basf Se Oximester-photoinitiatoren
JP5535065B2 (ja) * 2007-05-11 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア オキシムエステル光重合開始剤
CN102702073B (zh) 2007-05-11 2015-06-10 巴斯夫欧洲公司 肟酯光引发剂
CN101679394B (zh) 2007-05-11 2013-10-16 巴斯夫欧洲公司 肟酯光引发剂
KR101007440B1 (ko) * 2007-07-18 2011-01-12 주식회사 엘지화학 옥심 에스테르를 포함하는 수지상 광활성 화합물 및 이의제조방법
US8507725B2 (en) 2008-06-06 2013-08-13 Basf Se Oxime ester photoinitiators
GB0823025D0 (en) * 2008-12-18 2009-01-28 Eastman Kodak Co Method of making a planographic printing plate
JP4344400B1 (ja) * 2009-02-16 2009-10-14 株式会社日本化学工業所 オキシムエステル化合物及びこれらを用いた感光性樹脂組成物
US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
US8816211B2 (en) 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
KR20180091232A (ko) 2017-02-06 2018-08-16 동우 화인켐 주식회사 옥심 에스테르계 화합물 및 이를 포함하는 광경화성 조성물
KR20180099105A (ko) 2017-02-28 2018-09-05 동우 화인켐 주식회사 옥심 에스테르계 화합물 및 이를 포함하는 광경화성 조성물
US10976483B2 (en) * 2019-02-26 2021-04-13 Facebook Technologies, Llc Variable-etch-depth gratings

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US3306744A (en) * 1962-12-17 1967-02-28 Polaroid Corp Copying process using dithioxamides, heavy metal salts and photopolymerizable monomers and photocross linkable polymers
US3484238A (en) * 1965-07-02 1969-12-16 Horizons Research Inc Photographic element and diffusion process
FR2011046A1 (fr) * 1968-06-17 1970-02-27 Agfa Gevaert Nv
US3558309A (en) * 1967-08-08 1971-01-26 Agfa Gevaert Nv Photopolymerisation of ethylenically unsaturated organic compounds
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US3255002A (en) * 1961-03-09 1966-06-07 Polaroid Corp Color photographic process and product
US3306744A (en) * 1962-12-17 1967-02-28 Polaroid Corp Copying process using dithioxamides, heavy metal salts and photopolymerizable monomers and photocross linkable polymers
US3484238A (en) * 1965-07-02 1969-12-16 Horizons Research Inc Photographic element and diffusion process
US3558309A (en) * 1967-08-08 1971-01-26 Agfa Gevaert Nv Photopolymerisation of ethylenically unsaturated organic compounds
US3558311A (en) * 1967-08-08 1971-01-26 Gevert Agfa Nv Photographic material comprising light-sensitive polymers and photodegradation process
FR2011046A1 (fr) * 1968-06-17 1970-02-27 Agfa Gevaert Nv

Also Published As

Publication number Publication date
US4202697A (en) 1980-05-13
FR2393345A1 (fr) 1978-12-29
JPS53149330A (en) 1978-12-26
DE2861959D1 (en) 1982-09-09
EP0000082B1 (fr) 1982-07-21
FR2393345B1 (fr) 1980-04-25

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