EP0000184B1 - Procédé de transformation d'organosilanes - Google Patents
Procédé de transformation d'organosilanes Download PDFInfo
- Publication number
- EP0000184B1 EP0000184B1 EP78100222A EP78100222A EP0000184B1 EP 0000184 B1 EP0000184 B1 EP 0000184B1 EP 78100222 A EP78100222 A EP 78100222A EP 78100222 A EP78100222 A EP 78100222A EP 0000184 B1 EP0000184 B1 EP 0000184B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- general formula
- silane
- hydrogen
- carbon atoms
- silanes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims description 15
- 150000001282 organosilanes Chemical class 0.000 title claims description 5
- 230000009466 transformation Effects 0.000 title 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 35
- 229910000077 silane Inorganic materials 0.000 claims description 17
- 150000004756 silanes Chemical class 0.000 claims description 14
- 229930195733 hydrocarbon Natural products 0.000 claims description 11
- 239000004215 Carbon black (E152) Substances 0.000 claims description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 9
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 9
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 9
- 125000001931 aliphatic group Chemical group 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 229910000039 hydrogen halide Inorganic materials 0.000 claims description 5
- 239000012433 hydrogen halide Substances 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 150000002367 halogens Chemical class 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 150000002899 organoaluminium compounds Chemical class 0.000 claims 1
- -1 hydrocarbon radicals Chemical class 0.000 description 17
- 239000000203 mixture Substances 0.000 description 14
- 238000009835 boiling Methods 0.000 description 8
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 238000010992 reflux Methods 0.000 description 7
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 6
- 239000011541 reaction mixture Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 238000004817 gas chromatography Methods 0.000 description 4
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 4
- 239000005051 trimethylchlorosilane Substances 0.000 description 4
- CMAOLVNGLTWICC-UHFFFAOYSA-N 2-fluoro-5-methylbenzonitrile Chemical compound CC1=CC=C(F)C(C#N)=C1 CMAOLVNGLTWICC-UHFFFAOYSA-N 0.000 description 3
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 3
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 3
- 239000005052 trichlorosilane Substances 0.000 description 3
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 2
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 2
- RFUDQCRVCDXBGK-UHFFFAOYSA-L dichloro(propyl)alumane Chemical compound [Cl-].[Cl-].CCC[Al+2] RFUDQCRVCDXBGK-UHFFFAOYSA-L 0.000 description 2
- YNLAOSYQHBDIKW-UHFFFAOYSA-M diethylaluminium chloride Chemical compound CC[Al](Cl)CC YNLAOSYQHBDIKW-UHFFFAOYSA-M 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000004508 fractional distillation Methods 0.000 description 2
- 239000005048 methyldichlorosilane Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000005054 phenyltrichlorosilane Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- IIVWHGMLFGNMOW-UHFFFAOYSA-N 2-methylpropane Chemical compound C[C](C)C IIVWHGMLFGNMOW-UHFFFAOYSA-N 0.000 description 1
- SLRMQYXOBQWXCR-UHFFFAOYSA-N 2154-56-5 Chemical compound [CH2]C1=CC=CC=C1 SLRMQYXOBQWXCR-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- CIIWMZFXGSQCDC-UHFFFAOYSA-N [AlH3].C(CCC)[AlH]CCCC Chemical compound [AlH3].C(CCC)[AlH]CCCC CIIWMZFXGSQCDC-UHFFFAOYSA-N 0.000 description 1
- YUDRVAHLXDBKSR-UHFFFAOYSA-N [CH]1CCCCC1 Chemical group [CH]1CCCCC1 YUDRVAHLXDBKSR-UHFFFAOYSA-N 0.000 description 1
- CIUQDSCDWFSTQR-UHFFFAOYSA-N [C]1=CC=CC=C1 Chemical compound [C]1=CC=CC=C1 CIUQDSCDWFSTQR-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- HYZXMVILOKSUKA-UHFFFAOYSA-K chloro(dimethyl)alumane;dichloro(methyl)alumane Chemical compound C[Al](C)Cl.C[Al](Cl)Cl HYZXMVILOKSUKA-UHFFFAOYSA-K 0.000 description 1
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 1
- KWYZNESIGBQHJK-UHFFFAOYSA-N chloro-dimethyl-phenylsilane Chemical compound C[Si](C)(Cl)C1=CC=CC=C1 KWYZNESIGBQHJK-UHFFFAOYSA-N 0.000 description 1
- OJZNZOXALZKPEA-UHFFFAOYSA-N chloro-methyl-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](Cl)(C)C1=CC=CC=C1 OJZNZOXALZKPEA-UHFFFAOYSA-N 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- PNECSTWRDNQOLT-UHFFFAOYSA-N dichloro-ethyl-methylsilane Chemical compound CC[Si](C)(Cl)Cl PNECSTWRDNQOLT-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- MGDOJPNDRJNJBK-UHFFFAOYSA-N ethylaluminum Chemical compound [Al].C[CH2] MGDOJPNDRJNJBK-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229910000043 hydrogen iodide Inorganic materials 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229940050176 methyl chloride Drugs 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- JLAVCPKULITDHO-UHFFFAOYSA-N tetraphenylsilane Chemical compound C1=CC=CC=C1[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 JLAVCPKULITDHO-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- SIPHWXREAZVVNS-UHFFFAOYSA-N trichloro(cyclohexyl)silane Chemical compound Cl[Si](Cl)(Cl)C1CCCCC1 SIPHWXREAZVVNS-UHFFFAOYSA-N 0.000 description 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 1
- KWDQAHIRKOXFAV-UHFFFAOYSA-N trichloro(pentyl)silane Chemical compound CCCCC[Si](Cl)(Cl)Cl KWDQAHIRKOXFAV-UHFFFAOYSA-N 0.000 description 1
- DOEHJNBEOVLHGL-UHFFFAOYSA-N trichloro(propyl)silane Chemical compound CCC[Si](Cl)(Cl)Cl DOEHJNBEOVLHGL-UHFFFAOYSA-N 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- CNWZYDSEVLFSMS-UHFFFAOYSA-N tripropylalumane Chemical compound CCC[Al](CCC)CCC CNWZYDSEVLFSMS-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0801—General processes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/0825—Preparations of compounds not comprising Si-Si or Si-cyano linkages
- C07F7/0827—Syntheses with formation of a Si-C bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
- C07F7/125—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving both Si-C and Si-halogen linkages, the Si-C and Si-halogen linkages can be to the same or to different Si atoms, e.g. redistribution reactions
Definitions
- organosilanes can be reacted with at least one silane (1) of the general formula. with at least one of (1) different silane (II) of the general formula where R in each case denotes the same or different hydrocarbon radicals having 1 to 10 carbon atoms and free of aliphatic multiple bonds, a is 2, 3 or 4 and b is 0, 1, 2 or 3. It is also known to promote this reaction, which is referred to as "coproportionation” according to Noll, "Chemistry and Technology of Silicones", Weinheim, 1968, page 51/52, by catalysts. These catalysts include e.g. B.
- one of the silanes used as reactants can contain Si-bonded hydrogen (see, for example, DE-AS 1 111 184, applicant: Imperial Chemical Industries Limited), the combination of aluminum chloride and silane at least one Si-bonded hydrogen atom (see, for example, US Pat. No. 2,786,861, issued; March 23, 1957, HR McEntee, assignor to General Electric Company, this US Pat. No.
- the process according to the invention has the advantages, for example, that it can be carried out without using overpressure, at lower temperatures and with smaller amounts of aluminum compounds. Even with the method according to the invention, the disadvantages associated with the use of aluminum chloride, already known from GB-PS 8 51 868, cannot occur.
- the invention relates to a process for converting organosilanes by reacting at least one silane (1) of the general formula. with at least one of (1) different silane (11) of the general formula where R is in each case the same or different hydrocarbon radicals having 1 to 10 carbon atoms and free from aliphatic multiple bonds, a is 2, 3 or 4 and b is 0, 1, 2 or 3, in the presence of at least one organoaluminum compound of the general formula where R 1 is the same or different alkyl radicals having 1 to 4 carbon atoms, Y halogen, hydrogen or oxygen-bonded to the aluminum atom, free from aliphatic multiple bonds, hydrocarbon radicals having 1 to 10 carbon atoms and c is 1, 2 or 3, characterized in that at least a silane (111) of the general formula where R, b and c each have the meaning given above with the proviso that the sum of b + c is at most 4, and 0.1 to 5 percent by weight, based on the total weight of the silanes (1), (11) and
- hydrocarbon radicals R and Y are alkyl radicals, such as the methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl and the 2-ethylhexyl radical and decyl radicals; Cycloalkyl radicals, such as the cyclohexyl radical; Aryl residues like that Phenyl radical; Aralkyl radicals, such as the benzyl radical; and alkaryl groups such as tolyl groups.
- silanes of the general forms in R a SiCl 4-a (I) and R b SiCl 4-b (11) are trimethylchlorosilane, dimethyldichlorosilane, methyltrichlorosilane, diphenyldichlorosilane, ethyltrichlorosilane, n-propyltrichlorosilane, phenyltrichlorosilane, phenyltrichlorosilane, nyltrichlorosilane, Pentyltrichlorosilane, cyclohexyltrichlorosilane and methyl-ethyldichlorosilane.
- silanes (1) of the general formula R a SiCl 4-a are tetramethylsilane and tetraphenylsilane.
- the silane (11) of the general formula R b SiCl 4-b can also be tetrachlorosilane.
- Silane (1) of the general formula R a SiCl 4-e is preferably used in amounts of 0.8 to 1.2 mol per mole of silane (11) of the general formula R b SiC1 4-b .
- hydrocarbon radicals R and Y with 1 to 4 carbon atoms also apply in full to the hydrocarbon radicals R 1 .
- hydrocarbon radicals R 1 and Y are tert-butyl radical.
- Halogen Y chlorine is preferred because of its easy accessibility.
- Halogen atoms Y can also be fluorine, bromine or iodine.
- Preferred organoaluminum compounds are those with a boiling point above 150 ° C. at 760 mm Hg (abs.). Because of the easy accessibility, ethyl aluminum sesquichloride is particularly preferred.
- Formula R b H c SiCI 4-bc are silane, methyldichlorosilane, dimethylchlorosilane, trichlorosilane and monochlorosilane.
- Silane (111) is preferably used in amounts of 0.5 to 15 percent by weight, in particular 2 to 6 percent by weight, based in each case on the total weight of silanes (1) and (11).
- hydrogen chloride is preferred as the hydrogen halide.
- hydrogen fluoride hydrogen bromide and / or hydrogen iodide can also be used.
- the process according to the invention can be carried out at room temperature and the pressure of the surrounding atmosphere, ie the 760 mm Hg (abs.) Or about 760 mm Hg (abs.).
- higher temperatures can also be used, e.g. up to 450 ° C.
- temperatures of at most 150 ° C. are preferred. If the use of higher temperatures and the boiling points of the reactants so require, pressure and / or a high-boiling solvent which is inert to the other constituents of the reaction mixture, e.g. a mixture of alkanes with a boiling point of at least 150 ° C at 760 mm Hg (abs.) can be used.
- Water is preferably excluded as far as possible
- the process according to the invention can be carried out batchwise, semi-continuously or fully continuously.
- Example 2 The procedure described in Example 1 is repeated with the modification that no hydrogen halide is used. When determining the composition of the reaction mixture by gas chromatography, only about 1% trimethylchlorosilane is found.
- Example 2 The procedure described in Example 2 is repeated with the modification that no silane with Si-bonded hydrogen is used. When determining the composition of the reaction mixture by gas chromatography, only less than 3,996 dimethyldichlorosilane are found.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Claims (2)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2728196A DE2728196C3 (de) | 1977-06-23 | 1977-06-23 | Verfahren zur Umwandlung von Organosilanen |
| DE2728196 | 1977-06-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0000184A1 EP0000184A1 (fr) | 1979-01-10 |
| EP0000184B1 true EP0000184B1 (fr) | 1980-07-23 |
Family
ID=6012137
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP78100222A Expired EP0000184B1 (fr) | 1977-06-23 | 1978-06-23 | Procédé de transformation d'organosilanes |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4158010A (fr) |
| EP (1) | EP0000184B1 (fr) |
| JP (1) | JPS549229A (fr) |
| BR (1) | BR7803931A (fr) |
| CA (1) | CA1110646A (fr) |
| DD (1) | DD133951A5 (fr) |
| DE (2) | DE2728196C3 (fr) |
| IT (1) | IT1105418B (fr) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5798531A (en) * | 1980-12-11 | 1982-06-18 | Kanebo Synthetic Fibers Ltd | Porous film |
| DE3208829A1 (de) * | 1981-05-15 | 1982-12-02 | Wacker-Chemie GmbH, 8000 München | Verfahren zum methylieren von siliciumverbindungen |
| GB2101620A (en) * | 1981-05-15 | 1983-01-19 | Wacker Chemie Gmbh | Process for methylating silicon compounds |
| US4889838A (en) * | 1983-12-22 | 1989-12-26 | Union Carbide Corporation And Plastics Company Inc. | Redistribution of organohalosilanes utilizing heat treated crystalline alumina catalysts |
| US4946980A (en) * | 1988-10-17 | 1990-08-07 | Dow Corning Corporation | Preparation of organosilanes |
| US4962219A (en) * | 1988-10-17 | 1990-10-09 | Dow Corning Corporation | Alkylation of halodisilanes |
| DE19520737C2 (de) * | 1995-06-07 | 2003-04-24 | Degussa | Verfahren zur Herstellung von Alkylhydrogenchlorsilanen |
| CN101531674B (zh) * | 2009-04-23 | 2012-02-15 | 嘉兴学院 | 一种甲基氯硅烷的制备方法 |
| CN102276641A (zh) * | 2011-09-15 | 2011-12-14 | 江苏弘博新材料有限公司 | 甲基氯硅烷的生产方法 |
| US10858260B2 (en) * | 2014-12-15 | 2020-12-08 | Evonik Operations Gmbh | Method for producing perhalogenated hexasilane anion and method for producing a cyclic silane compound |
| DE102016117519A1 (de) | 2016-09-16 | 2018-03-22 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines Siloxans, Verfahren zur Herstellung eines Polysiloxans, Verfahren zum Vergießen von optoelektronischen Bauelementen |
| EP3911657B1 (fr) | 2019-07-10 | 2023-01-04 | Wacker Chemie AG | Procédé de conversion d'organosilanes |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB881698A (en) * | 1959-07-31 | 1961-11-08 | Ici Ltd | Organohalogenosilanes |
| US3769310A (en) * | 1972-06-07 | 1973-10-30 | Gen Electric | Redistribution of alkylhydrosilanes |
| US3793357A (en) * | 1972-10-20 | 1974-02-19 | Gen Electric | Process for the redistribution of alkylsilanes and alkylhydrosilanes |
| FR2279755A1 (fr) * | 1974-07-26 | 1976-02-20 | Rhone Poulenc Ind | Procede de preparation de chlorosilanes et emploi des chlorosilanes ainsi obtenus |
-
1977
- 1977-06-23 DE DE2728196A patent/DE2728196C3/de not_active Expired
-
1978
- 1978-03-10 DD DD78204109A patent/DD133951A5/xx unknown
- 1978-05-03 US US05/902,462 patent/US4158010A/en not_active Expired - Lifetime
- 1978-06-20 JP JP7481878A patent/JPS549229A/ja active Granted
- 1978-06-21 IT IT49967/78A patent/IT1105418B/it active
- 1978-06-21 BR BR787803931A patent/BR7803931A/pt unknown
- 1978-06-21 CA CA305,961A patent/CA1110646A/fr not_active Expired
- 1978-06-23 EP EP78100222A patent/EP0000184B1/fr not_active Expired
- 1978-06-23 DE DE7878100222T patent/DE2860047D1/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2860047D1 (en) | 1980-11-13 |
| BR7803931A (pt) | 1979-02-20 |
| JPS5711915B2 (fr) | 1982-03-08 |
| DE2728196C3 (de) | 1980-01-31 |
| EP0000184A1 (fr) | 1979-01-10 |
| DD133951A5 (de) | 1979-01-31 |
| IT1105418B (it) | 1985-11-04 |
| IT7849967A0 (it) | 1978-06-21 |
| JPS549229A (en) | 1979-01-24 |
| CA1110646A (fr) | 1981-10-13 |
| DE2728196B2 (de) | 1979-06-07 |
| DE2728196A1 (de) | 1979-01-04 |
| US4158010A (en) | 1979-06-12 |
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