EP0164230B1 - Elektrode für Elektronenkanone und Herstellungsverfahren - Google Patents

Elektrode für Elektronenkanone und Herstellungsverfahren Download PDF

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Publication number
EP0164230B1
EP0164230B1 EP85303457A EP85303457A EP0164230B1 EP 0164230 B1 EP0164230 B1 EP 0164230B1 EP 85303457 A EP85303457 A EP 85303457A EP 85303457 A EP85303457 A EP 85303457A EP 0164230 B1 EP0164230 B1 EP 0164230B1
Authority
EP
European Patent Office
Prior art keywords
polishing
end wall
flange
electron beam
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
EP85303457A
Other languages
English (en)
French (fr)
Other versions
EP0164230A1 (de
Inventor
Ikuya Takahara
Yoshihiro Fujimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of EP0164230A1 publication Critical patent/EP0164230A1/de
Application granted granted Critical
Publication of EP0164230B1 publication Critical patent/EP0164230B1/de
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48—Electron guns
    • H01J29/50—Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes

Definitions

  • This invention relates to methods of manufacturing electron gun electrodes of cathode ray tubes, for example electrodes for in-line electron gun assemblies of color picture cathode ray tubes.
  • end walls of the electrodes must be parallel to a reference plane perpendicular to the axis of the electron gun assembly.
  • a conventional in-line convergence electrode is shown in longitudinal section in Figure 1.
  • the convergence electrode is assembled such that a cylindrical upper convergence electrode portion 1 is welded by laser radiation at a plurality of positions with a cylindrical lower convergence electrode portion 2 at out-turned flanges 1 a and 2a, respectively.
  • Reference numeral 3 denotes a welded portion.
  • References numerals 1 and 2b denote the end walls of the upper and lower convergence electrode portions 1 and 2, respectively.
  • the end walls 1 b and 2b have electron beam apertures 1c and 2c, respectively.
  • An axis I of the apertures 1 and 2c is parallel with the axis of the electron gun assembly.
  • the upper and lower convergence electrode portions 1 and 2 are prepared by press drawing a stainless steel plate having a thickness of about 0.3 mm, and the resultant structures must be heat- treated in a hydrogen atmosphere at a temperature of 1,000 to 1,100°C so as to perform degassing and to eliminate stress. Under these circumstances, errors in parallelism of the end walls 1 b and 2b are caused by the pressing and the heat treatment. In particular, the error in each cylindrical electrode portion along its major axis is larger than that along the minor axis thereof, thereby causing an error h1 in parallelism between the upper and lower surfaces of the electrode portion.
  • the prior art describes a method of manufacturing an electron gun electrode of a cathode ray tube, comprising:
  • the present invention is characterized by: prior to said welding step, locating each said electrode portion in a polishing machine having upper and lower parallel reference bases and polishing the surface of said flange remote from the end wall to improve the degree of parallelism of said surface in relation to said end wall.
  • Fig. 2 is a central sectional view showing an upper convergence electrode portion 1 obtained by drawing in the same manner as in Fig. 1. Part of a flange surface 1 a of the portion 1 is deformed by a height h2. In this manner, a parallelism error in the flange surface 1a occurs with respect to a plane A - A' perpendicular to the axis of each electron beam aperture 1c.
  • the flange surface 1a is polished by a portion corresponding to the height h2, and the flange surface 1a can be precisely parallel to the ideal plane.
  • the flange surface of the lower electrode half can also be polished to obtain a convergence electrode having polished surfaces as the lens formation surfaces.
  • reference numerals 4 and 5 denote bases of a commercially available polishing machine, respectively.
  • This polishing machine has a mechanism for rotating the upper and lower bases 4 and 5 while the lower and upper surfaces of the upper and lower bases 4 and 5 are keptto be parallel with high precision.
  • the upper base 4 has a mechanism forvertically moving the lower surface of the upper base 4 and the upper surface of the lower base 5 relative to each other while the upper and lower surfaces are kept parallel with high precision.
  • the upper base 4 has a compressing mechanism for compressing an electrode half toward the lower base 5.
  • the electrode half 1 is held between the upper and lower bases in the polishing machine to polish the flange surface 1a a and a bottom surface 1 b.
  • a polishing jig 6 is mounted on the lower surface of the upper base 4.
  • the polishing jig 6 has at least two (three in this embodiment) cores 6b extending vertically on a table 6a fixed on the base 4.
  • a diameter of each of the cores 6b is smaller by 0.01 mm than that of the beam aperture 1c.
  • the tolerance of the diameter of the core 6b is 0.01 mm in the same as in the beam aperture 1c.
  • the cores 6b of the polishing jig 6 are fitted in the electron beam apertures 1c, respectively.
  • the flange surface 1a deformed as shown in Fig. 2 is fixed on the base 5.
  • the upper and lower bases 4 and 5 are rotated relative to each other while a pressure of 0.3 to 0.4 kg/cm 2 is applied to the surface to be polished.
  • the polished flange surface 1a becomes precisely parallel to the ideal plane perpendicular to the axis of the electron beam aperture 1c.
  • the bottom surface 1 b is polished using the polished flange surface 1a as a reference surface, thereby obtaining a flat bottom surface 1b which is precisely parallel to the ideal plane.
  • the flange surface is polished to be perpendicular to the axis of the electron beam aperture, and then the polished flange surface is used to as the reference surface to polish the bottom surface, thereby obtaining the flat flange and bottom surfaces precisely parallel to the ideal plane perpendicular to the axis of the electron beam aperture.
  • the flange surface often need not have higher precision than that of the bottom surface. It is important to obtain the flat bottom surface precisely parallel to the ideal plane.
  • the surface of the flange remote from the end wall and optionally also the outer surface of the end wall are polished to be parallel to the ideal plane perpendicular to the axis of the electron beam aperture, thereby improving the precision of the electron gun using such an electrode.
  • the surfaces to be polished can be easily located using a jig having cores entering the electron beam apertures.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Cold Cathode And The Manufacture (AREA)

Claims (5)

1. Verfahren zum Herstellen einer Elektrode für eine Elektronenkanone einer Kathodenstrahlröhre, bei dem:
ein erster und ein zweiter Elektrodenabschnitt (1, 2) bereitgestellt werden, die jeweils versehen sind mit einer Stirnwand (1b, 2b), die jeweils dieselbe Anzahl Elektronenstrahlöffnungen (1c, 2c) besitzt, einer Seitenwand, die sich am Umfang der Stirnwand erstreckt, und einem nach außen gedrehten Flansch (1a, 2a), der sich am Umfang des freien Endes der Seitenwand in einer Ebene erstreckt, die parallel zu der Stirnwand und senkrecht zu den Achsen jedes zugehörigen Paars der Elektronenstrahlöffnungen verläuft; und
die Flansche zur Herstellung der Elektrode für die Elektronenkanone miteinander verschweißt werden;

dadurch gekennzeichnet:
daß vor dem Verschweißen jeder Elektrodenabschnitt (1, 2) in einer Poliermaschine mit einer oberen und einer unteren parallelen Bezugsbasis (4, 5) positioniert und die von der Stirnwand (1b, 2b) abgewandte Fläche des Flansches (1a, 2a) poliert wird, um die Parallelität dieser Fläche bezüglich der Stirnwand zu verbessern.
2. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß anschließend an das Polieren der Fläche des Flansches (1a, 2a) die Außenfläche der Stirnwand (1b, 2b) poliert wird, wobei die vorher polierte Flanschfläche (1a, 2a) als Bezugsfläche verwendet wird, um die gegenseitige Parallelität der Flanschfläche und der Außenfläche der Stirnwand jedes Elektrodenabschnittes (1, 2) weiter zu verbessern.
3. Verfahren nach Anspruch 1 oder 2, dadurch gekennzeichnet, daß das Positionieren jedes Elektrodenabschnittes (1, 2) in einer Poliermaschine in der Weise erfolgt, daß mindestens zwei Kerne (6b) einer Schablone in die Elektronenstrahlöffnungen (1c, 2c) eingepaßt werden, wodurch die zu polierenden Flächen senkrecht zu den Längsachsen der Elektronenstrahlöffnungen poliert werden.
4. Verfahren nach Anspruch 3, dadurch gekennzeichnet, daß die Elektronenstrahlöffnungen (1c, 2c) kreisförmig sind und jeder Kern (6b) einen Durchmesser hat, der um 0,01 mm kleiner ist als der der betreffenden Öffnung.
5. Verfahren nach einem der Ansprüche 1 bis 4, dadurch gekennzeichnet, daß der oder jeder polierschritt durch eine Relativdrehung des positionierten Elektrodenabschnittes (1, 2) und eines Polierkörpers (5) der Poliermaschine unter einem aufgebrachten Druck von 0,3 bis 0,4 kg/cm2 erfolgt.
EP85303457A 1984-05-18 1985-05-16 Elektrode für Elektronenkanone und Herstellungsverfahren Expired EP0164230B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP98691/84 1984-05-18
JP59098691A JPS60243949A (ja) 1984-05-18 1984-05-18 電子銃用電極およびその製造方法

Publications (2)

Publication Number Publication Date
EP0164230A1 EP0164230A1 (de) 1985-12-11
EP0164230B1 true EP0164230B1 (de) 1989-08-09

Family

ID=14226529

Family Applications (1)

Application Number Title Priority Date Filing Date
EP85303457A Expired EP0164230B1 (de) 1984-05-18 1985-05-16 Elektrode für Elektronenkanone und Herstellungsverfahren

Country Status (4)

Country Link
EP (1) EP0164230B1 (de)
JP (1) JPS60243949A (de)
KR (1) KR910002972B1 (de)
DE (1) DE3572252D1 (de)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4234814A (en) * 1978-09-25 1980-11-18 Rca Corporation Electron gun with astigmatic flare-reducing beam forming region

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS568461B2 (de) * 1974-01-23 1981-02-24
JPS5939856B2 (ja) * 1974-05-20 1984-09-26 日本電気株式会社 赤外線暗視装置
JPS5229164A (en) * 1975-09-01 1977-03-04 Toshiba Corp Electron gun body and its method of production
JPS5911176B2 (ja) * 1980-01-18 1984-03-14 株式会社日立製作所 電子銃用電極

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4234814A (en) * 1978-09-25 1980-11-18 Rca Corporation Electron gun with astigmatic flare-reducing beam forming region

Also Published As

Publication number Publication date
JPS60243949A (ja) 1985-12-03
DE3572252D1 (en) 1989-09-14
EP0164230A1 (de) 1985-12-11
KR850008554A (ko) 1985-12-18
KR910002972B1 (ko) 1991-05-11

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