EP0177932A2 - Aufzeichnungskopf für Flüssigkeitsstrahl - Google Patents

Aufzeichnungskopf für Flüssigkeitsstrahl Download PDF

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Publication number
EP0177932A2
EP0177932A2 EP85112737A EP85112737A EP0177932A2 EP 0177932 A2 EP0177932 A2 EP 0177932A2 EP 85112737 A EP85112737 A EP 85112737A EP 85112737 A EP85112737 A EP 85112737A EP 0177932 A2 EP0177932 A2 EP 0177932A2
Authority
EP
European Patent Office
Prior art keywords
liquid
recording head
jet recording
photosensitive resin
ejection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP85112737A
Other languages
English (en)
French (fr)
Other versions
EP0177932A3 (de
Inventor
Tadayoshi Inamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of EP0177932A2 publication Critical patent/EP0177932A2/de
Publication of EP0177932A3 publication Critical patent/EP0177932A3/de
Withdrawn legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1645Manufacturing processes thin film formation thin film formation by spincoating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1601Production of bubble jet print heads
    • B41J2/1604Production of bubble jet print heads of the edge shooter type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1607Production of print heads with piezoelectric elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1631Manufacturing processes photolithography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1632Manufacturing processes machining
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2002/14379Edge shooter

Definitions

  • This invention relates to a liquid jet recording head, and more particularly, to a liquid jet recording head for forming liquid droplets for recording used for so-called ink jet recording system.
  • Recording -heads used for liquid jet recording systems generally have fine liquid ejecting ports (orifices), liquid paths and liquid ejecting energy generating members provided at a part of liquid paths.
  • the heads thus produced by conventional methods have remarkable roughness on the inner walls in the liquid paths produced by cutting processing, and strains are formed in the liquid paths due to the difference in etching rate so that liquid paths having a constant liquid path resistance can be obtained with difficulty and the liquid ejecting characteristics of the resulting recording heads are liable to fluctuate.
  • the plate upon cutting processing, the plate is broken or crack is formed in the plate, and therefore, the production yield is low.
  • etching processing many manufacturing steps are required disadvantageously resulting in a high production cost.
  • a recording head produced by forming liquid path walls constituted of a photosensitive resin cured film on a substrate provided with liquid ejecting energy generating members and then mounting a covering member on the substrate, for example, in Japanese Patent Application Laid-open No 43876/1982 and West German Patent Application Laid-open (DOS) No. 3108206.
  • DOS West German Patent Application Laid-open
  • the recording head fabricated by utilizing a photosensitive resin is excellent in improving finished accuracy of liquid paths and production yield, and solving complexity of fabricating steps.
  • the cured film of the photosensitive resin is so soft that the hardness is not the same as that of the substrate or the lid plate and as the result, the cured film of the photosensitive resin is liable to be injured.
  • the flaw at the ejection ports adversely changes the ejection direction of liquid resulting in degradation of the recording quality.
  • the liquid path walls composed of a cured film of the. photosensitive resin is soft, sometimes the walls absorb the liquid ejecting energy (e.g. ejection pressure) generated by the liquid ejection energy generating member and therefore, the designed liquid ejection ability can not be obtained. That is, the ejection speed of liquid droplets is lowered and as the result, the ejection direction is not definite and the accuracy of impact area of liquid droplet is lowered resulting in degradation of recording image quality.
  • a liquid jet recording head which comprises an ejection port for ejecting liquid and a liquid path having said ejection port, a part of the wall constituting the liquid path being composed of a photosensitive resin cured film, and the pencil hardness of the photosensitive resin cured film is H or higher.
  • FIGS. 1 - 7 are oblique views for explaining a process for fabricating a liquid jet recording head using heat generating elements in the first example of the present invention ;
  • FIGS. 8 - 10 are oblique views for explaining a process for fabricating a liquid jet recording head using piezoelectric elements in the second example of the present invention.
  • pencil hardness of the photosensitive resin cured film is H or higher, preferably 4H or higher.
  • This range of pencil hardness serves to prevent breakage of ejection ports, and injury of the photosensitive resin cured film which occur upon cutting for forming ejection Ports, unstable ejection of liquid due to absorption of ejection energy, and the like.
  • this range of pencil hardness can miniaturize and make highly dense the head, and further, can render the handling in the fabrication steps easy.
  • the pencil hardness is determined according to JIS K 5400, 6 : 14 (3) as to the preparation of test pencils and the lead, JIS K 5401 as to the testing machine, and JIS K 6894 as to the testing method.
  • FIGS. 1 - 7 are given for explaining a preferable first example of the present invention.
  • a support 101 a blue glass plate : 50mm x 50mm x 0.7mm thick
  • heat generating element 102 a kind of an electrothermal transducer
  • the element heated the liquid in the vicinity of the element resulting in generation of a liquid ejection energy.
  • Heat generating elements 102 were connected to electrode for signal input (not shown).
  • an electrical insulating film 103 composed of SiO 2 was overlaid on the heat genrating elements.
  • the film 103 was covered with a liquid resistant film 104 composed of Ta so as to impart liquid resistance.
  • the resulting substrate was cleaned and dried, and then a photosensitive resin composition as shown in Table 1 was applied to the substrate by squeezing.
  • the resulting coating was dried at 80°C for 20 min. to evaporate completely the solvent and there was produced a photosensitive resin film layer 105 of 5opm thick as shown in FIG. 2.
  • a photomask 106 was placed on the film layer 105 by registering the photomask 106 with heat generating elements 102, followed by exposure, as shown in FIG. 3.
  • the assembly was soaked in a developing liquid (1,1,1-trichloroethane) to develop.
  • 107 and 108 denote a liquid flow path and a liquid feeding chamber, respectively.
  • the photosensitive resin layer was cured. The curing was effected by heating at 150°C for one hour and then irradiating with ultraviolet ray (5J/cm z ) to enhance the hardness of the photosensitive resin to a pencil hardness of 4H. Onto the resulting photosensitive resin cured film 105P was adhered a glass cover 109 provided with a liquid feeding port 110.
  • Adhering the glass cover 109 was carried out by diluting an epoxy type adhesive (HP-2R, 2H": tradename, manufactured by Shinko Sha Co.) with methyl ethyl ketone, applying the diluted adhesive in the thickness of 3 - 4pm by spinner coating, drying, pressing the adhesive thus dried to the surface of photosensitive resin cured film 105P, and heating for curing.
  • an epoxy type adhesive HP-2R, 2H: tradename, manufactured by Shinko Sha Co.
  • FIG. 6 shows the cover 109 bonded to the substrate having grooves formed by using the photosensitive resin cured film 105P.
  • the resulting assembly was cut along a line A - A' in FIG. 6 to optimize the distance between heat generating element 102 and liquid ejecting port 111 in liquid flow path 107, and the region to be cut here may be optionally determined.
  • a dicing method usually used in semiconductor industry was employed.
  • the hardness of the photosensitive resin cured film was as hard as 4H and, therefore, the film was not injured.
  • FIG. 7 shows the head after cutting.
  • a liquid introducing pipe (not shown) to the liquid feeding port and further, electric wiring (not shown) for applying signals to the heat generating elements, a liquid jet recording head was completed.
  • FIGS. 8 - 10 are given for explaining a preferable second example of the present invention.
  • two pieces of piezoelectric elements 202 (a kind of an electromechanical transducer) as an ejecting energy generating element were provided on a support 201 (a blue plate glass: 50mm x 50mm x 0.72mm).
  • a liquid ejecting energy was generated by mechanical vibration (or mechanical displacement) of the elements.
  • Elements 202 were connected to electrodes for signal input (not shown).
  • an electrically insulating film composed of SiO 2 for imparting electric insulating property (not shown) and a Ta film (not shown) for imparting a liquid resistance were overlaid.
  • liquid flow paths 207 and a liquid feeding chamber 208 were formed by using the same photosensitive resin composition as in Example 1 and following the procedures of Example 1.
  • the photosensitive resin layer 205 was heated at 150°C for one hour and then irradiated with ultraviolet ray (5J/cm 2 ).
  • the resulting hardness of the photosensitive resin was as high as 4H of pencil hardness.
  • a glass cover 209 having a liquid feeding port 210 was then adhered to the photosensitive resin layer.
  • the adhering procedure was effected following the procedure of Example 1 using the same adhesive as that in Example 1.
  • the resulting assembly was cut along the B -B' line as indicated in FIG. 10 to optimize the relative positions of piezoelectric element 202 and liquid ejection port 211.
  • a liquid introducing pipe (not shown) was attached to liquid feeding port 210 and an electric wiring (not shown) for giving signals to the piezoelectric element was provided to complete a liquid jet recording head.
  • Example 1 Following the procedures of Example 1 except that a photosensitive resin composition in the following Table 2 was employed in place of that in Table 1, a head of the same structure as Example 1 was produced.
  • Example 2 Following the procedure of Example 2 except that the photosensitive resin composition in Example 3 was employed, there was fabricated a liquid jet recording head. An effect similar to that of the above-mentioned example was obtained.
  • a head was fabricated in the same manner as in Example 1 except that the materials shown in Table 3 were used as a photosensitive resin composition.
  • the pencil hardness of the photosensitive resin after curing was F-grade.
  • a head was fabricated in the same manner as Example 2 except that the same photosensitive resin composition in Comparative Example 1 was used.
  • the yield at the cutting step was expressed as the proportion of the photosensitive resin at the surface of the ejection port without flaw such as crack, breakage and the like when one hundred heads respectively in accordance with the above examples and comparative examples were fabricated to form ejection ports.
  • the results are shown in Table 4.
  • the yields at the cutting step of heads where a photosensitive resin having pencil hardness of H or higher after cured was used as shown in the Examples according to the present invention were 97 - 98% which is higher than 83 - 85% in the Comparative Examples by 12 - 15%.
  • the ejection speed in the Examples of the present invention was 8.5 - 9.2 m/sec which satisfied the designed value, i.e. 9 ⁇ 1 m/sec.
  • a blue glass plate was used as the support. It should, however, be noted that the present invention is not limited to this alone, but an appropriate material such as ceramics, plastics, metals and the like may be used as the support. On the other hand, although Si0 2 was used as the electrical insulating film, an inorganic oxide or nitride such as Ta 2 O 5 , Al 2 O 3 , glass, Si 3 N 4 , BN and the like may also be used.
  • liquid resistant film a corrosion resistant metal such as Au, Pt, Pd and the like, a corrosion resistant alloy such as SUS, monel metal and the like, or an inorganic or organic material other than those, and the like may also be used in addition to Ta, which is employed in the above-described examples.
  • a corrosion resistant metal such as Au, Pt, Pd and the like
  • a corrosion resistant alloy such as SUS, monel metal and the like
  • an inorganic or organic material other than those, and the like may also be used in addition to Ta, which is employed in the above-described examples.
  • photosensitive resin composition to be used in the present invention there may be enumerated various kinds of photosensitive compositions used in the field of ordinary photo-lithography such as photosensitive resins, photo-resists, etc.
  • photosensitive resins photo-resists, etc.
  • Actual examples are: diazo-resin; p-diazo-quinone; photo-polymerization type photo-polymers using, for example, a vinyl monomer and a polymerization initiator; dimerization type photo-polymers using polyvinyl cinnamate, etc., and a sensi- tizin g agent; a mixture of o-naphthoquinone diazide and a Novolac type phenolic resin; a mixture of polyvinyl alcohol and a diazo resin; polyether type photo-polymers obtained by copolymerization of 4-glycidylethy- lene oxide with benzophenone, glycidylchalcone, or the like
  • a solid photosensitive composition in film form is also advantageous since the film thickness can be easily and precisely controlled although the photosensitive resin composition layers were formed by a squeezing method in the examples.
  • Such solid photosensitive resin composition are those photosensitive resin films manufactured and sold by Dupont de Nemour & Co. under tradenames of Permanent Photopolymer Coating "RISTON” Solder Mask 730S, Solder Mask 740S, Solder Mask 730FR, Solder Mask 740FR, and Solder Mask SM1; "KAPTON” XA-A3, XA-B3, XA-A1, XA-M3 and XA-C3; those by Hitachi Kasei-Sha under tradenames of "Photec” PHT series and SR series; those by Asahi Kasei under tradenames of "DFR" E-15, P-25, P-38 and T-50; those by Nitto Denko under trandenames of "NEOTROCK” E type . and T type; and those by Tokyo Oka "Thiokol” LAMINAR GT, LAMINAR GSI, LAMINAR TO and LAMINAR TA; etc..
  • the cover for forming liquid paths there may be used a metal, a ceramics, a photosensitive resin cured film or the like as well as a glass described above. Further, there may be utilized the bonding force of a photosensitive resin with or without a bonding agent described above in order to furnishing a glass plate on the cured film of a photosensitive resin for the purpose of forming said liquid paths.
  • the recording head of the present invention may have a structure not only that a liquid flow path and a liquid feeding chamber are provided with one ejection energy generating element but also that they are provided with plural ejection energy generating elements.
  • the liquid path includes the space which can be filled with liquid such as the above-mentioned liquid flow path, liquid chamber and the like, and liquid inlets and outlets.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Special Spraying Apparatus (AREA)
EP85112737A 1984-10-09 1985-10-08 Aufzeichnungskopf für Flüssigkeitsstrahl Withdrawn EP0177932A3 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP21055384A JPS6189852A (ja) 1984-10-09 1984-10-09 液体噴射記録ヘツド
JP210553/84 1984-10-09

Publications (2)

Publication Number Publication Date
EP0177932A2 true EP0177932A2 (de) 1986-04-16
EP0177932A3 EP0177932A3 (de) 1987-03-25

Family

ID=16591225

Family Applications (1)

Application Number Title Priority Date Filing Date
EP85112737A Withdrawn EP0177932A3 (de) 1984-10-09 1985-10-08 Aufzeichnungskopf für Flüssigkeitsstrahl

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EP (1) EP0177932A3 (de)
JP (1) JPS6189852A (de)
ES (1) ES8609036A1 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0393855A1 (de) * 1989-03-24 1990-10-24 Canon Kabushiki Kaisha Verfahren für die Herstellung von Tintenstrahl-Aufzeichnungsköpfen
US6499835B1 (en) 2001-10-30 2002-12-31 Hewlett-Packard Company Ink delivery system for an inkjet printhead

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9636430B2 (en) * 2015-09-16 2017-05-02 The Procter & Gamble Company Microfluidic delivery system and cartridge having an outer cover

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4417251A (en) * 1980-03-06 1983-11-22 Canon Kabushiki Kaisha Ink jet head
JPS58220754A (ja) * 1982-06-18 1983-12-22 Canon Inc インクジエツト記録ヘツド
JPS5919168A (ja) * 1982-07-26 1984-01-31 Canon Inc インクジエツト記録ヘツド

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0393855A1 (de) * 1989-03-24 1990-10-24 Canon Kabushiki Kaisha Verfahren für die Herstellung von Tintenstrahl-Aufzeichnungsköpfen
US5126768A (en) * 1989-03-24 1992-06-30 Canon Kabushiki Kaisha Process for producing an ink jet recording head
US6499835B1 (en) 2001-10-30 2002-12-31 Hewlett-Packard Company Ink delivery system for an inkjet printhead

Also Published As

Publication number Publication date
JPS6189852A (ja) 1986-05-08
ES8609036A1 (es) 1986-09-01
EP0177932A3 (de) 1987-03-25
ES548390A0 (es) 1986-09-01

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