Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T428/00—Stock material or miscellaneous articles
  • Y10T428/12—All metal or with adjacent metals
  • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
  • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
  • Y10T428/12576—Boride, carbide or nitride component
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T428/00—Stock material or miscellaneous articles
  • Y10T428/12—All metal or with adjacent metals
  • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
  • Y10T428/12771—Transition metal-base component
  • Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component

Definitions

• the invention relates to a wear-resistant coated hard metal body, which consists of a hard metal base body, a metallic intermediate layer and at least one metal-free hard material layer.
• the invention further relates to a method for producing this hard metal body.
• DE-OS 2 528 255 utility and decorative objects are provided with a coating, the coating of which is 0.1 to 50 ⁇ m thick and consists of hard materials, the hard materials being the carbides and / or nitrides and / or borides and / or Silicides and / or oxides of the elements of III. to VI. Periodic table group are used.
• DE-OS 2 528 255 also proposes to use one or more intermediate layers made of metals or from alloys of metals and hard materials or from hard materials to improve the adhesive strength of the hard materials or to reduce thermal stresses.
• both metallic and non-metallic substances come into question, such as. B. steels, cast materials, non-ferrous metals, light metals, hard metals, glass and ceramics.
• the composite material known from CH-PS 542 678 is produced in that the intermediate layer material is deposited on the substrate by chemical reaction from the gas phase, the substrate material and intermediate layer material diffusing into one another, and in that the cover layer is chemically reacted from the gas phase on the intermediate layer deposits, with the cover layer material and the intermediate layer material diffusing into one another.
• coated hard metal bodies which consist of a hard metal base body, a metallic intermediate layer and at least one metal-free hard material layer and which are coated by chemical reaction from the gas phase, have wear properties which are used as tools for cutting and non-cutting shaping exclude from metallic workpieces.
• Our own experiments have shown, for example, that the wear resistance of a titanium nitride layer, which is deposited on the hard metal base body from the gas phase, deteriorates due to an intermediate layer of nickel, cobalt or titanium, which is also separated from the gas phase.
• the invention is therefore based on the object of providing a wear-resistant coated hard metal body which consists of a hard metal base body, a metallic intermediate layer and at least one metal-free hard material layer and which has wear properties which enable its use as a tool for cutting and non-cutting shaping of metallic workpieces.
• the metallic intermediate layer consists of molybdenum and / or tungsten, has a thickness of 0.1 to 2 ⁇ m and is applied to the hard metal base body by a PVD process, which has a thickness during the application of the intermediate layer Has temperature of 200 to 600 ° C.
• a body designed in this way has wear properties which enable its use as a tool for the non-cutting and cutting shaping of metallic workpieces.
• the metallic intermediate layer made of molybdenum and / or tungsten is applied to the hard metal base body by direct sputtering, since in this PVD process a particularly uniform sputtering of the molybdenum and / or tungsten onto the hard metal base body is achieved.
• the properties of the intermediate layer according to the invention can advantageously be varied by replacing 0.1 to 49% by weight of the molybdenum and / or the tungsten with titanium, zirconium, hafnium, niobium and / or tantalum.
• the object on which the invention is based is also achieved by a method for producing the wear-resistant coated hard metal body, in which the metallic intermediate layer is applied to the hard metal base body by a PVD process, which is heated to a temperature of 200 to 600 ° C. during the application of the intermediate layer.
• a method for producing the wear-resistant coated hard metal body in which the metallic intermediate layer is applied to the hard metal base body by a PVD process, which is heated to a temperature of 200 to 600 ° C. during the application of the intermediate layer.
• the metallic intermediate layer is applied to the hard metal base body by direct cathode sputtering, since a particularly uniform sputtering of the intermediate layer is achieved with this PVD process.
• at least one metal-free hard material layer is applied to the metallic intermediate layer by reactive sputtering or that at least one metal-free hard material layer is applied to the metallic intermediate layer by gas phase reaction.
• the application of hard material layers by reactive sputtering or by gas phase reaction is known per se.
• hard metal base bodies were used, which were designed as indexable inserts with the geometric shape SNUN 120408 and made of hard metal M15 (together settlement in% by weight: 82.5 WC, 11 (Ti, Ta, Nb) C, 6.5 Co) passed.
• the indexable insert was first treated in a CVD system at 1020 ° C. with a gas mixture of titanium tetrachloride, methane and hydrogen. After 60 minutes the temperature was reduced to 990 ° C. and methane was replaced by nitrogen. After a total of 180 minutes, the oven heating was turned off and the insert was cooled in flowing hydrogen. A metallographic cut showed that a hard material double layer of titanium carbide and titanium nitride with a total thickness of 7.5 ⁇ m had formed on the carbide insert.
• a layer of titanium nitride was formed at a temperature of 350 ° C. on the indexable insert by reactive sputtering of a titanium target (cathode) in a gas atmosphere composed of 10% by volume nitrogen and 90% by volume argon and a pressure of 1 Pascal deposited to a thickness of 7.2 microns.
• a 0.6 ⁇ m thick intermediate layer made of nickel was produced on an indexable insert by direct sputtering of a nickel target in an argon atmosphere, the indexable insert having a temperature of approximately 400 ° C.
• a titanium nitride layer was then applied to the intermediate nickel layer in the manner described in Example 2.
• An intermediate molybdenum layer with a thickness of 0.6 ⁇ m was deposited on the indexable insert by sputtering a target made of molybdenum in an argon atmosphere.
• the indexable insert had a temperature of approximately 400 ° C. during the deposition of the molybdenum intermediate layer.
• a titanium nitride hard material layer was then applied to the intermediate molybdenum layer in the manner described in Example 2.
• the indexable inserts were examined by metallographic methods, the layer thicknesses being measured and the bond between the base bodies and the layers being qualitatively assessed. With the help of the scratch test, in which a diamond cone tip is drawn over the layer with increasing contact load, a quantitative measure of the adhesive strength, the so-called critical load, could be determined. Finally, the edge retention of the coated indexable inserts was determined on a test lathe by machining a C60 steel shaft. The results of the tests are given in Table 1. The indexable insert coated according to Example 1 after the CVD process reached a critical load of 4.5 kg in the scratch test. In the machining test, a crater depth of 25 ⁇ m and a wear mark width of 0.15 mm were found after a turning time of 12 minutes.
• the indexable insert coated according to Example 2 showed a critical load of only 2.5 kg.
• the lower layer adhesive strength had an impact due to a higher crater wear and a larger wear mark width.
• the indexable insert coated according to Example 2 became coated flaking observed.
• the indexable insert according to Example 3 showed so much scour wear after a turning time of only 2 minutes that the machining test was terminated.
• the indexable insert according to the invention according to Example 4 had a high critical load and thus also a high adhesive strength of the hard material layer. With regard to the wear parameters, this insert was. superior to the reference plate according to Example 1.
• An indexable insert was coated by direct sputtering with a molybdenum intermediate layer and then by reactive sputtering with a 2 ⁇ m thick aluminum oxide layer.
• the temperature of the hard metal base body was approximately 400 ° C. during the two coating processes.
• the critical load of the indexable insert coated in this way was determined to be 6 kg. In the absence of the molybdenum intermediate layer, the critical load was 1.5 kg.
• An indexable insert was made with an intermediate layer under the conditions mentioned in Example 4 a molybdenum alloy consisting of 0.07% zircon, 0.5% titanium and the rest of molybdenum. This intermediate layer also gave the subsequently applied titanium nitride hard material layer good adhesive strength and good wear properties.
• PVD process Physical Vapor Deposition Process
• Process for coating substrates the coating being brought about by physical methods. Evaporation, sputtering, sputtering, etc. are considered physical methods.
• carbides include carbides, nitrides, borides, silicides and oxides, which are particularly hard and have a high melting point, e.g. Titanium carbide, titanium nitride, titanium carbonitride, aluminum oxide, zirconium oxide, boron carbide, silicon carbide, titanium diboride.
• the hard metals consist of a binder metal phase, which is composed of iron, cobalt and / or nickel, and of a hard material phase, which preferably contains hard carbides of tungsten, titanium, niobium and / or tantalum. Hard metals are used today
• a planar, circular or rectangular target plate is located in a vacuum vessel containing argon and in which there is a pressure of approx. 10 -2 mbar.
• the substrates to be coated are positioned on a plate at a distance of a few cm from the target.
• An electrical field between the target and the substrate plate causes partial ionization of the gas contained in the vacuum vessel.
• a strong pot magnet is attached behind the target plate, the field lines of which force the free electrons of the plasma in front of the target on circular or spiral paths, the planes of the electron paths being approximately parallel to the target plate. Due to the circular orbits of the electrons, the ionization density is increased significantly and one can work at relatively low gas pressures.
• the target is atomized by the positive argon ions accelerated by the electric field.
• the dusted atoms or groups of atoms hit the substrate with a relatively large amount of energy.
• a molybdenum intermediate layer is produced, for example, by sputtering a molybdenum target, while an argon-nitrogen mixture containing about 5% nitrogen is used to deposit titanium nitride.
• the titanium dusted from the titanium target reacts with the nitrogen to form titanium nitride, which forms a titanium nitride hard material layer on the substrate.

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• Chemical & Material Sciences (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Engineering & Computer Science (AREA)
• Materials Engineering (AREA)
• Mechanical Engineering (AREA)
• Metallurgy (AREA)
• Organic Chemistry (AREA)
• Physical Vapour Deposition (AREA)
• Powder Metallurgy (AREA)
• Chemical Vapour Deposition (AREA)

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• 1985
  • 1985-05-03 DE DE19853515919 patent/DE3515919A1/de active Granted
• 1986
  • 1986-03-04 US US06/835,985 patent/US4728579A/en not_active Expired - Fee Related
  • 1986-03-11 IN IN179/CAL/86A patent/IN165323B/en unknown
  • 1986-04-15 EP EP86105195A patent/EP0200088B1/fr not_active Expired
  • 1986-05-02 JP JP61101255A patent/JPS61264171A/ja active Granted
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