EP0250940B1 - Procédé d'assemblage étanche de deux parties d'enceinte métalliques - Google Patents
Procédé d'assemblage étanche de deux parties d'enceinte métalliques Download PDFInfo
- Publication number
- EP0250940B1 EP0250940B1 EP87108254A EP87108254A EP0250940B1 EP 0250940 B1 EP0250940 B1 EP 0250940B1 EP 87108254 A EP87108254 A EP 87108254A EP 87108254 A EP87108254 A EP 87108254A EP 0250940 B1 EP0250940 B1 EP 0250940B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- housing parts
- metal
- vacuum chamber
- vacuum
- window
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
- H01J9/26—Sealing together parts of vessels
- H01J9/263—Sealing together parts of vessels specially adapted for cathode-ray tubes
Definitions
- the present invention relates to a method according to the preamble of patent claim 1.
- the vacuum sealing technology in the production of image intensifier wafer tubes takes place in a high vacuum chamber after the individual components of the tube, such as fluorescent screen, microchannel plate, cathode carrier etc. are connected to one another in this high vacuum chamber by soldering or cold pressing with indium as solder.
- the soldered connection has the disadvantage that when the system is released, gases released can also degrade the vacuum in the wafer tube itself. If temperatures are used which are so low that the indium does not melt, very long processing times are required without being able to ensure that sufficient degassing has taken place. If you use higher temperatures, e.g. B. up to 400 ° C, at which the indium solder melts, alloys can occur which lead to a change in the structure, which in turn make difficulties in the subsequent cold pressing.
- the present invention is based on the object of specifying a novel connection technique for a vacuum-tight closure of the housing parts, in particular a wafer image intensifier tube, which allows high degassing temperatures to be used and leads to tubes with an improved service life.
- a major advantage of the invention is therein. seen that the risk of contamination within the finished tube by residual gases is largely reduced and on the other hand a secure and permanent closure is ensured.
- the figure shows schematically a half of a substantially rotationally symmetrical wafer picture tube 9 with an input disk 10, on the inner surface 13 of which the photocathode is located and with a fiber optic output window 11, on the inner surface of which there is a phosphor layer 12.
- a microchannel plate 14 is arranged as a secondary electron amplifier.
- the individual components, in particular the input and output windows 10 and 11, are connected to flange-like housing parts 7 and 8 made of metal, in particular by soldering or fusing.
- the flange-like housing parts are then connected to one another within a vacuum chamber in the manner described above. Only one window 6 of the vacuum chamber is shown.
- the housing parts are connected after a system bake-out temperature treatment that is up to over 400 ° C.
- the tube housing which is not yet vacuum-tight, is already in the vacuum chamber.
- the microchannel plate and the entrance and exit windows are already connected to the individual metal housing parts.
- the annular flange-like metal housing parts 7 and 8 preferably consist of an iron-nickel-cobalt compound.
- a thin gold or copper ring 4 is inserted between the surfaces of the flanges 7, 8.
- Correspondingly shaped plungers 3 and counter bearings 2 are also located in the vacuum chamber, which serve to exert greater pressure on the two flange parts 7 and 8.
- the two flange parts are firmly pressed together by this pressure.
- the interposed ductile metal parts 4 made of gold or copper deform in the process and result in a type of cold-soldered connection. The dimensions of the tube are largely fixed and sealed.
- the tube placed on a rotating device 5 is now further rotated within the vacuum chamber in the presence of a vacuum.
- a laser 1 located outside the vacuum chamber generates a laser beam 15, which is deflected and focused on the seam of the cold-pressed flange 7, 8 by means of collecting optics 16.
- the material of the two flange parts 7 and 8 is welded together on the circumference.
- the intensity of the laser beam and the speed of rotation of the turntable 5 are coordinated accordingly.
- the cross section of the laser beam 15 is selected in the plane of the window 6 inserted in a vacuum-tight manner in the wall of the vacuum chamber so that the thermal surface loading cannot lead to any damage to the flange 6. at a laser beam focal length of e.g. B. 150 to 200 mm focal length due to the existing beam at the window 6 a warming up of this disc is not yet taking place.
- a laser beam focal length e.g. B. 150 to 200 mm focal length due to the existing beam at the window 6 a warming up of this disc is not yet taking place.
- metal evaporation can occur.
- this metal evaporation cannot get into the interior of the wafer image intensifier tube as a result of the cold pressing that has already taken place.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
Claims (9)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19863620585 DE3620585A1 (de) | 1986-06-19 | 1986-06-19 | Verfahren zum vakuumdichten verbinden zweier metallener gehaeuseteile |
| DE3620585 | 1986-06-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0250940A1 EP0250940A1 (fr) | 1988-01-07 |
| EP0250940B1 true EP0250940B1 (fr) | 1990-03-28 |
Family
ID=6303281
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP87108254A Expired - Lifetime EP0250940B1 (fr) | 1986-06-19 | 1987-06-06 | Procédé d'assemblage étanche de deux parties d'enceinte métalliques |
Country Status (2)
| Country | Link |
|---|---|
| EP (1) | EP0250940B1 (fr) |
| DE (2) | DE3620585A1 (fr) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5422456A (en) * | 1993-08-31 | 1995-06-06 | Dahm; Jonathan S. | Orbital head laser welder |
| DE19806321A1 (de) * | 1998-02-06 | 1999-08-19 | Samsung Display Devices Co Ltd | Verfahren und Vorrichtung zum Verbinden von Befestigungselementen am Maskenrahmen von Bildröhren |
| DE102011107708B4 (de) | 2011-07-14 | 2025-02-27 | Evobeam GmbH | Laserstrahlschweißvorrichtung |
| DE102018210773A1 (de) * | 2018-06-29 | 2020-01-02 | Robert Bosch Gmbh | Herstellungsverfahren eines Gehäuses für eine Elektronik |
| CN114346436B (zh) * | 2022-01-17 | 2022-10-04 | 浙江精匠智能科技有限公司 | 保温杯抽真空设备及其使用方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1143535A (fr) * | 1965-02-23 | |||
| US4423351A (en) * | 1980-05-06 | 1983-12-27 | Tokyo Shibaura Denki Kabushiki Kaisha | Vacuum container of radiation image multiplier tube and method of manufacturing the same |
-
1986
- 1986-06-19 DE DE19863620585 patent/DE3620585A1/de not_active Withdrawn
-
1987
- 1987-06-06 EP EP87108254A patent/EP0250940B1/fr not_active Expired - Lifetime
- 1987-06-06 DE DE8787108254T patent/DE3762076D1/de not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP0250940A1 (fr) | 1988-01-07 |
| DE3620585A1 (de) | 1987-12-23 |
| DE3762076D1 (de) | 1990-05-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
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| STAA | Information on the status of an ep patent application or granted ep patent |
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