EP0321759A2 - Electromagnetic shock waves source - Google Patents

Electromagnetic shock waves source Download PDF

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Publication number
EP0321759A2
EP0321759A2 EP88120217A EP88120217A EP0321759A2 EP 0321759 A2 EP0321759 A2 EP 0321759A2 EP 88120217 A EP88120217 A EP 88120217A EP 88120217 A EP88120217 A EP 88120217A EP 0321759 A2 EP0321759 A2 EP 0321759A2
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EP
European Patent Office
Prior art keywords
membrane
shock wave
wave source
insulation film
copper
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP88120217A
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German (de)
French (fr)
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EP0321759B1 (en
EP0321759A3 (en
Inventor
Josef Dipl.-Ing. Katona
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Dornier Medizintechnik GmbH
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Dornier Medizintechnik GmbH
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Publication of EP0321759A3 publication Critical patent/EP0321759A3/en
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    • G—PHYSICS
    • G10—MUSICAL INSTRUMENTS; ACOUSTICS
    • G10K—SOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
    • G10K9/00—Devices in which sound is produced by vibrating a diaphragm or analogous element, e.g. fog horns, vehicle hooters or buzzers
    • G10K9/12—Devices in which sound is produced by vibrating a diaphragm or analogous element, e.g. fog horns, vehicle hooters or buzzers electrically operated

Definitions

  • the invention relates to an electromagnetic shock wave source according to the preamble of claim 1.
  • Electromagnetic shock wave generation is used, among other things, in extracorporeal stone crushing (DE 33 28 066 A) and is also suitable for other therapeutic methods in which shock waves are used.
  • shock tube The construction of a so-called shock tube is described in the magazine "Akustician Beihefte", 1962, Issue 1, pages 158 to 202.
  • a copper membrane is located in front of a flat coil, separated by an insulating film.
  • a tube filled with water connects to this copper membrane.
  • a voltage in the range of 2 - 20 kV By applying a voltage in the range of 2 - 20 kV to the flat coil, a magnetic field is induced in the copper membrane, which causes repulsive forces that push the membrane away from the coil. This creates a flat pressure pulse that becomes a steep shock wave in the water-filled pipe and is available for experiments at the end of the pipe.
  • Such a shock tube is used, for example, for chemical substance tests.
  • the object of the invention is to improve such a shock wave source in such a way that efficiency and service life are increased.
  • the invention has the following advantages: - Efficiency losses due to an earthed copper membrane are avoided. The heating of the overall system is reduced due to the improved efficiency. - The skin effect no longer has a limiting effect on the entire thickness of the highly conductive membrane, as shown in FIG. 2. Nevertheless, several membranes can now be placed one behind the other, the total thickness of which is greater than that of a single membrane. - The potential distribution between the coil and the grounded, final metal membrane becomes more favorable because the membranes in between are isolated from the final metal membrane and therefore assume a certain, lower potential when a high voltage is applied. This increases the lifespan, because the lifespan of the system is determined by the dielectric strength of the insulation layer between the wire coil and the membrane.
  • the insulation layer is subjected to less electrical stress, which means that the service life increases.
  • the highly conductive membrane can be placed directly on the coil, provided the insulation layer between its and the final membrane is made of it is laid. This results in a further improvement in the coupling of the membrane to the wire coil, since the stray field is minimized. - Reduction of eddy current losses.
  • the preferred metals used are stainless steel for the high-strength membrane and copper or silver for the highly conductive membranes.
  • Preferred dimensions are: Noble jet membrane: 0.1 - 0.2 mm Copper membrane: 0.05 - 0.2 mm Insulation film: 0.025 - 0.125 mm
  • any number of combinations are possible in the number and thickness of the insulating foils or the metal membranes. However, a total thickness of up to 1 mm should not be exceeded.
  • the shock wave source according to the invention here consists of a basic body 1, a wire coil 2, an insulation film 3, a copper membrane 4, a further insulation film 5, a second copper membrane 6, a further insulation lation film 7 and a stainless steel membrane 8, which is grounded. Designs with more than two highly conductive metal foils 4, 6 are possible, but not shown.
  • the individual layers are connected to one another in a conventional manner, for example by gluing.
  • the figure shows the shock wave source on a greatly enlarged scale. A total thickness of up to 1.0 mm is realistic.
  • the potential curve U during the application of a high voltage is shown in the lower part of the figure.
  • the coil 2 is at the high potential U0.
  • the stainless steel membrane 8 is at earth potential.
  • the copper membranes 4 and 6 are each at potentials that lie between the value U0 and 0. Within the insulating foils 3, 5 and 7, the potential U falls from the higher value to a lower one.
  • FIG. 2 shows the current density distribution in a 0.2 mm thick copper membrane and the current density distribution in two 0.1 mm thick copper membranes, which are separated by an insulation film. Due to the skin effect, the current density at high frequencies is not evenly distributed over the conductor cross-section. The maximum penetration depth at the frequency used is approx. 0.2 mm.
  • the distribution of the current density is shown schematically in FIG. 2. As can be seen from this, the integral over the current density is larger when using two membranes. This increases the repulsive forces and the amplitude of the pressure pulse generated. In the case of well-conductive membranes whose thicknesses are greater than 0.4 mm, the current density is zero in the inner region. This is not the case with a layered membrane. The distribution of the current density is similar in every membrane.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Acoustics & Sound (AREA)
  • Multimedia (AREA)
  • Surgical Instruments (AREA)
  • Building Environments (AREA)

Abstract

Elektromagnetische Stosswellenquelle mit einem Grundkörper (1) und einer Drahtspule (2), bei der mehrere, voneinander isoliert angeordnete Metallmembranen (4, 6, 8) verwendet werden.Electromagnetic shock wave source with a base body (1) and a wire coil (2), in which several metal membranes (4, 6, 8) arranged in isolation from each other are used.

Description

Die Erfindung betrifft eine elektromagnetische Stosswellen­quelle nach dem Oberbegriff des Anspruch 1.The invention relates to an electromagnetic shock wave source according to the preamble of claim 1.

Die elektromagnetische Stosswellenerzeugung (EMSE) wird unter anderem bei der extrakorporalen Steinzerkleinerung eingesetzt (DE 33 28 066 A) und ist auch für andere thera­peutische Verfahren geeignet, bei denen Stosswellen ver­wendet werden.Electromagnetic shock wave generation (EMSE) is used, among other things, in extracorporeal stone crushing (DE 33 28 066 A) and is also suitable for other therapeutic methods in which shock waves are used.

In der Zeitschrift "Akustische Beihefte", 1962, Heft 1, Seiten 158 bis 202, ist der Aufbau eines sogenannten Stoss­wellenrohres beschrieben. Vor einer Flachspule, durch eine Isolierfolie getrennt, befindet sich eine Kupfermembran. An dieser Kupfermembran schliesst ein mit Wasser gefülltes Rohr an. Durch Anlegen einer Spannung im Bereich von 2 - 20 kV an die Flachspule wird in der Kupfermembran ein Magnetfeld induziert, welches Abstosskräfte bewirkt, die die Membran von der Spule wegdrücken. Hierdurch entsteht ein ebener Druckpuls, der im wassergefüllten Rohr zu einer steilen Stosswelle wird und am Rohrende für Experimente zur Ver­fügung steht. Eingesetzt wird ein solches Stosswellenrohr zum Beispiel zu Stoffuntersuchungen in der Chemie.The construction of a so-called shock tube is described in the magazine "Akustische Beihefte", 1962, Issue 1, pages 158 to 202. A copper membrane is located in front of a flat coil, separated by an insulating film. A tube filled with water connects to this copper membrane. By applying a voltage in the range of 2 - 20 kV to the flat coil, a magnetic field is induced in the copper membrane, which causes repulsive forces that push the membrane away from the coil. This creates a flat pressure pulse that becomes a steep shock wave in the water-filled pipe and is available for experiments at the end of the pipe. Such a shock tube is used, for example, for chemical substance tests.

Aufgabe der Erfindung ist es, eine solche Stosswellenquelle dahingehend zu verbessern, dass Wirkungsgrad und Lebensdauer erhöht werden.The object of the invention is to improve such a shock wave source in such a way that efficiency and service life are increased.

Diese Aufgabe wird erfindungsgemäß gelöst von einer Stoss­wellenquelle mit den Merkmalen des Anspruchs 1. Ausführungen der Erfindung sind Gegenstände von Unteran­sprüchen.This object is achieved according to the invention by a shock wave source with the features of claim 1. Embodiments of the invention are the subject of subclaims.

Die Erfindung hat folgende Vorteile:
- Wirkungsgradverluste durch eine geerdete Kupfermembran werden vermieden. Die Erwärmung des Gesamtsystems wird wegen des verbesserten Wirkungsgrades verringert.
- Der Skineffekt wirkt sich nicht mehr begrenzend auf die gesamte Dicke der gut leitfähigen Membran aus, wie an­hand von Figur 2 gezeigt ist. Dennoch können nun mehrere Membranen hintereinander gesetzt werden, deren Gesamt­dicke größer ist als die einer einzelnen Membran.
- Die Potentialaufteilung zwischen Spule und der geerdeten abschliessenden Metallmembran wird günstiger, da die zwischenliegenden Membranen gegen die abschliessende Metallmembran isoliert sind und deshalb beim Anlegen einer hohen Spannung ein bestimmtes, niedrigeres Potential annehmen. Dies erhöht die Lebensdauer, denn die Lebensdauer des Systems ist bestimmt durch die Durchschlagfestigkeit der Isolationsschicht zwischen Drahtspule und Membran. Aufgrund der günstigeren Poten­tialaufteilung wird die Isolationsschicht elektrisch weniger stark beansprucht, das heisst die Lebensdauer erhöht sich.
- Die gut leitfähigen Membrane können direkt auf die Spule aufgelegt werden, sofern die Isolationsschicht zwischen ihren und der abschliessenden Membran entsprechend aus­ gelegt ist. Hieraus folgt eine weitere Verbesserung der Ankopplung der Membran an die Drahtspule, da das Streu­feld minimiert wird.
- Verringerung der Wirbelstromverluste.The invention has the following advantages:
- Efficiency losses due to an earthed copper membrane are avoided. The heating of the overall system is reduced due to the improved efficiency.
- The skin effect no longer has a limiting effect on the entire thickness of the highly conductive membrane, as shown in FIG. 2. Nevertheless, several membranes can now be placed one behind the other, the total thickness of which is greater than that of a single membrane.
- The potential distribution between the coil and the grounded, final metal membrane becomes more favorable because the membranes in between are isolated from the final metal membrane and therefore assume a certain, lower potential when a high voltage is applied. This increases the lifespan, because the lifespan of the system is determined by the dielectric strength of the insulation layer between the wire coil and the membrane. Due to the more favorable potential distribution, the insulation layer is subjected to less electrical stress, which means that the service life increases.
- The highly conductive membrane can be placed directly on the coil, provided the insulation layer between its and the final membrane is made of it is laid. This results in a further improvement in the coupling of the membrane to the wire coil, since the stray field is minimized.
- Reduction of eddy current losses.

Als bevorzugte Metalle werden für die hochfeste Membran Edelstahl und für die gut leitfähigen Membranen Kupfer oder Silber verwendet.The preferred metals used are stainless steel for the high-strength membrane and copper or silver for the highly conductive membranes.

Bevorzugte Dimensionen sind: Edelstrahlmembran: 0,1 - 0,2 mm Kupfermembran: 0,05 - 0,2 mm Isolationsfolie: 0,025 - 0,125 mm Preferred dimensions are: Noble jet membrane: 0.1 - 0.2 mm Copper membrane: 0.05 - 0.2 mm Insulation film: 0.025 - 0.125 mm

In der Anzahl und Dicke der Isolationsfolien oder der Metallmembranen sind beliebige Kombinationen möglich. Allerdings sollte eine Gesamtdicke von bis zu 1 mm nicht überschritten werden.Any number of combinations are possible in the number and thickness of the insulating foils or the metal membranes. However, a total thickness of up to 1 mm should not be exceeded.

Die Erfindung wird anhand zweier Figuren näher erläutert.

  • Figur 1 zeigt eine erfindungsgemässe Stosswellenquelle,
  • Figur 2 zeigt den Stromdichteverlauf in verschiedenen Membranen.
The invention is explained in more detail with reference to two figures.
  • FIG. 1 shows a shock wave source according to the invention,
  • Figure 2 shows the current density profile in different membranes.

Die Figur 1 zeigt in ihrer oberen Hälfte den Aufbau einer bevorzugten Ausführungsform einer erfindungsgemässen Stoss­wellenquelle und in ihrer unteren Hälfte den Potentialver­lauf beim Anlegen einer hohen Spannung an die Spule.
Die erfindungsgemässe Stosswellenquelle besteht hier aus einem Grundköprer 1, einer Drahtspule 2, einer Isolations­folie 3, einer Kupfermembran 4, einer weiteren Isolations­folie 5, einer zweiten Kupfermembran 6, einer weiteren Iso­ lationsfolie 7 und eine Edelstahlmembran 8, die geerdet ist. Möglich, aber nicht gezeigt, sind Ausführungen mit mehr als zwei gut leitenden Metallfolien 4, 6. Die einzelnen Schich­ten sind auf konventionelle Weise, zum Beispiel durch Kleben, miteinander verbunden.
Die Figur zeigt die Stosswellenquelle in stark vergrössertem Maßstab. Realistisch ist eine Gesamtdicke bis zu 1,0 mm. Im unteren Teil der Figur ist der Potentialverlauf U während des Anlegens einer hohen Spannung gezeigt. Die Spule 2 liegt auf dem hohen Potential U₀. Die Edelstahlmembran 8 liegt auf Erdpotential.
Die Kupfermembranen 4 und 6 liegen jeweils auf Potentialen, die zwischen dem Wert U₀ und 0 liegen. Innerhalb der Iso­lationsfolien 3, 5 und 7 fällt das Potential U jeweils vom höheren Wert auf einen niedrigeren.1 shows in its upper half the structure of a preferred embodiment of a shock wave source according to the invention and in its lower half the potential curve when a high voltage is applied to the coil.
The shock wave source according to the invention here consists of a basic body 1, a wire coil 2, an insulation film 3, a copper membrane 4, a further insulation film 5, a second copper membrane 6, a further insulation lation film 7 and a stainless steel membrane 8, which is grounded. Designs with more than two highly conductive metal foils 4, 6 are possible, but not shown. The individual layers are connected to one another in a conventional manner, for example by gluing.
The figure shows the shock wave source on a greatly enlarged scale. A total thickness of up to 1.0 mm is realistic. The potential curve U during the application of a high voltage is shown in the lower part of the figure. The coil 2 is at the high potential U₀. The stainless steel membrane 8 is at earth potential.
The copper membranes 4 and 6 are each at potentials that lie between the value U₀ and 0. Within the insulating foils 3, 5 and 7, the potential U falls from the higher value to a lower one.

Figur 2 zeigt oben die Stromdichteverteilung in einer 0,2 mm dicken Kupfermembran und unten die Stromdichteverteilung in zwei 0,1 mm dicken Kupfermembranen, die von einer Isola­tionsfolie getrennt sind. Aufgrund des Skineffektes verteilt sich die Stromdichte bei hohen Frequenzen nicht gleichmässig über den Leiterquerschnitt. Die maximale Eindringtiefe bei der verwendeten Frequenz beträgt ca. 0,2 mm. Die Verteilung der Stromdichte ist schematisch in der Figur 2 gezeigt. Wie daraus ersichtlich wird, ist das Integral über die Stromdichte bei Verwendung zweier Membranen grösser. Damit erhöhen sich die Abstossungskräfte und die Amplitude des erzeugten Druckimpules.
Bei gut leitfähigen Membranen, deren Dicken grösser als 0,4 mm sind, ist im inneren Bereich die Stromdichte Null. Bei einer geschichteten Membran ist dies nicht der Fall. Die Verteilung der Stromdichte ist in jeder Membran ähnlich.FIG. 2 shows the current density distribution in a 0.2 mm thick copper membrane and the current density distribution in two 0.1 mm thick copper membranes, which are separated by an insulation film. Due to the skin effect, the current density at high frequencies is not evenly distributed over the conductor cross-section. The maximum penetration depth at the frequency used is approx. 0.2 mm. The distribution of the current density is shown schematically in FIG. 2. As can be seen from this, the integral over the current density is larger when using two membranes. This increases the repulsive forces and the amplitude of the pressure pulse generated.
In the case of well-conductive membranes whose thicknesses are greater than 0.4 mm, the current density is zero in the inner region. This is not the case with a layered membrane. The distribution of the current density is similar in every membrane.

Claims (5)

1. Stosswellenquelle mit einem Grundkörper (1), mindestens einer Drahtspule (2), einer Isolationsfolie (3) und einer Metallmembran (8), gekennzeichnet durch mindestens eine gut leitfähige weitere Metall­membran (4, 6), die durch mindestens eine Isolations­folie (5, 7) von der ersten Metallmembran (8) getrennt ist.1. shock wave source with a base body (1), at least one wire coil (2), an insulation film (3) and a metal membrane (8), characterized by at least one highly conductive further metal membrane (4, 6), which is provided by at least one insulation film (5 , 7) is separated from the first metal membrane (8). 2. Stosswellenquelle nach Anspruch 1, gekennzeichnet durch eine hochfeste Membran (8), die von einer Isolations­folie (7) von den anderen Metallmembranen (4, 6) ge­trennt ist.2. Shock wave source according to claim 1, characterized by a high-strength membrane (8) which is separated from the other metal membranes (4, 6) by an insulation film (7). 3. Vorrichtung nach Anspruch 1 oder Anspruch 2, dadurch gekennzeichnet, dass die gut leitfähigen Metallmembranen (4, 6) aus Kupfer oder Silber bestehen.3. Device according to claim 1 or claim 2, characterized in that the highly conductive metal membranes (4, 6) consist of copper or silver. 4. Stosswellenquelle nach mindestens einem der vorhergehen­den Ansprüche, dadurch gekennzeichnet, dass die hoch­feste Membran (8) aus Edelstahl besteht.4. Shock wave source according to at least one of the preceding claims, characterized in that the high-strength membrane (8) consists of stainless steel. 5. Stosswellenquelle nach mindestens einem der vorhergehen­den Ansprüche, gekennzeichnet durch folgende Materialien und Dicken: - Edelstrahlmembran: 0,1 bis 0,2 mm - Isolationsfolie: 0,025 bis 0,125 mm - Kupfermembran: 0,05 bis 0,2 mm.
5. Shock wave source according to at least one of the preceding claims, characterized by the following materials and thicknesses: - Noble jet membrane: 0.1 to 0.2 mm - insulation film: 0.025 to 0.125 mm - copper membrane: 0.05 to 0.2 mm.
EP88120217A 1987-12-23 1988-12-03 Electromagnetic shock waves source Expired - Lifetime EP0321759B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19873743822 DE3743822A1 (en) 1987-12-23 1987-12-23 ELECTROMAGNETIC SHAFT SOURCE
DE3743822 1987-12-23

Publications (3)

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EP0321759A2 true EP0321759A2 (en) 1989-06-28
EP0321759A3 EP0321759A3 (en) 1989-10-04
EP0321759B1 EP0321759B1 (en) 1994-06-01

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EP88120217A Expired - Lifetime EP0321759B1 (en) 1987-12-23 1988-12-03 Electromagnetic shock waves source

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US (1) US4924858A (en)
EP (1) EP0321759B1 (en)
JP (1) JPH0741043B2 (en)
DE (1) DE3743822A1 (en)
ES (1) ES2056880T3 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4201139A1 (en) * 1992-01-17 1993-07-22 Siemens Ag ELECTROMAGNETIC ACOUSTIC PRESSURE PULSE SOURCE WITH ELECTRICALLY CONDUCTIVE MEMBRANES
DE4228963A1 (en) * 1992-08-31 1994-03-03 Siemens Ag Pressure impulse source - has cavitation-proof coated membrane limiting fluid, acoustic spreading medium

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DE3907605C2 (en) * 1989-03-09 1996-04-04 Dornier Medizintechnik Shock wave source
US5233972A (en) * 1990-09-27 1993-08-10 Siemens Aktiengesellschaft Shockwave source for acoustic shockwaves
DE4130796A1 (en) * 1990-09-27 1992-04-02 Siemens Ag ELECTRICALLY DRIVABLE SHOCK WAVE SOURCE
DE4041063A1 (en) * 1990-12-20 1992-06-25 Siemens Ag Removal of artificial joints - with focussed ultrasonic head to loosen cement around joint support
DE4125088C1 (en) * 1991-07-29 1992-06-11 Siemens Ag, 8000 Muenchen, De
US7189209B1 (en) * 1996-03-29 2007-03-13 Sanuwave, Inc. Method for using acoustic shock waves in the treatment of a diabetic foot ulcer or a pressure sore
US6390995B1 (en) 1997-02-12 2002-05-21 Healthtronics Surgical Services, Inc. Method for using acoustic shock waves in the treatment of medical conditions
DE10160595A1 (en) * 2001-12-10 2003-06-26 Dornier Medtech Holding Int Gmbh Electromagnetic shock or pressure wave source
DE102004013573B3 (en) * 2004-03-19 2005-09-01 Dornier Medtech Systems Gmbh Production of a traction impulse between electrically conducting structures comprises preparing the structures insulated from each other and lying next to each other, producing a magnetic field and switching off the magnetic field
DE102004036526B4 (en) * 2004-07-28 2008-06-05 Dornier Medtech Systems Gmbh Shock wave source and shock wave treatment device
US7925040B2 (en) * 2005-06-07 2011-04-12 Nidec Pigeon Corporation Speaker
CN1878427A (en) * 2005-06-07 2006-12-13 日本电产鸽株式会社 Speaker
US9997189B2 (en) * 2016-11-07 2018-06-12 Seagate Technology Llc Three dimensional electric field data storage device utilizing shockwaves and a light source
US10056146B2 (en) 2016-11-07 2018-08-21 Seagate Technology Llc Electric field storage device
US20220072326A1 (en) * 2020-09-10 2022-03-10 Moshe Ein-Gal Combined pulsed electromagnetic field and low intensity shockwave system and method

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Publication number Priority date Publication date Assignee Title
DE3447440A1 (en) * 1984-12-27 1986-07-03 Siemens AG, 1000 Berlin und 8000 München SHOCK SHAFT PIPE FOR THE CRUSHING OF CONCRETE
DE3505894A1 (en) * 1985-02-20 1986-08-21 Siemens AG, 1000 Berlin und 8000 München Shock wave tube with coil and diaphragm
EP0212352B1 (en) * 1985-08-09 1989-09-27 Siemens Aktiengesellschaft Ultrasonic generator
EP0256203A1 (en) * 1986-06-05 1988-02-24 Siemens Aktiengesellschaft Shock wave generator for the disintegration of concretions in a living body by non-contacting means
US4796608A (en) * 1986-06-16 1989-01-10 Siemens Aktiengesellschaft Shock wave generator for an apparatus for non-contacting disintegration of calculi in the body of a life form
DE8627238U1 (en) * 1986-10-06 1988-02-04 Siemens AG, 1000 Berlin und 8000 München Shock wave source
EP0278304A1 (en) * 1987-02-04 1988-08-17 Siemens Aktiengesellschaft Lithotripter with an integrated positioning device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4201139A1 (en) * 1992-01-17 1993-07-22 Siemens Ag ELECTROMAGNETIC ACOUSTIC PRESSURE PULSE SOURCE WITH ELECTRICALLY CONDUCTIVE MEMBRANES
DE4228963A1 (en) * 1992-08-31 1994-03-03 Siemens Ag Pressure impulse source - has cavitation-proof coated membrane limiting fluid, acoustic spreading medium
DE4228963C2 (en) * 1992-08-31 1998-10-22 Siemens Ag Pressure pulse source with a cavitation-resistant coated membrane

Also Published As

Publication number Publication date
US4924858A (en) 1990-05-15
JPH01280451A (en) 1989-11-10
EP0321759B1 (en) 1994-06-01
DE3743822C2 (en) 1989-10-12
JPH0741043B2 (en) 1995-05-10
ES2056880T3 (en) 1994-10-16
EP0321759A3 (en) 1989-10-04
DE3743822A1 (en) 1989-07-13

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