EP0429501A1 - Dispositif de traitement plasmique par anode - Google Patents

Dispositif de traitement plasmique par anode

Info

Publication number
EP0429501A1
EP0429501A1 EP19890909158 EP89909158A EP0429501A1 EP 0429501 A1 EP0429501 A1 EP 0429501A1 EP 19890909158 EP19890909158 EP 19890909158 EP 89909158 A EP89909158 A EP 89909158A EP 0429501 A1 EP0429501 A1 EP 0429501A1
Authority
EP
European Patent Office
Prior art keywords
anode
workpieces
individual anodes
individual
anodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
EP19890909158
Other languages
German (de)
English (en)
Inventor
Jan Elwart
Werner Oppel
Wolfgang Rembges
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kloeckner Ionon GmbH
Original Assignee
Kloeckner Ionon GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kloeckner Ionon GmbH filed Critical Kloeckner Ionon GmbH
Publication of EP0429501A1 publication Critical patent/EP0429501A1/fr
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding

Definitions

  • the invention relates to a device for plasma treatment with a cathodically connected charging plate for receiving several workpieces lying next to one another and possibly one above the other and with an anode.
  • the object of the invention is to remedy the problems which occur in the known devices of the type mentioned at the outset due to different thicknesses and / or different temperature values on the surface of a workpiece and to provide a device of the type mentioned at the beginning in which the individual to be treated Glow surfaces as evenly as possible.
  • the anode has a supporting part located above the workpieces, which is electrically conductive, which can be connected to a supply line for a glow voltage and at which elongated individual anodes can be attached at different selectable locations, which are located between the adjacent workpieces protrude.
  • the elongated individual anodes are immersed in the ravines between the workpieces lying next to one another, the individual anodes are designed and arranged in such a way that the electric field on all surfaces to be treated has the same possible values.
  • the arrangement can be adapted to the respective geometrical conditions of a particular batch.
  • the individual anodes are arranged in such a way that they cannot come into contact with workpieces. They will continue to be positioned so that the field conditions no longer vary locally.
  • the length of the individual anodes can also be varied, they can have different cross-sectional shapes, for example flat strips, rod-shaped, etc.
  • the temperature distribution is further influenced by the individual anodes.
  • the individual anodes By selecting the individual anodes with regard to their geometric dimensions, by a special arrangement of the individual anodes, etc., the most uniform possible temperature distribution in the arrangement of the workpieces to be glued is achieved. It has proven to be very advantageous to design the individual anodes to be flexible, in particular to use a metal chain as the individual anode. When such an anode arrangement is introduced into a stack of workpieces, there is no danger that a rigid individual anode will damage and injure, for example scratch, the workpieces, the flexible individual anodes will dodge if they should come into contact with workpieces without the surface being closed scratch.
  • the anode has proven to be advantageous to arrange the anode to be movable in the longitudinal direction of the individual anode. As a result, it does not initially interfere with the charging process and can, when the workpieces are below it, be lowered into the position of the optimal field distribution.
  • the individual anodes are preferably interchangeable, depending on the structure of the batch, those are selected from a set of existing individual anodes which lead to a particularly favorable field distribution. Since the same batch type is often treated repeatedly in devices for plasma treatment, the same anode arrangement can be used again and again for the special structure of a batch.
  • the anode arrangement described can be used as an auxiliary anode; this presupposes that a stationary, for example plate-shaped main anode is provided.
  • the anode arrangement according to the invention can also be the only anode of the device for plasma treatment.
  • the supporting part of the anode arrangement it is advantageous to give the supporting part of the anode arrangement the same surface shape as that of the charging plate. As a result, the supporting part is located vertically above the charging plate and all points on the charging plate can be reached by auxiliary anodes, which are fixed to the supporting part.
  • FIG. 1 shows a perspective Arrangement of an anode device according to the invention, which is located above a charging plate, on which workpieces are arranged side by side.
  • a metallically conductive charging plate 20 there are different workpieces 22 to 30 arranged one next to the other, including a tube, the inner surface of which is to be treated, and a plurality of schematically drawn bodies here, for example a stratification of individual, flat cubic bodies which are identical to one another per are. Between the workpieces, the entire outer surface of which is to be treated, gaps 32 necessarily remain free,
  • the charging plate 20 there is an anode arrangement with a supporting part 34 and a plurality of individual anodes 36, 38 which hang vertically from it.
  • the supporting part 34 is designed as a lattice-shaped frame made of metal and is therefore electrically conductive.
  • the individual anodes can be fastened at each individual point on the inner grid bars, but a field between grid bars can also be bridged by means of suitable devices so that the individual anodes can be fastened at any point in the field.
  • the individual anodes 36, 38 are made in the illustrated embodiment consists of a very flexible metal cable and rich connected in their upper region to the support member 34 fixed '. Their length is selected differently, in any case they end above the surface of the charging plate 20.
  • the individual anode 38 extends into the interior of the tubular workpiece 28. This is a particular advantage of the arrangement according to the invention, as it enables internal anodes to be formed in a simple manner (which are known per se).
  • the supporting part 34 is held on a vertical bar 40, which is only indicated schematically here, and which is also made of metal. It can be moved up and down in the sense of the double arrow 42 by means of a lifting device (not shown). As a result, the anode arrangement can be lifted up to such an extent that the individual electrodes are aligned are located above the uppermost surfaces of the workpieces 22 to 30.
  • a lifting device is not absolutely necessary if the individual anodes 36, 38 are designed to be elastically flexible, in particular are designed as chains.
  • the filled charging plate 20 can be inserted laterally into the fixed anode arrangement.
  • the chains touch the outer surfaces of the workpieces 22 to 30, but slide along them and find themselves in the positions that are shown in the figure. In this way, the free space required for the stroke in the recipient of the plasma treatment device above the supporting part 34 is saved.
  • a voltage source 44 for supplying a high voltage is connected to the rod 40, its other pole is connected to the charging plate 20.
  • the support member 34 can have any shape. It need not necessarily have the same area as the charging plate 20. Individual supporting parts can also be provided, this is particularly advantageous in the case of frequently repeating individual arrangements of workpieces on the charging plate.
  • the attachment of the individual anodes 36, 38 to the support member 34 can be carried out in different ways. In order to be able to adapt the anode arrangement quickly to different configurations on the charging plate 20, the individual anodes 36, 38 are connected to the supporting part 34 by means of quick fastening devices. They are either only clamped onto the bars, using heat-resistant springs, or. clamped by means of a screw on the rods of the support member 34.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

Un dispositif de traitement plasmique comprend une plaque de chargement (20) connectée à une cathode, qui reçoit plusieurs pièces à usiner (22 à 30) adjacentes et éventuellement superposées, ainsi qu'une anode. L'anode comprend une partie de support (34) électroconductrice située au-dessus des pièces à usiner (22 à 30) et connectée à une ligne d'alimentation en tension d'effluve. Plusieurs anodes individuelles (36 à 38) peuvent être assujetties à différents endroits sélectionnables de la partie de support et font saillie entre les pièces à usiner (22 à 30) adjacentes.
EP19890909158 1988-08-18 1989-08-17 Dispositif de traitement plasmique par anode Ceased EP0429501A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE8810441 1988-08-18
DE8810441U 1988-08-18

Publications (1)

Publication Number Publication Date
EP0429501A1 true EP0429501A1 (fr) 1991-06-05

Family

ID=6827010

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19890909158 Ceased EP0429501A1 (fr) 1988-08-18 1989-08-17 Dispositif de traitement plasmique par anode

Country Status (3)

Country Link
EP (1) EP0429501A1 (fr)
JP (1) JPH04500238A (fr)
WO (1) WO1990002213A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19635736C2 (de) * 1996-09-03 2002-03-07 Saxonia Umformtechnik Gmbh Diamantähnliche Beschichtung
DE59913736D1 (de) * 1999-05-16 2006-09-14 Inpro Innovations Gmbh Vorrichtung zur Plasmapolymerisation von Hohlkörperchargen in Mehrstückbearbeitung

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2620390C3 (de) * 1976-05-08 1979-01-18 Ionit Anstalt Bernhard Berghaus, Vaduz Anordnung zum Behandeln von Werkstücken mittels stromstarker Glimmentladungen

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO9002213A1 *

Also Published As

Publication number Publication date
WO1990002213A1 (fr) 1990-03-08
JPH04500238A (ja) 1992-01-16

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Legal Events

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Effective date: 19930520