EP0452772A1 - Matériaux photographiques à l'halogénure d'argent - Google Patents
Matériaux photographiques à l'halogénure d'argent Download PDFInfo
- Publication number
- EP0452772A1 EP0452772A1 EP91105559A EP91105559A EP0452772A1 EP 0452772 A1 EP0452772 A1 EP 0452772A1 EP 91105559 A EP91105559 A EP 91105559A EP 91105559 A EP91105559 A EP 91105559A EP 0452772 A1 EP0452772 A1 EP 0452772A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- group
- groups
- silver halide
- hydrogen atom
- added
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 96
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 55
- 239000004332 silver Substances 0.000 title claims abstract description 55
- 239000000463 material Substances 0.000 title claims abstract description 31
- 239000000839 emulsion Substances 0.000 claims abstract description 65
- 150000001875 compounds Chemical class 0.000 claims abstract description 52
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 24
- 125000003118 aryl group Chemical group 0.000 claims abstract description 21
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 17
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims abstract description 8
- 125000004391 aryl sulfonyl group Chemical group 0.000 claims abstract description 8
- 238000001179 sorption measurement Methods 0.000 claims abstract description 8
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims abstract description 6
- 125000005647 linker group Chemical group 0.000 claims abstract description 5
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims abstract description 4
- 125000005129 aryl carbonyl group Chemical group 0.000 claims abstract description 4
- 230000007062 hydrolysis Effects 0.000 claims abstract description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 4
- 125000001931 aliphatic group Chemical group 0.000 claims description 7
- 125000003277 amino group Chemical group 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 125000002252 acyl group Chemical group 0.000 claims description 4
- 125000004104 aryloxy group Chemical group 0.000 claims description 4
- 125000000717 hydrazino group Chemical group [H]N([*])N([H])[H] 0.000 claims description 2
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 description 46
- 238000000034 method Methods 0.000 description 38
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 36
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 30
- 239000000243 solution Substances 0.000 description 27
- 206010070834 Sensitisation Diseases 0.000 description 26
- 238000005299 abrasion Methods 0.000 description 25
- 230000008313 sensitization Effects 0.000 description 24
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 24
- 239000003795 chemical substances by application Substances 0.000 description 23
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 20
- 239000007864 aqueous solution Substances 0.000 description 19
- 239000010410 layer Substances 0.000 description 19
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 238000012545 processing Methods 0.000 description 18
- 108010010803 Gelatin Proteins 0.000 description 15
- 239000008273 gelatin Substances 0.000 description 15
- 229920000159 gelatin Polymers 0.000 description 15
- 235000019322 gelatine Nutrition 0.000 description 15
- 235000011852 gelatine desserts Nutrition 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- 238000011161 development Methods 0.000 description 13
- 230000018109 developmental process Effects 0.000 description 13
- 125000001424 substituent group Chemical group 0.000 description 13
- 229910001961 silver nitrate Inorganic materials 0.000 description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 10
- 239000002253 acid Substances 0.000 description 10
- 125000000623 heterocyclic group Chemical group 0.000 description 10
- 238000011156 evaluation Methods 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 9
- 239000000975 dye Substances 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 8
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 8
- 125000001391 thioamide group Chemical group 0.000 description 8
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 239000002202 Polyethylene glycol Substances 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 7
- 239000010931 gold Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 229920001223 polyethylene glycol Polymers 0.000 description 7
- 239000011241 protective layer Substances 0.000 description 7
- 230000001235 sensitizing effect Effects 0.000 description 7
- 229910052717 sulfur Inorganic materials 0.000 description 7
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 6
- 230000032683 aging Effects 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 150000002429 hydrazines Chemical class 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 230000005070 ripening Effects 0.000 description 6
- 239000011593 sulfur Substances 0.000 description 6
- 125000003396 thiol group Chemical group [H]S* 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- 125000004429 atom Chemical group 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 5
- 235000019345 sodium thiosulphate Nutrition 0.000 description 5
- 239000003381 stabilizer Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- 239000002562 thickening agent Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 3
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical group C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910021612 Silver iodide Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 3
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 3
- 239000000084 colloidal system Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 230000001788 irregular Effects 0.000 description 3
- 238000011068 loading method Methods 0.000 description 3
- 229910000510 noble metal Inorganic materials 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical class N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 3
- 229920000120 polyethyl acrylate Polymers 0.000 description 3
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 3
- 229940116357 potassium thiocyanate Drugs 0.000 description 3
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 229930182490 saponin Natural products 0.000 description 3
- 150000007949 saponins Chemical class 0.000 description 3
- 229940045105 silver iodide Drugs 0.000 description 3
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 2
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 2
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical group SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 2
- TZNOQWZRUXSMSN-UHFFFAOYSA-N 2-ethenylsulfonyl-n-[1-[(2-ethenylsulfonylacetyl)amino]ethyl]acetamide Chemical compound C=CS(=O)(=O)CC(=O)NC(C)NC(=O)CS(=O)(=O)C=C TZNOQWZRUXSMSN-UHFFFAOYSA-N 0.000 description 2
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- OCVLSHAVSIYKLI-UHFFFAOYSA-N 3h-1,3-thiazole-2-thione Chemical compound SC1=NC=CS1 OCVLSHAVSIYKLI-UHFFFAOYSA-N 0.000 description 2
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 2
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 2
- INVVMIXYILXINW-UHFFFAOYSA-N 5-methyl-1h-[1,2,4]triazolo[1,5-a]pyrimidin-7-one Chemical compound CC1=CC(=O)N2NC=NC2=N1 INVVMIXYILXINW-UHFFFAOYSA-N 0.000 description 2
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 2
- VYDWQPKRHOGLPA-UHFFFAOYSA-N 5-nitroimidazole Chemical compound [O-][N+](=O)C1=CN=CN1 VYDWQPKRHOGLPA-UHFFFAOYSA-N 0.000 description 2
- 125000004070 6 membered heterocyclic group Chemical group 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- MHABMANUFPZXEB-UHFFFAOYSA-N O-demethyl-aloesaponarin I Natural products O=C1C2=CC=CC(O)=C2C(=O)C2=C1C=C(O)C(C(O)=O)=C2C MHABMANUFPZXEB-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000004442 acylamino group Chemical group 0.000 description 2
- 125000004423 acyloxy group Chemical group 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 125000004644 alkyl sulfinyl group Chemical group 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 2
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 2
- 125000005135 aryl sulfinyl group Chemical group 0.000 description 2
- 125000005110 aryl thio group Chemical group 0.000 description 2
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical compound O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 2
- 150000001565 benzotriazoles Chemical class 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- MGNZXYYWBUKAII-UHFFFAOYSA-N cyclohexa-1,3-diene Chemical compound C1CC=CC=C1 MGNZXYYWBUKAII-UHFFFAOYSA-N 0.000 description 2
- LPIQUOYDBNQMRZ-UHFFFAOYSA-N cyclopentene Chemical compound C1CC=CC1 LPIQUOYDBNQMRZ-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- AFOSIXZFDONLBT-UHFFFAOYSA-N divinyl sulfone Chemical compound C=CS(=O)(=O)C=C AFOSIXZFDONLBT-UHFFFAOYSA-N 0.000 description 2
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- PQNFLJBBNBOBRQ-UHFFFAOYSA-N indane Chemical compound C1=CC=C2CCCC2=C1 PQNFLJBBNBOBRQ-UHFFFAOYSA-N 0.000 description 2
- 239000002198 insoluble material Substances 0.000 description 2
- 150000002503 iridium Chemical class 0.000 description 2
- 239000004816 latex Substances 0.000 description 2
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- 238000005259 measurement Methods 0.000 description 2
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- 239000003960 organic solvent Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000006174 pH buffer Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 150000003283 rhodium Chemical class 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 2
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 125000005420 sulfonamido group Chemical group S(=O)(=O)(N*)* 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- DHCDFWKWKRSZHF-UHFFFAOYSA-N sulfurothioic S-acid Chemical compound OS(O)(=O)=S DHCDFWKWKRSZHF-UHFFFAOYSA-N 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 150000003568 thioethers Chemical class 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea group Chemical group NC(=S)N UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 150000003585 thioureas Chemical class 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- 150000003852 triazoles Chemical class 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical class OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- FZENGILVLUJGJX-NSCUHMNNSA-N (E)-acetaldehyde oxime Chemical compound C\C=N\O FZENGILVLUJGJX-NSCUHMNNSA-N 0.000 description 1
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 1
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- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- ZAKLKBFCSHJIRI-UHFFFAOYSA-N mucochloric acid Natural products OC1OC(=O)C(Cl)=C1Cl ZAKLKBFCSHJIRI-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 150000004957 nitroimidazoles Chemical class 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical compound C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- QUBQYFYWUJJAAK-UHFFFAOYSA-N oxymethurea Chemical compound OCNC(=O)NCO QUBQYFYWUJJAAK-UHFFFAOYSA-N 0.000 description 1
- 229950005308 oxymethurea Drugs 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- ATGAWOHQWWULNK-UHFFFAOYSA-I pentapotassium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [K+].[K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O ATGAWOHQWWULNK-UHFFFAOYSA-I 0.000 description 1
- HWGNBUXHKFFFIH-UHFFFAOYSA-I pentasodium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O HWGNBUXHKFFFIH-UHFFFAOYSA-I 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- RWPGFSMJFRPDDP-UHFFFAOYSA-L potassium metabisulfite Chemical compound [K+].[K+].[O-]S(=O)S([O-])(=O)=O RWPGFSMJFRPDDP-UHFFFAOYSA-L 0.000 description 1
- 229940043349 potassium metabisulfite Drugs 0.000 description 1
- 235000010263 potassium metabisulphite Nutrition 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical compound O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- HBCQSNAFLVXVAY-UHFFFAOYSA-N pyrimidine-2-thiol Chemical class SC1=NC=CC=N1 HBCQSNAFLVXVAY-UHFFFAOYSA-N 0.000 description 1
- 125000000719 pyrrolidinyl group Chemical group 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- KIWUVOGUEXMXSV-UHFFFAOYSA-N rhodanine Chemical compound O=C1CSC(=S)N1 KIWUVOGUEXMXSV-UHFFFAOYSA-N 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- PODWXQQNRWNDGD-UHFFFAOYSA-L sodium thiosulfate pentahydrate Chemical compound O.O.O.O.O.[Na+].[Na+].[O-]S([S-])(=O)=O PODWXQQNRWNDGD-UHFFFAOYSA-L 0.000 description 1
- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- AMZPPWFHMNMIEI-UHFFFAOYSA-M sodium;2-sulfanylidene-1,3-dihydrobenzimidazole-5-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=C2NC(=S)NC2=C1 AMZPPWFHMNMIEI-UHFFFAOYSA-M 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 150000003431 steroids Chemical class 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
- 125000004964 sulfoalkyl group Chemical group 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 150000003475 thallium Chemical class 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- JJJPTTANZGDADF-UHFFFAOYSA-N thiadiazole-4-thiol Chemical class SC1=CSN=N1 JJJPTTANZGDADF-UHFFFAOYSA-N 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- 125000005323 thioketone group Chemical group 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/42—Developers or their precursors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/08—Sensitivity-increasing substances
- G03C1/10—Organic substances
Definitions
- the present invention concerns silver halide photographic materials and, in particular, it concerns sensitive materials which can be used in fields such as X-ray, photographic plate making, micro and general purpose amateur negative films, for example.
- the present invention concerns silver halide photographic materials which exhibit improved resistance to the slip-fogging and pressure sensitization which sometimes arise when films are rubbed together.
- Increased covering power is essential to increase the speed of X-ray photosensitive materials, micro-photosensitive materials and general purpose amateur negative photosensitive materials, for example; and it is known that the covering power is increased by reducing the amount of gelatin using the methods disclosed, for example, in JP-A-61-116347 and JP-A-57-182732 (the term "JP-A” as used herein refers to a "published unexamined Japanese patent application").
- JP-A blackening of abraded parts may occur when films are rubbed together if the amount of gelatin with respect to silver is reduced, and slip-fogging may occur as well.
- Hydroquinone derivatives are used in JP-A-62-21143, JP-A-56-1936 and JP-A-54-40629, but these are different compounds from those represented by formula (I) of the present inveniton.
- the object of the present invention is to provide silver halide photographic materials with which the problems of the conventional technology outlined above are overcome. These materials exhibit improved resistance to abrasion during handling and blackening due to pressure, have high photographic speed and are suitable for rapid processing.
- a silver halide photographic material comprising a support having thereon a surface latent image type silver halide emulsion layer and other constitutional layer, wherein a compound represented by formula (I) below is included in the said emulsion layer and/or other constitutional layer: wherein X represents R1 represents a hydrogen atom or a group which can become a hydrogen atom as a result of hydrolysis, R2, R3 and R4 each represents a hydrogen atom or a substitutable group, R5 and R6 each represents a hydrogen atom, an alkyl group, an aryl group, an alkylsulfonyl group, an arylsulfonyl group, an alkylcarbonyl group, an arylcarbonyl group or a carbamoyl group, Y is a group which promotes adsorption on silver halide, L represents a divalent linking group, and m represents 0 or 1.
- the group which can become a hydrogen atom by hydrolysis is, for example, a -COR7 group (where R7 represents a substituted or unsubstituted alkyl group having from 1 to 20 carbon atoms, a substituted or unsubstituted aryl group having from 6 to 20 carbon atoms or a substituted or unsubstituted amino group having from 1 to 20 carbon atoms) or a group (where J represents or -SO2, and Z represents a plurality of atoms required to form at least one 5- or 6-membered heterocyclic ring).
- the substitutable groups represented by R2, R3 and R4 can be, for example, halogen atoms (fluorine, chlorine, bromine), alkyl groups (which preferably have from 1 to 20 carbon atoms), aryl groups (which preferably have from 6 to 20 carbon atoms), alkoxy groups (which preferably have from 1 to 20 carbon atoms), aryloxy groups (which preferably have from 6 to 20 carbon atoms), alkylthio groups (which preferably have from 1 to 20 carbon atoms), arylthio groups (which preferably have from 6 to 20 carbon atoms), acyl groups (which preferably have from 2 to 20 carbon atoms), acylamino groups (preferably alkanoylamino groups which have from 1 to 20 carbon atoms and benzoylamino groups which have from 6 to 20 carbon atoms), nitro groups, cyano groups, oxycarbonyl groups (preferably alkoxycarbonyl groups which have from 1 to 20 carbon atoms and aryloxycarbonyl groups
- R2, R3 and R4 may be the same or different, or in cases where any two of R2, R3 and R4 are substituted onto adjacent carbon atoms of the benzene ring, they may be joined together to form a 5- to 7-membered carbocyclic or heterocyclic ring, and these rings may be saturated or unsaturated.
- ring compounds formed include cyclopentane, cyclohexane, cycloheptane, cyclopentene, cyclohexadiene, cycloheptadiene, indane, norbornane, norbornene and pyridine, and the ring compounds may have further substituent groups.
- R2, R3 and R4 each preferably contain from 1 to 10 carbon atoms in total.
- R5 and R6 each represents hydrogen atoms, substituted or unsubstituted alkyl groups, substituted or unsubstituted aryl groups, substituted or unsubstituted alkylsulfonyl groups, substituted or unsubstituted arylsulfonyl groups, substituted or unsubstituted alkylcarbonyl groups, substituted or unsubstituted arylcarbonyl groups or substituted or unsubstituted carbamoyl groups, and R5 and R6 may be the same or different, and they may be joined together to form a nitrogen-containing heterocyclic ring (for example, a morpholine group, a piperidine group, a pyrrolidine group, an imidazolyl group, a piperazino group may be formed).
- a nitrogen-containing heterocyclic ring for example, a morpholine group, a piperidine group, a pyrrolidine group, an imidazolyl group,
- R2 substitutable groups for R2, R3 and R4, and the -(L) m -Y group can be cited as substituent groups for R5 and R6, and further R5 and R6 each is most preferably hydrogen atoms.
- X is preferably substituted in the ortho or para position with respect to the -OR1 group and, of the groups which can be represented by X, the -OR1 groups are preferred, and R1 is most preferably a hydrogen atom.
- Y is a group which promotes adsorption on silver halide
- L is a divalent linking group.
- m is 0 or 1.
- Preferred examples of groups which promote adsorption on silver halide, represented by Y, include the thioamide group, the mercapto group, groups which have a disulfide bond and nitrogen-containing heterocyclic groups.
- the thioamido groups, which promote adsorption, represented by Y, are divalent groups represented by and this may be part of a ring structure, or it may be a noncyclic thioamide group.
- Useful thioamido adsorption promoting groups can be selected from those disclosed, for example, in U.S. Patents 4,030,295, 4,031,127, 4,080,207, 4,245,037, 4,255,511, 4,266,013 and 4,276,364, and in Research Disclosure , Vol. 151, No. 15162 (November, 1976) and Research Disclosure , Vol. 176, No. 17626 (December, 1978).
- noncyclic thioamide groups include thioureido groups, thiourethane groups and dithiocarbamic acid ester groups
- examples of cyclic thioamide groups include 4-thiazolin-2-thione, 4-imidazolin-2-thione, 2-thiohydantoin, rhodanine, thiobarbituric acid, tetrazolin-5-thione, 1,2,4-triazolin-3-one, 1,3,4-thiadiazolin-2-thione, 1,3,4-oxadiazolin-2-thione, benzimidazolin-2-thione, benzoxazolin-2-thione and benzothiazolin-2-thione, and these may be further substituted with substituent groups.
- the mercapto groups which may be represented by Y include aliphatic mercapto groups, aromatic mercapto groups and heterocyclic mercapto groups (these are the same as the cyclic thioamide groups to which they are related tautomerically in those cases where there is a nitrogen atom adjacent to the carbon atom to which the -SH group is bonded, and examples of these groups are the same as those for the cyclic thioamide groups listed above).
- the groups having a disulfide bond which may be represented by Y are atomic groups having a C-S-S-C bond which is necessary to form 4- to 12-membered rings.
- the nitrogen-containing 5- or 6-membered heterocyclic rings which can be represented by Y are comprised of combinations of nitrogen, oxygen, sulfur and carbon. From among these, preferred examples include benzotriazole, triazole, tetrazole, indazole, benzimidazole, imidazole, benzothiazole, thiazole, benzoxazole, oxazole, thiadiazole, oxadiazole and triazine. These mey be further substituted with appropriate substituent groups. Those listed as possible substituent groups for R2, R3 and R4 can be cited as substituent groups for these nitrogen-containing compounds as well.
- the cyclic thioamide groups (mercapto substituted nitrogen-containing heterocyclic groups, for example, 2-mercaptothiadiazole group, 3-mercapto-1,2,4-triazole group, 5-mercaptotetrazole group, 2-mercapto-1,3,4-oxadiazole group and 2-mercaptobenzoxazole group) or the nitrogen-containing heterocyclic groups (for example, benzotriazole group, benzimidazole group and indazole group) are preferred.
- Two or more Y-(L) m - groups may be substituted, and these groups may be the same or different.
- the divalent linking groups represented by L are atoms or groups of atoms containing at least one atom selected from C, N, S and O.
- the melting point of the obtained compound was 256-257°C.
- the compounds represented by formula (I) are included in photographic materials in amounts of preferably from 1 ⁇ 10 ⁇ 5 mol to 1 ⁇ 10 ⁇ 1 mol, and more preferably from 1 ⁇ 10 ⁇ 4 mol to 5 ⁇ 10 ⁇ 2 mol, per mol of silver halide.
- Hydrazine compounds may also be used in the present invention.
- the hydrazine derivatives which can be used are preferably those represented by formula (II) indicated below
- R1' represents an aliphatic group or an aromatic group
- R2' represents a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an amino group or a hydrazino group
- G1 represents a group, an -SO2- group, an -SO- group, a group, a group, a thiocarbonyl group or an iminomethylene group
- A1 and A2 each represents hydrogen atoms, or one represents a hydrogen atom and the other represents a substituted or unsubstituted alkylsulfonyl group, or a substituted or unsubstituted arylsulfonyl group, or a substituted or unsubstituted acyl group.
- the aliphatic groups represented by R1' in formula (II) preferably have from 1 to 30 carbon atoms, and they are most preferably linear chain, branched or cyclic alkyl groups which have from 1 to 20 carbon atoms.
- the alkyl groups may also include substituent groups.
- the aromatic groups represented by R1' in formula (II) are single ring or double ring aryl groups or unsaturated heterocyclic groups.
- the unsaturated heterocyclic groups may be condensed with aryl groups.
- Aryl groups are preferred for R1', and those which contain a benzene ring are especially desirable.
- the aliphatic groups or aromatic groups represented by R1' may be substituted, and typical substituent groups include, for example, alkyl groups, aralkyl groups, alkenyl groups, alkynyl groups, alkoxy groups, aryl groups, substituted amino groups, ureido groups, urethane groups, aryloxy groups, sulfamoyl groups, carbamoyl groups, alkyl- or arylthio groups, alkyl- or arylsulfonyl groups, alkyl- or arylsulfinyl groups, hydroxyl groups, halogen atoms, cyano groups, sulfo groups, aryloxycarbonyl groups, acyl groups, alkoxycarbonyl groups, acyloxy groups, carboxamido groups, sulfonamido groups, carboxyl groups, phosphonamido groups, diacylamino groups, imide groups and groups.
- typical substituent groups include, for example
- the preferred substituent groups are, for example, alkyl groups (which preferably have from 1 to 20 carbon atoms), aralkyl groups (which preferably have from 7 to 30 carbon atoms), alkoxy groups (which preferably have from 1 to 20 carbon atoms), substituted amino groups (preferably amino groups substituted with alkyl groups which have from 1 to 20 carbon atoms), acylamino groups (which preferably have from 2 to 30 carbon atoms), sulfonamido groups (which preferably have from 1 to 30 carbon atoms), ureido groups (which preferably have from 1 to 30 carbon atoms) and phosphonamido groups (which preferably have from 1 to 30 carbon atoms).
- the alkyl groups represented by R2' in formula (II) are preferably those which have from 1 to 4 carbon atoms, and the single ring and double ring aryl groups (for example, those which contain a benzene ring) are preferred as aryl groups.
- the preferred groups among those represented by R2' are, for example, hydrogen atoms, alkyl groups (for example, methyl, trifluoromethyl, 3-hydroxypropyl, 3-methanesulfonamidopropyl, phenylsulfonylmethyl), aralkyl groups (for example, o-hydroxybenzyl) and aryl groups (for example, phenyl, 3,5-dichlorophenyl, o-methanesulfonamidophenyl, 4-methanesulfonylphenyl, 2-hydroxymethylphenyl).
- the hydrogen atom is especially desirable.
- R2' may also be substituted, and the substituent groups may be substituent groups for on R1.
- G1 in formula (II) is most preferably a group.
- R2' may also be a group such that a cyclization reaction occurs, cleaving the G1-R2' portion from the rest of the molecule and forming a ring structure which contains the atoms of the -G1-R2' portion. Examples include those disclosed, for example, in JP-A-63-29751.
- R1' or R2' in the formula (II) may have incorporated within them the ballast groups or polymers which are normally used in immobile photographically useful additives such as couplers.
- Ballast groups are comparatively inert groups with respect to photographic properties which have at least 8 carbon atoms; and examples of the ballast groups include alkyl groups, alkoxy groups, phenyl groups, alkylphenyl groups, phenoxy groups and alkylphenoxy groups.
- those disclosed, for example, in JP-A-1-100530 can be cited as the above polymers.
- R1' or R2' in the formula (II) may have incorporated within them groups which intensify adsorption on silver halide grains.
- absorbing groups include thiourea groups, heterocyclic thioamide groups, mercapto heterocyclic groups and triazole groups disclosed, for example, in U.S.
- A1 and A2 are most preferably hydrogen atoms.
- hydrazine derivatives which can be used in the present invention include, as well as those indicated above, those disclosed in Research Disclosure, Item 23516 (November, 1983) page 346, and in the literature cited therein, and in U.S. Patents 4,080,207, 4,269,929, 4,276,364, 4,278,748, 4,385,108, 4,459,347, 4,560,638 and 4,478,928, British Patent 2,011,391B, JP-A-60-179734, JP-A-62-270948, JP-A-63-29751, JP-A-61-170733, JP-A-61-270744, JP-A-62-948, EP 217,310 or U.S.
- the hydrazine derivatives are preferably added in amounts within the range from 1 ⁇ 10 ⁇ 6 mol to 5 ⁇ 10 ⁇ 2 mol, and most preferably from 1 ⁇ 10 ⁇ 5 mol to 2 ⁇ 10 ⁇ 2 mol, per mol of silver halide.
- these compounds of the formulae (I) and (II) are included in a photographic material, they can be added to a silver halide emulsion solution or to a hydrophilic colloid solution in the form of an aqueous solution if they are soluble in water; or in the form of a solution in an organic solvent which is miscible with water, such as an alcohol (for example, methanol, ethanol), an ester (for example, ethyl acetate) or a ketone (for example, acetone), in cases where the compounds are insoluble in water.
- an alcohol for example, methanol, ethanol
- an ester for example, ethyl acetate
- a ketone for example, acetone
- the addition can be made at any time from the start of chemical ripening until the solution is coated, but the addition is preferably made after the completion of chemical ripening, and addition to the coating liquid is especially desirable.
- Methods for the preparation of the silver halide emulsions which can be used in the present invention include the methods described by P. Glafkides in Chimie et Physique Photographique (published by Paul Montel, 1967), by G.F. Duffin in Photographic Emulsion Chemistry (published by the Focal Press, 1966) and by V.L. Zelikman et al. in Making and Coating Photographic Emulsions (published by the Focal Press, 1964), the conversion methods disclosed, for example, in U.S. Patents 2,592,250 and 4,075,020, and the methods for the preparation of core/shell emulsions disclosed, for example, in British Patent 1,027,146.
- the water-soluble silver salt (aqueous silver nitrate solution) is reacted with the water-soluble halogen salt solution with a single jet method, a double jet method or a combination of these methods.
- the method in which the pAg value in the liquid phase where the silver halide is formed is kept constant, that is, the controlled double jet method, can also be used as one type of a double jet method.
- grain growth can also be carried out using "so-called silver halide solvents", such as ammonia, thioether and tetra-substituted thiourea, for example.
- silver halide solvents such as ammonia, thioether and tetra-substituted thiourea, for example.
- the silver halide grains in the photographic emulsions used in the present invention can have a comparatively wide grain size distribution, but emulsions which have a narrow grain size distribution are preferred, and those in which 90% of all the grains, either in terms of the weight or number of silver halide grains, are of a grain size within ⁇ 40% of the average grain size are most preferred (emulsions of this type are generally referred to as monodisperse emulsions).
- the silver halide grains in the photographic emulsion may have a regular crystalline form, such as a cubic or octahedral form, or an irregular form, such as a spherical or plate-like form, or they may have a form which is a composite of these crystalline forms.
- the silver halide grains may be such that the interior and surface layer are a uniform phase or different phases.
- Mixtures of two or more silver halide emulsions which have been prepared separately may also be used.
- Cadmium salts, sulfite, lead salts, thallium salts, iridium salts or complex salts thereof; and rhodium salts or complex salts thereof, for example, may also be present during the formation or physical ripening of the silver halide grains in a silver halide emulsion used in the present invention.
- the silver halide emulsions used in the present invention may or may not be chemically sensitized.
- Gold sensitization for example, can be used as a method of chemical sensitization, and combinations of gold sensitization with sulfur sensitization, reduction sensitization and noble metal sensitization methods, for example, can be used.
- the gold sensitization method is typical of the noble metal sensitization methods.
- Gold compounds comprising principally gold complex salts are used for this purpose.
- Complex salts of noble metals other than gold, for example, platinum, palladium and iridium, can also be included. Examples have been disclosed, for example, in U.S. Patent 2,448,060 and British Patent 618,061.
- sulfur compounds which are contained in gelatin
- various sulfur compounds for example, thiosulfate, thioureas, thiazoles and rhodanines, can be used as sulfur sensitizing agents. Examples have been disclosed in U.S. Patents 1,574,944, 2,278,947, 2,410,689, 2,728,668, 3,501,313 and 3,656,955.
- the silver halide emulsions can be optically sensitized to increase the photographic speed and to provide photosensitivity to a prescribed wavelength region.
- Sensitizing dyes such as cyanine dyes and merocyanine dyes, for example, can be used individually or together for optical sensitization purposes, and spectral sensitization and supersensitization can be achieved.
- Various compounds can be included in the photographic emulsions used in the present invention to prevent the occurrence of fogging during the manufacture, storage or photographic processing of the photosensitive material, or to stabilize photographic performance.
- Inorganic or organic film hardening agents may be included in the photographic emulsion layers, and/or other hydrophilic colloid layers, of the photographic material of the present invention.
- chromium salts for example, chrome alum, chromium acetate
- aldehydes for example, formaldehyde, glyoxal, glutaraldehyde
- N-methylol compounds for example, dimethylolurea, methyloldimethylhydantoin
- dioxane derivatives for example, 2,3-dihydroxydioxane
- active vinyl compounds for example, 1,3,5-triacryloyl-hexahydro-s-triazine, 1,3-vinylsulfonyl-2-propanol
- active halogen compounds for example, 2,4-dichloro-6-hydroxy-s-triazine
- mucohalogen acids for example, mucochloric acid, mucophenoxychloric acid
- Varioue surfactants can be included for various purposes in the photographic emulsion layers, and/or other hydrophilic layers, of a photosensitive material made using the present invention. These compounds may be used, for example, as coating aids or as antistatic agents, to improve slip properties, for emulsification and dispersion purposes, for the prevention of adhesion, and for improving photographic performance (for example, accelerating development, increasing contrast or increasing photographic speed).
- nonionic surfactants such as saponin (steroid based), alkylene oxide derivatives (for example, polyethylene glycol, polyethylene glycol/polypropylene glycol condensate, polyethylene glycol alkyl ethers or polyethylene glycol alkyl aryl ethers, polyethylene glycol esters, polyethylene glycol sorbitan esters, polyethylene glycol alkyl amines or amides, and poly(ethylene oxide) adducts of silicones), glycidol derivatives (for example, alkenylsuccinic acid polyglyceride, alkylphenol polyglyceride), fatty acid esters of polyhydric alcohols and sugar alkyl esters; anionic surfactants which include acidic groups, such as carboxylic acid groups, sulfo groups, phospho groups, sulfate ester groups and phosphate ester groups, for example, alkylcarboxylates, alkylsulfonates, al
- Dispersions of water-insoluble or sparingly soluble synthetic polymers can be included in a photographic emulsion layer and the other hydrophilic colloid layers of the photosensitive material used in the present invention to improve dimensional stability.
- Processing baths which contain dihydroxybenzene based developing agents as the main developing agent, and p-aminophenol based developing agents or 3-pyrazolidone based developing agents as auxiliary developing agents, are preferred in the present invention.
- the dihydroxybenzene based developing agents which can be used in the present invention include hydroquinone, chlorohydroquinone, bromohydroquinone, isopropylhydroquinone, methylhydroquinone, 2,3-dichlorohydroquinone, 2,3-dibromohydroquinone and 2,5-dimethylhydroquinone, for example, but the use of hydroquinone, among these compounds, is especially desirable.
- 1-phenyl-3-pyrazolidones and derivatives thereof which can be used as auxiliary developing agents include 1-phenyl-3-pyrazolidone, 1-phenyl-4,4-dimethyl-3-pyrazolidone, 1-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone, 1-phenyl-4,4-dihydroxymethyl-3-pyrazolidone, 1-phenyl-5-methyl-3-pyrazolidone, 1-p-aminophenyl-4,4-dimethyl-3-pyrazolidone and 1-p-tolyl-4,4-dimethyl-3-pyrazolidone.
- the p-aminophenol based auxiliary developing agents which can be used in the present invention include N-methyl-p-aminophenol, p-aminophenol, N-( ⁇ -hydroxyethyl)-p-amino phenol, N-(4-hydroxyphenyl)glycine, 2-methyl-p-aminophenol and p-benzylaminophenol, for example; and, among these, N-methyl-p-aminophenol is preferred.
- a dihydroxybenzene based developing agent in an amount of from 0.05 to 0.8 mol/ liter is preferred.
- the former are preferably used in amounts of from 0.05 to 0.5 mol/liter and the latter are preferably used in amounts of not more than 0.06 mol/ liter.
- Sodium sulfite, potassium sulfite, lithium sulfite, sodium bisulfite, potassium metabisulfite and formaldehyde/sodium sulfite can be used as sulfite preservatives in the present invention.
- the sulfite is used in an amount of at least 0.3 mol/liter; but, if too large an amount is added, it precipitates in the developer and causes contamination of the liquid. So, an upper limit of 1.2 mol/liter is desirable.
- Tertiary amine compounds and especially the compounds disclosed in U.S. Patent 4,269,929, can be included as development accelerators in the developer in the present invention.
- pH buffers such as boric acid, borax, sodium triphosphate, potassium triphosphate, and the pH buffers disclosed in JP-A-60-93433 can also be used in the developer of the present invention.
- Development inhibitors such as potassium bromide and potassium iodide
- organic solvents such as ethylene glycol, diethylene glycol, triethylene glycol, dimethylformamide, methyl cellosolve, hexylene glycol, ethanol and methanol
- indazole compounds such as 5-nitroindazole, antifogging agents and black spotting (black pepper) preventing agents, such as 2-mercaptobenzimidazole-5-sulfonic acid sodium salt, and 5-methylbenzotriazole may be included.
- toners may be included, if desired.
- surfactants may be included, if desired.
- hard water softening agents may be included, if desired.
- film hardening agents may be included, if desired.
- Well known fixing agent compositions can be used in the present invention.
- the organic sulfur compounds which are known to be effective as fixing agents can also be used.
- Water-soluble aluminum salts such as aluminum sulfate and alum, for example, can be included in the fixing solution as film hardening agents.
- the amount of water-soluble aluminum salt used is generally from 0 to 3.0 g ⁇ Al/liter.
- ethylenediaminetetraacetic acid ferric complex salts may be used as oxidizing agents.
- the processing temperature is generally selected within the range from 18°C to 50°C, but temperatures below 18°C and in excess of 50°C may be used.
- an aqueous solution containing 8.33 g of silver nitrate was added over a period of 26 minutes so the flow rate at the end of the addition was twice that at the start of the addition.
- 20 ml of 25% ammonia solution and 10 ml of 50% NH4NO3 were added.
- 240 ml of 1 N sulfuric acid were added after physical ripening of 20 minutes duration, and the mixture was neutralized.
- an aqueous solution containing 153.34 g of silver nitrate and an aqueous solution of potassium bromide were added over a period of 40 minutes using the controlled double jet method in such a way that the potential was maintained at a pAg value of 8.2.
- a coating solution was prepared by adding the reagents indicated below to the emulsion per mol of silver halide.
- the coating solution described above was coated onto a transparent PET support having a thickness of 175 ⁇ m at the same time as a surface protective layer coating solution.
- the coated amount of silver was 2.0 g per square meter.
- the surface protective layer was prepared using the amounts of each component indicated below.
- the photographic materials 1 to 13 (Table 1) were each obtained in this way.
- Photographic samples 1 to 13 were subjected to a 1/20th second exposure using green light which had a peak at 550 nm and then they were SP-processed at 35°C (dry to dry time: 45 seconds) using developer RD 7 and fixer Fuji F in an automatic processor FPM9000 made by the Fuji Photo Film Co., Ltd.
- Photographic speed was expressed by means of the reciprocal of the exposure required to provide a density of fog + 1.0 and the results obtained, taking the speed of photographic material 1 to be 100, are summarized in Table 1.
- Photographic materials 1 to 13 were equilibrated for 1 hour under conditions of 25°C, 25% RH and then they were rubbed at a speed of 1 cm per second with a commercial nylon brush under the same conditions with a loading of 100 g per 2 ⁇ 1 cm area. The samples were then processed in an unexposed condition in accordance with the automatic processing operation described above and the number of black abrasion lines was counted.
- a base was prepared with an underlayer with the coated amounts indicated below established on both surfaces of a blue colored poly(ethylene terephthalate) support having a thickness of 175 ⁇ m.
- Example 1 The emulsions described in Example 1 were coated onto both sides of this base in amounts of 1.9 g/ m2 of coated silver per side. At this time, the compound of the formula (I), or the comparative compound, was added so the amount added per mol of silver was as shown in Table 2. Protective layers were obtained using the same coating solution as in Example 1. The amount of film hardening agent added was changed to 15 mmol per 100 g of gelatin. Photographic materials 1 to 13 were obtained in this way. Abrasion resistance was evaluated in the same way as described in Example 1. However, processing was modified to that described below for the evaluation of photographic performance.
- Example 1 The samples were exposed in the same way as in Example 1 from both sides and then processed in an automatic processor using the developer and fixer described below.
- Each processing tank was filled with a processing solution as indicated below when starting development processing.
- Emulsions A to E were prepared using the methods described below.
- An aqueous solution of silver nitrate and an aqueous solution containing potassium bromide and potassium iodide were added, using the double jet method, to a container which contained potassium bromide and 25 g of gelatin in 1 liter of water, while maintaining a pAg value of 8.7.
- a regular octahedral silver iodobromide emulsion of average grain size 0.8 ⁇ m was obtained.
- This emulsion was chemically sensitized using sodium thiosulfate and chloroauric acid; a regular octahedral photosensitive silver iodobromide emulsion (A), which had an iodide content of 8 mol% at pAg 8.6, pH 6.4, was obtained.
- An aqueous solution of silver nitrate and an aqueous solution of potassium bromide were added using the double jet method, with the usual ammonia procedure, to a vessel which contained 25 g of potassium bromide, 4.5 g of potassium iodide, 9 ml of 2 N potassium thiocyanate and 24 g of gelatin in 1 liter of water.
- This emulsion was chemically sensitized using sodium thiosulfate and chloroauric acid; the photosensitive silver iodobromide emulsion (B) having pAg 8.6, pH 6.4 was obtained.
- Photosensitive silver iodobromide emulsion (C) average grain size 0.6 ⁇ m, which contained 6 mol% of iodide, was obtained by including 9 g of potassium iodide in the initial solution and carrying out grain formation and chemical sensitization in the same way as described for emulsion (B).
- An aqueous solution of silver nitrate and a mixed aqueous solution of potassium bromide and potassium iodide were prepared. 5% of the volume of the aqueous solution of silver nitrate and the mixed aqueous solution were added to a vessel which contained 5 g of potassium bromide and 30 g of gelatin in 1 liter of water in such a way that the pAg value was maintained at 9.5. Then, 5% of the volume of the silver nitrate solution were added using the siagle jet method; and finally the remaining 90% of the aqueous silver nitrate solution and the mixed aqueous solution of potassium bromide and potassium iodide were added using the double jet method, maintaining a pAg value of 8.1.
- a tabular silver halide emulsion of average projected area diameter 1.3 ⁇ m, standard deviation 15% and average aspect ratio 6.5 was obtained.
- This emulsion was chemically sensitized using sodium thiosulfate and chloroauric acid; and the photosensitive silver iodobromide emulsion (E), which had an iodide content of 3 mol%, was obtained at pAg 8.6 and pH 6.4.
- Coated samples were prepared by coating the emulsion layer formulation indicated below onto the emulsion layer coating side of a triacetyl cellulose support having a subbing layer on the emulsion coating side, and on the reverse side, a backing layer having the following formulation:
- the compounds of the formula (I) and comparative compounds were added in the amounts shown in Table 3. Hard films were prepared after storing the coated samples for 7 days at 25°C, 65% RH by means of bis(vinylsulfonylacetamido)ethane so the film thickness on immersion for 3 minutes in distilled water at 25°C was 200 ⁇ 10% of the dry film thickness.
- Coated samples 1 to 25 were stored for 7 days under conditions of 25°C, 65% RH. The samples were then exposed for 1/100 second using a filter which had a wavelength distribution corresponding to sunlight, after which they were developed for 7 minutes at 20°C with the developer; then, after fixation with the fixer, the samples were washed with water and dried. The photographic speeds were measured at fog + 0.3 density using the processed samples.
- the photographic speeds of each of the emulsions A to E were compared as relative value obtained by taking the speed of the blank in each case to be 100.
- Abrasion was carried out with a nylon brush using the same method as described in Example 1.
- the sample was developed and processed in the same way, with sensitometry. Then, the number of blackened abrasion lines was counted in the same way as described in Example 1.
- the samples of the present invention exhibited increased contrast in the toe part (so-called toe cutting) in the sensitometry; and a development accelerating effect was also observed when the development time was short.
- Coated samples 1 to 11 were prepared with the layer constitution indicated below.
- Hard films were prepared after storing the coated samples for 7 days at 25°C, 65% RH. Bis(vinylsulfonylacetamido)ethane was used to ensure that the film thickness, after immersion for 3 minutes in distilled water at 25°C, was 300 ⁇ 10% with respect to the dry film thickness.
- Emulsions (C) and (D) had 230 mg/mol-Ag of the same dye as in Example 3 added before post ripening.
- An aqueous solution of silver nitrate and an aqueous solution containing potassium bromide and potassium iodide were mixed using the double jet method in the presence of ammonia while maintaining a pAg value of 7.9.
- a monodisperse cubic silver iodobromide emulsion was prepared, having average grain size of 0.2 ⁇ m (silver iodide 2.0 mol%, silver bromide 98.0 mol%).
- the sensitizing dye 5,5'-dichloro-3,3'-di(3-sulfopropyl)-9-ethyl-oxacarbocyanine sodium salt was added in an amount of 6 ⁇ 10 ⁇ 4 mol per mol of silver to spectrally sensitize the emulsion.
- An aqueous gelatin solution comprised of gelatin, sodium dodecylbenzenesulfonate, silicone oil, fluorine based surfactant, colloidal silica, poly(ethyl acrylate) dispersion, poly(methyl methacrylate) (particle size: 2.5 ⁇ m) matting agent and poly(sodium styrenesulfonate) thickener was coated as a protective layer to provide a coated gelatin amount of 1.6 g/m2.
- the emulsion layer and the protective layer were coated simultaneously in such a way that the emulsion provided a coated silver amount of 3.6 g/m2.
- the two samples were exposed for 5 seconds through an optical wedge for sensitometric purposes using tungsten light (color temperature: 3,200°K). Then, they were developed for 30 seconds at 38°C in a developer having the composition indicated below, fixed, washed with water and dried. (An automatic processor, model FG-660F, made by the Fuji Photo Film Co., Ltd. was used for development processing.)
- the photographic speed was read off from the exposure at the point of fog + density 1.5 on the characteristic curve.
- the gamma value was obtained as the gradient of the straight line drawn between the point of fog + density 0.3 and the point of fog + density 3.0 on the characteristic curve.
- a gamma value of at least 10 is desirable to ensure adequate image quality.
- the loading on the needle used for abrasion was increased; and the load at which abrasion sensitization was observed to occur was recorded.
- the resistance to abrasion is strong when this value is high, and a value of at least 6 g is desirable.
- a silver chloroiodobromide emulsion (silver iodide content: 0.1 mol%, silver bromide content: 30 mol%) was prepared using the double jet method.
- (NH4)3RhCl6 was added as a rhodium salt to the aqueous halogen solution in an amount of 1 ⁇ 10 ⁇ 7 mol/mol-Ag in the silver chloroiodobromide emulsion.
- K3IrCl6, an iridium salt was also added to the aqueous halogen salt at the same time in an amount of 4 ⁇ 10 ⁇ 7 mol/mol-Ag.
- the aqueous halogen solution and the aqueous silver nitrate solution were mixed at 45°C over a period of 60 minutes and a monodisperse cubic emulsion having an average grain size of 0.25 ⁇ m was obtained.
- the compound indicated below was added in an amount of 1.2 ⁇ 10 ⁇ 3 mol/mol-Ag as a hydrazine compound.
- the compound of the formula (I) or hydroquinone was added in the amount shown in Table 6.
- An aqueous gelatin solution comprised of gelatin, sodium dodecylbenzenesulfonate, silicone oil, fluorine based surfactant, colloidal silica, a dispersion of poly(ethyl acrylate), polyacrylamide (molecular weight: 5,000), poly(methyl methacrylate) (particle size: 2.5 ⁇ m), matting agent and poly(sodium styrenesulfonate), thickener, was coated as a protective layer so that the coated amount of gelatin was 1.6 g/m2. The emulsion was coated so that the coated amount of silver was 3.6 g/m2. The emulsion layer and the protective layer were coated simultaneously.
- the compounds of the formula (I) of the present invention performed better with respect to loss of photographic speed, decrease in gamma and abrasion than the comparative compound hydroquinone.
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2094551A JPH0367243A (ja) | 1989-05-15 | 1990-04-10 | ハロゲン化銀写真感光材料 |
| JP94551/90 | 1990-04-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0452772A1 true EP0452772A1 (fr) | 1991-10-23 |
| EP0452772B1 EP0452772B1 (fr) | 1997-07-16 |
Family
ID=14113454
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP19910105559 Expired - Lifetime EP0452772B1 (fr) | 1990-04-10 | 1991-04-09 | Matériaux photographiques à l'halogénure d'argent |
Country Status (2)
| Country | Link |
|---|---|
| EP (1) | EP0452772B1 (fr) |
| DE (1) | DE69126815T2 (fr) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0482599A1 (fr) * | 1990-10-23 | 1992-04-29 | Fuji Photo Film Co., Ltd. | Matériau photographique à l'halogénure d'argent sensible à la lumière |
| EP0488029A1 (fr) * | 1990-11-19 | 1992-06-03 | Fuji Photo Film Co., Ltd. | Matériau photographique à l'halogénure d'argent sensible à la lumière |
| EP0782042A2 (fr) | 1995-12-27 | 1997-07-02 | Fuji Photo Film Co., Ltd. | Composé d'hydrazine et matériau photographique à l'halogénure d'argent le contenant |
| US6100020A (en) * | 1997-09-19 | 2000-08-08 | Eastman Kodak Company | Process for the preparation of silver halide photographic element |
| US6235461B1 (en) | 1998-06-19 | 2001-05-22 | Tulalip Consultoria Comercial Sociedade Unipessoal S.A. | Radiographic element having improved speed to Dmin ratio and manufacturing process thereof |
| EP1750173A1 (fr) | 2005-08-04 | 2007-02-07 | Fuji Photo Film Co., Ltd. | Matériau photosensible à l'halogénure d'argent et corps emballé le contenant |
| WO2008038764A1 (fr) | 2006-09-28 | 2008-04-03 | Fujifilm Corporation | Écran à émission spontanée, procédé de fabrication d'un écran à émission spontanée, film conducteur transparent, dispositif électroluminescent, électrode transparente de cellule solaire et électrode transparente de papier électronique |
| WO2008075771A1 (fr) | 2006-12-21 | 2008-06-26 | Fujifilm Corporation | Film conducteur et son procédé de fabrication |
| WO2025058077A1 (fr) | 2023-09-15 | 2025-03-20 | 富士フイルム株式会社 | Composé, composition, matériau fonctionnel, matériau photographique à halogénure d'argent photosensible et matériau photographique à halogénure d'argent photosensible de type à transfert par diffusion |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2758765A1 (de) * | 1977-09-06 | 1979-03-15 | Fuji Photo Film Co Ltd | Verfahren zur erzeugung von kontrastreichen photographischen bildern |
| GB2077453A (en) * | 1980-04-30 | 1981-12-16 | Fuji Photo Film Co Ltd | Development of silver halide photographic elements |
| US4734353A (en) * | 1983-08-08 | 1988-03-29 | Fuji Photo Film Co., Ltd. | Methods using oximes for processing a silver halide photographic light-sensitive material |
| US4845020A (en) * | 1984-10-09 | 1989-07-04 | Fuji Photo Film Co., Ltd. | Method of processing silver halide photographic material using an organic compound which loses its development restraining function by reaction with an oxidized developer |
-
1991
- 1991-04-09 DE DE1991626815 patent/DE69126815T2/de not_active Expired - Fee Related
- 1991-04-09 EP EP19910105559 patent/EP0452772B1/fr not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2758765A1 (de) * | 1977-09-06 | 1979-03-15 | Fuji Photo Film Co Ltd | Verfahren zur erzeugung von kontrastreichen photographischen bildern |
| GB2077453A (en) * | 1980-04-30 | 1981-12-16 | Fuji Photo Film Co Ltd | Development of silver halide photographic elements |
| US4734353A (en) * | 1983-08-08 | 1988-03-29 | Fuji Photo Film Co., Ltd. | Methods using oximes for processing a silver halide photographic light-sensitive material |
| US4845020A (en) * | 1984-10-09 | 1989-07-04 | Fuji Photo Film Co., Ltd. | Method of processing silver halide photographic material using an organic compound which loses its development restraining function by reaction with an oxidized developer |
Non-Patent Citations (1)
| Title |
|---|
| RESEARCH DISCLOSURE, no. 184, August 1979, pages 433-441, Havant, Hampshire, GB; item 18431: "Radiographic films/materials" * |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0482599A1 (fr) * | 1990-10-23 | 1992-04-29 | Fuji Photo Film Co., Ltd. | Matériau photographique à l'halogénure d'argent sensible à la lumière |
| US5643711A (en) * | 1990-10-23 | 1997-07-01 | Fuji Photo Film Co., Ltd. | Silver halide photographic light-sensitive material |
| EP0488029A1 (fr) * | 1990-11-19 | 1992-06-03 | Fuji Photo Film Co., Ltd. | Matériau photographique à l'halogénure d'argent sensible à la lumière |
| EP0782042A2 (fr) | 1995-12-27 | 1997-07-02 | Fuji Photo Film Co., Ltd. | Composé d'hydrazine et matériau photographique à l'halogénure d'argent le contenant |
| US6100020A (en) * | 1997-09-19 | 2000-08-08 | Eastman Kodak Company | Process for the preparation of silver halide photographic element |
| US6235461B1 (en) | 1998-06-19 | 2001-05-22 | Tulalip Consultoria Comercial Sociedade Unipessoal S.A. | Radiographic element having improved speed to Dmin ratio and manufacturing process thereof |
| EP1750173A1 (fr) | 2005-08-04 | 2007-02-07 | Fuji Photo Film Co., Ltd. | Matériau photosensible à l'halogénure d'argent et corps emballé le contenant |
| WO2008038764A1 (fr) | 2006-09-28 | 2008-04-03 | Fujifilm Corporation | Écran à émission spontanée, procédé de fabrication d'un écran à émission spontanée, film conducteur transparent, dispositif électroluminescent, électrode transparente de cellule solaire et électrode transparente de papier électronique |
| WO2008075771A1 (fr) | 2006-12-21 | 2008-06-26 | Fujifilm Corporation | Film conducteur et son procédé de fabrication |
| WO2025058077A1 (fr) | 2023-09-15 | 2025-03-20 | 富士フイルム株式会社 | Composé, composition, matériau fonctionnel, matériau photographique à halogénure d'argent photosensible et matériau photographique à halogénure d'argent photosensible de type à transfert par diffusion |
Also Published As
| Publication number | Publication date |
|---|---|
| DE69126815D1 (de) | 1997-08-21 |
| DE69126815T2 (de) | 1998-01-29 |
| EP0452772B1 (fr) | 1997-07-16 |
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