EP0547366A1 - Radiateur à haute puissance - Google Patents
Radiateur à haute puissance Download PDFInfo
- Publication number
- EP0547366A1 EP0547366A1 EP92119125A EP92119125A EP0547366A1 EP 0547366 A1 EP0547366 A1 EP 0547366A1 EP 92119125 A EP92119125 A EP 92119125A EP 92119125 A EP92119125 A EP 92119125A EP 0547366 A1 EP0547366 A1 EP 0547366A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- dielectric
- radiator
- electrode
- power
- radiator according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
Definitions
- the invention relates to a high-power radiator, in particular for ultraviolet light, with a discharge space filled with filling gas emitting radiation under discharge conditions, the walls of which are formed by an outer and an inner dielectric, the outer surfaces of the outer dielectric being provided with first electrodes, with second electrodes Electrodes on the surface of the second dielectric facing away from the discharge space, and with an alternating current source connected to the first and second electrodes for supplying the discharge.
- the invention relates to a state of the art, such as that which results from EP-A 254 111, US patent application 07/485544 dated February 27, 1990 or also EP patent application 90103082.5 dated February 17, 1990.
- UV sources The industrial use of photochemical processes depends heavily on the availability of suitable UV sources.
- the classic UV lamps deliver low to medium UV intensities at some discrete wavelengths, such as the low-pressure mercury lamps at 185 nm and especially at 254 nm.
- Really high UV powers can only be obtained from high-pressure lamps (Xe, Hg), which then distribute their radiation over a larger wavelength range.
- the new excimer lasers have provided some new wavelengths for basic photochemical experiments. for cost reasons for an industrial process probably only suitable in exceptional cases.
- the high-performance lamps mentioned are characterized by high efficiency, economical structure and enable the creation of large lamps, such as those used in UV polymerization and sterilization.
- Wide conveyor belts or cylinders often have to be irradiated by rod-shaped UV lamps.
- films, papers, cardboards, fabric frames, etc. coated with paints, varnishes or adhesives are irradiated by UV lamps approx. 1 meter long. Since the intensity of the lamps is normally evenly distributed over the length, the edge zones of the substrate naturally receive a lower radiation dose.
- the emitters In order to obtain a dose that is sufficient for the process at the edge, the emitters would have to be made considerably longer than the substrate width. This is usually ruled out on systems with conveyor belts for design reasons. The other option is to increase the intensity of the lamps so that the dose is just sufficient on the edge. So you accept a considerable overexposure of the middle zones with a corresponding energy consumption.
- the object of the invention is to create a high-power radiator, in particular for UV or VUV radiation, which is characterized in particular by high efficiency, is economical to manufacture, and in which the radiation can be emitted in a targeted manner.
- the proposed radiator is intended to enable flat substrates to be applied homogeneously.
- a high-power radiator of the type mentioned at the outset that means for influencing the radiation characteristic of the radiator are provided for locally changing the operating voltage of the discharge and / or the effective dielectric capacitance, and essentially coupling the second electrode to the discharge space takes place via a liquid with a dielectric constant that is at least 10 times higher than the dielectric constant of the dielectric, which liquid also serves to cool the radiator.
- the invention makes it possible for the first time to create UV lamps whose intensity is distributed unevenly over the length and is slightly raised at the ends.
- An inner quartz tube 2 is in an outer quartz tube 1 with a wall thickness of approximately 0.5 to 1.5 mm and an outer diameter of approximately 20 to 30 mm arranged coaxially.
- a helical inner electrode 3 bears against the inner surface of the inner quartz tube 2.
- An outer electrode 4 in the form of a wire mesh extends over the entire outer circumference of the outer quartz tube 1.
- a wire 4 is inserted into the inner quartz tube 3.
- the quartz tubes 1 and 2 are closed or melted at both ends by a cover 5 and 6, respectively.
- the space between the two tubes 1 and 2, the discharge space 7, is filled with a gas / gas mixture which emits radiation under discharge conditions.
- This liquid also serves to cool the radiator.
- the coolant is supplied or removed via the connections 9 and 10.
- the cooling liquid serves for the electrical coupling of the inner electrode 3 to the inner quartz tube 2, so that it is not necessary for the helical electrode 3 to be in contact with the inner wall everywhere.
- the two electrodes 3, 4 are connected to the two poles of an alternating current source 11.
- the alternating current source supplies an adjustable alternating voltage in the order of magnitude from several 100 volts to 20,000 volts at frequencies in the range of technical alternating current up to a few 1000 kHz - depending on the electrode geometry, pressure in the discharge space and composition of the filling gas.
- the fill gas is e.g. Mercury, noble gas, noble gas-metal vapor mixture, noble gas-halogen mixture, optionally using an additional further noble gas, preferably Ar, He, Ne, as a buffer gas.
- the electron energy distribution can be optimally adjusted by the thickness of the dielectrics and their properties, pressure and / or temperature in the discharge space.
- the power consumption can be changed by changing the operating voltage U B and / or by Dielectric capacitance C D affect. If you only change these sizes locally, you can specifically influence the power consumption and thus the UV intensity along a tube and / or in the circumferential direction of the tube.
- the power consumed can also be increased by increasing the dielectric capacitance (see equation (1)). This can be achieved by reducing the wall thickness of the inner and / or outer quartz tube 2 or 1 in the edge zones, or by doping the quartz with substances such as TiO2 or BaTiO3.
- the radiator shown in FIG. 5 has a central electrode 3 ', over which a dielectric tube 12, which acts as an additional capacitance, is pushed. Its inside diameter is larger than the outside diameter of the central electrode 3 '.
- the length of this tube 12 is less than that of the outer and inner dielectric tubes 1 and 2. Because this additional capacitance (electrically) is connected in series to the capacities of the inner and outer dielectric tube, the effective dielectric capacitance C D in the central part of the radiator is reduced . This automatically leads to a lower power consumption in the center of the radiator.
- the wall thickness and length of the tube 12 thus allow the axial intensity profile to be controlled and the dose to be largely homogenized on the substrate.
- the intensity profile can be controlled even more precisely if a molded body made of dielectric material is installed, which has a continuous transition, as shown in FIG.
- a common feature of the embodiments according to FIGS. 5 and 6 is that the coupling of the central inner electrode 3 'to the inner quartz tube 2 (and thus to the discharge space 7) is not direct, but rather via the liquid filling the interior 8 of the inner quartz tube 2, preferably demineralized water.
- the effective increase in the dielectric capacitance C D is essentially only influenced by the molded body 12 ′ and hardly by the water.
- a tubular shaped body 12' ' can also be fastened to the inner wall of the inner quartz tube 2, which, as can be seen from FIG. 7, similarly to FIG. 6 against its two ends tapers towards it.
- a helical electrode 3 is used here, which rests in the middle section on the inner wall of the shaped body 12 ′′ and in the edge zone on the quartz tube 2.
- the axial power and intensity control described above can also be used, without going beyond the scope of the invention, for the radial control of the power consumed and thus of the UV intensity.
- a shaped body 12a with a crescent-shaped cross section made of dielectric material extends only over the upper half of the inner circumference of the inner quartz tube 2 (FIG. 9). In longitudinal section, it corresponds to the shaped body 12 ′′ of FIG. 7, ie on both Ends tapering in front of the edge area of the spotlight.
- An equivalent solution with a half tube 12b made of dielectric material without a leaking edge zone is shown in section in FIG. In both variants a helical inner electrode 3 is used.
- molded bodies made of dielectric material can also be introduced into the interior 8 of the inner quartz tube 2, which only partially surround this electrode.
- a half tube 12c made of dielectric material is arranged, in FIG. 12 a shaped body 12d with a crescent-shaped cross section and in FIG. 13 a shaped body 12e with a kidney-like cross section. All these additional capacitances 12a to 12e reduce the power consumption in the upper section of the discharge space 7, cause an increased power consumption in the lower section of the discharge space 7 and thus force a downward radiation.
- radial and axial power and intensity control can be easily combined in one radiator.
- This also applies to radiator arrangements, as shown in FIGS. 3 and 4.
- the inner quartz tube 2 can also be configured there so that the gap width is the same everywhere in the lower half in the axial direction, while in the upper half it is larger or smaller in the middle section than in the peripheral zone .
- the measures according to the invention for power and intensity control can readily be applied retrospectively to existing radiators, so that in the case of radiators manufactured in series, loss-free control of the axial and / or radial ones is made by inserting an additional molded part in the inner cooling circuit Distribution of power consumption and UV intensity can force.
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4140497 | 1991-12-09 | ||
| DE4140497A DE4140497C2 (de) | 1991-12-09 | 1991-12-09 | Hochleistungsstrahler |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0547366A1 true EP0547366A1 (fr) | 1993-06-23 |
| EP0547366B1 EP0547366B1 (fr) | 1995-10-25 |
Family
ID=6446589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP92119125A Expired - Lifetime EP0547366B1 (fr) | 1991-12-09 | 1992-11-09 | Radiateur à haute puissance |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5386170A (fr) |
| EP (1) | EP0547366B1 (fr) |
| JP (1) | JP2528244B2 (fr) |
| CA (1) | CA2082861A1 (fr) |
| DE (2) | DE4140497C2 (fr) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0578953A1 (fr) * | 1992-07-06 | 1994-01-19 | Heraeus Noblelight GmbH | Emetteur de rayonnement à haute puissance |
| EP0642153A1 (fr) * | 1993-09-08 | 1995-03-08 | Ushiodenki Kabushiki Kaisha | Lampe à décharge à barrière diélectrique |
| DE19613502A1 (de) * | 1996-04-04 | 1997-10-09 | Heraeus Noblelight Gmbh | Langlebiger Excimerstrahler, Verfahren zu seiner Herstellung und zur Lebensdauerverlängerung sowie Vorrichtung zur Durchführung des letztgenannten Verfahrens |
| WO1998043278A3 (fr) * | 1997-03-21 | 1998-12-23 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Spot plat |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19636965B4 (de) * | 1996-09-11 | 2004-07-01 | Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH | Elektrische Strahlungsquelle und Bestrahlungssystem mit dieser Strahlungsquelle |
| DE19739181A1 (de) * | 1997-09-08 | 1999-03-11 | Abb Research Ltd | Entladungsreaktor und Verwendung desselben |
| US6015759A (en) * | 1997-12-08 | 2000-01-18 | Quester Technology, Inc. | Surface modification of semiconductors using electromagnetic radiation |
| US6049086A (en) * | 1998-02-12 | 2000-04-11 | Quester Technology, Inc. | Large area silent discharge excitation radiator |
| DE19844720A1 (de) * | 1998-09-29 | 2000-04-06 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Dimmbare Entladungslampe für dielektrisch behinderte Entladungen |
| DE19953531A1 (de) * | 1999-11-05 | 2001-05-10 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Entladungslampe mit Elektrodenhalterung |
| DE19953533A1 (de) * | 1999-11-05 | 2001-05-10 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Entladungslampe mit Elektrodenhalterung |
| DE10026781C1 (de) * | 2000-05-31 | 2002-01-24 | Heraeus Noblelight Gmbh | Entladungslampe für dielektrisch behinderte Entladung |
| DE10112900C1 (de) * | 2001-03-15 | 2002-07-11 | Heraeus Noblelight Gmbh | Excimer-Strahler, insbesondere UV-Strahler |
| DE10133949C1 (de) * | 2001-07-17 | 2003-03-20 | Inst Niedertemperatur Plasmaph | Vorrichtung zur Erzeugung von Gasentladungen, die nach dem Prinzip der dielektrisch behinderten Entladung aufgebaut ist, für Lichtquellen und Sichtanzeigeeinrichtungen |
| WO2004110932A2 (fr) * | 2003-05-27 | 2004-12-23 | Abq Ultraviolet Pollution Solutions, Inc. | Procede et appareil pour source de rayonnement ultraviolet a haute efficacite |
| US20050199484A1 (en) * | 2004-02-10 | 2005-09-15 | Franek Olstowski | Ozone generator with dual dielectric barrier discharge and methods for using same |
| CN1985348B (zh) * | 2004-07-09 | 2011-05-25 | 皇家飞利浦电子股份有限公司 | 具有集成多功能装置的介电阻挡放电灯 |
| DE102004055328B3 (de) * | 2004-11-16 | 2006-04-13 | Institut für Niedertemperatur-Plasmaphysik e.V. | Vorrichtung nach dem Prinzip einer dielektrisch behinderten Entladung zur Strahlungserzeugung |
| EP1859472A2 (fr) * | 2005-01-07 | 2007-11-28 | Philips Intellectual Property & Standards GmbH | Lampe a decharge comportant une barriere dielectrique segmentee |
| US7683343B2 (en) * | 2005-01-28 | 2010-03-23 | Koninklijke Philips Electronics N.V. | Treatment system comprising a dielectric barrier discharge lamp |
| DE102005007370B3 (de) * | 2005-02-17 | 2006-09-21 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Kompakte UV-Lichtquelle |
| EP1972000A4 (fr) * | 2005-12-21 | 2011-10-26 | Trojan Techn Inc | Ensemble lampe a rayonnement a excimere, module de source et systeme de traitement de liquide contenant le module |
| EP1971999A4 (fr) * | 2005-12-21 | 2012-05-30 | Trojan Techn Inc | Ensemble lampe a rayonnement a excimere, module de source et systeme de traitement de liquide contenant le module |
| DE102005062638A1 (de) * | 2005-12-23 | 2007-07-05 | Heraeus Noblelight Gmbh | Zündhilfe |
| KR101183418B1 (ko) * | 2005-12-30 | 2012-09-14 | 엘지디스플레이 주식회사 | 외부 전극 형광램프 및 이를 이용한 액정표시장치의백라이트 유닛 |
| WO2009068073A1 (fr) * | 2007-11-26 | 2009-06-04 | Osram Gesellschaft mit beschränkter Haftung | Lampe à décharge à barrière diélectrique bi-tube |
| WO2010020923A1 (fr) * | 2008-08-21 | 2010-02-25 | Philips Intellectual Property & Standards Gmbh | Lampe à décharge à barrière diélectrique |
| US8729500B2 (en) | 2010-11-16 | 2014-05-20 | Koninklijke Philips N.V. | Dielectric barrier discharge lamp device, and optical fluid treatment device provided with the dielectric barrier discharge lamp device |
| US9722550B2 (en) | 2014-04-22 | 2017-08-01 | Hoon Ahn | Power amplifying radiator (PAR) |
| DE102021108009B4 (de) | 2021-03-30 | 2023-02-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Multi-Wellenlängen UV-Strahlungsquelle sowie UV-Sonde, insbesondere für die Fluoreszenzanalyse |
| AU2022459256A1 (en) | 2022-05-19 | 2024-11-14 | IOT - Innovative Oberflächentechnologien GmbH | Irradiation device with excimer emitters as uv source |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0385205A1 (fr) * | 1989-02-27 | 1990-09-05 | Heraeus Noblelight GmbH | Dispositif de radiation à haute puissance |
| EP0458140A1 (fr) * | 1990-05-22 | 1991-11-27 | Heraeus Noblelight GmbH | Radiateur à haute puissance |
| EP0254111B1 (fr) * | 1986-07-22 | 1992-01-02 | BBC Brown Boveri AG | Dispositif de rayonnement ultraviolet |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE613178C (de) * | 1934-03-29 | 1935-05-16 | Patra Patent Treuhand | Elektrische Leuchtroehre mit Metalldampffuellung, in deren Innerm sich zwischen den Elektroden eine beiderseits geschlossene und axial gelagerte Glasroehre befindet |
| DE2438372B2 (de) * | 1974-08-09 | 1978-09-14 | Original Hanau Quarzlampen Gmbh, 6450 Hanau | Gas- oder Metalldampfentladungsstrahler |
| NL7908924A (nl) * | 1979-12-12 | 1981-07-16 | Philips Nv | Lagedrukkwikdampontladingslamp. |
| US4504768A (en) * | 1982-06-30 | 1985-03-12 | Fusion Systems Corporation | Electrodeless lamp using a single magnetron and improved lamp envelope therefor |
| DE59010169D1 (de) * | 1990-12-03 | 1996-04-04 | Heraeus Noblelight Gmbh | Hochleistungsstrahler |
-
1991
- 1991-12-09 DE DE4140497A patent/DE4140497C2/de not_active Expired - Fee Related
-
1992
- 1992-11-09 DE DE59204133T patent/DE59204133D1/de not_active Expired - Fee Related
- 1992-11-09 EP EP92119125A patent/EP0547366B1/fr not_active Expired - Lifetime
- 1992-11-13 CA CA002082861A patent/CA2082861A1/fr not_active Abandoned
- 1992-11-13 US US07/976,418 patent/US5386170A/en not_active Expired - Fee Related
- 1992-12-08 JP JP4327819A patent/JP2528244B2/ja not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0254111B1 (fr) * | 1986-07-22 | 1992-01-02 | BBC Brown Boveri AG | Dispositif de rayonnement ultraviolet |
| EP0385205A1 (fr) * | 1989-02-27 | 1990-09-05 | Heraeus Noblelight GmbH | Dispositif de radiation à haute puissance |
| EP0458140A1 (fr) * | 1990-05-22 | 1991-11-27 | Heraeus Noblelight GmbH | Radiateur à haute puissance |
Non-Patent Citations (2)
| Title |
|---|
| PATENT ABSTRACTS OF JAPAN vol. 13, no. 321 (E-790)20. Juli 1989 & JP-A-01 089 576 ( TOSHIBA CORP ) 4. April 1989 * |
| PATENT ABSTRACTS OF JAPAN vol. 16, no. 275 (E-1219)19. Juni 1992 & JP-A-04 065 885 ( TOSHIBA CORP ) 2. März 1992 * |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0578953A1 (fr) * | 1992-07-06 | 1994-01-19 | Heraeus Noblelight GmbH | Emetteur de rayonnement à haute puissance |
| US5432398A (en) * | 1992-07-06 | 1995-07-11 | Heraeus Noblelight Gmbh | High-power radiator with local field distortion for reliable ignition |
| EP0642153A1 (fr) * | 1993-09-08 | 1995-03-08 | Ushiodenki Kabushiki Kaisha | Lampe à décharge à barrière diélectrique |
| EP0721204A3 (fr) * | 1993-09-08 | 1996-11-06 | Ushio Electric Inc | Lampe à décharge à barrière diélectrique |
| KR100238642B1 (ko) * | 1993-09-08 | 2000-01-15 | 다나카 아키히로 | 유전체 배리어 방전램프 |
| DE19613502A1 (de) * | 1996-04-04 | 1997-10-09 | Heraeus Noblelight Gmbh | Langlebiger Excimerstrahler, Verfahren zu seiner Herstellung und zur Lebensdauerverlängerung sowie Vorrichtung zur Durchführung des letztgenannten Verfahrens |
| DE19613502C2 (de) * | 1996-04-04 | 1998-07-09 | Heraeus Noblelight Gmbh | Langlebiger Excimerstrahler und Verfahren zu seiner Herstellung |
| US5889367A (en) * | 1996-04-04 | 1999-03-30 | Heraeus Noblelight Gmbh | Long-life high powered excimer lamp with specified halogen content, method for its manufacture and extension of its burning life |
| WO1998043278A3 (fr) * | 1997-03-21 | 1998-12-23 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Spot plat |
| US6252352B1 (en) | 1997-03-21 | 2001-06-26 | Patent-Treuhand-Gesellschaft Fuer Elektrische Gluehlampen Mbh | Flat light emitter |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05266863A (ja) | 1993-10-15 |
| US5386170A (en) | 1995-01-31 |
| DE4140497C2 (de) | 1996-05-02 |
| EP0547366B1 (fr) | 1995-10-25 |
| DE4140497A1 (de) | 1993-06-17 |
| CA2082861A1 (fr) | 1993-06-10 |
| DE59204133D1 (de) | 1995-11-30 |
| JP2528244B2 (ja) | 1996-08-28 |
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