EP0636713A2 - Bains alcalins cyanurés pour le dépôt électrolytique de revêtements en alliage cuivre étain - Google Patents
Bains alcalins cyanurés pour le dépôt électrolytique de revêtements en alliage cuivre étain Download PDFInfo
- Publication number
- EP0636713A2 EP0636713A2 EP94109336A EP94109336A EP0636713A2 EP 0636713 A2 EP0636713 A2 EP 0636713A2 EP 94109336 A EP94109336 A EP 94109336A EP 94109336 A EP94109336 A EP 94109336A EP 0636713 A2 EP0636713 A2 EP 0636713A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- cyanide
- copper
- contain
- baths
- lead
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
Definitions
- the invention relates to alkaline cyanide baths for the electrodeposition of bright to shiny, leveled copper-tin alloy coatings, the 1 to 60 g / l copper in the form of copper (I) cyanide, 1 to 50 g / l tin in the form of alkali tannate , 0 to 10 g / l zinc in the form of zinc cyanide, 0.1 to 200 g / l of one or more complexing agents, 1 to 100 g / l free alkali metal cyanide, 1 to 50 g / l free alkali metal hydroxide, 0 to 50 g / l Contain alkali carbonate, 0.01 to 5 g / l brightener and 0 to 100 mg / l lead as lead (II) acetate or lead (II) sulfonate.
- the former are therefore used in decorative electroplating to replace, for example, silver, nickel, chromium or aluminum. Because of their very good soldering properties, their abrasion resistance, their corrosion resistance and their low electrical contact resistance, copper-tin coatings are also used increasingly in technical fields.
- the latter are mainly used in decorative electroplating as a replacement for brass and as an underlayer before electroplating. Copper-tin alloy layers do not cause any known allergies on human skin.
- Copper-tin alloys are mainly deposited from alkaline, cyanide-containing electrolytes that contain copper as copper (I) cyanide and tin as sodium stannate.
- Other electrolytes contain phosphate and / or polyphosphate as complexing agents and also colloids, such as polypeptides as gloss additives (DE-PS 860 300).
- These well-known baths must be operated at high, constant temperatures (65 o C and higher) in order to obtain uniform layers of constant composition. Working with these baths is therefore difficult and cumbersome.
- the copper-tin baths can also contain zinc salts, which means that a few percent of zinc is also separated.
- Copper-tin alloy baths have recently become known (DE-PS 33 39 541) which, in addition to copper cyanide, alkali tannate, phosphates, free alkali metal cyanide and free alkali metal hydroxide as complexing agents, also include organic substances in the form of fatty acid-imido-alkyl-dialkylamine oxides, fatty acid -amido-alkyl-dialkylamine-betaine and / or ethoxylated naphthols and as brighteners contain polyethylenediamines, benzaldehydes, ethynols and / or benzylpyridine carboxylates. These baths also require monitoring of the free cyanide and hydroxide content.
- Oligosaccharides based on pentose and hexose have proven particularly useful.
- the baths preferably contain 50 to 150 g / l of these oligosaccharides.
- Baths of this composition are not very sensitive to fluctuations in the hydroxide and cyanide content.
- the coatings deposited from such baths are shiny and shiny.
- the current density range of 1 to 3 A / dm2 that can be used to achieve uniform layers is relatively small.
- the baths preferably contain 0.5 to 1.5 g / l of this gloss agent.
- group a) e.g. Allylsufonate, vinyl sulfonate, from group b) propyne sulfonate and butyne sulfonate, from group c) 1- (3-sulfopropyl) -2-vinyl-pyridinium betaine, 4-methyl-1- (3-sulfopropyl) pyridinium betaine, 4-Benzyl-1- (3-sulfopropyl) pyridinium betaine, and from group d) S-isothiuronium-3-propanesulfonate, o-ethyl-dithiocarbonic acid (3-sulfopropyl) -ester potassium salt.
- the baths are less dependent on fluctuations in the bath components.
- the coatings do not trigger any known allergies and can therefore also replace nickel coatings.
- the baths according to the invention can be operated with insoluble anodes, e.g. with graphite anodes.
- the operating temperatures are 40 to 62 o C, the current densities between 0.1 and 5.0 A / dm2 and the pH values between 11 and 13.
- Baths containing 5 to 25 g / l copper in the form of copper (I) cyanide have proven successful. 5 to 40 g / l tin in the form of sodium stannate, 50-150 g / l complexing agent, 20 to 60 g / l free alkali metal cyanide, 2 to 40 g / l free alkali metal hydroxide, 0.2 to 1.5 g / l brightener and possibly contain 1 to 100 mg / l lead as lead (II) acetate.
- the copper-tin baths can additionally contain known complexing agents, such as phosphates, hydroxycarboxylic acids, aminocarboxylic acids or polyoxycarboxylic acids.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4324995 | 1993-07-26 | ||
| DE4324995A DE4324995C2 (de) | 1993-07-26 | 1993-07-26 | Cyanidisch-alkalische Bäder zur galvanischen Abscheidung von Kupfer-Zinn-Legierungsüberzügen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0636713A2 true EP0636713A2 (fr) | 1995-02-01 |
| EP0636713A3 EP0636713A3 (fr) | 1995-07-26 |
Family
ID=6493699
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP94109336A Withdrawn EP0636713A3 (fr) | 1993-07-26 | 1994-06-17 | Bains alcalins cyanurés pour le dépÔt électrolytique de revêtements en alliage cuivre étain. |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5534129A (fr) |
| EP (1) | EP0636713A3 (fr) |
| JP (1) | JP3305504B2 (fr) |
| BR (1) | BR9402931A (fr) |
| DE (1) | DE4324995C2 (fr) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1961840A1 (fr) * | 2007-02-14 | 2008-08-27 | Umicore Galvanotechnik GmbH | Electrolyte de cuivre-étain et procédé pour le dépôt de couches de bronze |
| EP2085502A1 (fr) * | 2008-01-29 | 2009-08-05 | Enthone, Incorporated | Composition d'électrolytes et procédé pour le dépôt d'un alliage d'étain et de zinc |
| EP2116634A1 (fr) | 2008-05-08 | 2009-11-11 | Umicore Galvanotechnik GmbH | Electrolyte de cuivre-zinc modifié et procédé de déposition de couches de bronze |
| DE102008032398A1 (de) | 2008-07-10 | 2010-01-14 | Umicore Galvanotechnik Gmbh | Verbesserter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten |
| DE102008050135A1 (de) | 2008-10-04 | 2010-04-08 | Umicore Galvanotechnik Gmbh | Verfahren zur Abscheidung von Platin-Rhodiumschichten mit verbesserter Helligkeit |
| WO2011029507A1 (fr) | 2009-09-11 | 2011-03-17 | Umicore Galvanotechnik Gmbh | Procédé de plaquage électrolytique au cuivre d'objets moulés en zinc présentant une moindre tendance à la formation de cloques |
| WO2015000010A1 (fr) | 2013-07-05 | 2015-01-08 | Ing. W. Garhöfer Gesellschaft M.B.H. | Bain d'électrolyte ainsi que objets ou articles qui sont revêtus à l'aide du bain |
| WO2015039152A1 (fr) | 2013-09-18 | 2015-03-26 | Ing.W.Garhöfer Gesellschaft M.B.H. | Dépôt de couches de cu, sn, zn sur des substrats métalliques |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3313277B2 (ja) * | 1995-09-22 | 2002-08-12 | 古河サーキットフォイル株式会社 | ファインパターン用電解銅箔とその製造方法 |
| EP1091023A3 (fr) * | 1999-10-08 | 2003-05-14 | Shipley Company LLC | Composition d'alliage et procédé de plaquage |
| JP3455712B2 (ja) * | 2000-04-14 | 2003-10-14 | 日本ニュークローム株式会社 | 銅−スズ合金めっき用ピロリン酸浴 |
| EP2620529B1 (fr) * | 2012-01-25 | 2014-04-30 | Atotech Deutschland GmbH | Procédé de production de dépôts de cuivre mate |
| CN103422079B (zh) * | 2012-05-22 | 2016-04-13 | 比亚迪股份有限公司 | 一种化学镀铜液及其制备方法 |
| JP6093143B2 (ja) * | 2012-10-19 | 2017-03-08 | 株式会社シミズ | 非シアン銅‐錫合金めっき浴 |
| JP2018127698A (ja) * | 2017-02-10 | 2018-08-16 | 学校法人関東学院 | 電気めっき方法及び電気めっき皮膜 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE496261A (fr) * | 1949-06-11 | |||
| NL217034A (fr) * | 1956-06-15 | |||
| US2916423A (en) * | 1957-06-19 | 1959-12-08 | Metal & Thermit Corp | Electrodeposition of copper and copper alloys |
| JPS58133391A (ja) * | 1982-02-01 | 1983-08-09 | Oosakashi | 光沢銅−ニツケル合金電気めつき浴 |
| DE3339541C2 (de) * | 1983-11-02 | 1986-08-07 | Degussa Ag, 6000 Frankfurt | Alkalisch-cyanidisches Bad zur galvanischen Abscheidung von Kupfer-Zinn-Legierungsüberzügen |
| GB8822641D0 (en) * | 1988-09-27 | 1988-11-02 | Int Paint Plc | Improvements related to coatings |
-
1993
- 1993-07-26 DE DE4324995A patent/DE4324995C2/de not_active Expired - Fee Related
-
1994
- 1994-06-17 EP EP94109336A patent/EP0636713A3/fr not_active Withdrawn
- 1994-07-20 US US08/277,631 patent/US5534129A/en not_active Expired - Lifetime
- 1994-07-25 BR BR9402931A patent/BR9402931A/pt not_active IP Right Cessation
- 1994-07-26 JP JP17424894A patent/JP3305504B2/ja not_active Expired - Fee Related
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1961840A1 (fr) * | 2007-02-14 | 2008-08-27 | Umicore Galvanotechnik GmbH | Electrolyte de cuivre-étain et procédé pour le dépôt de couches de bronze |
| EP2085502A1 (fr) * | 2008-01-29 | 2009-08-05 | Enthone, Incorporated | Composition d'électrolytes et procédé pour le dépôt d'un alliage d'étain et de zinc |
| EP2116634A1 (fr) | 2008-05-08 | 2009-11-11 | Umicore Galvanotechnik GmbH | Electrolyte de cuivre-zinc modifié et procédé de déposition de couches de bronze |
| DE102008032398A1 (de) | 2008-07-10 | 2010-01-14 | Umicore Galvanotechnik Gmbh | Verbesserter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten |
| DE102008050135A1 (de) | 2008-10-04 | 2010-04-08 | Umicore Galvanotechnik Gmbh | Verfahren zur Abscheidung von Platin-Rhodiumschichten mit verbesserter Helligkeit |
| WO2011029507A1 (fr) | 2009-09-11 | 2011-03-17 | Umicore Galvanotechnik Gmbh | Procédé de plaquage électrolytique au cuivre d'objets moulés en zinc présentant une moindre tendance à la formation de cloques |
| DE102009041250A1 (de) | 2009-09-11 | 2011-05-12 | Umicore Galvanotechnik Gmbh | Verfahren zur elektrolytischen Verkupferung von Zinkdruckguss mit verringerter Neigung zur Blasenbildung |
| DE102009041250B4 (de) * | 2009-09-11 | 2011-09-01 | Umicore Galvanotechnik Gmbh | Verfahren zur elektrolytischen Verkupferung von Zinkdruckguss mit verringerter Neigung zur Blasenbildung |
| WO2015000010A1 (fr) | 2013-07-05 | 2015-01-08 | Ing. W. Garhöfer Gesellschaft M.B.H. | Bain d'électrolyte ainsi que objets ou articles qui sont revêtus à l'aide du bain |
| WO2015039152A1 (fr) | 2013-09-18 | 2015-03-26 | Ing.W.Garhöfer Gesellschaft M.B.H. | Dépôt de couches de cu, sn, zn sur des substrats métalliques |
Also Published As
| Publication number | Publication date |
|---|---|
| DE4324995A1 (de) | 1995-02-02 |
| BR9402931A (pt) | 1995-04-11 |
| JPH0754187A (ja) | 1995-02-28 |
| EP0636713A3 (fr) | 1995-07-26 |
| US5534129A (en) | 1996-07-09 |
| JP3305504B2 (ja) | 2002-07-22 |
| DE4324995C2 (de) | 1995-12-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
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| 17P | Request for examination filed |
Effective date: 19940617 |
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| AK | Designated contracting states |
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| RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: DEGUSSA AKTIENGESELLSCHAFT |
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| 17Q | First examination report despatched |
Effective date: 19960315 |
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| GRAG | Despatch of communication of intention to grant |
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| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN |
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| 18W | Application withdrawn |
Withdrawal date: 19970114 |