EP0636713A2 - Bains alcalins cyanurés pour le dépôt électrolytique de revêtements en alliage cuivre étain - Google Patents

Bains alcalins cyanurés pour le dépôt électrolytique de revêtements en alliage cuivre étain Download PDF

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Publication number
EP0636713A2
EP0636713A2 EP94109336A EP94109336A EP0636713A2 EP 0636713 A2 EP0636713 A2 EP 0636713A2 EP 94109336 A EP94109336 A EP 94109336A EP 94109336 A EP94109336 A EP 94109336A EP 0636713 A2 EP0636713 A2 EP 0636713A2
Authority
EP
European Patent Office
Prior art keywords
cyanide
copper
contain
baths
lead
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP94109336A
Other languages
German (de)
English (en)
Other versions
EP0636713A3 (fr
Inventor
Gerd Hoffacker
Hasso Kaiser
Klaus Reissmüller
Günter Wirth
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evonik Operations GmbH
Original Assignee
Degussa GmbH
Demetron GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Degussa GmbH, Demetron GmbH filed Critical Degussa GmbH
Publication of EP0636713A2 publication Critical patent/EP0636713A2/fr
Publication of EP0636713A3 publication Critical patent/EP0636713A3/fr
Withdrawn legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/60Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/58Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper

Definitions

  • the invention relates to alkaline cyanide baths for the electrodeposition of bright to shiny, leveled copper-tin alloy coatings, the 1 to 60 g / l copper in the form of copper (I) cyanide, 1 to 50 g / l tin in the form of alkali tannate , 0 to 10 g / l zinc in the form of zinc cyanide, 0.1 to 200 g / l of one or more complexing agents, 1 to 100 g / l free alkali metal cyanide, 1 to 50 g / l free alkali metal hydroxide, 0 to 50 g / l Contain alkali carbonate, 0.01 to 5 g / l brightener and 0 to 100 mg / l lead as lead (II) acetate or lead (II) sulfonate.
  • the former are therefore used in decorative electroplating to replace, for example, silver, nickel, chromium or aluminum. Because of their very good soldering properties, their abrasion resistance, their corrosion resistance and their low electrical contact resistance, copper-tin coatings are also used increasingly in technical fields.
  • the latter are mainly used in decorative electroplating as a replacement for brass and as an underlayer before electroplating. Copper-tin alloy layers do not cause any known allergies on human skin.
  • Copper-tin alloys are mainly deposited from alkaline, cyanide-containing electrolytes that contain copper as copper (I) cyanide and tin as sodium stannate.
  • Other electrolytes contain phosphate and / or polyphosphate as complexing agents and also colloids, such as polypeptides as gloss additives (DE-PS 860 300).
  • These well-known baths must be operated at high, constant temperatures (65 o C and higher) in order to obtain uniform layers of constant composition. Working with these baths is therefore difficult and cumbersome.
  • the copper-tin baths can also contain zinc salts, which means that a few percent of zinc is also separated.
  • Copper-tin alloy baths have recently become known (DE-PS 33 39 541) which, in addition to copper cyanide, alkali tannate, phosphates, free alkali metal cyanide and free alkali metal hydroxide as complexing agents, also include organic substances in the form of fatty acid-imido-alkyl-dialkylamine oxides, fatty acid -amido-alkyl-dialkylamine-betaine and / or ethoxylated naphthols and as brighteners contain polyethylenediamines, benzaldehydes, ethynols and / or benzylpyridine carboxylates. These baths also require monitoring of the free cyanide and hydroxide content.
  • Oligosaccharides based on pentose and hexose have proven particularly useful.
  • the baths preferably contain 50 to 150 g / l of these oligosaccharides.
  • Baths of this composition are not very sensitive to fluctuations in the hydroxide and cyanide content.
  • the coatings deposited from such baths are shiny and shiny.
  • the current density range of 1 to 3 A / dm2 that can be used to achieve uniform layers is relatively small.
  • the baths preferably contain 0.5 to 1.5 g / l of this gloss agent.
  • group a) e.g. Allylsufonate, vinyl sulfonate, from group b) propyne sulfonate and butyne sulfonate, from group c) 1- (3-sulfopropyl) -2-vinyl-pyridinium betaine, 4-methyl-1- (3-sulfopropyl) pyridinium betaine, 4-Benzyl-1- (3-sulfopropyl) pyridinium betaine, and from group d) S-isothiuronium-3-propanesulfonate, o-ethyl-dithiocarbonic acid (3-sulfopropyl) -ester potassium salt.
  • the baths are less dependent on fluctuations in the bath components.
  • the coatings do not trigger any known allergies and can therefore also replace nickel coatings.
  • the baths according to the invention can be operated with insoluble anodes, e.g. with graphite anodes.
  • the operating temperatures are 40 to 62 o C, the current densities between 0.1 and 5.0 A / dm2 and the pH values between 11 and 13.
  • Baths containing 5 to 25 g / l copper in the form of copper (I) cyanide have proven successful. 5 to 40 g / l tin in the form of sodium stannate, 50-150 g / l complexing agent, 20 to 60 g / l free alkali metal cyanide, 2 to 40 g / l free alkali metal hydroxide, 0.2 to 1.5 g / l brightener and possibly contain 1 to 100 mg / l lead as lead (II) acetate.
  • the copper-tin baths can additionally contain known complexing agents, such as phosphates, hydroxycarboxylic acids, aminocarboxylic acids or polyoxycarboxylic acids.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
EP94109336A 1993-07-26 1994-06-17 Bains alcalins cyanurés pour le dépÔt électrolytique de revêtements en alliage cuivre étain. Withdrawn EP0636713A3 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4324995 1993-07-26
DE4324995A DE4324995C2 (de) 1993-07-26 1993-07-26 Cyanidisch-alkalische Bäder zur galvanischen Abscheidung von Kupfer-Zinn-Legierungsüberzügen

Publications (2)

Publication Number Publication Date
EP0636713A2 true EP0636713A2 (fr) 1995-02-01
EP0636713A3 EP0636713A3 (fr) 1995-07-26

Family

ID=6493699

Family Applications (1)

Application Number Title Priority Date Filing Date
EP94109336A Withdrawn EP0636713A3 (fr) 1993-07-26 1994-06-17 Bains alcalins cyanurés pour le dépÔt électrolytique de revêtements en alliage cuivre étain.

Country Status (5)

Country Link
US (1) US5534129A (fr)
EP (1) EP0636713A3 (fr)
JP (1) JP3305504B2 (fr)
BR (1) BR9402931A (fr)
DE (1) DE4324995C2 (fr)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1961840A1 (fr) * 2007-02-14 2008-08-27 Umicore Galvanotechnik GmbH Electrolyte de cuivre-étain et procédé pour le dépôt de couches de bronze
EP2085502A1 (fr) * 2008-01-29 2009-08-05 Enthone, Incorporated Composition d'électrolytes et procédé pour le dépôt d'un alliage d'étain et de zinc
EP2116634A1 (fr) 2008-05-08 2009-11-11 Umicore Galvanotechnik GmbH Electrolyte de cuivre-zinc modifié et procédé de déposition de couches de bronze
DE102008032398A1 (de) 2008-07-10 2010-01-14 Umicore Galvanotechnik Gmbh Verbesserter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten
DE102008050135A1 (de) 2008-10-04 2010-04-08 Umicore Galvanotechnik Gmbh Verfahren zur Abscheidung von Platin-Rhodiumschichten mit verbesserter Helligkeit
WO2011029507A1 (fr) 2009-09-11 2011-03-17 Umicore Galvanotechnik Gmbh Procédé de plaquage électrolytique au cuivre d'objets moulés en zinc présentant une moindre tendance à la formation de cloques
WO2015000010A1 (fr) 2013-07-05 2015-01-08 Ing. W. Garhöfer Gesellschaft M.B.H. Bain d'électrolyte ainsi que objets ou articles qui sont revêtus à l'aide du bain
WO2015039152A1 (fr) 2013-09-18 2015-03-26 Ing.W.Garhöfer Gesellschaft M.B.H. Dépôt de couches de cu, sn, zn sur des substrats métalliques

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3313277B2 (ja) * 1995-09-22 2002-08-12 古河サーキットフォイル株式会社 ファインパターン用電解銅箔とその製造方法
EP1091023A3 (fr) * 1999-10-08 2003-05-14 Shipley Company LLC Composition d'alliage et procédé de plaquage
JP3455712B2 (ja) * 2000-04-14 2003-10-14 日本ニュークローム株式会社 銅−スズ合金めっき用ピロリン酸浴
EP2620529B1 (fr) * 2012-01-25 2014-04-30 Atotech Deutschland GmbH Procédé de production de dépôts de cuivre mate
CN103422079B (zh) * 2012-05-22 2016-04-13 比亚迪股份有限公司 一种化学镀铜液及其制备方法
JP6093143B2 (ja) * 2012-10-19 2017-03-08 株式会社シミズ 非シアン銅‐錫合金めっき浴
JP2018127698A (ja) * 2017-02-10 2018-08-16 学校法人関東学院 電気めっき方法及び電気めっき皮膜

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE496261A (fr) * 1949-06-11
NL217034A (fr) * 1956-06-15
US2916423A (en) * 1957-06-19 1959-12-08 Metal & Thermit Corp Electrodeposition of copper and copper alloys
JPS58133391A (ja) * 1982-02-01 1983-08-09 Oosakashi 光沢銅−ニツケル合金電気めつき浴
DE3339541C2 (de) * 1983-11-02 1986-08-07 Degussa Ag, 6000 Frankfurt Alkalisch-cyanidisches Bad zur galvanischen Abscheidung von Kupfer-Zinn-Legierungsüberzügen
GB8822641D0 (en) * 1988-09-27 1988-11-02 Int Paint Plc Improvements related to coatings

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1961840A1 (fr) * 2007-02-14 2008-08-27 Umicore Galvanotechnik GmbH Electrolyte de cuivre-étain et procédé pour le dépôt de couches de bronze
EP2085502A1 (fr) * 2008-01-29 2009-08-05 Enthone, Incorporated Composition d'électrolytes et procédé pour le dépôt d'un alliage d'étain et de zinc
EP2116634A1 (fr) 2008-05-08 2009-11-11 Umicore Galvanotechnik GmbH Electrolyte de cuivre-zinc modifié et procédé de déposition de couches de bronze
DE102008032398A1 (de) 2008-07-10 2010-01-14 Umicore Galvanotechnik Gmbh Verbesserter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten
DE102008050135A1 (de) 2008-10-04 2010-04-08 Umicore Galvanotechnik Gmbh Verfahren zur Abscheidung von Platin-Rhodiumschichten mit verbesserter Helligkeit
WO2011029507A1 (fr) 2009-09-11 2011-03-17 Umicore Galvanotechnik Gmbh Procédé de plaquage électrolytique au cuivre d'objets moulés en zinc présentant une moindre tendance à la formation de cloques
DE102009041250A1 (de) 2009-09-11 2011-05-12 Umicore Galvanotechnik Gmbh Verfahren zur elektrolytischen Verkupferung von Zinkdruckguss mit verringerter Neigung zur Blasenbildung
DE102009041250B4 (de) * 2009-09-11 2011-09-01 Umicore Galvanotechnik Gmbh Verfahren zur elektrolytischen Verkupferung von Zinkdruckguss mit verringerter Neigung zur Blasenbildung
WO2015000010A1 (fr) 2013-07-05 2015-01-08 Ing. W. Garhöfer Gesellschaft M.B.H. Bain d'électrolyte ainsi que objets ou articles qui sont revêtus à l'aide du bain
WO2015039152A1 (fr) 2013-09-18 2015-03-26 Ing.W.Garhöfer Gesellschaft M.B.H. Dépôt de couches de cu, sn, zn sur des substrats métalliques

Also Published As

Publication number Publication date
DE4324995A1 (de) 1995-02-02
BR9402931A (pt) 1995-04-11
JPH0754187A (ja) 1995-02-28
EP0636713A3 (fr) 1995-07-26
US5534129A (en) 1996-07-09
JP3305504B2 (ja) 2002-07-22
DE4324995C2 (de) 1995-12-21

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